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Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 1, 2018
Date:
2017-12-04
Author Information
| Name | Institution |
|---|---|
| Jae-Min Park | Sejong University |
| Seongyoon Kim | Sejong University |
| June Hwang | Sejong University |
| Won Seok Han | UP Chemical |
| Wonyong Koh | UP Chemical |
| Won-Jun Lee | Sejong University |
Films
Plasma Ni
Film/Plasma Properties
Characteristic: Precursor Characterization
Analysis: TGA, Thermo Gravimetric Analysis
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Silicon |
Notes
| 1120 |