1 | Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition |
2 | Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors |
3 | Hysteresis behaviour of top-down fabricated ZnO nanowire transistors |
4 | Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns |
5 | An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD |
6 | Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition |
7 | WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications |
8 | Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition |
9 | AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments |
10 | In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition |
11 | Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique |
12 | Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide |
13 | Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions |
14 | Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition |
15 | Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide |
16 | Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices |
17 | Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma |
18 | Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping |
19 | Interfaces Formed by ALD Metal Oxide Growth on Metal Layers |
20 | Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition |
21 | Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films |
22 | Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD |
23 | TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films |
24 | A controlled growth of WNx and WCx thin films prepared by atomic layer deposition |
25 | Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films |
26 | Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition |
27 | Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry |
28 | Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics |
29 | Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material |
30 | Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu |
31 | Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films |
32 | Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition |
33 | Plasma-Assisted Atomic Layer Deposition of Palladium |
34 | Atomic layer epitaxy of Si using atomic H |
35 | Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma |
36 | Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase |
37 | Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor |
38 | Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating |
39 | Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films |
40 | In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides |
41 | Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films |
42 | Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition |
43 | PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases |
44 | Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor |
45 | PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor |
46 | Low temperature plasma enhanced deposition of GaP films on Si substrate |
47 | Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications |
48 | Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2 |
49 | High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD |
50 | Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures |
51 | Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition |
52 | Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper |
53 | Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition |
54 | Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4 |
55 | Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process |
56 | Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films |
57 | Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications |
58 | Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation |
59 | Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition |
60 | Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources |
61 | Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition |
62 | Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors |
63 | In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications |
64 | Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition |
65 | Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition |
66 | Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane |
67 | Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor |
68 | Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor |
69 | Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy |
70 | Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl |
71 | Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers |
72 | GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation |
73 | Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection |
74 | Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition |
75 | Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition |
76 | Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting |
77 | Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD) |
78 | Low temperature temporal and spatial atomic layer deposition of TiO2 films |
79 | Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition |
80 | Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity |
81 | Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia |
82 | Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor |
83 | Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors |
84 | Densification of Thin Aluminum Oxide Films by Thermal Treatments |
85 | Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma |
86 | Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires |
87 | Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si |
88 | Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD |
89 | Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials |
90 | Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition |
91 | Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2 |
92 | High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition |
93 | Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing |
94 | Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers |
95 | RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor |
96 | Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition |
97 | Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage |
98 | Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics |
99 | Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma |
100 | Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors |
101 | Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma |
102 | ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method |
103 | Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films |
104 | Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties |
105 | Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas |
106 | Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition |
107 | A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition |
108 | Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films |
109 | Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN |
110 | Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces |
111 | Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications |
112 | Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma |
113 | Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition |
114 | Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization |
115 | Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution |
116 | Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide |
117 | Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics |
118 | Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering |
119 | Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors |
120 | Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu |
121 | A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition |
122 | Growth of aluminum nitride films by plasma-enhanced atomic layer deposition |
123 | Properties of AlN grown by plasma enhanced atomic layer deposition |
124 | Copper-ALD Seed Layer as an Enabler for Device Scaling |
125 | Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition |
126 | Atomic Layer Deposition of the Solid Electrolyte LiPON |
127 | Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application |
128 | Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps |
129 | Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties |
130 | Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma |
131 | Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition |
132 | Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition |
133 | Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2 |
134 | Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition |
135 | A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer |
136 | Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material |
137 | Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition |
138 | Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study |
139 | Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition |
140 | Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex |
141 | Plasma-enhanced atomic layer deposition of BaTiO3 |
142 | Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD |
143 | Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene |
144 | Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films |
145 | Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition |
146 | Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode |
147 | Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties |
148 | Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction |
149 | Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon |
150 | Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality |
151 | Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds |
152 | Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma |
153 | Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics |
154 | Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries |
155 | Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition |
156 | Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers |
157 | Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications |
158 | Graphene-based MMIC process development and RF passives design |
159 | Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition |
160 | The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications |
161 | Plasma Enhanced Atomic Layer Deposition on Powders |
162 | Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia |
163 | Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition |
164 | Ultrathin Surface Coating Enables the Stable Sodium Metal Anode |
165 | Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties |
166 | α-Ga2O3 grown by low temperature atomic layer deposition on sapphire |
167 | Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure |
168 | Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System |
169 | Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition |
170 | Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique |
171 | Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films |
172 | Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition |
173 | Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen |
174 | Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells |
175 | Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3 |
176 | Self-limiting growth of GaN using plasma-enhanced atomic layer deposition |
177 | Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights |
178 | Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications |
179 | Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy |
180 | Plasma-enhanced atomic layer deposition of palladium on a polymer substrate |
181 | Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors |
182 | Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3 |
183 | Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition |
184 | Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating |
185 | Plasma-enhanced atomic layer deposition of tungsten nitride |
186 | Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films |
187 | Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD |
188 | Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O |
189 | Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films |
190 | Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates |
191 | Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition |
192 | Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries |
193 | In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd |
194 | Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen |
195 | Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries |
196 | Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films |
197 | Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride |
198 | Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases |
199 | Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition |
200 | Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells |
201 | The role of plasma in plasma-enhanced atomic layer deposition of crystalline films |
202 | Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate |
203 | Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas |
204 | Symmetrical Al2O3-based passivation layers for p- and n-type silicon |
205 | Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics |
206 | Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance |
207 | In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells |
208 | Damage evaluation in graphene underlying atomic layer deposition dielectrics |
209 | Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach |
210 | Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing |
211 | Optimization of the Surface Structure on Black Silicon for Surface Passivation |
212 | Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor |
213 | Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions |
214 | Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application |
215 | Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment |
216 | Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma |
217 | Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition |
218 | Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices |
219 | Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films |
220 | Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric |
221 | Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD |
222 | Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum |
223 | Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications |
224 | The effects of layering in ferroelectric Si-doped HfO2 thin films |
225 | Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification |
226 | Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors |
227 | Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources |
228 | GeSbTe deposition for the PRAM application |
229 | Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer |
230 | Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition |
231 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
232 | Remote Plasma ALD of Platinum and Platinum Oxide Films |
233 | Characteristics of TiO2 Films Prepared by ALD With and Without Plasma |
234 | Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition |
235 | ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors |
236 | Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique |
237 | Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode |
238 | Atomic Layer Deposition of SiN for spacer applications in high-end logic devices |
239 | Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films |
240 | Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu |
241 | Plasma enhanced atomic layer deposition of zinc sulfide thin films |
242 | Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition |
243 | Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide |
244 | Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor |
245 | Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling |
246 | The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD |
247 | Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications |
248 | Plasma enhanced atomic layer deposition of SiNx:H and SiO2 |
249 | Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition |
250 | Plasma-enhanced atomic layer deposition of titanium vanadium nitride |
251 | Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3 |
252 | SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition |
253 | Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors |
254 | Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers |
255 | Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition |
256 | Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD |
257 | Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices |
258 | Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting |
259 | Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes |
260 | Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage |
261 | ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium |
262 | Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition |
263 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
264 | Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films |
265 | Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing |
266 | Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition |
267 | Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor |
268 | Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition |
269 | Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys |
270 | Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition |
271 | Innovative remote plasma source for atomic layer deposition for GaN devices |
272 | Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET |
273 | Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films |
274 | Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy |
275 | Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition |
276 | Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization |
277 | Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties |
278 | Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure |
279 | Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier |
280 | AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing |
281 | Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition |
282 | Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition |
283 | Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition |
284 | Microwave properties of superconducting atomic-layer deposited TiN films |
285 | Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing |
286 | Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements |
287 | Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma |
288 | Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application |
289 | Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD |
290 | Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition |
291 | Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems |
292 | Plasma-enhanced atomic layer deposition of zinc phosphate |
293 | Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition |
294 | Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks |
295 | Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon |
296 | Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films |
297 | XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films |
298 | Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3 |
299 | Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition |
300 | Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition |
301 | Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode |
302 | Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C |
303 | XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition |
304 | Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors |
305 | Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition |
306 | Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient |
307 | Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor |
308 | Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten |
309 | Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition |
310 | ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window" |
311 | PEALD of Copper using New Precursors for Next Generation of Interconnections |
312 | Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant |
313 | Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition |
314 | The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition |
315 | Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition |
316 | Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition |
317 | Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition |
318 | Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3 |
319 | Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process |
320 | Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack |
321 | Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition |
322 | Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier |
323 | 3D structure evolution using metastable atomic layer deposition based on planar silver templates |
324 | Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition |
325 | Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition |
326 | Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors |
327 | Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition |
328 | Optical and Electrical Properties of TixSi1-xOy Films |
329 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma |
330 | Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2 |
331 | Atomic layer deposition of TiN for the fabrication of nanomechanical resonators |
332 | Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization |
333 | Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material |
334 | N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes |
335 | Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures |
336 | Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources |
337 | Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone |
338 | Plasma enhanced atomic layer deposition of aluminum sulfide thin films |
339 | Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact |
340 | Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries |
341 | Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing |
342 | Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices |
343 | PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads |
344 | Comparative study of ALD SiO2 thin films for optical applications |
345 | Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition |
346 | Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors |
347 | Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers |
348 | The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2 |
349 | Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy |
350 | Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources |
351 | Atomic layer deposition of GaN at low temperatures |
352 | Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition |
353 | Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide |
354 | Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries |
355 | Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals |
356 | Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation |
357 | Plasma-Assisted ALD of LiPO(N) for Solid State Batteries |
358 | Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films |
359 | Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films |
360 | Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition |
361 | Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering |
362 | Topographically selective deposition |
363 | Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor |
364 | Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition |
365 | Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent |
366 | Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells |
367 | Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition |
368 | High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition |
369 | Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor |
370 | Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method |
371 | Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition |
372 | Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition |
373 | Evaluation of plasma parameters on PEALD deposited TaCN |
374 | Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme |
375 | Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature |
376 | Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition |
377 | Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films |
378 | Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc |
379 | Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing |
380 | Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors |
381 | AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms |
382 | Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl |
383 | Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium |
384 | Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer |
385 | Plasma enhanced atomic layer deposition of Fe2O3 thin films |
386 | Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries |
387 | A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors |
388 | Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition |
389 | Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes |
390 | Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating |
391 | Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors |
392 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
393 | Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature |
394 | Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition |
395 | Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process |
396 | Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators |
397 | Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4 |
398 | Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes |
399 | Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash |
400 | Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current |
401 | Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide |
402 | Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN |
403 | Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor |
404 | Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition |
405 | Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition |
406 | Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition |
407 | Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors |
408 | Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition |
409 | Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP) |
410 | Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films |
411 | Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features |
412 | Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells |
413 | Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors |
414 | Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN |
415 | Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition |
416 | Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition |
417 | Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces |
418 | Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films |
419 | Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle |
420 | Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas |
421 | Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition |
422 | Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature |
423 | Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process |
424 | HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition |
425 | Spectroscopy and control of near-surface defects in conductive thin film ZnO |
426 | Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN |
427 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
428 | Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates |
429 | Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma |
430 | A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD |
431 | Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method |
432 | Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide |
433 | Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition |
434 | Ru thin film grown on TaN by plasma enhanced atomic layer deposition |
435 | Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection |
436 | Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric |
437 | Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals |
438 | Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments |
439 | Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant |
440 | Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films |
441 | MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion |
442 | New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell |
443 | ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications |
444 | Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition |
445 | Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor |
446 | Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device |
447 | Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage |
448 | Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth |
449 | Patterned deposition by plasma enhanced spatial atomic layer deposition |
450 | Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis |
451 | Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy |
452 | Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering |
453 | Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy |
454 | GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope |
455 | The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges |
456 | Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals |
457 | A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition |
458 | Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks |
459 | Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition |
460 | Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films |
461 | Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor |
462 | Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization |
463 | Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma |
464 | Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers |
465 | Plasma-enhanced atomic layer deposition of superconducting niobium nitride |
466 | Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries |
467 | Composite materials and nanoporous thin layers made by atomic layer deposition |
468 | A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology |
469 | Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5 |
470 | Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation |
471 | Analysis of nitrogen species in titanium oxynitride ALD films |
472 | Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells |
473 | Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition |
474 | Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition |
475 | Tribological properties of thin films made by atomic layer deposition sliding against silicon |
476 | Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate |
477 | Hydrogen plasma-enhanced atomic layer deposition of copper thin films |
478 | Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization |
479 | Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods |
480 | Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition |
481 | Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy |
482 | Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films |
483 | Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants |
484 | In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition |
485 | Self-Limiting Growth of GaN at Low Temperatures |
486 | TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition |
487 | Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma |
488 | Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells |
489 | Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation |
490 | Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition |
491 | Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN |
492 | Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas |
493 | Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum |
494 | The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition |
495 | Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films |
496 | An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor |
497 | Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition |
498 | Texture of atomic layer deposited ruthenium |
499 | Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology |
500 | Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications |
501 | Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator |
502 | Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma |
503 | Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers |
504 | Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition |
505 | Antireflection Coating on PMMA Substrates by Atomic Layer Deposition |
506 | Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime |
507 | Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition |
508 | Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement |
509 | Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen |
510 | Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide |
511 | Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets |
512 | Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells |
513 | Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures |
514 | Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition |
515 | Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 |
516 | Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide |
517 | Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications |
518 | Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition |
519 | Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma |
520 | Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S |
521 | Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor |
522 | Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia |
523 | High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition |
524 | High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane |
525 | Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition |
526 | Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD |
527 | Challenges in spacer process development for leading-edge high-k metal gate technology |
528 | Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition |
529 | Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO |
530 | Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth |
531 | Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study |
532 | A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films |
533 | Atomic layer controlled deposition of silicon nitride with self-limiting mechanism |
534 | Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering |
535 | Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films |
536 | Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM |
537 | Impact of interface materials on side permeation in indirect encapsulation of organic electronics |
538 | Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
539 | Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition |
540 | Gadolinium nitride films deposited using a PEALD based process |
541 | Layer-by-layer epitaxial growth of GaN at low temperatures |
542 | Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition |
543 | Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition |
544 | Gallium nitride thin films by microwave plasma-assisted ALD |
545 | A route to low temperature growth of single crystal GaN on sapphire |
546 | Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride |
547 | Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition |
548 | Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs |
549 | Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates |
550 | Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel |
551 | Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition |
552 | Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment |
553 | Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor |
554 | Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer |
555 | Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth |
556 | Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries |
557 | Thin film GaP for solar cell application |
558 | Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity |
559 | Atomic layer deposition of titanium nitride from TDMAT precursor |
560 | Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity |
561 | Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method |
562 | Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic |
563 | Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor |
564 | Perspectives on future directions in III-N semiconductor research |
565 | Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration |
566 | Sub-nanometer heating depth of atomic layer annealing |
567 | TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition |
568 | Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid |
569 | Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry |
570 | Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer |
571 | Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition |
572 | PEALD AlN: controlling growth and film crystallinity |
573 | Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition |
574 | Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor |
575 | Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor |
576 | Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect |
577 | Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma |
578 | Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition |
579 | Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition |
580 | Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition |
581 | Room temperature atomic layer deposition of TiO2 on gold nanoparticles |
582 | Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon |
583 | Modal properties of a strip-loaded horizontal slot waveguide |
584 | Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3 |
585 | The important role of water in growth of monolayer transition metal dichalcogenides |
586 | A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application |
587 | Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods |
588 | Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition |
589 | Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT) |
590 | Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition |
591 | Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber |
592 | Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum |
593 | Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing |
594 | Plasma-enhanced atomic layer deposition of vanadium nitride |
595 | Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor |
596 | Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma |
597 | Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices |
598 | Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing |
599 | Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate |
600 | Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition |
601 | Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition |
602 | Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition |
603 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
604 | Atomic layer epitaxy of germanium |
605 | Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor |
606 | Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier |
607 | Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon |
608 | Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate |
609 | Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films |
610 | Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide |
611 | Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors |
612 | Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications |
613 | Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time |
614 | Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization |
615 | In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition |
616 | Characteristics of HfO2 thin films grown by plasma atomic layer deposition |
617 | Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks |
618 | In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications |
619 | Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma |
620 | Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma |
621 | Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx |
622 | Atomic layer epitaxy for quantum well nitride-based devices |
623 | The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition |
624 | Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films |
625 | Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition |
626 | Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS |
627 | Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications |
628 | Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application |
629 | Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation |
630 | PEALD of a Ruthenium Adhesion Layer for Copper Interconnects |
631 | Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics |
632 | Optical and Electrical Properties of AlxTi1-xO Films |
633 | Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma |
634 | RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor |
635 | The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor |
636 | Plasma-enhanced ALD system for SRF cavity |
637 | An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices |
638 | Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide |
639 | Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors |
640 | Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides |
641 | Experimental and theoretical determination of the role of ions in atomic layer annealing |
642 | Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing |
643 | Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor |
644 | Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures |
645 | Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma |
646 | Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells |
647 | Plasma enhanced atomic layer deposition of Ga2O3 thin films |
648 | Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy |
649 | Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma |
650 | Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition |
651 | The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties |
652 | Sub-10-nm ferroelectric Gd-doped HfO2 layers |
653 | Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors |
654 | Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer |
655 | Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2 |
656 | Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source |
657 | Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
658 | Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films |
659 | The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films |
660 | Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries |
661 | Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor |
662 | Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing |
663 | Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers |
664 | Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors |
665 | Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer |
666 | Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant |
667 | Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma |
668 | Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition |
669 | Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films |
670 | Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications |
671 | Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage |
672 | Atomic hydrogen-assisted ALE of germanium |
673 | Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System |
674 | Crystalline growth of AlN thin films by atomic layer deposition |
675 | Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma |
676 | ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition |
677 | Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices |
678 | Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers |
679 | Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN |
680 | Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals |
681 | PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity |
682 | High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating |
683 | Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier |
684 | Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition |
685 | Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene |
686 | Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition |
687 | Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method |
688 | Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma |
689 | Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry |
690 | Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source |
691 | Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting |
692 | Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD |
693 | In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition |
694 | Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon |
695 | Fast PEALD ZnO Thin-Film Transistor Circuits |
696 | Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry |
697 | In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition |
698 | Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma |
699 | Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation |
700 | Plasma enhanced atomic layer deposition of gallium sulfide thin films |
701 | Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs |
702 | TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD |
703 | The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices |
704 | Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films |
705 | The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology |
706 | Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures |
707 | Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films |
708 | Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures |
709 | Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity |
710 | Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition |
711 | In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films |
712 | Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas |
713 | Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes |
714 | Atomic layer deposition of high-mobility hydrogen-doped zinc oxide |
715 | Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes |
716 | Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD |
717 | Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate |
718 | Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies |
719 | Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3 |
720 | Study on the characteristics of aluminum thin films prepared by atomic layer deposition |
721 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
722 | Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors |
723 | Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs |
724 | Plasma-enhanced atomic layer deposition for plasmonic TiN |
725 | Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures |
726 | Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth |
727 | Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique |
728 | Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation |
729 | Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy |
730 | Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor |
731 | ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors |
732 | Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications |
733 | Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition |
734 | In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3 |
735 | Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma |
736 | Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time |
737 | Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane |
738 | A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition |
739 | Structural and optical characterization of low-temperature ALD crystalline AlN |
740 | Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films |
741 | Electron-enhanced atomic layer deposition of silicon thin films at room temperature |
742 | Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers |
743 | Advances in the fabrication of graphene transistors on flexible substrates |
744 | Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices |
745 | Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3 |
746 | Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics |
747 | Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source |
748 | Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate |
749 | Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques |
750 | Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition |
751 | Atmospheric pressure plasma enhanced spatial ALD of silver |
752 | On the role of nanoporosity in controlling the performance of moisture permeation barrier layers |
753 | Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures |
754 | Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition |
755 | Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer |
756 | Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition |
757 | Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries |
758 | High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates |
759 | Sub-7-nm textured ZrO2 with giant ferroelectricity |
760 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film |
761 | Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma |
762 | Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma |
763 | Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation |
764 | Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control |
765 | Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions |
766 | Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films |
767 | Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy |
768 | Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods |
769 | Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3 |
770 | Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma |
771 | Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition |
772 | Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition |
773 | Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation |
774 | Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells |
775 | Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma |
776 | A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films |
777 | Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition |
778 | Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition |
779 | Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology |
780 | Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3 |
781 | Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology |
782 | In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition |
783 | Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma |
784 | Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma |
785 | Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition |
786 | Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer |
787 | GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride |
788 | Room-Temperature Atomic Layer Deposition of Platinum |
789 | Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2 |
790 | Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition |
791 | A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs |
792 | Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma |
793 | Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC |
794 | Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition |
795 | Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
796 | Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films |
797 | Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods |
798 | Plasma-Enhanced Atomic Layer Deposition of Ni |
799 | Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition |
800 | Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration |
801 | Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition |
802 | Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis |
803 | Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment |
804 | Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition |
805 | Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods |
806 | Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires |
807 | Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN |
808 | Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon |
809 | Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes |
810 | Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes |
811 | Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes |
812 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films |
813 | Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer |
814 | Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies |
815 | Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
816 | Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures |
817 | Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides |
818 | Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas |
819 | Carbon content control of silicon oxycarbide film with methane containing plasma |
820 | Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range |
821 | Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition |
822 | Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films |
823 | Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride |
824 | Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure |
825 | Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications |
826 | DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air |
827 | Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate |
828 | Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 |
829 | Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants |
830 | Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors |
831 | Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition |
832 | Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy |
833 | Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition |
834 | A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films |
835 | Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers |
836 | Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry |
837 | Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source |
838 | Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells |
839 | Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition |
840 | Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition |
841 | Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study |
842 | Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell |
843 | Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition |
844 | Atomic layer deposition of YMnO3 thin films |
845 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
846 | Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia |
847 | Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films |
848 | Electrically Excited Plasmonic Nanoruler for Biomolecule Detection |
849 | Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C |
850 | Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier |
851 | Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation |
852 | Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas |
853 | Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices |
854 | Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions |
855 | Self-limiting diamond growth from alternating CFx and H fluxes |
856 | Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties |
857 | Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor |
858 | Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches |
859 | Atomic Layer Deposition of Niobium Nitride from Different Precursors |
860 | Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition |
861 | The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films |
862 | The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition |
863 | Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma |
864 | Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches |
865 | Atomic layer deposition of InN using trimethylindium and ammonia plasma |
866 | Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators |
867 | Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier |
868 | Ag films grown by remote plasma enhanced atomic layer deposition on different substrates |
869 | Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3 |
870 | Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition |
871 | Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers |
872 | Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition |