Chemical Composition, Impurities Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
2Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
3Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
4Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
5Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
6Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
7High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
8Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
9Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
10Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
11Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
12Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
13Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
14Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
15Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
16Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
17On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
18Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
19High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
20Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
21Atomic Layer Deposition of the Solid Electrolyte LiPON
22Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
23Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
24PEALD of Copper using New Precursors for Next Generation of Interconnections
25Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
26Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
27Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
28Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
29Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
30Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
31Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
32High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
33Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
34Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
35Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
36Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
37Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
38Plasma enhanced atomic layer deposition of aluminum sulfide thin films
39Optical and Electrical Properties of TixSi1-xOy Films
40Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
41Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
42Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
43Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
44HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
45Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
46Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
47Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
48Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
49Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
50PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
51Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
52Oxygen migration in TiO2-based higher-k gate stacks
53Study on the characteristics of aluminum thin films prepared by atomic layer deposition
54Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
55Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
56The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
57Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
58Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
59Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
60Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
61A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
62Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
63AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
64Plasma-enhanced atomic layer deposition for plasmonic TiN
65Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
66Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
67Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
68Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
69Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
70Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
71Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
72Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
73Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
74Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
75Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
76Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
77Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
78Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
79High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
80Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
81Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
82Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
83Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
84Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
85Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
86Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
87Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
88Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
89Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
90Improved understanding of recombination at the Si/Al2O3 interface
91Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
92Atomic Layer Deposition of Niobium Nitride from Different Precursors
93The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
94Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
95Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
96ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
97Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
98Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
99Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
100From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
101Atomic layer deposition of YMnO3 thin films
102Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
103Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
104Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
105Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
106Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
107An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
108A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
109Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
110Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
111Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
112Plasma enhanced atomic layer deposition of gallium sulfide thin films
113Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
114Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
115Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
116Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
117Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
118Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
119Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
120Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
121Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
122Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
123Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
124Atomic layer deposition of titanium nitride from TDMAT precursor
125Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
126A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
127Atomic layer deposition of metal-oxide thin films on cellulose fibers
128Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
129Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
130ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
131Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
132Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
133Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
134Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
135Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
136An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
137Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
138Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
139The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
140Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
141Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
142Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
143High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
144Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
145PEALD AlN: controlling growth and film crystallinity
146High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
147Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
148Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
149Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
150Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
151Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
152Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
153Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
154Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
155Effects of Recessed-Gate Structure on AlGaN/GaN-on-SiC MIS-HEMTs with Thin AlOxNy MIS Gate
156Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
157Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
158XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
159Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
160Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
161Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
162Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
163Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
164Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
165Protective capping and surface passivation of III-V nanowires by atomic layer deposition
166Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
167Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
168Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
169Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
170Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
171Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
172Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
173Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
174Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
175Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
176Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
177Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
178In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
179Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
180Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
181Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
182Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
183Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
184Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
185Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
186Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
187Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
188High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
189Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
190Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
191HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
192Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
193Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
194Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
195Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
196Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
197Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
198In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
199Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
200Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
201Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
202Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
203Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
204Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
205Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
206Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
207PEALD ZrO2 Films Deposition on TiN and Si Substrates
208Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
209Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
210Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
211Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
212Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
213Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
214Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
215Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
216Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
217Densification of Thin Aluminum Oxide Films by Thermal Treatments
218Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
219TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
220Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
221Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
222The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
223Tuning size and coverage of Pd nanoparticles using atomic layer deposition
224Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
225Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
226In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
227Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
228Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
229Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
230Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
231Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
232Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
233Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
234Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
235Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
236Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
237Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
238Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
239Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
240Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
241Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
242Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
243The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
244Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
245Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
246Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
247Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
248Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
249Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
250Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
251Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
252Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
253Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
254PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
255In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
256Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
257Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
258Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
259Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
260Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
261Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
262Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
263Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
264Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
265Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
266ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
267Plasma-enhanced atomic layer deposition of tungsten nitride
268Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
269The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
270Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
271Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
272Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
273Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
274The effects of layering in ferroelectric Si-doped HfO2 thin films
275Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
276Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
277A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
278Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
279Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
280Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
281Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
282Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
283Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
284Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
285Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
286Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
287Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
288Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
289Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
290Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
291Ru thin film grown on TaN by plasma enhanced atomic layer deposition
292Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
293AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
294Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
295Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
296Structural and optical characterization of low-temperature ALD crystalline AlN
297Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
298Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
299Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
300Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
301Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
302Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
303Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
304Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
305GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
306Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
307Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
308Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
309Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
310Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
311Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
312Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
313Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
314Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
315Plasma enhanced atomic layer deposition of SiNx:H and SiO2
316Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
317Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
318Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
319Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
320Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
321Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
322Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
323Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
324Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
325ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
326Sub-nanometer heating depth of atomic layer annealing
327Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
328Plasma enhanced atomic layer deposition of Ga2O3 thin films
329Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
330MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
331Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
332Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
333Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
334Properties of AlN grown by plasma enhanced atomic layer deposition
335Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
336Plasma-enhanced atomic layer deposition of superconducting niobium nitride
337Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
338Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
339Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
340Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
341Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
342Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
343Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
344Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
345Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
346In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
347Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
348An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
349MANOS performance dependence on ALD Al2O3 oxidation source
350Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
351Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
352Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
353Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
354Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
355Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
356CeO2 Doping of Hf0.5Zr0.5O2 Thin Films for High Endurance Ferroelectric Memories
357Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
358Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
359An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
360Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
361Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
362Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
363Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
364Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
365XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
366Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
367Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
368Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
369Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
370A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
371Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
372Room temperature atomic layer deposition of TiO2 on gold nanoparticles
373Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
374Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
375Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
376Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
377TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
378Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
379RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
380The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
381Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
382Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
383Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
384Perspectives on future directions in III-N semiconductor research
385Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
386Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
387ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
388Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
389A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
390Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
391Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
392Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
393Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
394Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
395Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
396Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
397Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
398Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
399Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
400Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
401Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
402Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
403Room-Temperature Atomic Layer Deposition of Platinum
404Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
405Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
406Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
407Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
408A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
409Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
410Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
411Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
412Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
413Composite materials and nanoporous thin layers made by atomic layer deposition
414Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
415A route to low temperature growth of single crystal GaN on sapphire
416TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
417Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
418Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
419Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
420In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
421Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
422Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
423Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
424Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
425Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
426Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
427Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
428Trilayer Tunnel Selectors for Memristor Memory Cells
429Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
430Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
431Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
432Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
433Plasma-enhanced atomic layer deposition of vanadium nitride
434Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
435Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
436Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
437Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
438Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
439Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
440Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
441Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
442Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
443Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
444Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
445Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
446Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
447Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
448Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
449Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
450Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
451The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
452Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
453In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
454Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
455Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
456Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
457Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
458Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
459In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
460Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
461Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
462Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
463Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
464Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
465Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
466Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
467Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
468Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
469Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
470Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
471Plasma enhanced atomic layer deposition of zinc sulfide thin films
472Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
473Gadolinium nitride films deposited using a PEALD based process
474RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
475Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
476Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
477Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
478Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
479The effects of plasma treatment on the thermal stability of HfO2 thin films
480Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
481Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
482Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
483Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
484Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
485Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
486Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
487Analysis of nitrogen species in titanium oxynitride ALD films
488Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
489Atomic Layer Deposition of Nanolayered Carbon Films
490Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
491Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
492Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
493Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
494Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
495ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
496Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
497High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
498In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
499The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
500Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
501Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
502Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
503Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
504Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
505GeSbTe deposition for the PRAM application
506Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
507Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
508Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
509Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
510Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
511Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
512Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
513Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
514Hydrogen plasma-enhanced atomic layer deposition of copper thin films
515Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
516Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
517High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
518Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
519Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
520The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
521PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
522Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
523Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
524Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
525Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
526Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
527Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
528Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
529Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
530TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
531Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
532Texture of atomic layer deposited ruthenium
533Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
534Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
535Nitride passivation of the interface between high-k dielectrics and SiGe
536Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
537Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
538Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
539Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
540In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
541Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
542Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
543Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
544Plasma-enhanced ALD system for SRF cavity
545Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
546In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
547Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
548Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
549Plasma-enhanced atomic layer deposition of BaTiO3
550Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
551Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
552Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
553Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
554Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
555Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
556Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
557Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
558Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
559GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
560Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
561Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
562Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
563Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
564Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
565Plasma enhanced atomic layer deposition of Fe2O3 thin films
566Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
567Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
568All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
569Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
570In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
571Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
572Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
573In-gap states in titanium dioxide and oxynitride atomic layer deposited films
574Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
575Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
576Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
577Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
578Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
579Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
580Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
581Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
582Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
583Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
584Atomic layer deposition of GaN at low temperatures
585Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
586Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
587Plasma-Enhanced Atomic Layer Deposition of Ni
588Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
589Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
590Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
591Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
592Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
593Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
594Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
595Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
596Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
597Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
598Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
599Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
600Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
601Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
602A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
603Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
604Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
605Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
606Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
607Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
608Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
609Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
610Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
611Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
612Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
613Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
614Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
615Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
616Experimental and theoretical determination of the role of ions in atomic layer annealing
617Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
618Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
619Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
620Fully CMOS-compatible titanium nitride nanoantennas
621Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
622Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
623Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
624Fundamental beam studies of radical enhanced atomic layer deposition of TiN
625Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
626Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
627Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
628Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
629Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
630A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
631Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
632Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
633Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
634Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
635Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
636Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
637Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
638Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
639Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
640Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
641Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
642Flexible Memristive Memory Array on Plastic Substrates
643Atomic Layer Deposition of the Conductive Delafossite PtCoO2
644The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
645Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
646Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
647Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
648Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
649Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
650Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
651Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
652Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
653High-Reflective Coatings For Ground and Space Based Applications
654Copper-ALD Seed Layer as an Enabler for Device Scaling
655Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
656Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
657ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
658Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
659Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
660Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
661Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
662Plasma-enhanced atomic layer deposition of titanium vanadium nitride
663Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
664Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
665Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
666A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
667Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
668Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
669Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
670A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
671Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
672Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
673Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
674The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
675Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
676Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
677A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
678Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
679Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
680Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
681The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
682Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
683Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
684Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
685Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
686Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
687Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
688Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
689Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
690Evaluation of plasma parameters on PEALD deposited TaCN
691Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
692Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
693AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
694Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
695Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
696Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
697High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
698Remote Plasma ALD of Platinum and Platinum Oxide Films
699Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
700Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
701ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
702Electron-enhanced atomic layer deposition of silicon thin films at room temperature
703Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
704Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
705Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
706Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
707Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
708Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
709Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
710Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
711Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
712Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
713A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
714Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
715Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
716Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
717Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
718The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
719Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
720Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
721Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
722Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
723Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
724Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
725Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
726Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
727Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
728Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
729Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
730Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
731Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
732Damage evaluation in graphene underlying atomic layer deposition dielectrics
733Atmospheric pressure plasma enhanced spatial ALD of silver
734Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
735Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
736Plasma Enhanced Atomic Layer Deposition on Powders
737Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
738Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
739Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
740The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
741Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
742Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
743Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
744Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
745Self-Limiting Growth of GaN at Low Temperatures
746Carbon content control of silicon oxycarbide film with methane containing plasma
747Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
748Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
749In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
750The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
751Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
752Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
753Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
754Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
755Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
756Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
757Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
758Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
759Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
760Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
761Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
762Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
763Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
764Gallium nitride thin films by microwave plasma-assisted ALD
765Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
766Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
767Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
768Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
769Low temperature temporal and spatial atomic layer deposition of TiO2 films
770Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
771Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
772Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
773Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
774Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
775Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
776Atomic hydrogen-assisted ALE of germanium
777Formation of aluminum nitride thin films as gate dielectrics on Si(100)
778Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
779Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
780A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
781Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
782Characteristics of HfO2 thin films grown by plasma atomic layer deposition
783A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
784Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
785Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
786Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
787Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
788Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
789Surface and sensing properties of PE-ALD SnO2 thin film
790Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
791Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
792Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
793X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
794Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
795Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
796Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
797Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
798HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
799Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
800Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
801Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
802Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
803Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
804Plasma-Assisted Atomic Layer Deposition of Palladium
805Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
806Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
807Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
808Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
809Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
810Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
811Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
812In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
813Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
814Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
815Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
816Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
817Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
818Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
819Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
820Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
821Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
822Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
823Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
824Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
825Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
826Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
827Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
828Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
829Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
830Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
831Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
832Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
833Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
834Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
835Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
836Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
837Nitride memristors
838Atomic Layer Deposition of Gold Metal
839Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
840Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
841Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
842Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
843Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition