Publication Information

Title:
Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 1, 2018
Date:
2017-12-04

Author Information

Name Institution
Jae-Min ParkSejong University
Seongyoon KimSejong University
June HwangSejong University
Won Seok HanUP Chemical
Wonyong KohUP Chemical
Won-Jun LeeSejong University

Films

Plasma Ni


Film/Plasma Properties

Characteristic: Precursor Characterization
Analysis: TGA, Thermo Gravimetric Analysis

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy

Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Silicon

Keywords

Notes

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