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Publication Information

Title: Graphene-based MMIC process development and RF passives design

Type: Conference Proceedings

Info: GeMiC 2015 - March 16-18, 2015, N├╝rnberg, Germany

Date: 2015-03-16

DOI: http://dx.doi.org/10.1109/GEMIC.2015.7107813

Author Information

Name

Institution

RWTH Aachen University

RWTH Aachen University

RWTH Aachen University

Applied Micro and Optoelectronic (AMO) GmbH

Applied Micro and Optoelectronic (AMO) GmbH

RWTH Aachen University

Films

Plasma Al2O3 using Unknown

Deposition Temperature = 300C

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Unknown

Unknown

Dielectric Constant, Permittivity

Unknown

Unknown

Substrates

SiO2

Ti/Al

Keywords

Notes

PEALD Al2O3 film for graphene-based MMIC process.

337

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