Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Applied Materials Volta Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Applied Materials Volta hardware returned 1 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM