Publication Information

Title: Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures

Type: Journal

Info: Thin Solid Films, Volume 566, 1 September 2014, Pages 93-98

Date: 2014-07-17

DOI: http://dx.doi.org/10.1016/j.tsf.2014.07.031

Author Information

Name

Institution

National Applied Research Laboratories

Films

Plasma Pt using Unknown

Deposition Temperature = 200C

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Density

XRR, X-Ray Reflectivity

Rigaku TTRAX III

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Rigaku TTRAX III

Conformality, Step Coverage

TEM, Transmission Electron Microscope

Unknown

Resistivity, Sheet Resistance

Unknown

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Veeco Dimension 3100

Thickness

Unknown

Unknown

Substrates

Glass

Silicon

Keywords

Catalysts

Notes

PEALD Pt deposition for catalyst application.

280



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