Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37(1) 2018 010904
Date:
2018-11-01
Author Information
Name | Institution |
---|---|
Qipeng Fan | Beijing Institute of Graphic Communication |
Lijun Sang | Beijing Institute of Graphic Communication |
Derong Jiang | Beijing Institute of Graphic Communication |
Lizhen Yang | Beijing Institute of Graphic Communication |
Haibao Zhang | Beijing Institute of Graphic Communication |
Qiang Chen | Beijing Institute of Graphic Communication |
Zhongwei Liu | Beijing Institute of Graphic Communication |
Films
Plasma CoN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Profilometry
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Substrates
Glass |
Silicon |
Notes
1722 |