Thickness Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
2Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
3Sub-7-nm textured ZrO2 with giant ferroelectricity
4Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
5Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
6New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
7Atmospheric pressure plasma enhanced spatial ALD of silver
8Atomic layer epitaxy of Si using atomic H
9Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
10TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
11On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
12Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
13Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
14Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
15Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
16Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
17Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
18Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
19Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
20Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
21Self-limiting diamond growth from alternating CFx and H fluxes
22Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
23Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
24Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
25Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
26Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
27Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
28Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
29Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
30Atomic layer deposition of YMnO3 thin films
31Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
32Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
33Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
34Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
35Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
36Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
37Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
38Graphene-based MMIC process development and RF passives design
39Tribological properties of thin films made by atomic layer deposition sliding against silicon
40Plasma-enhanced atomic layer deposition for plasmonic TiN
41Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
42Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
43Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
44Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
45Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
46Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
47Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
48The important role of water in growth of monolayer transition metal dichalcogenides
49Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
50Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
51Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
52Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
53Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
54Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
55Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
56Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
57Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
58Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
59Atomic layer deposition of titanium nitride from TDMAT precursor
60Gadolinium nitride films deposited using a PEALD based process
61Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
62Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
63Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
64Properties of AlN grown by plasma enhanced atomic layer deposition
65Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
66Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
67TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
68Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
69Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
70Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
71Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
72Comparative study of ALD SiO2 thin films for optical applications
73Plasma-enhanced atomic layer deposition of titanium vanadium nitride
74Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
75Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
76Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
77Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
78Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
79Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
80Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
81Impact of interface materials on side permeation in indirect encapsulation of organic electronics
82Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
83Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
84Innovative remote plasma source for atomic layer deposition for GaN devices
85Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
86An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
87Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
88Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
89Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
90TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
91Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
92Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
93Atomic Layer Deposition of Niobium Nitride from Different Precursors
94Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
95Plasma-enhanced atomic layer deposition of superconducting niobium nitride
96Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
97Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
98Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
99Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
100Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
101A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
102Plasma enhanced atomic layer deposition of aluminum sulfide thin films
103Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
104Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
105Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
106Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
107Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
108Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
109Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
110Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
111Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
112Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
113In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
114MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
115Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
116Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
117Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
118Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
119Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
120Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
121Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
122Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
123Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
124Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
125Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
126Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
127Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
128Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
129Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
130Composite materials and nanoporous thin layers made by atomic layer deposition
131Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
132Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
133Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
134Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
135Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
136Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
137Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
138Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
139Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
140Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
141Room temperature atomic layer deposition of TiO2 on gold nanoparticles
142Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
143The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
144Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
145Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
146Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
147In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
148Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
149Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
150Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
151Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
152Experimental and theoretical determination of the role of ions in atomic layer annealing
153Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
154Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
155Plasma enhanced atomic layer deposition of zinc sulfide thin films
156Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
157Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
158Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
159Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
160Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
161PEALD AlN: controlling growth and film crystallinity
162Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
163Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
164Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
165Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
166Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
167Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
168Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
169Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
170Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
171Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
172Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
173Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
174Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
175Microwave properties of superconducting atomic-layer deposited TiN films
176Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
177Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
178Plasma enhanced atomic layer deposition of Fe2O3 thin films
179Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
180Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
181WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
182Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
183Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
184Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
185Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
186Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
187Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
188Plasma-Assisted Atomic Layer Deposition of Palladium
189Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
190Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
191Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
192Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
193Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
194Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
195Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
196Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
197A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
198Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
199Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
200In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
201Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
202Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
203Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
204Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
205Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
206Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
207Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
208Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
209Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
210Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
211Layer-by-layer epitaxial growth of GaN at low temperatures
212Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
213Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
214Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
215Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
216Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
217Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
218Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
219Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
220Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
221Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
222Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
223Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
224Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
225Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
226Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
227Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
228Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
229Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
230Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
231Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
232Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
233Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
234Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
235Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
236Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
237A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
238Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
239Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
240Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
241Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
242Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
243Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
2443D structure evolution using metastable atomic layer deposition based on planar silver templates
245Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
246Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
247A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
248Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
249Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
250Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
251Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
252Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
253Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
254Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
255Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
256ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
257Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
258Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
259Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
260Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
261Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
262Atomic Layer Deposition of the Solid Electrolyte LiPON
263Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
264Optical and Electrical Properties of AlxTi1-xO Films
265Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
266Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
267In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
268Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
269Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
270Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
271ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
272Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
273Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
274Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
275Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
276Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
277AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
278Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
279Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
280Fast PEALD ZnO Thin-Film Transistor Circuits
281Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
282Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
283Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
284A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
285Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
286Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
287Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
288Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
289Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
290RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
291Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
292Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
293The effects of layering in ferroelectric Si-doped HfO2 thin films
294Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
295Thin film GaP for solar cell application
296Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
297Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
298Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
299Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
300Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
301Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
302Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
303Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
304Plasma-enhanced atomic layer deposition of zinc phosphate
305Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
306In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
307Plasma Enhanced Atomic Layer Deposition on Powders
308An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
309Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
310Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
311Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
312Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
313Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
314Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
315Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
316Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
317Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
318Patterned deposition by plasma enhanced spatial atomic layer deposition
319ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
320Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
321Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
322Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
323Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
324Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
325Topographically selective deposition
326Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
327Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
328Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
329Atomic layer controlled deposition of silicon nitride with self-limiting mechanism
330Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
331Plasma enhanced atomic layer deposition of SiNx:H and SiO2
332The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
333Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
334Plasma-enhanced atomic layer deposition of BaTiO3
335Analysis of nitrogen species in titanium oxynitride ALD films
336Plasma enhanced atomic layer deposition of gallium sulfide thin films
337Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
338Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
339Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
340Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
341Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
342Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
343A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
344Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
345Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
346Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
347Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
348Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
349Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
350Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
351Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
352Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
353Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
354Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
355Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
356Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
357Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
358Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
359Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
360Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
361Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
362Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
363Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
364The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
365Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
366Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
367Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
368Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
369Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
370Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
371Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
372Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
373Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
374Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
375Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
376Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
377Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
378Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
379Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
380Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
381Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
382Texture of atomic layer deposited ruthenium
383GeSbTe deposition for the PRAM application
384Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
385A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
386The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
387Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
388Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
389High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
390Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
391Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
392Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
393Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
394Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
395Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
396Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
397Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
398Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
399Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
400Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
401DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
402Evaluation of plasma parameters on PEALD deposited TaCN
403Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
404Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
405Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
406Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
407Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
408A route to low temperature growth of single crystal GaN on sapphire
409Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
410Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
411Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
412Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
413Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
414Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
415Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
416Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
417GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
418Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
419Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
420Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
421Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
422Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
423Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
424Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
425ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
426Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
427Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
428Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
429Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
430Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
431TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
432Symmetrical Al2O3-based passivation layers for p- and n-type silicon
433Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
434Room-Temperature Atomic Layer Deposition of Platinum
435Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
436Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
437Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
438Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
439Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
440High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
441Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
442Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
443Plasma enhanced atomic layer deposition of Ga2O3 thin films
444Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
445High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
446Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
447Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
448Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
449Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
450GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
451Densification of Thin Aluminum Oxide Films by Thermal Treatments
452Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
453Electron-enhanced atomic layer deposition of silicon thin films at room temperature
454Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
455Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
456Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
457Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
458Challenges in spacer process development for leading-edge high-k metal gate technology
459Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
460ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
461Remote Plasma ALD of Platinum and Platinum Oxide Films
462Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
463Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
464Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
465Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
466Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
467Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
468PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
469Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
470Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
471Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
472Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
473Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
474Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
475Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
476Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
477Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
478Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
479Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
480Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
481Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
482Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
483Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
484Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
485Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
486Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
487Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
488Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
489Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
490Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
491Low temperature plasma enhanced deposition of GaP films on Si substrate
492Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
493Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
494Sub-10-nm ferroelectric Gd-doped HfO2 layers
495Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
496Atomic layer epitaxy of germanium
497Structural and optical characterization of low-temperature ALD crystalline AlN
498Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
499Spectroscopy and control of near-surface defects in conductive thin film ZnO
500Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
501PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
502Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
503High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
504Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
505Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
506Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
507Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
508Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
509Low temperature temporal and spatial atomic layer deposition of TiO2 films
510Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
511Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
512Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
513Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
514Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
515Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
516Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
517Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
518Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
519Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
520The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
521Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
522XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
523Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
524Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
525Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
526Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
527Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
528Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
529GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
530In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
531The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
532Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
533Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
534Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
535Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
536Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
537Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
538A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
539Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
540Crystalline growth of AlN thin films by atomic layer deposition
541Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
542Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
543Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
544The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
545Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
546Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
547Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
548Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
549A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
550Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
551Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
552Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
553Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
554Perspectives on future directions in III-N semiconductor research
555Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
556Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
557Atomic Layer Deposition of SiN for spacer applications in high-end logic devices
558Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack
559Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
560Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
561Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
562Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
563Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
564Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
565In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
566Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
567Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
568Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
569Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
570Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
571Self-Limiting Growth of GaN at Low Temperatures
572Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
573Plasma-enhanced ALD system for SRF cavity
574Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
575Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
576Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
577Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
578Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
579Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
580Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
581Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
582Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
583Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
584XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
585Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
586Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
587Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
588In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
589Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
590Hydrogen plasma-enhanced atomic layer deposition of copper thin films
591Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
592A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
593RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
594Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
595PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
596Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
597Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
598Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
599Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
600HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
601Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
602Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
603Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
604Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
605Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
606Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
607Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
608Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
609Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
610Study on the characteristics of aluminum thin films prepared by atomic layer deposition
611Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
612Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
613Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
614Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
615Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
616Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
617Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
618Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
619High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
620Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
621Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
622Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
623PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
624PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
625Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
626Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
627Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
628Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
629A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
630SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
631Copper-ALD Seed Layer as an Enabler for Device Scaling
632Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
633Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
634Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
635Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
636Damage evaluation in graphene underlying atomic layer deposition dielectrics
637Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
638Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
639Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
640PEALD of Copper using New Precursors for Next Generation of Interconnections
641Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
642Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
643Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
644Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
645Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
646Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
647Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
648Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
649Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
650Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
651Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
652Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
653Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
654Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
655Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
656Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
657AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
658The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
659Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
660Carbon content control of silicon oxycarbide film with methane containing plasma
661Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
662The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
663An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
664Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
665Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
666Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
667Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
668Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
669Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
670Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
671Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
672High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
673Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
674Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
675Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
676Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
677Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
678Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
679Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
680Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
681Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
682Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
683Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
684Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
685Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
686In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
687Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
688Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
689Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
690Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
691Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
692Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
693Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
694Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
695Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
696In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
697Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
698Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
699Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
700Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
701Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
702Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
703Ru thin film grown on TaN by plasma enhanced atomic layer deposition
704Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
705Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
706Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
707Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
708Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
709Plasma-enhanced atomic layer deposition of vanadium nitride
710Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
711Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
712Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
713Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
714Characteristics of HfO2 thin films grown by plasma atomic layer deposition
715Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
716Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
717In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
718Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
719Plasma-enhanced atomic layer deposition of tungsten nitride
720Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
721High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
722Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
723Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
724Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
725Plasma-Enhanced Atomic Layer Deposition of Ni
726Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
727Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
728N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
729Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
730Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
731The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
732Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
733Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
734Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
735Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
736Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
737Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
738Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
739Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
740The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
741Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
742Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
743Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
744Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
745Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
746Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
747Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
748A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
749Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
750Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
751Advances in the fabrication of graphene transistors on flexible substrates
752Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
753Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
754Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
755Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
756Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
757In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
758Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
759Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
760Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
761Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
762Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
763Atomic hydrogen-assisted ALE of germanium
764Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
765Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
766Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
767Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
768Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
769Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
770Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
771Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
772Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
773Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
774Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
775Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
776Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
777Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
778Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
779In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
780Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
781Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
782A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
783Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
784Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
785Optical and Electrical Properties of TixSi1-xOy Films
786Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
787Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
788Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
789The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
790Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
791Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
792Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
793Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
794Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
795Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
796Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
797Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
798Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
799Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
800Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
801Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
802Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
803Atomic layer deposition of InN using trimethylindium and ammonia plasma
804Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
805Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
806Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
807Atomic layer deposition of GaN at low temperatures
808Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
809Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
810Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
811Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
812Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
813The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
814Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
815Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
816Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
817Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
818Gallium nitride thin films by microwave plasma-assisted ALD
819Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
820Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
821Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
822Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
823Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
824Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
825Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
826Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
827The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
828Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
829Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
830Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
831Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
832ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
833Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
834Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
835Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
836Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
837Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
838Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
839Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
840Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
841Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
842Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
843Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
844ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
845Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
846Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
847Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
848Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
849Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
850Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
851Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
852Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
853Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
854Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
855Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
856A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
857α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
858Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
859Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
860Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
861Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
862Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
863Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
864Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
865Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
866Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
867Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
868Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
869Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
870Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
871Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
872Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
873AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
874Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
875Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
876Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
877Optimization of the Surface Structure on Black Silicon for Surface Passivation
878Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
879Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
880Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
881Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
882Modal properties of a strip-loaded horizontal slot waveguide
883Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
884Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
885Atomic layer epitaxy for quantum well nitride-based devices
886Sub-nanometer heating depth of atomic layer annealing
887The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
888Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
889Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
890Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
891Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
892Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
893Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
894Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices