Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

CH4, Methane, CAS# 74-82-8

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 5 record(s).

NumberTitle
1Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
2Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
3Carbon content control of silicon oxycarbide film with methane containing plasma
4Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
5Atomic Layer Deposition of Nanolayered Carbon Films