Publication Information

Title: Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel

Type: Journal

Info: Journal of Vacuum Science & Technology A 36, 1, 2018

Date: 2017-12-04

DOI: http://dx.doi.org/10.1116/1.5003388

Author Information

Name

Institution

Sejong University

Sejong University

Sejong University

UP Chemical

UP Chemical

Sejong University

Films

Plasma Ni using Atomic Premium CN1

Deposition Temperature Range = 125-250C

0-0-0

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Precursor Characterization

TGA, Thermo Gravimetric Analysis

Unknown

Thickness

TEM, Transmission Electron Microscope

JEOL 2100F

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Rigaku D/Max-2500

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Raman Spectroscopy

Renishaw Invia Raman

Compositional Depth Profiling

XPS, X-ray Photoelectron Spectroscopy

PHI VersaProbe 5000

Substrates

Silicon

Keywords

Notes

1120



Shortcuts



© 2014-2019 plasma-ald.com