Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content

Type:
Journal
Info:
J. Vac. Sci. Technol. A 40(3) May/Jun 2022
Date:
2022-03-31
DOI:
http://dx.doi.org/10.1116/6.0001752

Author Information

Name Institution
Daniela FontechaUniversity of Maryland
R. Blake NuwayhidUniversity of Maryland
Alexander Campbell KozenUniversity of Maryland
David M. StewartUniversity of Maryland
Gary W. RubloffUniversity of Maryland
Keith E. GregorczykUniversity of Maryland

Films

Plasma NaPON

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
NaOtBu, Sodium tert-butoxide
CAS#: 865-48-5
Trimethyl phosphate, TMP, (MeO)3PO
CAS#: 512-56-1
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature Range = 150-350C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000D

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Xpert PRO MRD X-ray Diffractometer

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Xpert PRO MRD X-ray Diffractometer

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Kratos Analytical Axis Ultra DLD

Characteristic: Conformality, Step Coverage
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: Hitachi SU-70

Characteristic: Conductivity
Analysis: EIS, Electrochemical Impedance Spectroscopy
Diagnostic: Bio-Logic VSP

Substrates

Si(100)
AAO, Anodic Aluminum Oxide

Notes

1701