Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Where to buy (Ethyl Cyclopentadienyl) (CycloHexaDiene) Iridium, Ir(EtCp)(CHD) CAS# 721427-58-3

(Ethyl Cyclopentadienyl) (CycloHexaDiene) Iridium, Ir(EtCp)(CHD) CAS# 721427-58-3 is available from the following source(s):

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸1-Ethylcyclopentadienyl-1,3-cyclohexadieneiridium(I), 99% (99.9%-Ir)

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