Thickness Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
2Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
3Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
4Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
5Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
6Impact of interface materials on side permeation in indirect encapsulation of organic electronics
7Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
8Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
9Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
10Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
11Sub-10-nm ferroelectric Gd-doped HfO2 layers
12Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
13Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
14Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
15Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
16Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
17Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
18A route to low temperature growth of single crystal GaN on sapphire
19Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
20Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
21Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
22Graphene-based MMIC process development and RF passives design
23Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
24RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
25Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
26Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
27Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
28Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
29ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
30Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
31The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
32A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
33Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
34Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
35Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
36Modal properties of a strip-loaded horizontal slot waveguide
37Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
38Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
39Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
40Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
41Room-Temperature Atomic Layer Deposition of Platinum
42Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
43Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
44Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
45In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
46Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
47Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
48Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
49Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
50Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
51Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
52Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
53Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
54XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
55Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
56Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
57Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
58Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
59Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
60Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
61Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
62Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
63Ru thin film grown on TaN by plasma enhanced atomic layer deposition
64Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
65Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
66Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
67The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
68Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
69Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
70Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
71Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
72Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
73PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
74Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
75Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
76Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
77Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
78A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
79Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
80Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
81In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
82The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
83Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
84Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
85Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
86A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
87ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
88Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
89Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
90Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
91Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
92Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
93Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
94An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
95Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
96TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
97Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
98Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
99Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
100High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
101Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
102Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
103Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
104Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
105Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
106Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
107Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
108Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
109Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
110Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
111Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
112Atomic layer epitaxy of germanium
113Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
114The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
115Self-limiting diamond growth from alternating CFx and H fluxes
116Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
117Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
118Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
119Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
120Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
121Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
122Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
123Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
124Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
125Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
126Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
127Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
128Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
129A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
130Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
131Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
132Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
133Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
134Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
135Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
136Plasma-enhanced atomic layer deposition of superconducting niobium nitride
137Texture of atomic layer deposited ruthenium
138Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
139Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
140In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
141Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
142Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
143Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
144Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
145Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
146Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
147Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
148The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
149Atomic layer deposition of InN using trimethylindium and ammonia plasma
150Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
151Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
152Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
153Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
154Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
155Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
156Atomic layer epitaxy for quantum well nitride-based devices
157Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
158Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
159Properties of AlN grown by plasma enhanced atomic layer deposition
160Plasma-Enhanced Atomic Layer Deposition of Ni
161GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
162Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
163Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
164Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
165Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
166Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
167Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
168HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
169Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
170Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
171Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
172Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
173Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
174Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
175Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
176Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
177Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
178Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
179Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
180Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
181Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
182Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
183Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
184Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
185Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
186Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
187Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
188Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
189Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
190Thin film GaP for solar cell application
191Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
192Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
193Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
194A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
195Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
196Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
197Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
198Gallium nitride thin films by microwave plasma-assisted ALD
199Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
200Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
201Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
202Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
203Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
204Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
205Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
206Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
207Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
208Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
209Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
210Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
211Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
212ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
213Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
214Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
215Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
216Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
217Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
218Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
219Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
220Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
221Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
222Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
223Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
224The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
225The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
226Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
227New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
228Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
229Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
230Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
231Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
232Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
233Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
234Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
235Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
236Atomic hydrogen-assisted ALE of germanium
237Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
238Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
239The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
240Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
241Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
242The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
243Copper-ALD Seed Layer as an Enabler for Device Scaling
244Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
245Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
246Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
247Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
248Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
249ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
250Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
251Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
252Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
253Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
254Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
255Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
256Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
257Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
258Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
259Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
260Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
261Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
262Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
263Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
264Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
265Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
266The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
267Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
268Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
269Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
270Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
271Sub-7-nm textured ZrO2 with giant ferroelectricity
272Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
273Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
274Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
275Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
276Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
277Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
278In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
279Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
280A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
281Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
282Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
283Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
284Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
285Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
286Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
287Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
288Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
289Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
290Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
291Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
292Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
293Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
294Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
295Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
296Topographically selective deposition
297Atomic layer epitaxy of Si using atomic H
298Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
299Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
300In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
301Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
302SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
303Plasma enhanced atomic layer deposition of SiNx:H and SiO2
304Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
305Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
306Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
307Advances in the fabrication of graphene transistors on flexible substrates
308Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
309Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
310Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
311Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
312Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
313Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
314Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
315Plasma-enhanced atomic layer deposition of vanadium nitride
316Crystalline growth of AlN thin films by atomic layer deposition
317Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
318Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
319Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
320Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
321Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
322Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
323Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
324Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
325Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
326Characteristics of HfO2 thin films grown by plasma atomic layer deposition
327Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
328Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
329Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
330Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
331An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
332Low temperature plasma enhanced deposition of GaP films on Si substrate
333Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
334Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
335Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
336Plasma-enhanced atomic layer deposition of titanium vanadium nitride
337Electron-enhanced atomic layer deposition of silicon thin films at room temperature
338Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
339Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
340Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
341Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
342Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
343WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
344Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
345Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
346Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
347Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
348Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
349AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
350Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
351Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
352Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
353Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
354Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
355Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
356Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
357Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
358Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
359Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
360TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
361AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
362The important role of water in growth of monolayer transition metal dichalcogenides
363Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
364High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
365Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
366Plasma-enhanced ALD system for SRF cavity
367Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
368Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
369Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
370PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
371Plasma enhanced atomic layer deposition of Fe2O3 thin films
372Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
373Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
374Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
375Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
376Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
377ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
378High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
379Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
380Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
381Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
382Comparative study of ALD SiO2 thin films for optical applications
383Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
384Experimental and theoretical determination of the role of ions in atomic layer annealing
385Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
386Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
387Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
388Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
389Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
390Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
391Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
392Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
393Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
394Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
395Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
396Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
397Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
398Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
399Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
400Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
401Plasma-enhanced atomic layer deposition of tungsten nitride
402Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
403Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
404Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
405Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
406Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
407Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
408Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
409Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
410PEALD of Copper using New Precursors for Next Generation of Interconnections
411Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
412Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
413Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
414Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
415Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
416Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
417Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
418Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
419Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
420Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
421Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
422Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
423Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
424ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
425Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
426Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
427Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
428Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
429Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
430Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
431Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
432Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
433Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
434Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
435Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
436Plasma-enhanced atomic layer deposition for plasmonic TiN
437In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
438Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
439Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
440Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
441Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
442Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
443Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
444Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
445The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
446Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
447High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
448Plasma enhanced atomic layer deposition of Ga2O3 thin films
449Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
450Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
451Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
452Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
453Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
454Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
455Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
456Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
457Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
458Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
459Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
460Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
461Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
462Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
463Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
464MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
465Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
466Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
467A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
468Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
469Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
470Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
471A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
472Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
473A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
474Composite materials and nanoporous thin layers made by atomic layer deposition
475Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
476Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
477Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
478Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
479Gadolinium nitride films deposited using a PEALD based process
480Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
481Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
482Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
483Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
484In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
485Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
486Optical and Electrical Properties of TixSi1-xOy Films
487Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
488Atomic layer controlled deposition of silicon nitride with self-limiting mechanism
489Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
490RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
491Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
492Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
493Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
494Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
495Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
496Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
497Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
498Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
499Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
500Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
501Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
502Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
503Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
504Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
505Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
506Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
507TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
508Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
509Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
510Plasma-enhanced atomic layer deposition of zinc phosphate
511Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
512ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
513Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
514Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
515Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
516A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
517Innovative remote plasma source for atomic layer deposition for GaN devices
518An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
519Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
520Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
521Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
522Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
523Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
524Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
525Analysis of nitrogen species in titanium oxynitride ALD films
526Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
527GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
528Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
529Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
530Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
531Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
532Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
533Challenges in spacer process development for leading-edge high-k metal gate technology
534Atmospheric pressure plasma enhanced spatial ALD of silver
535A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
536Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
537Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
538Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
539Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
540Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
541Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
542Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
543Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
544Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
545Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
546High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
547Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
548Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
549Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
550Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
551Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
552Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
553Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
554Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
555Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
556The effects of layering in ferroelectric Si-doped HfO2 thin films
557Room temperature atomic layer deposition of TiO2 on gold nanoparticles
558Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
559Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
560Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
561Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
562Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
563Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
564Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
565Atomic layer deposition of titanium nitride from TDMAT precursor
566Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
567Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
568GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
569Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
570Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
571Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
572PEALD AlN: controlling growth and film crystallinity
573Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
574Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
575Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
576Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
577Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
578Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
579Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
580Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
581Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
582Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
583Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
584Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
585Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
586Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
587Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
588Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
589Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
590Patterned deposition by plasma enhanced spatial atomic layer deposition
591Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
592Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
593Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
594Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
595Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
596Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
597Atomic layer deposition of GaN at low temperatures
598Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
599Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
600Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
601Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
602Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
603Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
604Perspectives on future directions in III-N semiconductor research
605Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
606Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
607Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
608Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
609Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
610Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
611Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
612Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
613Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
614Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
615Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
616GeSbTe deposition for the PRAM application
617Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
618Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
619α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
620Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
621Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
622Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
623Spectroscopy and control of near-surface defects in conductive thin film ZnO
624Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
625Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
626Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
627Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
628Densification of Thin Aluminum Oxide Films by Thermal Treatments
629Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
630Atomic Layer Deposition of SiN for spacer applications in high-end logic devices
631In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
632Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
633The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
634Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
635Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
636Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
637Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
638Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
639Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
640Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
641Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
642Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
643Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
644Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
645Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
646Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
647Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
648Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
649Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
650Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
651Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
652A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
653Plasma-enhanced atomic layer deposition of BaTiO3
654Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
655Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
656Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
657Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
658Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
659Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
660Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
661Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
662Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
663Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
664Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
665Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
666Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
667High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
668Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
669Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
670Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
671Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
672Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
673Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
674Damage evaluation in graphene underlying atomic layer deposition dielectrics
675Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
676Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
677Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
678Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
679Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
680Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
681Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
682Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
683Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
684Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
685Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
686Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
687Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
688Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
689Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
690Atomic layer deposition of YMnO3 thin films
691Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
692Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
693Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
694Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
695Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
696Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
697Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
698Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
699Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
700Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
701Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
702Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
703Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
704Remote Plasma ALD of Platinum and Platinum Oxide Films
705Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
706Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
707Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
708Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
709On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
710Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
711Atomic Layer Deposition of the Solid Electrolyte LiPON
712Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
713Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
714Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
715Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
716Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
717Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
718Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
719In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
720Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
721Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
722Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
723Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
724Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
725Self-Limiting Growth of GaN at Low Temperatures
726Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
727Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
728Sub-nanometer heating depth of atomic layer annealing
729Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
730A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
731Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
732Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
733Optimization of the Surface Structure on Black Silicon for Surface Passivation
734Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
735Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
736Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
737A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
738Tribological properties of thin films made by atomic layer deposition sliding against silicon
739Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
740Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
741Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
742Plasma enhanced atomic layer deposition of zinc sulfide thin films
743Microwave properties of superconducting atomic-layer deposited TiN films
744Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
745Plasma-Assisted Atomic Layer Deposition of Palladium
746AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
747Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
748Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
749Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
750Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
751In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
752Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
753Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
754Structural and optical characterization of low-temperature ALD crystalline AlN
755Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
756Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
757Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
758Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
759Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
760Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
761Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
762Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
763Symmetrical Al2O3-based passivation layers for p- and n-type silicon
764Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
765Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
7663D structure evolution using metastable atomic layer deposition based on planar silver templates
767Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
768Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
769Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
770Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
771Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
772TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
773Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
774Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
775Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
776Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
777Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
778Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
779The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
780Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
781Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
782Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
783Carbon content control of silicon oxycarbide film with methane containing plasma
784Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
785Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
786Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
787Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
788Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
789In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
790Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
791Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
792Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
793XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
794Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
795Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
796Hydrogen plasma-enhanced atomic layer deposition of copper thin films
797Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
798Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
799Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
800Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
801Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack
802Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
803Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
804Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
805Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
806Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
807Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
808Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
809Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
810Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
811In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
812Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
813Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
814Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
815Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
816Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
817Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
818Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
819Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
820Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
821Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
822Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
823Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
824Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
825Plasma enhanced atomic layer deposition of aluminum sulfide thin films
826Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
827Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
828Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
829PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
830Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
831Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
832Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
833Fast PEALD ZnO Thin-Film Transistor Circuits
834Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
835Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
836Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
837Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
838Evaluation of plasma parameters on PEALD deposited TaCN
839Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
840PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
841Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
842Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
843Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
844The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
845High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
846Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
847Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
848Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
849Study on the characteristics of aluminum thin films prepared by atomic layer deposition
850Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
851Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
852Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
853Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
854Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
855Optical and Electrical Properties of AlxTi1-xO Films
856Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
857Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
858Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
859Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
860Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
861Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
862Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
863Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
864In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
865Plasma Enhanced Atomic Layer Deposition on Powders
866Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
867Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
868Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
869Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
870Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
871Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
872Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
873Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
874Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
875Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
876PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
877Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
878Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
879Layer-by-layer epitaxial growth of GaN at low temperatures
880Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
881Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
882Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
883Plasma enhanced atomic layer deposition of gallium sulfide thin films
884Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
885DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
886Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
887Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
888Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
889Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
890Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
891Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
892Atomic Layer Deposition of Niobium Nitride from Different Precursors
893Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
894The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
895Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
896Low temperature temporal and spatial atomic layer deposition of TiO2 films
897Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
898Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
899Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
900ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
901N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
902Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
903Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
904Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
905Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
906Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
907Plasma-enhanced atomic layer deposition of palladium on a polymer substrate