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Chemical Composition, Impurities Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Chemical Composition, Impurities returned 898 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
2Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
3Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
4Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
5Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
6Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
7Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
8Plasma enhanced atomic layer deposition of zinc sulfide thin films
9Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
10Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
11Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
12Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
13Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
14Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
15Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
16Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
17Self-Limiting Growth of GaN at Low Temperatures
18Plasma enhanced atomic layer deposition of Fe2O3 thin films
19Plasma-Enhanced Atomic Layer Deposition of Ni
20Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
21Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
22Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
23Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
24Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
25HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
26Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
27Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
28Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
29Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
30Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
31Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
32Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
33Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
34Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
35Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
36Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
37Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
38Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
39Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
40Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
41Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
42The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
43The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
44Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
45Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
46Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
47Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
48Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
49Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
50Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
51Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
52Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
53Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
54Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
55XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
56Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
57Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
58Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
59Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
60Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
61Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
62Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
63Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
64Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
65Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
66Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
67Atomic Layer Deposition of Nanolayered Carbon Films
68Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
69Plasma-enhanced atomic layer deposition of BaTiO3
70Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
71Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
72Evaluation of plasma parameters on PEALD deposited TaCN
73Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
74Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
75Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
76Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
77Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
78Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
79Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
80Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
81Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
82Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
83Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
84Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
85Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
86Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
87Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
88Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
89The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
90Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
91Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
92Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
93Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
94The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
95ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
96Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
97Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
98ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
99Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
100Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
101Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
102Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
103Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
104Atomic Layer Deposition of Niobium Nitride from Different Precursors
105Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
106Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
107Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
108Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
109Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
110Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
111Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
112Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
113Gallium nitride thin films by microwave plasma-assisted ALD
114Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
115Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
116Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
117Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
118Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
119Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
120Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
121Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
122The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
123Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
124Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
125Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
126Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
127Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
128Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
129Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
130Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
131Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
132Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
133Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
134Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
135Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
136Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
137Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
138Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
139Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
140Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
141Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
142Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
143A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
144Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
145Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
146Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
147Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
148ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
149Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
150Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
151PEALD ZrO2 Films Deposition on TiN and Si Substrates
152Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
153A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
154Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
155ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
156Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
157The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
158Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
159Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
160Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
161Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
162Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
163In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
164Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
165Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
166Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
167Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
168Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
169Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
170Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
171Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
172High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
173Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
174Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
175Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
176Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
177Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
178Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
179Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
180Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
181PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
182Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
183Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
184Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
185Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
186In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
187Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
188Atomic layer deposition of YMnO3 thin films
189Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
190Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
191Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
192ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
193ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
194Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
195Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
196Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
197Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
198Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
199Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
200Densification of Thin Aluminum Oxide Films by Thermal Treatments
201Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
202Sub-nanometer heating depth of atomic layer annealing
203Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
204Effects of Recessed-Gate Structure on AlGaN/GaN-on-SiC MIS-HEMTs with Thin AlOxNy MIS Gate
205Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
206Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
207Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
208Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
209Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
210Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
211Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
212Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
213High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
214Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
215Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
216Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
217From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
218Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
219Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
220Surface and sensing properties of PE-ALD SnO2 thin film
221Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
222Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
223Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
224Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
225Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
226Oxygen migration in TiO2-based higher-k gate stacks
227High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
228Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
229MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
230Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
231Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
232Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
233Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
234Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
235Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
236Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
237Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
238Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
239Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
240TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
241Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
242Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
243On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
244Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
245Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
246Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
247Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
248Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
249Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
250Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
251Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
252Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
253Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
254Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
255Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
256Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
257Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
258Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
259Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
260Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
261AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
262High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
263Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
264Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
265Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
266Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
267High-Reflective Coatings For Ground and Space Based Applications
268Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
269Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
270Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
271AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
272Hydrogen plasma-enhanced atomic layer deposition of copper thin films
273Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
274In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
275Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
276Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
277Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
278Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
279Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
280Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
281ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
282A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
283Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
284Nitride memristors
285Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
286Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
287Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
288Atomic Layer Deposition of the Solid Electrolyte LiPON
289Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
290Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
291Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
292Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
293Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
294Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
295Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
296High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
297In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
298Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
299Structural and optical characterization of low-temperature ALD crystalline AlN
300Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
301Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
302Analysis of nitrogen species in titanium oxynitride ALD films
303Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
304Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
305In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
306Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
307Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
308Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
309Plasma enhanced atomic layer deposition of Ga2O3 thin films
310Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
311Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
312Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
313TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
314Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
315Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
316Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
317Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
318Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
319Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
320Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
321Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
322Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
323Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
324A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
325Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
326Atmospheric pressure plasma enhanced spatial ALD of silver
327PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
328Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
329Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
330Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
331Room temperature atomic layer deposition of TiO2 on gold nanoparticles
332In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
333Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
334Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
335Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
336Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
337Plasma enhanced atomic layer deposition of gallium sulfide thin films
338Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
339Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
340Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
341Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
342Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
343Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
344Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
345Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
346Protective capping and surface passivation of III-V nanowires by atomic layer deposition
347Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
348Perspectives on future directions in III-N semiconductor research
349Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
350Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
351Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
352Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
353Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
354Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
355Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
356Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
357Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
358Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
359Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
360Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
361Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
362Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
363Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
364Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
365Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
366Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
367Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
368Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
369Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
370Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
371Characteristics of HfO2 thin films grown by plasma atomic layer deposition
372Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
373Fundamental beam studies of radical enhanced atomic layer deposition of TiN
374Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
375Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
376Electron-enhanced atomic layer deposition of silicon thin films at room temperature
377Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
378Nitride passivation of the interface between high-k dielectrics and SiGe
379Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
380Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
381Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
382HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
383Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
384Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
385A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
386Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
387Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
388Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
389Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
390Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
391A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
392Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
393Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
394Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
395Plasma-Assisted Atomic Layer Deposition of Palladium
396Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
397Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
398Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
399Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
400Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
401Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
402Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
403Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
404AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
405Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
406Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
407Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
408Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
409Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
410Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
411Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
412Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
413Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
414In-gap states in titanium dioxide and oxynitride atomic layer deposited films
415XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
416Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
417A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
418Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
419Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
420A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
421Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
422Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
423Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
424Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
425Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
426Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
427Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
428Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
429Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
430Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
431Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
432Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
433Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
434Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
435Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
436Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
437The effects of plasma treatment on the thermal stability of HfO2 thin films
438Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
439Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
440Properties of AlN grown by plasma enhanced atomic layer deposition
441Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
442High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
443Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
444Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
445Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
446Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
447Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
448Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
449Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
450Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
451Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
452Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
453Improved understanding of recombination at the Si/Al2O3 interface
454In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
455Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
456Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
457Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
458Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
459Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
460Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
461Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
462Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
463Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
464Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
465Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
466Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
467Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
468High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
469Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
470Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
471Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
472Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
473Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
474Carbon content control of silicon oxycarbide film with methane containing plasma
475Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
476Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
477Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
478Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
479Texture of atomic layer deposited ruthenium
480The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
481A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
482Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
483Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
484MANOS performance dependence on ALD Al2O3 oxidation source
485Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
486The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
487Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
488Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
489Plasma Enhanced Atomic Layer Deposition on Powders
490Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
491Atomic Layer Deposition of the Conductive Delafossite PtCoO2
492Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
493Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
494Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
495Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
496Formation of aluminum nitride thin films as gate dielectrics on Si(100)
497Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
498Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
499Room-Temperature Atomic Layer Deposition of Platinum
500Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
501Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
502Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
503Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
504Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
505Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
506Composite materials and nanoporous thin layers made by atomic layer deposition
507Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
508Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
509Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
510Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
511Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
512Optical and Electrical Properties of TixSi1-xOy Films
513Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
514Plasma enhanced atomic layer deposition of SiNx:H and SiO2
515In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
516Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
517Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
518Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
519Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
520High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
521PEALD AlN: controlling growth and film crystallinity
522Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
523Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
524Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
525Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
526Atomic Layer Deposition of Gold Metal
527Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
528A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
529Flexible Memristive Memory Array on Plastic Substrates
530Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
531X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
532Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
533Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
534Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
535Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
536Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
537Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
538Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
539Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
540Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
541Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
542Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
543Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
544Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
545Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
546Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
547Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
548The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
549Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
550Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
551Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
552Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
553Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
554Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
555A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
556Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
557Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
558The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
559Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
560Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
561Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
562Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
563Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
564Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
565Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
566Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
567Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
568Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
569Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
570Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
571Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
572Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
573Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
574Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
575Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
576An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
577Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
578RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
579The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
580Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
581In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
582Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
583Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
584Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
585Experimental and theoretical determination of the role of ions in atomic layer annealing
586Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
587In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
588Plasma-enhanced ALD system for SRF cavity
589Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
590Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
591Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
592Low temperature temporal and spatial atomic layer deposition of TiO2 films
593Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
594Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
595Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
596Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
597Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
598Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
599Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
600Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
601Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
602Copper-ALD Seed Layer as an Enabler for Device Scaling
603Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
604Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
605Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
606Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
607Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
608Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
609Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
610Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
611Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
612Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
613Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
614Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
615Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
616Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
617Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
618PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
619Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
620Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
621Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
622Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
623Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
624GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
625Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
626Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
627Atomic layer deposition of titanium nitride from TDMAT precursor
628Plasma-enhanced atomic layer deposition of tungsten nitride
629Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
630Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
631Plasma-enhanced atomic layer deposition for plasmonic TiN
632Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
633Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
634Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
635Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
636Plasma-enhanced atomic layer deposition of superconducting niobium nitride
637The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
638Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
639Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
640Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
641The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
642Tuning size and coverage of Pd nanoparticles using atomic layer deposition
643Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
644Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
645RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
646Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
647In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
648Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
649Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
650Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
651Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
652Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
653Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
654Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
655Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
656Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
657Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
658ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
659Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
660Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
661Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
662CeO2 Doping of Hf0.5Zr0.5O2 Thin Films for High Endurance Ferroelectric Memories
663Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
664Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
665In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
666Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
667The effects of layering in ferroelectric Si-doped HfO2 thin films
668Remote Plasma ALD of Platinum and Platinum Oxide Films
669Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
670Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
671Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
672Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
673Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
674Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
675Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
676Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
677Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
678Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
679Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
680Ru thin film grown on TaN by plasma enhanced atomic layer deposition
681Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
682Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
683Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
684Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
685Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
686Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
687Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
688Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
689Atomic hydrogen-assisted ALE of germanium
690Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
691Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
692Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
693Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
694Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
695Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
696Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
697Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
698Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
699Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
700Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
701Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
702Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
703Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
704Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
705Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
706Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
707Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
708Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
709Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
710Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
711Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
712GeSbTe deposition for the PRAM application
713High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
714An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
715Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
716Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
717Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
718Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
719Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
720A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
721Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
722Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
723Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
724Fully CMOS-compatible titanium nitride nanoantennas
725Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
726Plasma-enhanced atomic layer deposition of titanium vanadium nitride
727Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
728Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
729ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
730An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
731Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
732All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
733Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
734TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
735Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
736Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
737An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
738Plasma enhanced atomic layer deposition of aluminum sulfide thin films
739Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
740Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
741Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
742Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
743Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
744Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
745Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
746Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
747Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
748A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
749In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
750Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
751Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
752Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
753Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
754Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
755Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
756Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
757Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
758Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
759The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
760Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
761Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
762Atomic layer deposition of GaN at low temperatures
763PEALD of Copper using New Precursors for Next Generation of Interconnections
764Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
765Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
766Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
767Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
768Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
769Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
770Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
771Gadolinium nitride films deposited using a PEALD based process
772Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
773Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
774Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
775Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
776Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
777Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
778High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
779Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
780Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
781Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
782Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
783GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
784Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
785Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
786Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
787Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
788Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
789Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
790Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
791RF Characterization of Novel Superconducting Materials and Multilayers
792Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
793Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
794Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
795Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
796Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
797Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
798Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
799Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
800Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
801Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
802Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
803Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
804TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
805Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
806Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
807Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
808Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
809Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
810Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
811Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
812Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
813Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
814Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
815Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
816Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
817Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
818Trilayer Tunnel Selectors for Memristor Memory Cells
819Damage evaluation in graphene underlying atomic layer deposition dielectrics
820Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
821Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
822Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
823The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
824A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
825Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
826Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
827Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
828Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
829Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
830Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
831Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
832Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
833Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
834Study on the characteristics of aluminum thin films prepared by atomic layer deposition
835Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
836Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
837Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
838Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
839Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
840A route to low temperature growth of single crystal GaN on sapphire
841Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
842Atomic layer deposition of metal-oxide thin films on cellulose fibers
843The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
844Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
845Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
846Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
847Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
848Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
849Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
850Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
851Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
852HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
853Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
854Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
855Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
856Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
857Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
858Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
859Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
860Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
861Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
862Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
863Plasma-enhanced atomic layer deposition of vanadium nitride
864Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
865Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
866Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
867In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
868Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
869Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
870Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
871Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
872A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
873Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
874Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
875Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
876Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
877Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions