Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


ASM Pulsar 3000 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM Pulsar 3000 hardware returned 2 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
2Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing