Publication Information

Title: Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures

Type: Journal

Info: Thin Solid Films, Volume 566, 1 September 2014, Pages 93-98

Date: 2014-07-17

DOI: http://dx.doi.org/10.1016/j.tsf.2014.07.031

Author Information

Name

Institution

National Applied Research Laboratories

Films

Plasma Pt using Unknown

Deposition Temperature = 200C

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Density

XRR, X-Ray Reflectivity

Rigaku TTRAX III

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Rigaku TTRAX III

Conformality, Step Coverage

TEM, Transmission Electron Microscope

-

Resistivity, Sheet Resistance

Unknown

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Veeco Dimension 3100

Thickness

Unknown

-

Substrates

Glass

Silicon

Keywords

Catalysts

Notes

PEALD Pt deposition for catalyst application.

280



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