Chemical Composition, Impurities Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
3A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
6A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
7A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
8A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
9A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10A route to low temperature growth of single crystal GaN on sapphire
11A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
12A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
13Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
14Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
15Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
16Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
19ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
20ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
21ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
22AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
23Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
24AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
25Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
26Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
29An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
30Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
31Analysis of nitrogen species in titanium oxynitride ALD films
32Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
33Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
34Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
35Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
36Atmospheric pressure plasma enhanced spatial ALD of silver
37Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
38Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
39Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
40Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
41Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
42Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
43Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
44Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
45Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
46Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
47Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
48Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
49Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
50Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
51Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
52Atomic layer deposition of GaN at low temperatures
53Atomic Layer Deposition of Gold Metal
54Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
55Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
56Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
57Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
58Atomic Layer Deposition of Niobium Nitride from Different Precursors
59Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
60Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
61Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
62Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
63Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
64Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
65Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
66Atomic Layer Deposition of the Solid Electrolyte LiPON
67Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
68Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
69Atomic layer deposition of titanium nitride from TDMAT precursor
70Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
71Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
72Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
73Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
74Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
75Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
76Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
77Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
78Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
79Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
80Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
81Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
82Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
83Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
84Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
85Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
86Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
87Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
88Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
89Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
90Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
91Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
92Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
93Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
94Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
95Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
96Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
97Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
98Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
99Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
100Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
101Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
102Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
103Composite materials and nanoporous thin layers made by atomic layer deposition
104Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
105Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
106Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
107Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
108Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
109Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
110Copper-ALD Seed Layer as an Enabler for Device Scaling
111Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
112Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
113Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
114Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
115Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
116Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
117Damage evaluation in graphene underlying atomic layer deposition dielectrics
118Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
119Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
120Densification of Thin Aluminum Oxide Films by Thermal Treatments
121Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
122Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
123Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
124Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
125Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
126Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
127Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
128Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
129Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
130Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
131Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
132Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
133Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
134Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
135Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
136Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
137Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
138Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
139Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
140Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
141Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
142Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
143Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
144Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
145Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
146Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
147Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
148Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
149Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
150Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
151Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
152Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
153Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
154Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
155Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
156Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
157Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
158Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
159Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
160Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
161Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
162Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
163Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
164Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
165Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
166Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
167Evaluation of plasma parameters on PEALD deposited TaCN
168Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
169Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
170Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
171Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
172Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
173Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
174Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
175Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
176Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
177Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
178Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
179Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
180Flexible Memristive Memory Array on Plastic Substrates
181Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
182Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
183Fully CMOS-compatible titanium nitride nanoantennas
184GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
185Gadolinium nitride films deposited using a PEALD based process
186GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
187Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
188Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
189Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
190Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
191Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
192Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
193Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
194Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
195Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
196Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
197Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
198Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
199Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
200HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
201HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
202High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
203High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
204High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
205High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
206High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
207High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
208High-Reflective Coatings For Ground and Space Based Applications
209Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
210Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
211Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
212Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
213Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
214Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
215Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
216Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
217Hydrogen plasma-enhanced atomic layer deposition of copper thin films
218Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
219Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
220Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
221Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
222Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
223Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
224Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
225Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
226Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
227Improved understanding of recombination at the Si/Al2O3 interface
228Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
229Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
230Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
231In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
232In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
233In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
234In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
235In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
236In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
237In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
238In-gap states in titanium dioxide and oxynitride atomic layer deposited films
239Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
240Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
241Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
242Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
243Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
244Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
245Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
246Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
247Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
248Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
249Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
250Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
251Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
252Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
253Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
254Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
255Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
256Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
257Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
258Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
259Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
260Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
261Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
262Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
263Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
264Investigation of native oxide removing from HCPA ALD grown GaN thin films surface utilizing HF solutions
265Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
266Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
267Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
268Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
269Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
270Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
271Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
272Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
273Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
274Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
275Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
276Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
277Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
278Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
279Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
280Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
281Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
282Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
283Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
284Low temperature temporal and spatial atomic layer deposition of TiO2 films
285Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
286Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
287Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
288Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
289Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
290Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
291Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
292Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
293Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
294Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
295Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
296Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
297Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
298Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
299Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
300Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
301Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
302Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
303Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
304Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
305Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
306Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
307Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
308Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
309Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
310MANOS performance dependence on ALD Al2O3 oxidation source
311Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
312Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
313Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
314Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
315Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
316Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
317Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
318Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
319Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
320Nitride memristors
321Nitride passivation of the interface between high-k dielectrics and SiGe
322Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
323Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
324Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
325Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
326Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
327On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
328Optical and Electrical Properties of TixSi1-xOy Films
329Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
330Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
331Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
332Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
333Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
334Oxygen migration in TiO2-based higher-k gate stacks
335Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
336PEALD AlN: controlling growth and film crystallinity
337PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
338PEALD of Copper using New Precursors for Next Generation of Interconnections
339PEALD ZrO2 Films Deposition on TiN and Si Substrates
340Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
341Perspectives on future directions in III-N semiconductor research
342Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
343Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
344Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
345Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
346Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
347Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
348Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
349Plasma enhanced atomic layer deposition of aluminum sulfide thin films
350Plasma enhanced atomic layer deposition of Fe2O3 thin films
351Plasma enhanced atomic layer deposition of Ga2O3 thin films
352Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
353Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
354Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
355Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
356Plasma enhanced atomic layer deposition of SiNx:H and SiO2
357Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
358Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
359Plasma enhanced atomic layer deposition of zinc sulfide thin films
360Plasma Enhanced Atomic Layer Deposition on Powders
361Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
362Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
363Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
364Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
365Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
366Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
367Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
368Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
369Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
370Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
371Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
372Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
373Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
374Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
375Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
376Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
377Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
378Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
379Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
380Plasma-enhanced ALD system for SRF cavity
381Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
382Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
383Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
384Plasma-enhanced atomic layer deposition for plasmonic TiN
385Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
386Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
387Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
388Plasma-enhanced atomic layer deposition of BaTiO3
389Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
390Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
391Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
392Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
393Plasma-Enhanced Atomic Layer Deposition of Ni
394Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
395Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
396Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
397Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
398Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
399Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
400Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
401Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
402Plasma-enhanced atomic layer deposition of superconducting niobium nitride
403Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
404Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
405Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
406Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
407Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
408Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
409Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
410Plasma-enhanced atomic layer deposition of tungsten nitride
411Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
412Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
413Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
414Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
415Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
416Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
417Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
418Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
419Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
420Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
421Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
422Properties of AlN grown by plasma enhanced atomic layer deposition
423Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
424Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
425Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
426Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
427Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
428Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
429Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
430Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
431Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
432Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
433Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
434Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
435Remote Plasma ALD of Platinum and Platinum Oxide Films
436Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
437Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
438Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
439Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
440Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
441Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
442Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
443Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
444Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
445Room temperature atomic layer deposition of TiO2 on gold nanoparticles
446Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
447Room-Temperature Atomic Layer Deposition of Platinum
448Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
449Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
450RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
451RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
452Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
453Ru thin film grown on TaN by plasma enhanced atomic layer deposition
454Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
455Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
456Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
457Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
458Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
459Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
460Self-Limiting Growth of GaN at Low Temperatures
461Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
462Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
463Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
464Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
465Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
466Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
467Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
468Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
469Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
470Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
471Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
472Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
473Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
474Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
475Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
476Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
477Structural and optical characterization of low-temperature ALD crystalline AlN
478Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
479Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
480Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
481Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
482Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
483Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
484Study on the characteristics of aluminum thin films prepared by atomic layer deposition
485Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
486Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
487Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
488Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
489Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
490Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
491Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
492Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
493Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
494Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
495Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
496Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
497TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
498Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
499Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
500Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
501The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
502The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
503The effects of layering in ferroelectric Si-doped HfO2 thin films
504The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
505The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
506The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
507The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
508The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
509The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
510The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
511Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
512Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
513Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
514Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
515Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
516Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
517Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
518TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
519Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
520TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
521Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
522Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
523Trilayer Tunnel Selectors for Memristor Memory Cells
524Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
525Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
526Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
527Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
528Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
529Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
530Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
531Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
532Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
533Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
534Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
535Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
536Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
537Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
538Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
539Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
540Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
541Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
542Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
543X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
544ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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