The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
Type:
Journal
Info:
Applied Physics Letters 87, 262901 (2005)
Date:
2005-11-17
Author Information
| Name | Institution |
|---|---|
| Youngdo Won | Hanyang University |
| Sangwook Park | Hanyang University |
| Jaehyoung Koo | Hanyang University |
| Seokhoon Kim | Hanyang University |
| Jinwoo Kim | Hanyang University |
| Hyeongtag Jeon | Hanyang University |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Surface Reactions
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Substrates
| Si(100) |
Notes
| 1255 |