Title: Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
Type: Journal
Info: Thin Solid Films, Volume 566, 1 September 2014, Pages 93-98
Date: 2014-07-17
DOI: http://dx.doi.org/10.1016/j.tsf.2014.07.031
Name
Institution
National Applied Research Laboratories
Characteristic
Analysis
Diagnostic
Density
XRR, X-Ray Reflectivity
Rigaku TTRAX III
Chemical Composition, Impurities
XPS, X-ray Photoelectron Spectroscopy
Unknown
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
XRD, X-Ray Diffraction
Rigaku TTRAX III
Conformality, Step Coverage
TEM, Transmission Electron Microscope
Unknown
Resistivity, Sheet Resistance
Unknown
Unknown
Morphology, Roughness, Topography
AFM, Atomic Force Microscopy
Veeco Dimension 3100
Thickness
Unknown
Unknown
Glass
Silicon
Catalysts
PEALD Pt deposition for catalyst application.
280
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