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Thickness Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Thickness returned 927 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
2Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
3Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack
4Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
5Plasma-enhanced atomic layer deposition of vanadium nitride
6Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
7Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
8Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
9Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
10Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
11Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
12Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
13Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
14Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
15Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
16ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
17Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
18Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
19Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
20Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
21Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
22Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
23Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
24The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
25Copper-ALD Seed Layer as an Enabler for Device Scaling
26Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
27Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
28Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
29Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
30Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
31Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
32Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
33Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
34Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
35Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
36XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
37Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
38Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
39Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
40Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
41Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
42Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
43Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
44Damage evaluation in graphene underlying atomic layer deposition dielectrics
45Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
46Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
47Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
48Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
49Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
50Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
51Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
52Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
53Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
54Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
55Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
56Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
57Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
58Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
59Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
60A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
61Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
62Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
63Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
64Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
65Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
66Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
67Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
68Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
69Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
70Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
71Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
72Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
73Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
74Atomic layer controlled deposition of silicon nitride with self-limiting mechanism
75Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
76Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
77Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
78Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
79Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
80Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
81Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
82Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
83Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
84Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
85Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
86Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
87In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
88PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
89Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
90Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
91Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
92Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
93Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
94Impact of interface materials on side permeation in indirect encapsulation of organic electronics
95Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
96Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
97Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
98Atomic layer epitaxy of Si using atomic H
99Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
100Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
101Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
102Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
103Plasma enhanced atomic layer deposition of Ga2O3 thin films
104Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
105Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
106Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
107Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
108ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
109Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
110Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
111Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
112Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
113Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
114Texture of atomic layer deposited ruthenium
115In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
116Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
117Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
118Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
119Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
120Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
121Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
122Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
123Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
124Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
125Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
126On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
127Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
128Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
129The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
130Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
131Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
132Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
133Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
134The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
135Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
136Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
137Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
138Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
139Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
140Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
141Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
142Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
143Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
144Crystalline growth of AlN thin films by atomic layer deposition
145Optimization of the Surface Structure on Black Silicon for Surface Passivation
146Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
147Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
148Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
149Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
150Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
151A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
152Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
153Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
154Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
155Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
156Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
157Atomic Layer Deposition of Niobium Nitride from Different Precursors
158Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
159Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
160Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
161Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
162Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
163The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
164Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
165Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
166Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
167Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
168Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
169Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
170RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
171Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
172Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
173Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
174Comparative study of ALD SiO2 thin films for optical applications
175Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
176Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
177Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
178In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
179Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
180Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
181Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
182Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
183Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
184Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
185Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
186Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
187Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
188Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
189Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
190Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
191Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
192Study on the characteristics of aluminum thin films prepared by atomic layer deposition
193Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
194Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
195Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
196Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
197Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
198Plasma enhanced atomic layer deposition of Fe2O3 thin films
199Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
200Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
201Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
202Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
203Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
204Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
205Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
206Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
207Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
208Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
209Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
210The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
211Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
212Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
213Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
214AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
215Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
216Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
217Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
218Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
219Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
220Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
221Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
222Challenges in spacer process development for leading-edge high-k metal gate technology
223Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
224Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
225An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
226Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
227Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
228The important role of water in growth of monolayer transition metal dichalcogenides
229Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
230Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
231Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
232High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
233Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
234Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
235Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
236Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
237Modal properties of a strip-loaded horizontal slot waveguide
238Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
239Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
240Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
241High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
242Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
243A route to low temperature growth of single crystal GaN on sapphire
244Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
245Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
246Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
247In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
248Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
249Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
250Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
251Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
252Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
253Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
254Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
255Analysis of nitrogen species in titanium oxynitride ALD films
256Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
257Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
258Symmetrical Al2O3-based passivation layers for p- and n-type silicon
259Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
260High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
261Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
262Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
263The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
264Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
265Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
266Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
267Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
268New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
269Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
270Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
271Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
272Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
273RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
274Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
275Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
276Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
277Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
278PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
279Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
280Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
281Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
282Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
283Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
284Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
285A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
286Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
287Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
288Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
289Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
290N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
291Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
292Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
293Atmospheric pressure plasma enhanced spatial ALD of silver
294Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
295Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
296Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
297Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
298Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
299Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
300Advances in the fabrication of graphene transistors on flexible substrates
301Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
302Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
303Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
304A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
305Atomic Layer Deposition of the Solid Electrolyte LiPON
306Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
307Atomic layer deposition of GaN at low temperatures
308Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
309Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
310Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
311Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
312Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
313ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
314Self-limiting diamond growth from alternating CFx and H fluxes
315Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
316Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
317Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
318The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
319Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
320Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
321Patterned deposition by plasma enhanced spatial atomic layer deposition
322Thin film GaP for solar cell application
323Composite materials and nanoporous thin layers made by atomic layer deposition
324Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
325Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
326Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
327Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
328Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
329Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
330Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
331Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
332Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
333Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
334Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
335Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
336Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
337Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
338A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
339Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
340Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
341Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
342Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
343Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
344Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
345Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
346Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
347Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
348Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
349Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
350Sub-7-nm textured ZrO2 with giant ferroelectricity
351Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
352Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
353Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
354Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
355Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
356Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
357Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
358Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
359In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
360Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
361Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
362Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
363Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
364Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
365Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
366Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
367A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
368Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
369Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
370Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
371Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
372Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
373MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
374Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
375Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
376Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
377The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
378Topographically selective deposition
379Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
380Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
381Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
382Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
383Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
384Remote Plasma ALD of Platinum and Platinum Oxide Films
385α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
386Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
387Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
388Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
389Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
390Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
391Gadolinium nitride films deposited using a PEALD based process
392Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
393Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
394Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
395Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
396Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
397Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
398Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
399Atomic layer deposition of InN using trimethylindium and ammonia plasma
400Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
401Low temperature plasma enhanced deposition of GaP films on Si substrate
402Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
403Experimental and theoretical determination of the role of ions in atomic layer annealing
404Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
405Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
406Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
407Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
408Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
409Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
410PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
411Spectroscopy and control of near-surface defects in conductive thin film ZnO
412Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
413Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
414Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
415Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
416Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
417Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
418Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
419Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
420Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
421Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
422GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
423Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
424Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
425Low temperature temporal and spatial atomic layer deposition of TiO2 films
426Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
427Characteristics of HfO2 thin films grown by plasma atomic layer deposition
428Perspectives on future directions in III-N semiconductor research
429Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
430Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
431Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
432Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
433Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
434Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
435Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
436Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
437Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
438Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
439Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
440Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
441Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
442AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
443Microwave properties of superconducting atomic-layer deposited TiN films
444Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
445Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
446Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
447Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
448Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
449Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
450Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
451Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
452Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
453Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
454PEALD AlN: controlling growth and film crystallinity
455DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
456Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
457Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
458Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
459Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
460Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
461Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
462TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
463Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
464Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
465Ru thin film grown on TaN by plasma enhanced atomic layer deposition
466Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
467Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
468TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
469Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
470Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
471A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
472Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
473An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
474Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
475Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
476Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
477Structural and optical characterization of low-temperature ALD crystalline AlN
478Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
479High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
480Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
481Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
482Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
483Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
484Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
485Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
486Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
487Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
488Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
489Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
490Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
491Plasma enhanced atomic layer deposition of gallium sulfide thin films
492ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
493Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
494Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
495Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
496Plasma enhanced atomic layer deposition of SiNx:H and SiO2
497Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
498Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
499Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
500Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
501Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
502Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
503Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
504Gallium nitride thin films by microwave plasma-assisted ALD
505Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
506Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
507Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
508Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
509Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
510Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
511Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
512Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
513Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
514Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
515Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
516Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
517Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
518Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
519Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
520Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
521Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
522Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
523Evaluation of plasma parameters on PEALD deposited TaCN
524Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
525WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
526Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
527Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
528Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
529Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
530Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
531Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
532Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
533Carbon content control of silicon oxycarbide film with methane containing plasma
534Room temperature atomic layer deposition of TiO2 on gold nanoparticles
535Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
536Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
537SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
538Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
539Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
540Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
541Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
542Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
543Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
544Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
545Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
546Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
547Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
548GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
549Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
550Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
551Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
552Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
553In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
554Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
555Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
556Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
557Sub-10-nm ferroelectric Gd-doped HfO2 layers
558Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
559In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
560Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
561Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
562AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
563Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
564Optical and Electrical Properties of TixSi1-xOy Films
565Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
566Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
567Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
568Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
569Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
570Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
571Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
572Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
573Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
574Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
575Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
576Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
577Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
578Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
579Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
580Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
581Fast PEALD ZnO Thin-Film Transistor Circuits
582Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
583Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
584Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
585Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
586Plasma-enhanced atomic layer deposition of tungsten nitride
587Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
588Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
589Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
590The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
591Atomic layer epitaxy of germanium
592Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
593Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
594Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
595Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
596Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
597Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
598Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
599Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
600Plasma-Enhanced Atomic Layer Deposition of Ni
601Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
602Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
603Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
604Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
605Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
606Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
607Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
608Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
609Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
610Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
611Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
612The effects of layering in ferroelectric Si-doped HfO2 thin films
613Atomic layer deposition of YMnO3 thin films
614Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
615Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
616Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
617Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
618Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
619Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
620Room-Temperature Atomic Layer Deposition of Platinum
621Innovative remote plasma source for atomic layer deposition for GaN devices
622Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
623A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
624Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
625Densification of Thin Aluminum Oxide Films by Thermal Treatments
626Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
627Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
628Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
629PEALD of Copper using New Precursors for Next Generation of Interconnections
630Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
631Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
632Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
633Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
634Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
635Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
636Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
637Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
638Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
639Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
640Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
641Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
642Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
643Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
644Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
645Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
646Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
647Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
648Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
649Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
650Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
651The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
652Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
653Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
654Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
655Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
656Plasma-enhanced atomic layer deposition of superconducting niobium nitride
657Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
658Atomic Layer Deposition of SiN for spacer applications in high-end logic devices
659Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
660Plasma-enhanced ALD system for SRF cavity
661Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
662High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
663Self-Limiting Growth of GaN at Low Temperatures
664Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
665Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
666Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
667Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
668Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
669Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
670Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
671Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
672Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
673Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
674Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
675Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
676Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
677Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
678Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
679Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
680A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
681Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
682Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
683Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
684Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
685The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
686Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
687Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
688Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
689Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
690Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
691Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
692Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
693Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
694Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
695Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
696Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
697Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
698Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
699Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
700Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
701A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
702Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
703Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
704Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
705Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
706Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
707Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
708Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
709Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
710Atomic layer epitaxy for quantum well nitride-based devices
711Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
712Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
713Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
714Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
715Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
716Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
717Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
718The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
719Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
720Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
721TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
722In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
723Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
724Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
725Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
726Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
727Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
728Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
729Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
730Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
731Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
732Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
733Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
734In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
735Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
736Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
737Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
738GeSbTe deposition for the PRAM application
739Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
740TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
741A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
742Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
743Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
744Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
745Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
746Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
747Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
748Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
749Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
750Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
751Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
752Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
753Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
754Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
755Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
756Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
757Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
758Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
759ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
760Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
761Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
762Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
763Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
764Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
765Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
766In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
767Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
768In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
769Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
770High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
771Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
772Atomic layer deposition of titanium nitride from TDMAT precursor
773Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
774Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
775Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
776HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
777Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
778Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
779Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
780Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
781In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
782Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
783Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
784Tribological properties of thin films made by atomic layer deposition sliding against silicon
785Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
786Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
787Hydrogen plasma-enhanced atomic layer deposition of copper thin films
788Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
789Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
790Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
791Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
792Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
793Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
794Plasma-enhanced atomic layer deposition of titanium vanadium nitride
795Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
796Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
797Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
798Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
799Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
800Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
801Plasma Enhanced Atomic Layer Deposition on Powders
802Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
803Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
804Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
805A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
806Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
807Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
808Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
809Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
810Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
811Plasma-Assisted Atomic Layer Deposition of Palladium
812Optical and Electrical Properties of AlxTi1-xO Films
813Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
814An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
815Properties of AlN grown by plasma enhanced atomic layer deposition
816Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
817Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
818Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
819PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
820Layer-by-layer epitaxial growth of GaN at low temperatures
821Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
822Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
823Plasma enhanced atomic layer deposition of zinc sulfide thin films
824Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
825Sub-nanometer heating depth of atomic layer annealing
826Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
827The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
828Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
829Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
830Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
831Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
8323D structure evolution using metastable atomic layer deposition based on planar silver templates
833Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
834Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
835Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
836Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
837ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
838PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
839Plasma-enhanced atomic layer deposition of zinc phosphate
840Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
841Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
842Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
843A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
844Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
845GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
846Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
847ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
848Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
849Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
850Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
851Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
852Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
853Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
854Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
855Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
856Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
857The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
858High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
859Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
860Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
861In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
862Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
863Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
864The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
865Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
866Graphene-based MMIC process development and RF passives design
867Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
868Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
869Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
870Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
871Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
872Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
873Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
874Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
875Plasma-enhanced atomic layer deposition of BaTiO3
876Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
877Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
878Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
879Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
880Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
881Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
882Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
883Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
884Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
885Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
886Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
887Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
888Plasma-enhanced atomic layer deposition for plasmonic TiN
889Atomic hydrogen-assisted ALE of germanium
890Electron-enhanced atomic layer deposition of silicon thin films at room temperature
891Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
892Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
893XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
894Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
895Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
896Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
897Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
898Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
899Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
900Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
901Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
902Plasma enhanced atomic layer deposition of aluminum sulfide thin films
903Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
904Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
905A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
906Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
907ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications