Publication Information

Title: High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films

Type: Conference Proceedings

Info: 228th ECS Meeting, October 11-15, 2015

Date: 2015-10-11

DOI: https://ecs.confex.com/ecs/228/webprogram/Paper60722.html

Author Information

Name

Institution

Stanford University

Stanford University

Films

Other BaTiO3 using Unknown

Deposition Temperature = 250C

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Dielectric Constant, Permittivity

Unknown

-

Leakage Current

Unknown

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Unknown

-

Density

Unknown

-

Substrates

Keywords

Notes

485



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