TEL Phoenix CVD cluster tool Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using TEL Phoenix CVD cluster tool hardware returned 7 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
2Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
3Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
4Hydrogen plasma-enhanced atomic layer deposition of copper thin films
5Copper-ALD Seed Layer as an Enabler for Device Scaling
6The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
7Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper