Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
2Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
3Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
4Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
5Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
6Oxygen migration in TiO2-based higher-k gate stacks
7Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
8Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
9Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
10The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
11Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
12PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
13Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
14Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
15Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
16Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
17Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
18Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
19Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
20Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
21Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
22Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
23Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
24Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
25Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
26Plasma-enhanced atomic layer deposition of BaTiO3
27Comparative study of ALD SiO2 thin films for optical applications
28Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
29Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
30Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
31Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
32Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
33Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
34A route to low temperature growth of single crystal GaN on sapphire
35Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
36Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
37Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
38Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
39Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
40Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
41Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
42The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
43Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
44Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
45Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
46Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
47Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
48Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
49ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
50Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
51Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
52Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
53Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
54P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
55Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
56Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
57Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
58Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
59Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
60Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
61Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
62Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
63Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
64The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
65Low temperature plasma enhanced deposition of GaP films on Si substrate
66Plasma-enhanced atomic layer deposition of titanium vanadium nitride
67Properties of AlN grown by plasma enhanced atomic layer deposition
68Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
69HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
70Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
71Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
72Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
73Evaluation of plasma parameters on PEALD deposited TaCN
74Plasma-Assisted Atomic Layer Deposition of Palladium
75Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
76Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
77HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
78Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
79Structural and optical characterization of low-temperature ALD crystalline AlN
80Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
81Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
82Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
83Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
84The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
85Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
86Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
87Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
88Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
89In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
90Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
91Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
92Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
93Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
94In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
95Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
96Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
97Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
98Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
99Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
100Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
101Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
102Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
103Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
104Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
105GeSbTe deposition for the PRAM application
106Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
107In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
108Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
109A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
110Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
111Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
112Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
113Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
114Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
115α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
116Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
117Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
118Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
119Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
120Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
121Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
122Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
123ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
124Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
125Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
126Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
127Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
128Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
129RF Characterization of Novel Superconducting Materials and Multilayers
130Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
131Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
132Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
133Plasma-enhanced atomic layer deposition of superconducting niobium nitride
134Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
135Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
136Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
137Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
138Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
139Perspectives on future directions in III-N semiconductor research
140Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
141Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
142Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
143Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
144Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
145Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
146Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
147ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
148Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
149Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
150Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
151High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
152Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
153Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
154Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
155Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
156Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
157Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
158PEALD AlN: controlling growth and film crystallinity
159An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
160Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
161Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
162Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
163Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
164Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
165Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
166New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
167Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
168Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
169Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
170Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
171Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
172Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
173Densification of Thin Aluminum Oxide Films by Thermal Treatments
174Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
175Plasma enhanced atomic layer deposition of aluminum sulfide thin films
176ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
177TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
178Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
179Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
180Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
181Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
182Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
183Layer-by-layer epitaxial growth of GaN at low temperatures
184Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
185Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
186Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
187Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
188Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
189Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
190Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
191Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
192Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
193Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
194Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
195Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
196Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
197Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
198Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
199Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
200Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
201Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
202TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
203In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
204Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
205Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
206Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
207Characteristics of HfO2 thin films grown by plasma atomic layer deposition
208Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
209Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
210Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
211Plasma-enhanced atomic layer deposition of vanadium nitride
212Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
213Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
214Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
215Plasma enhanced atomic layer deposition of zinc sulfide thin films
216Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
217The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
218Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
219High-Reflective Coatings For Ground and Space Based Applications
220Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
221Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
222Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
223Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
224Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
225Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
226Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
227Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
228Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
229Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
230Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
231Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
232The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
233Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
234Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
235Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
236Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
237The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
238Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
239Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
240Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
241Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
242Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
243Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
244Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
245Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
246Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
247Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
248TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
249X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
250Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
251Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
252Gallium nitride thin films by microwave plasma-assisted ALD
253Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
254Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
255Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
256Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
257Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
258Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
259Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
260Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
261Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
262Atomic layer deposition of titanium nitride for quantum circuits
263Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
264Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
265Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
266Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
267Fast PEALD ZnO Thin-Film Transistor Circuits
268Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
269Remote Plasma ALD of Platinum and Platinum Oxide Films
270Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
271Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
272Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
273Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
274Sub-nanometer heating depth of atomic layer annealing
275Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
276Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
277Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
278Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
279Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
280A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
281Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
282The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
283Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
284Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
285Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
286Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
287Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
288Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
289Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
290Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
291Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
292Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
293Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
294A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
295Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
296Atomic layer deposition of metal-oxide thin films on cellulose fibers
297Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
298Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
299Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
300Texture of atomic layer deposited ruthenium
301A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
302Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
303Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
304Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
305Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
306Sub-10-nm ferroelectric Gd-doped HfO2 layers
307SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
308Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
309Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
310Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
311Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
312Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
313Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
314Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
315Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
316Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
317Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
318Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
319Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
320Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
321Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
322Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
323Formation of aluminum nitride thin films as gate dielectrics on Si(100)
324Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
325A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
326Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
327Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
328CeO2 Doping of Hf0.5Zr0.5O2 Thin Films for High Endurance Ferroelectric Memories
329Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
330Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
331Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
332Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
333Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
334Study on the characteristics of aluminum thin films prepared by atomic layer deposition
335Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
336Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
337Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
338TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
339Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
340A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
341Trilayer Tunnel Selectors for Memristor Memory Cells
342Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
343Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
344HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
345Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
346Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
347Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
348Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
349Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
350Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
351Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
352Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
353Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
354Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
355Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
356Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
357Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
358Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
359Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
360Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
361A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
362Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
363Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
364Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
365From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
366Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
367Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
368Atomic layer deposition of YMnO3 thin films
369Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
370Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
371Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
372The effects of layering in ferroelectric Si-doped HfO2 thin films
373Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
374Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
375Atomic Layer Deposition of the Conductive Delafossite PtCoO2
376Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
377Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
378Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
379Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
380Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
381Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
382Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
383Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
384Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
385Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
386Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
387Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
388Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
389Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
390Crystalline growth of AlN thin films by atomic layer deposition
391Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
392Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
393Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
394Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
395Plasma-Modified Atomic Layer Deposition
396Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
397Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
398Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
399Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
400Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
401Room-Temperature Atomic Layer Deposition of Platinum
402Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
403A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
404Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
405Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
406Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
407Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
408Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
409Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
410Atomic layer epitaxy of Si using atomic H
411Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
412Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
413Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
414Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
415Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
416Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
417Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
418The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
419Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
420Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
421Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
422Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
423Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
424Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
425Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
426Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
427Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
428Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
429Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
430PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
431Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
432Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
433Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
434Fully CMOS-compatible titanium nitride nanoantennas
435Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
436Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
437Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
438Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
439Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
440Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
441High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
442Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
443High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
444Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
445Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
446Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
447Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
448Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
449Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
450Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
451Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
452Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
453The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
454Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
455Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
456Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
457Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
458Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
459Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
460Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
461Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
462Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
463High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
464Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
465Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
466Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
467Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
468Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
469Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
470Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
471Atomic layer deposition of InN using trimethylindium and ammonia plasma
472Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
473The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
474AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
4753D structure evolution using metastable atomic layer deposition based on planar silver templates
476Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
477Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
478Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
479Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
480High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
481Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
482In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
483Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
484Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
485Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
486Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
487Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
488Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
489Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
490The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
491Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
492Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
493Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
494Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
495Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
496Tribological properties of thin films made by atomic layer deposition sliding against silicon
497Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
498Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
499Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
500Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
501Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
502Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
503Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
504Plasma-Enhanced Atomic Layer Deposition of Ni
505Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
506Atomic hydrogen-assisted ALE of germanium
507Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
508In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
509Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
510Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
511In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
512Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
513Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
514Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
515Plasma enhanced atomic layer deposition of gallium sulfide thin films
516Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
517Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
518Electron-enhanced atomic layer deposition of silicon thin films at room temperature
519Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
520Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
521Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
522Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
523Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
524Atomic layer deposition of GaN at low temperatures
525Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
526Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
527Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
528Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
529The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
530ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
531Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
532Ru thin film grown on TaN by plasma enhanced atomic layer deposition
533In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
534Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
535Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
536Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
537Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
538Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
539Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
540Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
541Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
542Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
543PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
544Plasma enhanced atomic layer deposition of Ga2O3 thin films
545WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
546Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
547Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
548A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
549Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
550Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
551AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
552Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
553Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
554Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
555Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
556Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
557Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
558Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
559Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
560Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
561Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
562Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
563Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
564Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
565Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
566Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
567High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
568Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
569Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
570Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
571Plasma enhanced atomic layer deposition of Fe2O3 thin films
572Experimental and theoretical determination of the role of ions in atomic layer annealing
573Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
574Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
575Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
576Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
577Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
578Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
579Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
580Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
581Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
582Nitride memristors
583Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
584Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
585Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
586Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
587Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
588Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
589Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
590Thin film GaP for solar cell application
591Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
592Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
593NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
594Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
595Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
596Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
597Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
598Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
599Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
600Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
601Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
602Sub-7-nm textured ZrO2 with giant ferroelectricity