Chemical Composition, Impurities Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
3A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
6A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
7A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
8A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
9A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
10A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
11A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
12A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
13A route to low temperature growth of single crystal GaN on sapphire
14A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
15A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
16A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
17Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
18Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
19Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
20Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
21Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
22Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
23ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
24ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
25ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
26ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
27ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
28AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
29All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
30Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
31AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
32AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
33Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
34Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
35Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
36Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
37Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
38An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
39An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
40An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
41An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
42Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
43Analysis of nitrogen species in titanium oxynitride ALD films
44Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
45Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
46Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
47Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
48Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
49Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
50Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
51Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
52Atmospheric pressure plasma enhanced spatial ALD of silver
53Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
54Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
55Atomic hydrogen-assisted ALE of germanium
56Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
57Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
58Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
59Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
60Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
61Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
62Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
63Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
64Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
65Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
66Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
67Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
68Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
69Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
70Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
71Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
72Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
73Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
74Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
75Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
76Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
77Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
78Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
79Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
80Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
81Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
82Atomic layer deposition of GaN at low temperatures
83Atomic Layer Deposition of Gold Metal
84Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
85Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
86Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
87Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
88Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
89Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
90Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
91Atomic layer deposition of metal-oxide thin films on cellulose fibers
92Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
93Atomic Layer Deposition of Nanolayered Carbon Films
94Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
95Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
96Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
97Atomic Layer Deposition of Niobium Nitride from Different Precursors
98Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
99Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
100Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
101Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
102Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
103Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
104Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
105Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
106Atomic Layer Deposition of the Solid Electrolyte LiPON
107Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
108Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
109Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
110Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
111Atomic layer deposition of titanium nitride from TDMAT precursor
112Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
113Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
114Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
115Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
116Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
117Atomic layer deposition of YMnO3 thin films
118Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
119Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
120Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
121Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
122Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
123Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
124Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
125Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
126Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
127Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
128Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
129Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
130Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
131Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
132Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
133Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
134Carbon content control of silicon oxycarbide film with methane containing plasma
135Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
136Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
137Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
138Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
139Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
140Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
141Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
142Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
143Characteristics of HfO2 thin films grown by plasma atomic layer deposition
144Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
145Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
146Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
147Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
148Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
149Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
150Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
151Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
152Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
153Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
154Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
155Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
156Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
157Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
158Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
159Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
160Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
161Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
162Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
163Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
164Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
165Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
166Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
167Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
168Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
169Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
170Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
171Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
172Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
173Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
174Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
175Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
176Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
177Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
178Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
179Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
180Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
181Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
182Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
183Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
184Composite materials and nanoporous thin layers made by atomic layer deposition
185Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
186Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
187Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
188Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
189Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
190Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
191Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
192Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
193Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
194Copper-ALD Seed Layer as an Enabler for Device Scaling
195Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
196Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
197Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
198Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
199Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
200Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
201Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
202Damage evaluation in graphene underlying atomic layer deposition dielectrics
203Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
204Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
205Densification of Thin Aluminum Oxide Films by Thermal Treatments
206Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
207Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
208Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
209Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
210Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
211Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
212Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
213Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
214Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
215Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
216Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
217Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
218Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
219Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
220Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
221Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
222Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
223Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
224Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
225Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
226Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
227Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
228Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
229Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
230Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
231Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
232Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
233Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
234Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
235Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
236Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
237Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
238Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
239Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
240Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride
241Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
242Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
243Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
244Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
245Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
246Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
247Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
248Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
249Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
250Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
251Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
252Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
253Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
254Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
255Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
256Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
257Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
258Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
259Effects of Recessed-Gate Structure on AlGaN/GaN-on-SiC MIS-HEMTs with Thin AlOxNy MIS Gate
260Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
261Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
262Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
263Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
264Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
265Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
266Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
267Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
268Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
269Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
270Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
271Electron-enhanced atomic layer deposition of silicon thin films at room temperature
272Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
273Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
274Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
275Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
276Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
277Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
278Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
279Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
280Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
281Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
282Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
283Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
284Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
285Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
286Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
287Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
288Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
289Evaluation of plasma parameters on PEALD deposited TaCN
290Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
291Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
292Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
293Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
294Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
295Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
296Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
297Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
298Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
299Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
300Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
301Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
302Flexible Memristive Memory Array on Plastic Substrates
303Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
304Formation of aluminum nitride thin films as gate dielectrics on Si(100)
305Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
306Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
307Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
308From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
309Fully CMOS-compatible titanium nitride nanoantennas
310Fundamental beam studies of radical enhanced atomic layer deposition of TiN
311GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
312Gadolinium nitride films deposited using a PEALD based process
313GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
314GeSbTe deposition for the PRAM application
315Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
316Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
317Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
318Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
319Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
320Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
321Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
322Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
323Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
324Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
325Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3
326Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
327Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
328Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
329Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
330Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
331Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
332Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
333Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
334Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
335Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
336Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
337HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
338HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
339HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
340High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
341High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
342High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
343High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
344High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
345High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
346High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
347High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
348High-Reflective Coatings For Ground and Space Based Applications
349High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
350Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
351Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
352Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
353Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
354Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
355Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
356Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
357Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
358Hydrogen plasma-enhanced atomic layer deposition of copper thin films
359Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
360Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
361Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
362Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
363Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
364Impact of oxygen plasma on nitrided and annealed atomic layer deposited SiO2/high-k/metal gate for high-voltage input and output fin-shaped field effect transistor devices
365Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
366Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
367Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
368Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
369Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
370Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
371Improved understanding of recombination at the Si/Al2O3 interface
372Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
373Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
374Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
375Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
376Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
377Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
378In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
379In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
380In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
381In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
382In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
383In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
384In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
385In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
386In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
387In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
388In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
389In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
390In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
391In-gap states in titanium dioxide and oxynitride atomic layer deposited films
392In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
393Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
394Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
395Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
396Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
397Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
398Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
399Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
400Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
401Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
402Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
403Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
404Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
405Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
406Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
407Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
408Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
409Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
410Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
411Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
412Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
413Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
414Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
415Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
416Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
417Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
418Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
419Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
420Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
421Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
422Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
423Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
424Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
425Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
426Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
427Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
428Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
429Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
430Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
431Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
432Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
433Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
434Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
435Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
436Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
437Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
438Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
439Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
440Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
441Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
442Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
443Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
444Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
445Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
446Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
447Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
448Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
449Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
450Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
451Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
452Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
453Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
454Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
455Low temperature temporal and spatial atomic layer deposition of TiO2 films
456Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
457Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
458Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
459Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
460Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
461Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
462Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
463Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
464Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
465Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
466Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
467Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
468Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
469Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
470Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
471Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
472Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
473Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
474Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
475Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
476Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
477Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
478Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
479Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
480Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
481Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
482Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
483MANOS performance dependence on ALD Al2O3 oxidation source
484Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
485Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
486Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
487Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
488Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
489Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
490Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
491Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
492Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
493MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
494Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
495Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
496Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
497Nitride memristors
498Nitride passivation of the interface between high-k dielectrics and SiGe
499Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
500Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
501Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
502Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
503Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
504On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
505Optical and Electrical Properties of TixSi1-xOy Films
506Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
507Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
508Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
509Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
510Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
511Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
512Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
513Oxygen migration in TiO2-based higher-k gate stacks
514Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
515PEALD AlN: controlling growth and film crystallinity
516PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
517PEALD of Copper using New Precursors for Next Generation of Interconnections
518PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
519PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
520PEALD ZrO2 Films Deposition on TiN and Si Substrates
521Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
522Perspectives on future directions in III-N semiconductor research
523Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
524Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
525Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
526Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
527Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
528Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
529Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
530Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
531Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
532Plasma enhanced atomic layer deposition of aluminum sulfide thin films
533Plasma enhanced atomic layer deposition of Fe2O3 thin films
534Plasma enhanced atomic layer deposition of Ga2O3 thin films
535Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
536Plasma enhanced atomic layer deposition of gallium sulfide thin films
537Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
538Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
539Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
540Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
541Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
542Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
543Plasma enhanced atomic layer deposition of SiNx:H and SiO2
544Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
545Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
546Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
547Plasma enhanced atomic layer deposition of zinc sulfide thin films
548Plasma Enhanced Atomic Layer Deposition on Powders
549Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
550Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
551Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
552Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
553Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
554Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
555Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
556Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
557Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
558Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
559Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
560Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
561Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
562Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
563Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
564Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
565Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
566Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
567Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
568Plasma-Assisted Atomic Layer Deposition of Palladium
569Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
570Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
571Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
572Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
573Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
574Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
575Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
576Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
577Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
578Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
579Plasma-enhanced ALD system for SRF cavity
580Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
581Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
582Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
583Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
584Plasma-enhanced atomic layer deposition for plasmonic TiN
585Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
586Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
587Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
588Plasma-enhanced atomic layer deposition of BaTiO3
589Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
590Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
591Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
592Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
593Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
594Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
595Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
596Plasma-Enhanced Atomic Layer Deposition of Ni
597Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
598Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
599Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
600Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
601Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
602Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
603Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
604Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
605Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
606Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
607Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
608Plasma-enhanced atomic layer deposition of superconducting niobium nitride
609Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
610Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
611Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
612Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
613Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
614Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
615Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
616Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
617Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
618Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
619Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
620Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
621Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
622Plasma-enhanced atomic layer deposition of titanium vanadium nitride
623Plasma-enhanced atomic layer deposition of tungsten nitride
624Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
625Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
626Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
627Plasma-enhanced atomic layer deposition of vanadium nitride
628Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
629Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
630Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
631Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
632Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
633Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
634Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
635Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
636Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
637Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
638Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
639Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
640Properties of AlN grown by plasma enhanced atomic layer deposition
641Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
642Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
643Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
644Protective capping and surface passivation of III-V nanowires by atomic layer deposition
645Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
646Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
647Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
648Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
649Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
650Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
651Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
652Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
653Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
654Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
655Remote Plasma ALD of Platinum and Platinum Oxide Films
656Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
657Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
658Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
659Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
660Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
661Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
662Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
663Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
664Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
665Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
666Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
667Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
668Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
669Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
670Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
671Room temperature atomic layer deposition of TiO2 on gold nanoparticles
672Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
673Room-Temperature Atomic Layer Deposition of Platinum
674Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
675Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
676Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
677RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
678RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
679Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
680Ru thin film grown on TaN by plasma enhanced atomic layer deposition
681Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
682Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
683Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
684Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
685Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
686Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
687Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
688Self-Limiting Growth of GaN at Low Temperatures
689Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
690Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
691Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
692Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
693Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
694Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
695Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
696Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
697Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
698Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
699Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
700Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
701Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
702Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
703Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
704Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
705Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
706Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
707Structural and optical characterization of low-temperature ALD crystalline AlN
708Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
709Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
710Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
711Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
712Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
713Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
714Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
715Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
716Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
717Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
718Study on the characteristics of aluminum thin films prepared by atomic layer deposition
719Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
720Sub-nanometer heating depth of atomic layer annealing
721Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
722Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
723Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
724Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
725Surface and sensing properties of PE-ALD SnO2 thin film
726Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
727Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
728Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
729Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
730Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
731Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
732Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
733Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
734Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
735Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
736TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
737Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
738TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
739Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
740Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
741Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
742Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
743Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
744Texture of atomic layer deposited ruthenium
745The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
746The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
747The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
748The effects of layering in ferroelectric Si-doped HfO2 thin films
749The effects of plasma treatment on the thermal stability of HfO2 thin films
750The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
751The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
752The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
753The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
754The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
755The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
756The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
757The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
758The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
759The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
760The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
761The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
762The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
763Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
764Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
765Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
766Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
767Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
768Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
769Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
770Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
771Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
772Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
773Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
774Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
775Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
776TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
777Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
778Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
779TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
780Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
781Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
782Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
783Trilayer Tunnel Selectors for Memristor Memory Cells
784Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
785Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
786Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
787Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
788Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
789Tuning size and coverage of Pd nanoparticles using atomic layer deposition
790Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
791Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
792Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
793Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
794Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
795Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
796Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
797Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
798Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
799Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
800Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
801Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
802Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
803Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
804Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
805Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
806Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
807Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
808Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
809Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
810X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
811XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
812XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
813ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
814ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
815ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition