Chemical Composition, Impurities Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
2Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
3Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
4Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
5Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
6A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
7Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
8In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
9Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
10Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
11Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
12Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
13Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
14Atomic Layer Deposition of Niobium Nitride from Different Precursors
15Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
16Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
17Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
18Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
19Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
20Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
21Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
22Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
23Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
24Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
25Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
26Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
27Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
28Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
29Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
30Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
31Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
32Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
33Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
34Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
35Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
36Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
37Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
38Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
39Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
40Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
41Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
42Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
43Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
44Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
45Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
46Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
47Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
48Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
49The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
50Densification of Thin Aluminum Oxide Films by Thermal Treatments
51Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
52ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
53Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
54Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
55Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
56Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
57Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
58Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
59Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
60Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
61Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
62High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
63Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
64Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
65Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
66Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
67Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
68Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
69Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
70TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
71Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
72Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
73In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
74Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
75Analysis of nitrogen species in titanium oxynitride ALD films
76Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
77Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
78Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
79The effects of plasma treatment on the thermal stability of HfO2 thin films
80Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
81Improved understanding of recombination at the Si/Al2O3 interface
82Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
83Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
84Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
85Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
86Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
87Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
88High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
89Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
90Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
91Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
92Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
93Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
94Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
95Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
96Experimental and theoretical determination of the role of ions in atomic layer annealing
97Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
98Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
99Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
100Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
101Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
102High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
103Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
104Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
105Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
106Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
107Atomic layer deposition of YMnO3 thin films
108Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
109Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
110Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
111Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
112Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
113Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
114Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
115Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
116Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
117RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
118Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
119A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
120Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
121Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
122MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
123Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
124Copper-ALD Seed Layer as an Enabler for Device Scaling
125A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
126Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
127Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
128Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
129Hydrogen plasma-enhanced atomic layer deposition of copper thin films
130Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
131Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
132Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
133Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
134Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
135Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
136Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
137Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
138Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
139Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
140The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
141Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
142Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
143Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
144XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
145Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
146Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
147Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
148Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
149Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
150Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
151A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
152A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
153Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
154Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
155TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
156Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
157Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
158Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
159Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
160Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
161Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
162Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
163Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
164Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
165The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
166Composite materials and nanoporous thin layers made by atomic layer deposition
167Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
168Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
169Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
170Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
171Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
172Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
173Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
174Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
175In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
176Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
177Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
178Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
179Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
180Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
181Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
182Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
183Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
184ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
185Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
186Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
187Oxygen migration in TiO2-based higher-k gate stacks
188Room temperature atomic layer deposition of TiO2 on gold nanoparticles
189Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
190Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
191An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
192Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
193Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
194Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
195Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
196Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
197Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
198Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
199Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
200Plasma enhanced atomic layer deposition of aluminum sulfide thin films
201Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
202Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
203In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
204Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
205Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
206Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
207Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
208Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
209Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
210Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
211Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
212Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
213Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
214A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
215Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
216The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
217Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
218Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
219Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
220Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
221Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
222Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
223Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
224Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
225Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
226Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
227Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
228Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
229Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
230Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
231Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
232Plasma-enhanced atomic layer deposition of superconducting niobium nitride
233Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
234Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
235Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
236Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
237Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
238Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
239Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
240Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
241Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
242Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
243Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
244Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
245Ru thin film grown on TaN by plasma enhanced atomic layer deposition
246Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
247The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
248Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
249Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
250Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
251Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
252Structural and optical characterization of low-temperature ALD crystalline AlN
253ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
254Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
255Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
256Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
257Damage evaluation in graphene underlying atomic layer deposition dielectrics
258Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
259Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
260Effects of Recessed-Gate Structure on AlGaN/GaN-on-SiC MIS-HEMTs with Thin AlOxNy MIS Gate
261Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
262Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
263Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
264Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
265On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
266Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
267The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
268Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
269Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
270Flexible Memristive Memory Array on Plastic Substrates
271Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
272Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
273Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
274Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
275Study on the characteristics of aluminum thin films prepared by atomic layer deposition
276Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
277Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
278Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
279Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
280Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
281Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
282Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
283Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
284Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
285Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
286Atomic layer deposition of GaN at low temperatures
287Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
288Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
289A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
290Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
291Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
292Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
293Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
294TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
295Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
296Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
297Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
298Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
299Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
300RF Characterization of Novel Superconducting Materials and Multilayers
301Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
302Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
303Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
304Nitride memristors
305Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
306Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
307Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
308Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
309Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
310Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
311Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
312AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
313Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
314Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
315Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
316Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
317The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
318Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
319Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
320Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
321Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
322Plasma-Assisted Atomic Layer Deposition of Palladium
323Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
324Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
325Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
326Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
327Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
328Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
329Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
330Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
331Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
332Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
333Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
334Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
335Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
336Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
337Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
338Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
339Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
340Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
341Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
342An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
343Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
344Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
345Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
346Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
347High-Reflective Coatings For Ground and Space Based Applications
348Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
349Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
350A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
351A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
352Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
353Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
354Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
355Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
356Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
357Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
358Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
359Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
360Plasma-enhanced atomic layer deposition of vanadium nitride
361Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
362Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
363PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
364Carbon content control of silicon oxycarbide film with methane containing plasma
365Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
366Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
367Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
368Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
369Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
370A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
371Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
372Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
373The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
374Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
375Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
376Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
377Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
378Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
379Plasma-enhanced atomic layer deposition of titanium vanadium nitride
380Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
381Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
382Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
383High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
384Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
385Room-Temperature Atomic Layer Deposition of Platinum
386Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
387Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
388Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
389Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
390Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
391Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
392Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
393Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
394Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
395Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
396In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
397Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
398Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
399Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
400Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
401Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
402Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
403High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
404Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
405Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
406Fully CMOS-compatible titanium nitride nanoantennas
407Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
408Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
409A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
410Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
411Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
412Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
413Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
414Plasma-Enhanced Atomic Layer Deposition of Ni
415AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
416Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
417Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
418In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
419Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
420Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
421High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
422Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
423Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
424Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
425Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
426Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
427Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
428Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
429Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
430Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
431Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
432Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
433Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
434Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
435Properties of AlN grown by plasma enhanced atomic layer deposition
436Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
437Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
438Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
439Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
440Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
441Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
442GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
443Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
444Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
445Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
446Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
447Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
448Plasma-enhanced atomic layer deposition of BaTiO3
449Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
450Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
451Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
452Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
453Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
454The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
455Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
456Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
457Formation of aluminum nitride thin films as gate dielectrics on Si(100)
458Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
459Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
460Plasma-enhanced atomic layer deposition for plasmonic TiN
461Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
462Plasma enhanced atomic layer deposition of gallium sulfide thin films
463Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
464Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
465Atomic hydrogen-assisted ALE of germanium
466Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
467HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
468Nitride passivation of the interface between high-k dielectrics and SiGe
469Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
470Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
471Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
472Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
473Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
474Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
475All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
476In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
477In-gap states in titanium dioxide and oxynitride atomic layer deposited films
478Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
479Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
480Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
481AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
482HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
483Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
484Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
485CeO2 Doping of Hf0.5Zr0.5O2 Thin Films for High Endurance Ferroelectric Memories
486Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
487Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
488Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
489Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
490Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
491Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
492Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
493Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
494Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
495Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
496Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
497Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
498Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
499Plasma enhanced atomic layer deposition of SiNx:H and SiO2
500Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
501X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
502Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
503PEALD AlN: controlling growth and film crystallinity
504The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
505Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
506Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
507Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
508Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
509Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
510Gallium nitride thin films by microwave plasma-assisted ALD
511Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
512Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
513Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
514Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
515XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
516Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
517Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
518Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
519Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
520Low temperature temporal and spatial atomic layer deposition of TiO2 films
521Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
522Atmospheric pressure plasma enhanced spatial ALD of silver
523Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
524Trilayer Tunnel Selectors for Memristor Memory Cells
525Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
526Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
527Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
528Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
529Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
530Characteristics of HfO2 thin films grown by plasma atomic layer deposition
531GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
532Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
533Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
534Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
535Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
536Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
537High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
538Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
539The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
540The effects of layering in ferroelectric Si-doped HfO2 thin films
541Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
542Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
543Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
544Gadolinium nitride films deposited using a PEALD based process
545Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
546Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
547ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
548Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
549Protective capping and surface passivation of III-V nanowires by atomic layer deposition
550Surface and sensing properties of PE-ALD SnO2 thin film
551Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
552Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
553Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
554Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
555Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
556Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
557In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
558Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
559Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
560High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
561Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
562Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
563Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
564Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
565Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
566A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
567Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
568Plasma Enhanced Atomic Layer Deposition on Powders
569Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
570Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
571Atomic layer deposition of metal-oxide thin films on cellulose fibers
572In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
573Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
574In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
575Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
576Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
577In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
578The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
579Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
580Electron-enhanced atomic layer deposition of silicon thin films at room temperature
581Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
582Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
583Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
584Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
585Perspectives on future directions in III-N semiconductor research
586Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
587MANOS performance dependence on ALD Al2O3 oxidation source
588Atomic Layer Deposition of Gold Metal
589PEALD of Copper using New Precursors for Next Generation of Interconnections
590Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
591Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
592Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
593Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
594Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
595Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
596Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
597Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
598Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
599Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
600Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
601Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
602Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
603Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
604Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
605Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
606GeSbTe deposition for the PRAM application
607Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
608Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
609Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
610Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
611Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
612Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
613ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
614Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
615Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
616Remote Plasma ALD of Platinum and Platinum Oxide Films
617Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
618Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
619PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
620Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
621Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
622Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
623Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
624Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
625Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
626Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
627Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
628Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
629Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
630Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
631Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
632Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
633Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
634RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
635Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
636Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
637Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
638Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
639Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
640Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
641Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
642Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
643Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
644The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
645Optical and Electrical Properties of TixSi1-xOy Films
646ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
647Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
648Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
649Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
650HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
651Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
652Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
653Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
654Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
655Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
656Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
657Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
658Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
659Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
660Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
661Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
662Plasma-enhanced ALD system for SRF cavity
663Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
664Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
665Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
666Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
667Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
668Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
669Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
670Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
671Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
672Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
673Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
674Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
675Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
676Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
677Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
678Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
679Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
680Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
681In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
682Atomic layer deposition of titanium nitride from TDMAT precursor
683Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
684Evaluation of plasma parameters on PEALD deposited TaCN
685Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
686An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
687Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
688Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
689Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
690Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
691Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
692Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
693From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
694A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
695Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
696PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
697Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
698Sub-nanometer heating depth of atomic layer annealing
699Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
700Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
701Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
702Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
703Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
704Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
705ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
706In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
707Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
708Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
709Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
710Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
711Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
712Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
713Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
714Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
715Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
716Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
717Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
718Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
719Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
720Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
721Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
722Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
723Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
724Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
725Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
726Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
727Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
728Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
729An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
730Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
731Atomic Layer Deposition of the Solid Electrolyte LiPON
732Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
733Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
734Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
735Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
736A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
737Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
738Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
739Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
740Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
741Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
742Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
743Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
744Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
745ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
746Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
747Plasma enhanced atomic layer deposition of Ga2O3 thin films
748Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
749Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
750Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
751Texture of atomic layer deposited ruthenium
752Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
753Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
754Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
755Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
756Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
757Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
758ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
759Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
760A route to low temperature growth of single crystal GaN on sapphire
761Plasma enhanced atomic layer deposition of Fe2O3 thin films
762Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
763Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
764Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
765Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
766Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
767Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
768Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
769Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
770Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
771Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
772High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
773Tuning size and coverage of Pd nanoparticles using atomic layer deposition
774Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
775Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
776Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
777Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
778Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
779Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
780Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
781Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
782Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
783Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
784Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
785Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
786Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
787PEALD ZrO2 Films Deposition on TiN and Si Substrates
788Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
789In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
790Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
791Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
792Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
793Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
794TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
795Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
796Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
797Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
798Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
799Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
800Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
801Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
802Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
803Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
804Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
805Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
806Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
807Plasma enhanced atomic layer deposition of zinc sulfide thin films
808Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
809The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
810Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
811High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
812Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
813Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
814Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
815Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
816Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
817Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
818Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
819Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
820Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
821Atomic Layer Deposition of the Conductive Delafossite PtCoO2
822Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
823Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
824Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
825Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
826Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
827Atomic Layer Deposition of Nanolayered Carbon Films
828Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
829Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
830Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
831Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
832Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
833Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
834Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
835Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
836Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
837Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
838Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
839Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
840Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
841Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
842Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
843Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
844Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
845Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
846Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
847The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
848Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
849The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
850Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
851Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
852Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
853Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
854Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
855Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
856Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
857Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
858A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
859Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
860Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
861Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
862Self-Limiting Growth of GaN at Low Temperatures
863Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
864Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
865Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
866Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
867Plasma-enhanced atomic layer deposition of tungsten nitride
868Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
869Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
870Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
871Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
872Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
873Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
874Fundamental beam studies of radical enhanced atomic layer deposition of TiN
875Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
876Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
877Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis