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Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
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Publication Information
Title:
Growth of silica nanowires in vacuum
Type:
Journal
Info:
CrystEngComm, 2015, 17, 2406-2412
Date:
2015-02-04
Author Information
| Name | Institution |
|---|---|
| V. Gurylev | National Tsing Hua University |
| C. C. Wang | Feng Chia University |
| Y. C. Hsueh | National Tsing Hua University |
| T.-P. Perng | National Tsing Hua University |
Films
Film/Plasma Properties
Substrates
| Silicon |
Keywords
Notes
| 476 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |