
IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
Type:
Journal
Info:
Journal of Nanoscience and Nanotechnology, Volume 14, Number 7, July 2014, pp. 5386-5389(4)
Date:
2014-07-01
Author Information
Name | Institution |
---|---|
Deok-Kee Kim | Sejong University |
Films
Film/Plasma Properties
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Substrates
Notes
PEALD IrO2 nanodot charge storage layer for memory device. |
265 |