Thickness Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Thickness returned 892 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
2Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
3The effects of layering in ferroelectric Si-doped HfO2 thin films
4Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
5Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
6A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
7Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
8Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
9Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
10Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
11Gallium nitride thin films by microwave plasma-assisted ALD
12Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
13Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
14Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
15Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
16Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
17PEALD AlN: controlling growth and film crystallinity
18Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
19Structural and optical characterization of low-temperature ALD crystalline AlN
20Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
21Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
22Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
23Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
24Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
25Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
26Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
27Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
28Ru thin film grown on TaN by plasma enhanced atomic layer deposition
29Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
30The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
31TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
32Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
33Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
34MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
35Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
36Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
37Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
38Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
39Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
40Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
41Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
42Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
43Crystalline growth of AlN thin films by atomic layer deposition
44Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
45Experimental and theoretical determination of the role of ions in atomic layer annealing
46Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
47Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
48Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
49Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
50Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
51Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
52Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
53Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
54Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
55Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
56Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
57Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
58Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
59Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
60A route to low temperature growth of single crystal GaN on sapphire
61Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
62Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
63Thin film GaP for solar cell application
64Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
65Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
66Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
67Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
68Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
69Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
70Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
71ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
72Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
73In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
74Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
75GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
76Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
77An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
78Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
79Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
80Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
81Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
82Plasma-enhanced atomic layer deposition of superconducting niobium nitride
83Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
84Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
85Plasma-enhanced atomic layer deposition of zinc phosphate
86Graphene-based MMIC process development and RF passives design
87Atomic layer epitaxy of Si using atomic H
88Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
89Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
90Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
91Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
92Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
93Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
94High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
95Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
96Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
97Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
98Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
99Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
100Fast PEALD ZnO Thin-Film Transistor Circuits
101TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
102Low temperature temporal and spatial atomic layer deposition of TiO2 films
103Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
104Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
105Sub-10-nm ferroelectric Gd-doped HfO2 layers
106Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
107Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
108Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
109Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
110Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
111Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
112Properties of AlN grown by plasma enhanced atomic layer deposition
113Evaluation of plasma parameters on PEALD deposited TaCN
114Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
115Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
116Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
117In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
118Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
119Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
120ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
121Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
122Atomic Layer Deposition of the Solid Electrolyte LiPON
123Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
124Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
125In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
126Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
127Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
128Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
129The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
130TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
131Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
132Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
133Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
134Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
135Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
136Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
137Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
138Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
139Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
140Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
141Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
142ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
143Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
144Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
145Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
146Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
147Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
148Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
149A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
150Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
151Characteristics of HfO2 thin films grown by plasma atomic layer deposition
152Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
153A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
154Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
155Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
156Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
157Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
158Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack
159Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
160The important role of water in growth of monolayer transition metal dichalcogenides
161Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
162Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
163Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
164Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
165Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
166High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
167Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
168Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
169Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
170Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
171Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
172Atmospheric pressure plasma enhanced spatial ALD of silver
173Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
174Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
175Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
176Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
177Remote Plasma ALD of Platinum and Platinum Oxide Films
178Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
179Spectroscopy and control of near-surface defects in conductive thin film ZnO
180GeSbTe deposition for the PRAM application
181Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
182Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
183Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
184Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
185In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
186Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
187PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
188Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
189Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
190Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
191Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
192Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
193Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
194Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
195Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
196Plasma-enhanced atomic layer deposition of BaTiO3
197Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
198Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
199Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
200Composite materials and nanoporous thin layers made by atomic layer deposition
201Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
202The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
203Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
204Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
205A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
206Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
207Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
208Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
209Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
210Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
211Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
212Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
213Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
214Atomic layer deposition of InN using trimethylindium and ammonia plasma
215Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
216Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
217Optical and Electrical Properties of AlxTi1-xO Films
218A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
219High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
220Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
2213D structure evolution using metastable atomic layer deposition based on planar silver templates
222Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
223Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
224TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
225Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
226Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
227Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
228Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
229Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
230Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
231Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
232Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
233Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
234Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
235Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
236Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
237Plasma enhanced atomic layer deposition of Ga2O3 thin films
238The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
239Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
240Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
241Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
242Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
243Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
244Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
245Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
246Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
247Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
248Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
249Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
250Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
251Plasma-Enhanced Atomic Layer Deposition of Ni
252Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
253Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
254Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
255Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
256AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
257Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
258Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
259Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
260Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
261Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
262Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
263Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
264The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
265Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
266Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
267Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
268Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
269High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
270Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
271Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
272Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
273Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
274Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
275Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
276Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
277Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
278Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
279Modal properties of a strip-loaded horizontal slot waveguide
280Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
281Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
282The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
283Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
284Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
285GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
286Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
287Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
288Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
289Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
290Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
291Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
292Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
293Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
294Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
295Analysis of nitrogen species in titanium oxynitride ALD films
296Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
297Copper-ALD Seed Layer as an Enabler for Device Scaling
298Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
299Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
300Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
301Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
302Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
303Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
304Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
305Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
306α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
307Advances in the fabrication of graphene transistors on flexible substrates
308High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
309Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
310Plasma-enhanced ALD system for SRF cavity
311Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
312Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
313Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
314Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
315Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
316Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
317RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
318Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
319The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
320Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
321Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
322Microwave properties of superconducting atomic-layer deposited TiN films
323Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
324Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
325Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
326Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
327Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
328An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
329Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
330Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
331AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
332Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
333Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
334Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
335Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
336Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
337Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
338Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
339Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
340Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
341Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
342Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
343Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
344Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
345Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
346Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
347Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
348Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
349Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
350Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
351Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
352Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
353Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
354Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
355Texture of atomic layer deposited ruthenium
356The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
357Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
358Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
359Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
360N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
361Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
362Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
363Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
364Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
365Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
366Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
367Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
368Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
369Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
370Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
371Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
372Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
373Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
374Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
375Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
376Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
377Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
378Perspectives on future directions in III-N semiconductor research
379Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
380Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
381PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
382Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
383Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
384Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
385Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
386Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
387PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
388Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
389Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
390Atomic hydrogen-assisted ALE of germanium
391Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
392Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
393Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
394Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
395Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
396Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
397Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
398Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
399Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
400Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
401Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
402Room temperature atomic layer deposition of TiO2 on gold nanoparticles
403Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
404Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
405Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
406Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
407Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
408Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
409Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
410Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
411A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
412Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
413Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
414Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
415Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
416Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
417Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
418Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
419Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
420Plasma enhanced atomic layer deposition of Fe2O3 thin films
421Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
422Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
423Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
424SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
425Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
426Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
427Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
428Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
429Atomic Layer Deposition of SiN for spacer applications in high-end logic devices
430Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
431Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
432Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
433Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
434Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
435Sub-7-nm textured ZrO2 with giant ferroelectricity
436Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
437Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
438Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
439Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
440Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
441The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
442Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
443Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
444Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
445Innovative remote plasma source for atomic layer deposition for GaN devices
446Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
447Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
448Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
449Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
450Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
451Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
452In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
453Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
454Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
455Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
456A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
457Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
458In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
459Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
460Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
461Layer-by-layer epitaxial growth of GaN at low temperatures
462Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
463Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
464Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
465Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
466Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
467Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
468Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
469Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
470Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
471Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
472Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
473Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
474Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
475Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
476A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
477Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
478Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
479Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
480AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
481Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
482Densification of Thin Aluminum Oxide Films by Thermal Treatments
483Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
484Atomic layer epitaxy of germanium
485Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
486Gadolinium nitride films deposited using a PEALD based process
487Atomic layer epitaxy for quantum well nitride-based devices
488Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
489Study on the characteristics of aluminum thin films prepared by atomic layer deposition
490Atomic layer deposition of titanium nitride from TDMAT precursor
491Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
492Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
493Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
494Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
495The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
496Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
497DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
498Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
499Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
500Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
501Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
502Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
503Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
504Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
505Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
506Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
507Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
508Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
509Sub-nanometer heating depth of atomic layer annealing
510Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
511Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
512Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
513Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
514Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
515Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
516In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
517Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
518Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
519Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
520Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
521Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
522In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
523Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
524Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
525In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
526PEALD of Copper using New Precursors for Next Generation of Interconnections
527Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
528Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
529Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
530Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
531Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
532Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
533Self-limiting diamond growth from alternating CFx and H fluxes
534Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
535Impact of interface materials on side permeation in indirect encapsulation of organic electronics
536Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
537Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
538Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
539Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
540Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
541Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
542Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
543Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
544Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
545Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
546Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
547WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
548Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
549Atomic layer deposition of GaN at low temperatures
550Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
551Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
552Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
553Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
554The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
555Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
556Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
557The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
558Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
559Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
560Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
561Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
562Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
563Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
564Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
565Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
566Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
567Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
568Plasma enhanced atomic layer deposition of zinc sulfide thin films
569Tribological properties of thin films made by atomic layer deposition sliding against silicon
570In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
571Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
572Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
573Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
574Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
575Optimization of the Surface Structure on Black Silicon for Surface Passivation
576Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
577Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
578Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
579In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
580Challenges in spacer process development for leading-edge high-k metal gate technology
581Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
582High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
583Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
584Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
585Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
586Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
587Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
588Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
589A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
590Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
591Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
592Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
593Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
594Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
595Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
596Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
597Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
598Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
599In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
600Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
601Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
602Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
603Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
604Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
605A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
606Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
607Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
608Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
609Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
610Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
611Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
612Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
613Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
614Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
615Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
616Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
617Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
618Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
619Carbon content control of silicon oxycarbide film with methane containing plasma
620HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
621Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
622Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
623New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
624Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
625Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
626Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
627Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
628Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
629Atomic Layer Deposition of Niobium Nitride from Different Precursors
630Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
631Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
632Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
633Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
634On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
635Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
636Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
637Atomic layer deposition of YMnO3 thin films
638Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
639Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
640The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
641Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
642Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
643Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
644Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
645Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
646Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
647Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
648Plasma enhanced atomic layer deposition of gallium sulfide thin films
649Plasma-enhanced atomic layer deposition of titanium vanadium nitride
650Plasma-enhanced atomic layer deposition of tungsten nitride
651GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
652Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
653Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
654An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
655ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
656Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
657Plasma enhanced atomic layer deposition of SiNx:H and SiO2
658Low temperature plasma enhanced deposition of GaP films on Si substrate
659Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
660Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
661Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
662Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
663Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
664Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
665In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
666Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
667ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
668Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
669Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
670Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
671Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
672Plasma-enhanced atomic layer deposition of vanadium nitride
673Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
674Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
675RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
676Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
677Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
678Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
679Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
680Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
681A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
682A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
683Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
684Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
685Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
686Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
687Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
688Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
689Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
690Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
691Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
692Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
693Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
694Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
695Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
696Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
697Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
698Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
699Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
700Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
701Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
702Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
703Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
704Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
705Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
706Plasma enhanced atomic layer deposition of aluminum sulfide thin films
707Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
708Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
709Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
710Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
711Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
712Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
713Hydrogen plasma-enhanced atomic layer deposition of copper thin films
714Symmetrical Al2O3-based passivation layers for p- and n-type silicon
715Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
716Plasma-Assisted Atomic Layer Deposition of Palladium
717Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
718Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
719Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
720Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
721Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
722Patterned deposition by plasma enhanced spatial atomic layer deposition
723Comparative study of ALD SiO2 thin films for optical applications
724Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
725Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
726Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
727Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
728Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
729Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
730Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
731Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
732Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
733PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
734Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
735Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
736Topographically selective deposition
737Optical and Electrical Properties of TixSi1-xOy Films
738Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
739Electron-enhanced atomic layer deposition of silicon thin films at room temperature
740Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
741Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
742Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
743Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
744Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
745Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
746Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
747Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
748Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
749Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
750Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
751Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
752Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
753Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
754Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
755Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
756Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
757Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
758Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
759Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
760Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
761Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
762Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
763Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
764Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
765Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
766Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
767Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
768Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
769Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
770Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
771Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
772Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
773Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
774Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
775Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
776Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
777Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
778Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
779Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
780Room-Temperature Atomic Layer Deposition of Platinum
781Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
782Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
783Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
784XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
785Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
786Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
787Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
788Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
789Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
790Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
791Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
792Plasma-enhanced atomic layer deposition for plasmonic TiN
793Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
794Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
795Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
796Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
797High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
798PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
799Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
800Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
801Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
802A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
803Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
804Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
805Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
806Damage evaluation in graphene underlying atomic layer deposition dielectrics
807Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
808Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
809Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
810Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
811Atomic layer controlled deposition of silicon nitride with self-limiting mechanism
812Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
813Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
814Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
815The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
816Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
817Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
818Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
819Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
820Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
821Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
822ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
823Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
824Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
825Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
826Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
827Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
828Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
829Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
830XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
831Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
832Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
833Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
834Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
835Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
836Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
837Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
838Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
839Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
840Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
841Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
842Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
843Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
844Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
845Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
846Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
847Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
848A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
849Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
850Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
851Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
852Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
853Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
854Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
855Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
856ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
857Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
858Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
859Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
860Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
861Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
862Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
863Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
864Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
865Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
866Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
867Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
868Self-Limiting Growth of GaN at Low Temperatures
869The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
870Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
871Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
872Plasma Enhanced Atomic Layer Deposition on Powders