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2021 Year in Review




The publication database currently has 1628 entries.
Search from:
203 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
90 Theses

Use Advanced Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)


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Recent Database Additions
Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
Search 1628 plasma ALD publications by:
203 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics

TEL Phoenix CVD cluster tool Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using TEL Phoenix CVD cluster tool hardware returned 7 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Copper-ALD Seed Layer as an Enabler for Device Scaling
2Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
3Hydrogen plasma-enhanced atomic layer deposition of copper thin films
4Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
5Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
6The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
7Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD

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