Thickness Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
2Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
3Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
4Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
5Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
6Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
7Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
8Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
9Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
10Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
11Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
12In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
13Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
14Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
15Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
16Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
17Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
18Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
19Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
20Challenges in spacer process development for leading-edge high-k metal gate technology
21Plasma Enhanced Atomic Layer Deposition on Powders
22Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
23Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
24The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
25Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
26Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
27XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
28Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
29Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
30Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
31Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
32Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
33HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
34Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
35Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
36Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
37Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
38Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
39Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
40An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
41Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
42Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
43Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
44Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
45High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
46Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
47Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
48Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
49Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
50Plasma-enhanced atomic layer deposition of titanium vanadium nitride
51Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
52Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
53Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
54Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
55Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
56Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
57Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
58Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
59Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
60Comparative study of ALD SiO2 thin films for optical applications
61Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
62Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
63Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
64Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
65Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
66Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
67Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
68Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
69Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
70Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
71Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
72Room temperature atomic layer deposition of TiO2 on gold nanoparticles
73A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
74The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
75Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
76Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
77The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
78Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
79Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
80Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
81Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
82Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
83Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
84Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
85Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
86Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
87Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
88Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
89Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
90Study on the characteristics of aluminum thin films prepared by atomic layer deposition
91Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
92Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
93Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
94Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
95Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
96Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
97Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
98Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
99Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
100Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
101High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
102Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
103Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
104Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
105Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
106Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
107Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
108Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
109Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
110Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
111Room-Temperature Atomic Layer Deposition of Platinum
112Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
113Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
114Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
115Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
116Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
117Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
118Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
119Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
120Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
121Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
122Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
123The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
124Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
125Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
126Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
127Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
128Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
129Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
130Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
131Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
132Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
133Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
134Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
135Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
136Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
137Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
138Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
139Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
140Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack
141Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
142Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
143Optimization of the Surface Structure on Black Silicon for Surface Passivation
144Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
145Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
146ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
147Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
148Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
149Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
150Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
151Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
152Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
153Patterned deposition by plasma enhanced spatial atomic layer deposition
154Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
155Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
156Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
157Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
158The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
159Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
160Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
161Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
162Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
163Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
164Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
165Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
166Atomic layer epitaxy of Si using atomic H
167ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
168Properties of AlN grown by plasma enhanced atomic layer deposition
169Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
170Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
171Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
172Plasma-enhanced atomic layer deposition of superconducting niobium nitride
173Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
174Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
175Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
176Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
177Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
178Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
179Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
180Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
181Sub-10-nm ferroelectric Gd-doped HfO2 layers
182Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
183Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
184Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
185TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
186Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
187A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
188Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
189PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
190Atomic layer epitaxy of germanium
191Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
192Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
193Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
194Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
195Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
196Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
197Atomic layer deposition of GaN at low temperatures
198Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
199Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
200In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
201Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
202Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
203Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
204Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
205Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
206Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
207Topographically selective deposition
208N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
209Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
210Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
211Self-Limiting Growth of GaN at Low Temperatures
212Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
213Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
214Composite materials and nanoporous thin layers made by atomic layer deposition
215Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
216Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
217Plasma-enhanced ALD system for SRF cavity
218Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
219Plasma enhanced atomic layer deposition of aluminum sulfide thin films
220Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
221Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
222Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
223Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
224Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
225Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
226Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
227Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
228Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
229Graphene-based MMIC process development and RF passives design
230The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
231Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
232Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
233Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
234Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
235A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
236Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
237Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
238Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
239Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
240Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
241Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
242Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
243Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
244Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
245Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
246Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
247Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
248Microwave properties of superconducting atomic-layer deposited TiN films
249Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
250Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
251Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
252Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
253Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
254Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
255Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
256Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
257Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
258Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
259Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
260Layer-by-layer epitaxial growth of GaN at low temperatures
261PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
262Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
263Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
264Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
265A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
266SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
267Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
268Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
269Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
270Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
271Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
272Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
273Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
274Plasma-enhanced atomic layer deposition for plasmonic TiN
275Atomic Layer Deposition of Niobium Nitride from Different Precursors
276Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
277Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
278Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
279RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
280Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
281Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
282Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
283Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
284Plasma-enhanced atomic layer deposition of tungsten nitride
285Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
286Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
287Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
288In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
289Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
290Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
291Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
292Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
293Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
294Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
295Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
296Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
297Self-limiting diamond growth from alternating CFx and H fluxes
298Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
299Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
300Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
301Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
302Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
303PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
304Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
305Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
306Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
307Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
308Atomic layer deposition of titanium nitride from TDMAT precursor
309Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
310Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
311The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
312Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
313Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
314ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
315Atomic Layer Deposition of SiN for spacer applications in high-end logic devices
316Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
317Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
318Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
319Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
320Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
321Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
322Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
323Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
324PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
325The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
326Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
327Analysis of nitrogen species in titanium oxynitride ALD films
328Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
329Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
330Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
331Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
332Ru thin film grown on TaN by plasma enhanced atomic layer deposition
333Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
334Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
335Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
336Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
337ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
338Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
339Impact of interface materials on side permeation in indirect encapsulation of organic electronics
340Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
341Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
342Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
343RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
344Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
345Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
346Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
347PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
348Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
349Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
350Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
351Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
352Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
353MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
354Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
355Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
356Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
357Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
358Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
359Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
360Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
361Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
362Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
363Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
364Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
365Electron-enhanced atomic layer deposition of silicon thin films at room temperature
366Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
367Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
368Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
369Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
370Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
371Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
372Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
373Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
374Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
375Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
376Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
377Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
378Atomic hydrogen-assisted ALE of germanium
379Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
380Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
381Gallium nitride thin films by microwave plasma-assisted ALD
382Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
383Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
384Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
385Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
386Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
387Carbon content control of silicon oxycarbide film with methane containing plasma
388Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
389Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
390Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
391Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
392Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
393Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
394Hydrogen plasma-enhanced atomic layer deposition of copper thin films
395Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
396Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
397Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
398On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
399Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
400Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
401GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
402Evaluation of plasma parameters on PEALD deposited TaCN
403Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
404Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
405Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
406Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
407Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
408Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
409In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
410Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
411High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
412Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
413Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
414Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
415An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
416Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
417Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
418Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
419Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
420Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
421Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
422Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
423Structural and optical characterization of low-temperature ALD crystalline AlN
424Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
425Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
426Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
427In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
428Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
429TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
430Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
431Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
432Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
433Atmospheric pressure plasma enhanced spatial ALD of silver
434Crystalline growth of AlN thin films by atomic layer deposition
435Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
436Plasma enhanced atomic layer deposition of Fe2O3 thin films
437Remote Plasma ALD of Platinum and Platinum Oxide Films
438Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
439Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
440Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
441Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
442Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
443Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
444Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
445Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
446Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
447Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
448Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
449Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
450Experimental and theoretical determination of the role of ions in atomic layer annealing
451Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
452Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
453Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
454AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
455Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
456Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
457Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
458Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
459Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
460ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
461Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
462Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
463Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
464Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
465Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
466Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
467Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
468Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
469Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
470Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
471ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
472Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
473Modal properties of a strip-loaded horizontal slot waveguide
474Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
475Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
476Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
477Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
478Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
479Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
480Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
481Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
482Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
483Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
484Sub-nanometer heating depth of atomic layer annealing
485Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
486Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
487Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
488Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
489Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
490Plasma-enhanced atomic layer deposition of vanadium nitride
491Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
492Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
493Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
494In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
495Innovative remote plasma source for atomic layer deposition for GaN devices
496Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
497Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
498New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
499Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
5003D structure evolution using metastable atomic layer deposition based on planar silver templates
501Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
502Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
503Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
504Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
505Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
506Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
507Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
508Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
509Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
510Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
511TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
512Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
513Optical and Electrical Properties of AlxTi1-xO Films
514Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
515Atomic layer deposition of YMnO3 thin films
516Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
517Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
518Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
519Atomic layer deposition of InN using trimethylindium and ammonia plasma
520Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
521Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
522A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
523Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
524Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
525Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
526Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
527Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
528Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
529Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
530Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
531Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
532Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
533Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
534Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
535Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
536Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
537Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
538Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
539Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
540Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
541Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
542Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
543Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
544A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
545Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
546Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
547Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
548GaN Nanowire MOSFET With Near-Ideal Subthreshold Slope
549Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
550Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
551GeSbTe deposition for the PRAM application
552The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
553Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
554Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
555Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
556ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
557Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
558Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
559Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
560High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
561An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
562Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
563Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
564Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
565Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
566Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
567Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
568Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
569Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
570In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
571Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
572Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
573Perspectives on future directions in III-N semiconductor research
574A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
575Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
576DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
577Plasma enhanced atomic layer deposition of Ga2O3 thin films
578Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
579Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
580Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
581Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
582Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
583Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
584Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
585Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
586Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
587A route to low temperature growth of single crystal GaN on sapphire
588Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
589Fast PEALD ZnO Thin-Film Transistor Circuits
590Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
591Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
592Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
593Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
594Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
595Atomic layer epitaxy for quantum well nitride-based devices
596Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
597Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
598Characteristics of HfO2 thin films grown by plasma atomic layer deposition
599Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
600Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
601Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
602Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
603Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
604Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
605Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
606Plasma-Assisted Atomic Layer Deposition of Palladium
607Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
608Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
609Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
610Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
611Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
612Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
613Atomic Layer Deposition of the Solid Electrolyte LiPON
614Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
615Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
616Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
617Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
618Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
619The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
620Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
621Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
622Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
623Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
624Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
625Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
626Low temperature temporal and spatial atomic layer deposition of TiO2 films
627Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
628Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
629Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
630Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
631Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
632Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
633Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
634Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
635Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
636Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
637In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
638In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
639Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
640In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
641Thin film GaP for solar cell application
642Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
643Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
644Plasma enhanced atomic layer deposition of zinc sulfide thin films
645Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
646Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
647Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
648Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
649Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
650Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
651Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
652Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
653Texture of atomic layer deposited ruthenium
654Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
655Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
656Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
657Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
658Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
659Copper-ALD Seed Layer as an Enabler for Device Scaling
660Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
661Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
662Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
663Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
664Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
665Gadolinium nitride films deposited using a PEALD based process
666In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
667A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
668Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
669Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
670Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
671Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
672Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
673Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
674Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
675High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
676Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
677Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
678Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
679Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
680Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
681Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
682Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
683Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
684Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
685Plasma-Enhanced Atomic Layer Deposition of Ni
686Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
687Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
688Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
689Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
690Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
691The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
692Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
693Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
694Plasma enhanced atomic layer deposition of SiNx:H and SiO2
695Densification of Thin Aluminum Oxide Films by Thermal Treatments
696Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
697Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
698Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
699Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
700High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
701Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
702Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
703Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
704GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
705Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
706Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
707Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
708Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
709Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
710A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
711Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
712Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
713Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
714Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
715Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
716Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
717AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
718Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
719Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
720Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
721Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
722Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
723Spectroscopy and control of near-surface defects in conductive thin film ZnO
724A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
725Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
726The effects of layering in ferroelectric Si-doped HfO2 thin films
727Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
728Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
729Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
730Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
731Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
732Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
733A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
734High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
735Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
736Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
737Atomic layer controlled deposition of silicon nitride with self-limiting mechanism
738Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
739Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
740Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
741Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
742Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
743Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
744Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
745Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
746Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
747A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
748Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
749Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
750Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
751Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
752Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
753Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
754Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
755Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
756Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
757Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
758Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
759Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
760Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
761Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
762Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
763Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
764Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
765Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
766Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
767Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
768The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
769Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
770Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
771Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
772Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
773A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
774Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
775Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
776Plasma enhanced atomic layer deposition of gallium sulfide thin films
777Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
778The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
779Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
780Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
781Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
782Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
783Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
784Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
785Low temperature plasma enhanced deposition of GaP films on Si substrate
786Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
787PEALD of Copper using New Precursors for Next Generation of Interconnections
788Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
789Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
790Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
791Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
792Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
793Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
794PEALD AlN: controlling growth and film crystallinity
795Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
796Optical and Electrical Properties of TixSi1-xOy Films
797Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
798XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
799Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
800Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
801The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
802Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
803Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
804Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
805Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
806Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
807Plasma-enhanced atomic layer deposition of BaTiO3
808Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
809Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
810Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
811Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
812In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
813Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
814Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
815Ga2O3 MOSFETs Using Spin-On-Glass Source/Drain Doping Technology
816Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
817Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
818Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
819Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
820In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
821Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
822Tribological properties of thin films made by atomic layer deposition sliding against silicon
823Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
824Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
825Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
826Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
827Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
828Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
829Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
830Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
831Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
832Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
833The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
834Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
835Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
836Plasma-enhanced atomic layer deposition of zinc phosphate
837Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
838Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
839Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
840Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
841Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
842Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
843Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
844Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
845Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
846Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
847Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
848Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
849Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
850TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
851Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
852Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
853Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
854Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
855Damage evaluation in graphene underlying atomic layer deposition dielectrics
856A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
857Advances in the fabrication of graphene transistors on flexible substrates
858Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
859Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
860Symmetrical Al2O3-based passivation layers for p- and n-type silicon
861Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
862Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
863Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
864Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
865Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
866Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
867ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
868Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
869Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
870Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
871Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
872Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
873Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
874Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
875Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
876α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
877Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
878Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
879AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
880Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
881Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
882Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
883Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
884Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
885Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
886Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
887Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
888Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
889Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
890Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
891Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
892Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
893Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
894The important role of water in growth of monolayer transition metal dichalcogenides
895Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
896Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
897WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
898Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
899Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
900Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
901Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
902Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
903Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
904Sub-7-nm textured ZrO2 with giant ferroelectricity
905Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
906Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
907Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition