
Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 14 (1) D10-D12 (2011)
Date:
2010-10-06
Author Information
Name | Institution |
---|---|
Tae-Kwang Eom | Yeungnam University |
Soo-Hyun Kim | Yeungnam University |
Kye-Sun Park | University of Ulsan |
Sunjung Kim | University of Ulsan |
Hoon Kim | Applied Materials |
Films
Plasma RuSiN
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Substrates
TiN |
Notes
1364 |