2022 Year in Review

August 2023 Stats


The publication database currently has 1695 entries.
210 Films
283 Precursors
78 Dep Hardware Sets
255 Characteristics
96 Theses
5204 Authors

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2021 Year in Review
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Recent Database Additions
Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films Gallium nitride thin films by microwave plasma-assisted ALD Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium

TEL Phoenix CVD cluster tool Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using TEL Phoenix CVD cluster tool hardware returned 7 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Copper-ALD Seed Layer as an Enabler for Device Scaling
2Hydrogen plasma-enhanced atomic layer deposition of copper thin films
3Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
4Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
5The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
6Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
7Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers

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