Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Applied Materials TxZ chamber Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Applied Materials TxZ chamber hardware returned 1 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition