TEL Phoenix CVD cluster tool Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using TEL Phoenix CVD cluster tool hardware returned 7 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
2Copper-ALD Seed Layer as an Enabler for Device Scaling
3Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
4Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
5Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
6Hydrogen plasma-enhanced atomic layer deposition of copper thin films
7Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications