Chemical Composition, Impurities Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
3A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
6A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
7A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
8A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
9A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
10A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
11A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
12A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
13A route to low temperature growth of single crystal GaN on sapphire
14A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
15A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
16Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
17Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
18Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
19Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
20Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
21Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
22ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
23ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
24ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
25ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
26ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
27AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
28All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
29Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
30AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
31AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
32Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
33Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
34Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
35Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
36Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
37An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
38An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
39An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
40An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
41Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
42Analysis of nitrogen species in titanium oxynitride ALD films
43Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
44Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
45Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
46Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
47Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
48Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
49Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
50Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
51Atmospheric pressure plasma enhanced spatial ALD of silver
52Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
53Atomic hydrogen-assisted ALE of germanium
54Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
55Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
56Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
57Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
58Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
59Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
60Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
61Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
62Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
63Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
64Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
65Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
66Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
67Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
68Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
69Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
70Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
71Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
72Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
73Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
74Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
75Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
76Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
77Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
78Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
79Atomic layer deposition of GaN at low temperatures
80Atomic Layer Deposition of Gold Metal
81Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
82Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
83Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
84Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
85Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
86Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
87Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
88Atomic layer deposition of metal-oxide thin films on cellulose fibers
89Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
90Atomic Layer Deposition of Nanolayered Carbon Films
91Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
92Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
93Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
94Atomic Layer Deposition of Niobium Nitride from Different Precursors
95Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
96Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
97Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
98Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
99Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
100Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
101Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
102Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
103Atomic Layer Deposition of the Solid Electrolyte LiPON
104Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
105Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
106Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
107Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
108Atomic layer deposition of titanium nitride from TDMAT precursor
109Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
110Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
111Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
112Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
113Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
114Atomic layer deposition of YMnO3 thin films
115Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
116Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
117Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
118Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
119Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
120Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
121Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
122Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
123Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
124Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
125Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
126Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
127Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
128Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
129Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
130Carbon content control of silicon oxycarbide film with methane containing plasma
131Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
132Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
133Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
134Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
135Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
136Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
137Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
138Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
139Characteristics of HfO2 thin films grown by plasma atomic layer deposition
140Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
141Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
142Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
143Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
144Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
145Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
146Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
147Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
148Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
149Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
150Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
151Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
152Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
153Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
154Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
155Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
156Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
157Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
158Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
159Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
160Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
161Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
162Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
163Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
164Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
165Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
166Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
167Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
168Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
169Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
170Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
171Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
172Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
173Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
174Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
175Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
176Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
177Composite materials and nanoporous thin layers made by atomic layer deposition
178Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
179Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
180Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
181Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
182Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
183Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
184Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
185Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
186Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
187Copper-ALD Seed Layer as an Enabler for Device Scaling
188Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
189Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
190Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
191Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
192Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
193Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
194Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
195Damage evaluation in graphene underlying atomic layer deposition dielectrics
196Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
197Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
198Densification of Thin Aluminum Oxide Films by Thermal Treatments
199Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
200Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
201Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
202Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
203Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
204Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
205Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
206Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
207Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
208Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
209Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
210Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
211Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
212Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
213Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
214Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
215Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
216Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
217Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
218Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
219Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
220Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
221Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
222Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
223Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
224Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
225Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
226Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
227Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
228Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
229Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
230Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
231Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
232Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
233Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
234Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
235Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
236Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
237Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
238Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
239Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
240Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
241Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
242Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
243Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
244Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
245Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
246Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
247Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
248Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
249Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
250Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
251Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
252Effects of Recessed-Gate Structure on AlGaN/GaN-on-SiC MIS-HEMTs with Thin AlOxNy MIS Gate
253Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
254Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
255Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
256Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
257Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
258Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
259Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
260Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
261Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
262Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
263Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
264Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
265Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
266Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
267Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
268Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
269Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
270Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
271Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
272Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
273Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
274Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
275Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
276Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
277Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
278Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
279Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
280Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
281Evaluation of plasma parameters on PEALD deposited TaCN
282Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
283Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
284Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
285Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
286Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
287Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
288Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
289Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
290Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
291Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
292Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
293Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
294Flexible Memristive Memory Array on Plastic Substrates
295Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
296Formation of aluminum nitride thin films as gate dielectrics on Si(100)
297Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
298Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
299Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
300From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
301Fully CMOS-compatible titanium nitride nanoantennas
302Fundamental beam studies of radical enhanced atomic layer deposition of TiN
303GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
304Gadolinium nitride films deposited using a PEALD based process
305GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
306GeSbTe deposition for the PRAM application
307Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
308Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
309Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
310Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
311Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
312Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
313Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
314Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
315Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
316Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
317Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
318Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
319Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
320Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
321Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
322Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
323Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
324Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
325Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
326Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
327Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
328Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
329HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
330HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
331HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
332High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
333High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
334High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
335High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
336High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
337High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
338High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
339High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
340High-Reflective Coatings For Ground and Space Based Applications
341High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
342Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
343Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
344Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
345Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
346Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
347Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
348Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
349Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
350Hydrogen plasma-enhanced atomic layer deposition of copper thin films
351Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
352Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
353Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
354Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
355Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
356Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
357Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
358Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
359Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
360Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
361Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
362Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
363Improved understanding of recombination at the Si/Al2O3 interface
364Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
365Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
366Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
367Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
368Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
369Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
370In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
371In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
372In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
373In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
374In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
375In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
376In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
377In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
378In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
379In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
380In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
381In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
382In-gap states in titanium dioxide and oxynitride atomic layer deposited films
383In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
384Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
385Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
386Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
387Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
388Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
389Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
390Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
391Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
392Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
393Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
394Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
395Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
396Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
397Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
398Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
399Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
400Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
401Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
402Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
403Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
404Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
405Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
406Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
407Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
408Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
409Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
410Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
411Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
412Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
413Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
414Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
415Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
416Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
417Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
418Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
419Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
420Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
421Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
422Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
423Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
424Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
425Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
426Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
427Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
428Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
429Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
430Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
431Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
432Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
433Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
434Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
435Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
436Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
437Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
438Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
439Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
440Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
441Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
442Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
443Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
444Low temperature temporal and spatial atomic layer deposition of TiO2 films
445Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
446Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
447Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
448Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
449Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
450Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
451Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
452Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
453Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
454Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
455Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
456Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
457Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
458Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
459Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
460Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
461Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
462Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
463Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
464Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
465Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
466Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
467Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
468Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
469Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
470Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
471Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
472MANOS performance dependence on ALD Al2O3 oxidation source
473Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
474Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
475Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
476Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
477Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
478Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
479Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
480Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
481Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
482MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
483Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
484Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
485Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
486Nitride memristors
487Nitride passivation of the interface between high-k dielectrics and SiGe
488Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
489Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
490Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
491Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
492Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
493On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
494Optical and Electrical Properties of TixSi1-xOy Films
495Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
496Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
497Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
498Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
499Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
500Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
501Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
502Oxygen migration in TiO2-based higher-k gate stacks
503Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
504PEALD AlN: controlling growth and film crystallinity
505PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
506PEALD of Copper using New Precursors for Next Generation of Interconnections
507PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
508PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
509PEALD ZrO2 Films Deposition on TiN and Si Substrates
510Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
511Perspectives on future directions in III-N semiconductor research
512Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
513Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
514Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
515Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
516Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
517Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
518Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
519Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
520Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
521Plasma enhanced atomic layer deposition of aluminum sulfide thin films
522Plasma enhanced atomic layer deposition of Fe2O3 thin films
523Plasma enhanced atomic layer deposition of Ga2O3 thin films
524Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
525Plasma enhanced atomic layer deposition of gallium sulfide thin films
526Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
527Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
528Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
529Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
530Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
531Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
532Plasma enhanced atomic layer deposition of SiNx:H and SiO2
533Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
534Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
535Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
536Plasma enhanced atomic layer deposition of zinc sulfide thin films
537Plasma Enhanced Atomic Layer Deposition on Powders
538Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
539Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
540Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
541Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
542Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
543Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
544Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
545Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
546Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
547Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
548Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
549Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
550Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
551Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
552Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
553Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
554Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
555Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
556Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
557Plasma-Assisted Atomic Layer Deposition of Palladium
558Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
559Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
560Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
561Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
562Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
563Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
564Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
565Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
566Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
567Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
568Plasma-enhanced ALD system for SRF cavity
569Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
570Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
571Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
572Plasma-enhanced atomic layer deposition for plasmonic TiN
573Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
574Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
575Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
576Plasma-enhanced atomic layer deposition of BaTiO3
577Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
578Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
579Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
580Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
581Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
582Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
583Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
584Plasma-Enhanced Atomic Layer Deposition of Ni
585Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
586Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
587Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
588Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
589Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
590Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
591Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
592Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
593Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
594Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
595Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
596Plasma-enhanced atomic layer deposition of superconducting niobium nitride
597Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
598Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
599Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
600Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
601Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
602Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
603Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
604Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
605Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
606Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
607Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
608Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
609Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
610Plasma-enhanced atomic layer deposition of titanium vanadium nitride
611Plasma-enhanced atomic layer deposition of tungsten nitride
612Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
613Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
614Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
615Plasma-enhanced atomic layer deposition of vanadium nitride
616Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
617Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
618Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
619Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
620Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
621Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
622Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
623Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
624Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
625Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
626Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
627Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
628Properties of AlN grown by plasma enhanced atomic layer deposition
629Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
630Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
631Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
632Protective capping and surface passivation of III-V nanowires by atomic layer deposition
633Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
634Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
635Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
636Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
637Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
638Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
639Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
640Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
641Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
642Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
643Remote Plasma ALD of Platinum and Platinum Oxide Films
644Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
645Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
646Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
647Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
648Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
649Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
650Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
651Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
652Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
653Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
654Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
655Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
656Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
657Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
658Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
659Room temperature atomic layer deposition of TiO2 on gold nanoparticles
660Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
661Room-Temperature Atomic Layer Deposition of Platinum
662Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
663Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
664Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
665RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
666RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
667Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
668Ru thin film grown on TaN by plasma enhanced atomic layer deposition
669Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
670Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
671Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
672Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
673Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
674Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
675Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
676Self-Limiting Growth of GaN at Low Temperatures
677Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
678Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
679Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
680Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
681Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
682Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
683Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
684Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
685Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
686Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
687Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
688Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
689Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
690Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
691Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
692Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
693Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
694Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
695Structural and optical characterization of low-temperature ALD crystalline AlN
696Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
697Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
698Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
699Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
700Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
701Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
702Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
703Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
704Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
705Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
706Study on the characteristics of aluminum thin films prepared by atomic layer deposition
707Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
708Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
709Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
710Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
711Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
712Surface and sensing properties of PE-ALD SnO2 thin film
713Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
714Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
715Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
716Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
717Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
718Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
719Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
720Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
721Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
722Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
723TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
724Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
725TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
726Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
727Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
728Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
729Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
730Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
731The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
732The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
733The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
734The effects of layering in ferroelectric Si-doped HfO2 thin films
735The effects of plasma treatment on the thermal stability of HfO2 thin films
736The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
737The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
738The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
739The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
740The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
741The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
742The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
743The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
744The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
745The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
746The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
747The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
748Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
749Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
750Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
751Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
752Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
753Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
754Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
755Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
756Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
757Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
758Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
759Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
760TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
761Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
762Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
763TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
764Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
765Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
766Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
767Trilayer Tunnel Selectors for Memristor Memory Cells
768Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
769Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
770Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
771Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
772Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
773Tuning size and coverage of Pd nanoparticles using atomic layer deposition
774Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
775Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
776Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
777Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
778Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
779Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
780Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
781Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
782Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
783Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
784Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
785Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
786Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
787Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
788Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
789Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
790Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
791Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
792Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
793Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
794X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
795XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
796XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
797ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
798ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
799ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition