Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
Type:
Journal
Info:
Journal of Nanoscience and Nanotechnology, Volume 15, Number 11, 2015, pp. 8472-8477
Date:
2015-09-01
Author Information
Name | Institution |
---|---|
Jae-Hun Jung | Yeungnam University |
Seung-Joon Lee | Yeungnam University |
Hyun-Jung Lee | Yeungnam University |
Min Young Lee | Yeungnam University |
Taehoon Cheon | Yeungnam University |
So Ik Bae | Yeungnam University |
Masayuki Saito | Tanaka |
Kazuharu Suzuki | Tanaka |
Shunichi Nabeya | Tanaka |
Jeongyeop Lee | Hynix Semiconductor |
Sangdeok Kim | Hynix Semiconductor |
Seungjin Yeom | Hynix Semiconductor |
Jong Hyun Seo | Korea Aerospace University |
Soo-Hyun Kim | Yeungnam University |
Films
Film/Plasma Properties
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Thickness
Analysis: -
Substrates
SiO2 |
Notes
425 |