Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
13D structure evolution using metastable atomic layer deposition based on planar silver templates
2A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
3A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
6A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
7A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
8A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
9A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
10A route to low temperature growth of single crystal GaN on sapphire
11Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
12Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
13Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
14ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
15ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
16AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
17AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
18Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
19Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
20Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
21An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
22Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
23Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
24Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
25Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
26Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
27Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
28Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
29Atomic hydrogen-assisted ALE of germanium
30Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
31Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
32Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
33Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
34Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
35Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
36Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
37Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
38Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
39Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
40Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
41Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
42Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
43Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
44Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
45Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
46Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
47Atomic layer deposition of GaN at low temperatures
48Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
49Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
50Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
51Atomic layer deposition of InN using trimethylindium and ammonia plasma
52Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
53Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
54Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
55Atomic layer deposition of metal-oxide thin films on cellulose fibers
56Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
57Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
58Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
59Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
60Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
61Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
62Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
63Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
64Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
65Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
66Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
67Atomic layer deposition of titanium nitride for quantum circuits
68Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
69Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
70Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
71Atomic layer deposition of YMnO3 thin films
72Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
73Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
74Atomic layer epitaxy of Si using atomic H
75Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
76Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
77Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
78Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
79Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
80Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
81Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
82Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
83Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
84Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
85Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
86Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
87Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
88Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
89Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
90Characteristics of HfO2 thin films grown by plasma atomic layer deposition
91Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
92Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
93Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
94Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
95Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
96Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
97Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
98Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
99Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
100Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
101Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
102Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
103Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
104Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
105Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
106Comparative study of ALD SiO2 thin films for optical applications
107Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
108Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
109Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
110Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
111Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
112Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
113Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
114Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
115Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
116Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
117Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
118Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
119Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
120Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
121Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
122Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
123Crystalline growth of AlN thin films by atomic layer deposition
124Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
125Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
126Densification of Thin Aluminum Oxide Films by Thermal Treatments
127Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
128Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
129Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
130Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
131Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
132Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
133Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
134Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
135Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
136Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
137Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
138Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
139Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
140Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
141Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
142Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
143Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
144Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
145Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
146Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
147Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
148Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
149Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
150Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
151Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
152Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
153Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
154Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
155Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
156Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
157Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
158Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
159Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
160Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
161Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
162Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
163Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
164Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
165Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
166Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
167Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
168Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
169Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
170Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
171Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
172Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
173Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
174Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
175Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
176Evaluation of plasma parameters on PEALD deposited TaCN
177Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
178Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
179Fast PEALD ZnO Thin-Film Transistor Circuits
180Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
181Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
182Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
183Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
184Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
185Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
186Formation of aluminum nitride thin films as gate dielectrics on Si(100)
187Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
188Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
189From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
190Fully CMOS-compatible titanium nitride nanoantennas
191Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
192GeSbTe deposition for the PRAM application
193Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
194Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
195Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
196Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
197Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
198Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
199Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
200Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
201Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
202Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
203Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
204Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
205Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
206Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
207Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
208Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
209Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
210Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
211Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
212Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
213HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
214HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
215HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
216High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
217High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
218High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
219High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
220High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
221High-Reflective Coatings For Ground and Space Based Applications
222High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
223Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
224Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
225Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
226Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
227Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
228Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
229Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
230Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
231Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
232Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
233Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
234Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
235Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
236In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
237In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
238In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
239In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
240In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
241In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
242In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
243Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
244Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
245Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
246Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
247Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
248Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
249Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
250Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
251Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
252Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
253Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
254Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
255Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
256Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
257Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
258Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
259Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
260Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
261Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
262Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
263Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
264Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
265Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
266Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
267Layer-by-layer epitaxial growth of GaN at low temperatures
268Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
269Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
270Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
271Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
272Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
273Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
274Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
275Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
276Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
277Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
278Low temperature plasma enhanced deposition of GaP films on Si substrate
279Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
280Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
281Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
282Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
283Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
284Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
285Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
286Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
287Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
288Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
289Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
290Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
291Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
292Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
293Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
294Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
295Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
296Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
297Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
298Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
299Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
300Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
301Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
302Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
303Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
304Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
305Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
306Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
307New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
308NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
309Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
310Nitride memristors
311Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
312Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
313Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
314Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
315Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
316Oxygen migration in TiO2-based higher-k gate stacks
317P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
318Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
319PEALD AlN: controlling growth and film crystallinity
320PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
321PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
322PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
323Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
324Perspectives on future directions in III-N semiconductor research
325Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
326Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
327Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
328Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
329Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
330Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
331Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
332Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
333Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
334Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
335Plasma enhanced atomic layer deposition of aluminum sulfide thin films
336Plasma enhanced atomic layer deposition of Fe2O3 thin films
337Plasma enhanced atomic layer deposition of Ga2O3 thin films
338Plasma enhanced atomic layer deposition of gallium sulfide thin films
339Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
340Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
341Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
342Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
343Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
344Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
345Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
346Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
347Plasma enhanced atomic layer deposition of zinc sulfide thin films
348Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
349Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
350Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
351Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
352Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
353Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
354Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
355Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
356Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
357Plasma-Assisted Atomic Layer Deposition of Palladium
358Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
359Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
360Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
361Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
362Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
363Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
364Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
365Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
366Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
367Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
368Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
369Plasma-enhanced atomic layer deposition of BaTiO3
370Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
371Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
372Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
373Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
374Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
375Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
376Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
377Plasma-Enhanced Atomic Layer Deposition of Ni
378Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
379Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
380Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
381Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
382Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
383Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
384Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
385Plasma-enhanced atomic layer deposition of superconducting niobium nitride
386Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
387Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
388Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
389Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
390Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
391Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
392Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
393Plasma-enhanced atomic layer deposition of titanium vanadium nitride
394Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
395Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
396Plasma-enhanced atomic layer deposition of vanadium nitride
397Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
398Plasma-Modified Atomic Layer Deposition
399Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
400Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
401Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
402Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
403Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
404Properties of AlN grown by plasma enhanced atomic layer deposition
405Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
406Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
407Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
408Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
409Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
410Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
411Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
412Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
413Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
414Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
415Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
416Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
417Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
418Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
419Remote Plasma ALD of Platinum and Platinum Oxide Films
420Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
421Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
422Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
423Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
424Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
425Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
426Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
427Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
428Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
429Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
430Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
431Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
432Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
433Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
434Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
435Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
436Room-Temperature Atomic Layer Deposition of Platinum
437Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
438Ru thin film grown on TaN by plasma enhanced atomic layer deposition
439Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
440Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
441Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
442Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
443Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
444Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
445Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
446SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
447Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
448Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
449Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
450Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
451Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
452Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
453Structural and optical characterization of low-temperature ALD crystalline AlN
454Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
455Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
456Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
457Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
458Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
459Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
460Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
461Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
462Study on the characteristics of aluminum thin films prepared by atomic layer deposition
463Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
464Sub-7-nm textured ZrO2 with giant ferroelectricity
465Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
466Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
467Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
468Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
469Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
470Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
471Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
472Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
473Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
474Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
475Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
476Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
477TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
478Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
479Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
480TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
481Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
482Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
483Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
484Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
485Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
486The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
487The effects of layering in ferroelectric Si-doped HfO2 thin films
488The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
489The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
490The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
491The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
492The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
493The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
494The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
495The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
496The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
497The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
498The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
499Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
500Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
501Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
502Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
503Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
504Thin film GaP for solar cell application
505Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
506TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
507TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
508Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
509Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
510Tribological properties of thin films made by atomic layer deposition sliding against silicon
511Trilayer Tunnel Selectors for Memristor Memory Cells
512Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
513Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
514Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
515Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
516Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
517Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
518Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
519Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
520Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
521Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
522Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
523Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
524WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
525Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
526X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
527ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
528ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
529α-Ga2O3 grown by low temperature atomic layer deposition on sapphire