TEL Phoenix CVD cluster tool Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using TEL Phoenix CVD cluster tool hardware returned 7 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
2Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
3Copper-ALD Seed Layer as an Enabler for Device Scaling
4Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
5Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
6Hydrogen plasma-enhanced atomic layer deposition of copper thin films
7The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications