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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Growth of silica nanowires in vacuum
Type:
Journal
Info:
CrystEngComm, 2015, 17, 2406-2412
Date:
2015-02-04
Author Information
| Name | Institution |
|---|---|
| V. Gurylev | National Tsing Hua University |
| C. C. Wang | Feng Chia University |
| Y. C. Hsueh | National Tsing Hua University |
| T.-P. Perng | National Tsing Hua University |
Films
Film/Plasma Properties
Substrates
| Silicon |
Keywords
Notes
| 476 |