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Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes

Type:
Journal
Info:
Journal of Energy Storage 64 (2023) 107049
Date:
2023-03-02
DOI:
https://doi.org/10.1016/j.est.2023.107049

Author Information

Name Institution
Hanie KazariMcGill University
Elmira PajootanMcGill University
Mark J. SowaVeeco Instruments
Sylvain CoulombeMcGill University
Pascal HubertMcGill University

Films

Plasma Ru

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
η4-2,3-dimethylbutadiene ruthenium tricarbonyl, Ru(DMBD)(CO)3
CAS#: 0-0-0
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature Range = 150-210C

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi SU-8000

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: Oxford Instruments XMax

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Talos F200X

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Diagnostic: FEI Talos F200X

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Empyrean

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Empyrean

Characteristic: Capacitance
Analysis: CV, Cyclic Voltammetry
Diagnostic: -

Characteristic: Stability
Analysis: Galvanostatic Cycling
Diagnostic: -

Characteristic: Electrochemical Performance
Analysis: EIS, Electrochemical Impedance Spectroscopy
Diagnostic: -

Characteristic: Flexibility
Analysis: Custom
Diagnostic: Custom

Substrates

CNTs, Carbon NanoTubes

Notes

1746