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Atomic layer epitaxy of germanium
Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
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Growth of silica nanowires in vacuum
Type:
Journal
Info:
CrystEngComm, 2015, 17, 2406-2412
Date:
2015-02-04
Author Information
| Name | Institution |
|---|---|
| V. Gurylev | National Tsing Hua University |
| C. C. Wang | Feng Chia University |
| Y. C. Hsueh | National Tsing Hua University |
| T.-P. Perng | National Tsing Hua University |
Films
Film/Plasma Properties
Substrates
| Silicon |
Keywords
Notes
| 476 |