Your search for plasma enhanced atomic layer deposition publications using Altatech AltaCVD hardware returned 2 records. If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme|
|2||Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps|
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