Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37(1) 2018 010904
Date:
2018-11-01

Author Information

Name Institution
Qipeng FanBeijing Institute of Graphic Communication
Lijun SangBeijing Institute of Graphic Communication
Derong JiangBeijing Institute of Graphic Communication
Lizhen YangBeijing Institute of Graphic Communication
Haibao ZhangBeijing Institute of Graphic Communication
Qiang ChenBeijing Institute of Graphic Communication
Zhongwei LiuBeijing Institute of Graphic Communication

Films

Plasma CoN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Profilometry

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Substrates

Glass
Silicon

Notes

1722