Publication Information

Title:
Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 14 (1) D10-D12 (2011)
Date:
2010-10-06

Author Information

Name Institution
Tae-Kwang EomYeungnam University
Soo-Hyun KimYeungnam University
Kye-Sun ParkUniversity of Ulsan
Sunjung KimUniversity of Ulsan
Hoon KimApplied Materials

Films


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Substrates

TiN

Keywords

Seed Layer

Notes

1364