Title: Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
Type: Journal
Info: Thin Solid Films, Volume 566, 1 September 2014, Pages 93-98
Date: 2014-07-17
DOI: http://dx.doi.org/10.1016/j.tsf.2014.07.031
Name
Institution
National Applied Research Laboratories
Characteristic
Analysis
Diagnostic
Density
XRR, X-Ray Reflectivity
Rigaku TTRAX III
Chemical Composition, Impurities
XPS, X-ray Photoelectron Spectroscopy
-
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
XRD, X-Ray Diffraction
Rigaku TTRAX III
Conformality, Step Coverage
TEM, Transmission Electron Microscope
-
Resistivity, Sheet Resistance
-
-
Morphology, Roughness, Topography
AFM, Atomic Force Microscopy
Veeco Dimension 3100
Thickness
-
-
Glass
Silicon
Catalysts
PEALD Pt deposition for catalyst application.
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