Publication Information

Title:
High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
Type:
Conference Proceedings
Info:
228th ECS Meeting, October 11-15, 2015
Date:
2015-10-11

Author Information

Name Institution
Jihwan AnStanford University
Fritz B. PrinzStanford University

Films

Other BaTiO3

Hardware used: Unknown

CAS#: 7782-44-7

Film/Plasma Properties

Characteristic: Dielectric Constant, Permittivity
Analysis: -

Characteristic: Leakage Current
Analysis: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -

Characteristic: Density
Analysis: -

Substrates

Keywords

Notes

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