Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


JSW-Afty AFTEX-600 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using JSW-Afty AFTEX-600 hardware returned 3 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
2Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
3Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition