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Search 1536 plasma ALD publications by:
Publication Information
Title:
Time-Dependent Breakdown Mechanisms and Reliability Improvement in Edge Terminated AlGaN/GaN Schottky Diodes Under HTRB Tests
Type:
Journal
Info:
IEEE ELECTRON DEVICE LETTERS, VOL. 38, NO. 3, PP. 371-374, 2017
Date:
2017-01-27
Author Information
Name | Institution |
---|---|
Jie Hu | IMEC |
Steve Stoffels | IMEC |
Ming Zhao | IMEC |
Andrea Natale Tallarico | University of Bologna |
Isabella Rossetto | University of Padova |
Matteo Meneghini | University of Padova |
Xuanwu Kang | IMEC |
Benoit Bakeroot | IMEC |
Denis Marcon | IMEC |
B. Kaczer | IMEC |
Stefaan Decoutere | IMEC |
Guido Groeseneken | IMEC |
Films
Film/Plasma Properties
Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Characteristic: Wet Etch Resistance
Analysis: Custom
Characteristic: Chemical Composition, Impurities
Analysis: -
Substrates
Keywords
Notes
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