Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Applied Materials 300mm ALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Applied Materials 300mm ALD hardware returned 3 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
2Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
3Development of a multianalyte optical sol-gel biosensor for medical diagnostic