Thickness Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
2Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
3Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
4Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
5Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
6In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
7Plasma-Assisted Atomic Layer Deposition of Palladium
8Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
9Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
10Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
11Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
12ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
13Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
14Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
15RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
16Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
17Plasma-enhanced atomic layer deposition of tungsten nitride
18Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
19Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
20Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
21Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
22Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
23Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
24Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
25Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
26Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
27Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
28Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
29Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
30Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
31Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
32Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
33Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
34Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
35Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
36Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
37Plasma enhanced atomic layer deposition of SiNx:H and SiO2
38Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
39Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
40Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
41Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
42Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
43Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
44Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
45Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
46Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
47Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
48Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
49Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
50Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
51Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
52Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
53Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
54Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
55Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
56Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
57Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
58Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
59Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
60Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
61Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
62Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
63Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
64Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
65An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
66Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
67Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
68Damage evaluation in graphene underlying atomic layer deposition dielectrics
69Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
70Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
71Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
72Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
73Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
74Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
75Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
76Topographically selective deposition
77GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
78Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
79Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
80Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
81Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
82Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
83Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
84Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
85Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
86Plasma enhanced atomic layer deposition of gallium sulfide thin films
87A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
88Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
89Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
90Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
91Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
92Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
93Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
94Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
95Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
96Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
97Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
98Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
99Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
100Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
101Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
102Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
103Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
104Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
105A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
106Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
107Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
108Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
109Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
110Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
111Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
112Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
113Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
114Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
115Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
116Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
117Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
118Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
119Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
120Advances in the fabrication of graphene transistors on flexible substrates
121Modal properties of a strip-loaded horizontal slot waveguide
122Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
123Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
124Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
125Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
126Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
127In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
128Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
129Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
130Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
131Plasma enhanced atomic layer deposition of zinc sulfide thin films
132Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
133Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
134Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
135Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
136Atomic layer epitaxy of Si using atomic H
137Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
138Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
139Atomic layer deposition of YMnO3 thin films
140Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
141Plasma-enhanced ALD system for SRF cavity
142Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
143Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
144Remote Plasma ALD of Platinum and Platinum Oxide Films
145Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
146Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
147Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
148TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
149Tribological properties of thin films made by atomic layer deposition sliding against silicon
150Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
151WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
152Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
153Composite materials and nanoporous thin layers made by atomic layer deposition
154Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack
155Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
156Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
157Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
158Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
159Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
160Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
161Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
162ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
163Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
164Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
165Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
166Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
167Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
168Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
169Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
170In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
171Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
172Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
173Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
174Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
175The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
176Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
177Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
178Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
179Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
180ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
181Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
182Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
183Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
184Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
185Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
186Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
187High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
188PEALD of Copper using New Precursors for Next Generation of Interconnections
189Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
190Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
191In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
192Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
193Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
194Plasma enhanced atomic layer deposition of Ga2O3 thin films
195Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
196Atomic layer deposition of titanium nitride from TDMAT precursor
197Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
198Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
199Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
200Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
201Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
202Plasma-enhanced atomic layer deposition of BaTiO3
203Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
204Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
205Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
206Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
207Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
208Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
209XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
210Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
211Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
212Low temperature plasma enhanced deposition of GaP films on Si substrate
213Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
214In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
215Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
216Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
217The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
218Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
219An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
220Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
221AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
222Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
223Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
224Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
225GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
226Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
227Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
228Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
229Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
230Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
231A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
232High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
233Study on the characteristics of aluminum thin films prepared by atomic layer deposition
234Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
235Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
236Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
237Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
238Carbon content control of silicon oxycarbide film with methane containing plasma
239Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
240Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
241Self-Limiting Growth of GaN at Low Temperatures
242In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
243Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
244Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
245Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
246Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
247Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
248Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
249Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
250Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
251Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
252Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
253Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
254Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
255Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
256Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
257XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
258Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
259Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
260Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
261Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
262Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
263Gadolinium nitride films deposited using a PEALD based process
264Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
265Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
266Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
267Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
268Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
269Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
270Impact of interface materials on side permeation in indirect encapsulation of organic electronics
271Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
272Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
273Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
274Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
275Atomic layer controlled deposition of silicon nitride with self-limiting mechanism
276Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
277SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
278Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
279Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
280Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
281Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
282Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
283ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
284In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
285Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
286Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
287Atomic layer deposition of GaN at low temperatures
288Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
289Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
290Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
291Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
292Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
293Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
294Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
295Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
296Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
297A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
298Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
299Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
300Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
301Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
302Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
303Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
304Atomic Layer Deposition of SiN for spacer applications in high-end logic devices
305Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
306Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
307Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
308Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
309Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
310Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
311Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
312Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
313Atomic Layer Deposition of Niobium Nitride from Different Precursors
314Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
315Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
316Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
317Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
318On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
319Plasma-enhanced atomic layer deposition of superconducting niobium nitride
320Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
321Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
322Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
323The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
324The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
325Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
326Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
327Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
328Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
329Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
330Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
331Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
332Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
333A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
334Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
335Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
336Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
337Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
338Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
339Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
340Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
341The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
342Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
343Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
344Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
345Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
346Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
347Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
348Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
349Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
350Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
351Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
352TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
353HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
354Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
355Plasma enhanced atomic layer deposition of Fe2O3 thin films
356Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
357Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
358Patterned deposition by plasma enhanced spatial atomic layer deposition
359PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
360Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
361Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
362Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
363Layer-by-layer epitaxial growth of GaN at low temperatures
364The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
365Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
366Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
367Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
368Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
369Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
370Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
371α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
372Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
373Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
374Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
375Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
376Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
377Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
378Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
379Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
380Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
381Plasma-enhanced atomic layer deposition of zinc phosphate
382A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
383Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
384A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
385Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
386Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
387Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
388Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
389Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
390Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
391Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
392Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
393Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
394MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
395Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
396Sub-10-nm ferroelectric Gd-doped HfO2 layers
397Sub-nanometer heating depth of atomic layer annealing
398TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
399Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
400Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
401Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
402Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
403Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
404Hydrogen plasma-enhanced atomic layer deposition of copper thin films
405Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
406Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
407Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
408Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
409Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
410Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
411Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
412Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
413Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
414Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
415Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
416In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
417Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
418Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
419Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
420Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
421Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
422Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
423Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
424Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
425Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
426Plasma Enhanced Atomic Layer Deposition on Powders
427Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
428ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
429Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
430Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
431Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
432Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
433Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
434Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
435Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
436Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
437Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
438Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
439Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
440Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
441Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
442Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
443High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
444Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
445Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
446Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
447Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
448Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
449Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
450PEALD AlN: controlling growth and film crystallinity
451Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
452Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
453Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
454Gallium nitride thin films by microwave plasma-assisted ALD
4553D structure evolution using metastable atomic layer deposition based on planar silver templates
456Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
457The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
458Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
459Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
460A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
461Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
462High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
463Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
464Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
465Sub-7-nm textured ZrO2 with giant ferroelectricity
466Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
467Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
468Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
469Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
470Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
471Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
472Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
473Optical and Electrical Properties of TixSi1-xOy Films
474Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
475Plasma-enhanced atomic layer deposition of vanadium nitride
476Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
477Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
478Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
479Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
480Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
481N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
482Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
483Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
484Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
485Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
486Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
487Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
488Crystalline growth of AlN thin films by atomic layer deposition
489Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
490Perspectives on future directions in III-N semiconductor research
491Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
492Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
493Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
494Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
495Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
496Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
497Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
498Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
499Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
500Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
501Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
502Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
503Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
504Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
505ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
506Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
507Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
508Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
509Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
510Room temperature atomic layer deposition of TiO2 on gold nanoparticles
511Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
512Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
513Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
514Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
515Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
516Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
517In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
518Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
519Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
520Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
521Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
522Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
523Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
524Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
525Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
526Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
527Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
528Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
529The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
530Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
531Evaluation of plasma parameters on PEALD deposited TaCN
532High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
533Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
534Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
535Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
536Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
537Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
538Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
539Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
540Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
541Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
542Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
543Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
544Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
545Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
546Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
547Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
548Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
549Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
550Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
551Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
552Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
553Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
554Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
555Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
556Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
557Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
558Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
559The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
560Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
561Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
562Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
563Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
564Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
565Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
566In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
567Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
568Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
569The important role of water in growth of monolayer transition metal dichalcogenides
570Thin film GaP for solar cell application
571Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
572Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
573Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
574Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
575Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
576Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
577Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
578In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
579Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
580Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
581Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
582Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
583Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
584Texture of atomic layer deposited ruthenium
585Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
586A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
587Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
588Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
589The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
590Structural and optical characterization of low-temperature ALD crystalline AlN
591Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
592Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
593Optical and Electrical Properties of AlxTi1-xO Films
594Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
595A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
596The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
597The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
598Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
599Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
600Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
601Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
602Optimization of the Surface Structure on Black Silicon for Surface Passivation
603Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
604Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
605In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
606Plasma-Enhanced Atomic Layer Deposition of Ni
607Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
608A route to low temperature growth of single crystal GaN on sapphire
609Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
610Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
611Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
612Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
613Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
614Atomic layer deposition of InN using trimethylindium and ammonia plasma
615Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
616Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
617Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
618Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
619Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
620Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
621Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
622Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
623Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
624Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
625Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
626Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
627Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
628A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
629DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
630Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
631Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
632Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
633Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
634Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
635Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
636Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
637Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
638Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
639Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
640Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
641A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
642Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
643Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
644Symmetrical Al2O3-based passivation layers for p- and n-type silicon
645Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
646Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
647Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
648Analysis of nitrogen species in titanium oxynitride ALD films
649Atomic hydrogen-assisted ALE of germanium
650Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
651Ru thin film grown on TaN by plasma enhanced atomic layer deposition
652Innovative remote plasma source for atomic layer deposition for GaN devices
653An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
654Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
655Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
656Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
657Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
658Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
659Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
660Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
661Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
662Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
663Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
664RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
665Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
666Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
667New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
668Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
669Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
670AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
671Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
672Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
673Microwave properties of superconducting atomic-layer deposited TiN films
674Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
675Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
676Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
677Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
678Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
679Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
680Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
681Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
682Self-limiting diamond growth from alternating CFx and H fluxes
683Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
684Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
685Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
686Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
687Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
688Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
689Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
690Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
691Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
692The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
693Atomic Layer Deposition of the Solid Electrolyte LiPON
694Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
695Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
696Room-Temperature Atomic Layer Deposition of Platinum
697Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
698The effects of layering in ferroelectric Si-doped HfO2 thin films
699Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
700Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
701Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
702Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
703Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
704Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
705Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
706Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
707Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
708Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
709Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
710Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
711Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
712Experimental and theoretical determination of the role of ions in atomic layer annealing
713PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
714Properties of AlN grown by plasma enhanced atomic layer deposition
715Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
716Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
717Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
718Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
719ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
720Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
721Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
722Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
723Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
724Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
725Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
726Atmospheric pressure plasma enhanced spatial ALD of silver
727Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
728Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
729Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
730Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
731Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
732Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
733Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
734Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
735Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
736Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
737Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
738Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
739Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
740Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
741Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
742Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
743GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
744Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
745Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
746Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
747Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
748Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
749Atomic layer epitaxy of germanium
750Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
751Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
752Fast PEALD ZnO Thin-Film Transistor Circuits
753Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
754Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
755Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
756Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
757Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
758High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
759Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
760Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
761TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
762Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
763Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
764Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
765Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
766PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
767Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
768Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
769Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
770Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
771Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
772Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
773Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
774Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
775Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
776GeSbTe deposition for the PRAM application
777Densification of Thin Aluminum Oxide Films by Thermal Treatments
778Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
779Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
780Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
781Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
782Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
783Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
784The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
785Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
786Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
787Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
788Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
789Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
790Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
791Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
792Challenges in spacer process development for leading-edge high-k metal gate technology
793Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
794Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
795Plasma enhanced atomic layer deposition of aluminum sulfide thin films
796Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
797Electron-enhanced atomic layer deposition of silicon thin films at room temperature
798Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
799Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
800Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
801Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
802Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
803Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
804Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
805Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
806Characteristics of HfO2 thin films grown by plasma atomic layer deposition
807Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
808Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
809Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
810Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
811Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
812Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
813Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
814Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
815Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
816Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
817Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
818Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
819Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
820Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
821Graphene-based MMIC process development and RF passives design
822In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
823Plasma-enhanced atomic layer deposition for plasmonic TiN
824Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
825Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
826Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
827Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
828Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
829Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
830Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
831Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
832AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
833Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
834Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
835Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
836Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
837Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
838Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
839Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
840Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
841Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
842Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
843Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
844PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
845Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
846Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
847Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
848Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
849Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
850Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
851Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
852Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
853Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
854Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
855ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
856Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
857Atomic layer epitaxy for quantum well nitride-based devices
858Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
859Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
860Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
861Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
862Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
863Comparative study of ALD SiO2 thin films for optical applications
864Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
865Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
866The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
867Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
868Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
869Copper-ALD Seed Layer as an Enabler for Device Scaling
870Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
871Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
872Plasma-enhanced atomic layer deposition of titanium vanadium nitride
873Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
874Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
875Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
876Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
877Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
878Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
879Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
880Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
881Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
882Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
883Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
884Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
885Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
886PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
887Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
888A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
889Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
890Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
891Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
892Low temperature temporal and spatial atomic layer deposition of TiO2 films
893Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
894Spectroscopy and control of near-surface defects in conductive thin film ZnO
895Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
896Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
897Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
898Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
899Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
900Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
901Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
902A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
903High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
904Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
905Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
906Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
907Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films