Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
2Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
3Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
4Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
5Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
6Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
7Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
8Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
9Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
10Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
11Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
12Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
13Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
14Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
15Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
16Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
17Plasma-enhanced atomic layer deposition of BaTiO3
18Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
19Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
20Fully CMOS-compatible titanium nitride nanoantennas
21Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
22Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
23The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
24Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
25Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
26Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
27Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
28Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
29Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
30Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
31Atomic layer epitaxy of Si using atomic H
32Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
33Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
34Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
35Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
36Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
37Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
38Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
39Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
40Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
41Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
42Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
43Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
44Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
45Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
46Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
47The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
48Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
49Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
503D structure evolution using metastable atomic layer deposition based on planar silver templates
51Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
52Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
53Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
54Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
55Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
56Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
57Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
58Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
59ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
60Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
61High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
62Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
63Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
64Nitride memristors
65Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
66Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
67Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
68Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
69Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
70Atomic hydrogen-assisted ALE of germanium
71Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
72Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
73Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
74GeSbTe deposition for the PRAM application
75Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
76Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
77Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
78Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
79Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
80ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
81Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
82Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
83Comparative study of ALD SiO2 thin films for optical applications
84Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
85Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
86Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
87Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
88Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
89Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
90Ru thin film grown on TaN by plasma enhanced atomic layer deposition
91Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
92From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
93Plasma-Assisted Atomic Layer Deposition of Palladium
94TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
95Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
96Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
97Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
98Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
99Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
100RF Characterization of Novel Superconducting Materials and Multilayers
101Plasma enhanced atomic layer deposition of zinc sulfide thin films
102The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
103Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
104Properties of AlN grown by plasma enhanced atomic layer deposition
105Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
106Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
107In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
108Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
109Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
110Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
111The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
112The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
113Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
114Plasma enhanced atomic layer deposition of aluminum sulfide thin films
115Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
116Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
117Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
118Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
119Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
120Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
121Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
122Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
123SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
124Electron-enhanced atomic layer deposition of silicon thin films at room temperature
125Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
126Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
127Structural and optical characterization of low-temperature ALD crystalline AlN
128Plasma-Modified Atomic Layer Deposition
129Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
130Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
131Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
132A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
133Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
134Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
135Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
136Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
137Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
138Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
139Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
140Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
141Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
142Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
143Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
144Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
145Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
146Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
147Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
148Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
149Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
150High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
151Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
152HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
153Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
154Perspectives on future directions in III-N semiconductor research
155Plasma enhanced atomic layer deposition of Fe2O3 thin films
156Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
157Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
158Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
159Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
160Fast PEALD ZnO Thin-Film Transistor Circuits
161Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
162Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
163Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
164Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
165In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
166Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
167The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
168The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
169Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
170Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
171Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
172Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
173Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
174Low temperature plasma enhanced deposition of GaP films on Si substrate
175Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
176Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
177Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
178Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
179Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
180Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
181Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
182Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
183Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
184The effects of layering in ferroelectric Si-doped HfO2 thin films
185Thin film GaP for solar cell application
186Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
187Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
188Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
189Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
190Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
191Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
192Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
193Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
194Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
195Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
196Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
197Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
198AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
199Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
200Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
201The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
202Tribological properties of thin films made by atomic layer deposition sliding against silicon
203NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
204Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
205Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
206Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
207Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
208CeO2 Doping of Hf0.5Zr0.5O2 Thin Films for High Endurance Ferroelectric Memories
209Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
210Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
211Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
212Plasma enhanced atomic layer deposition of gallium sulfide thin films
213The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
214Texture of atomic layer deposited ruthenium
215Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
216Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
217A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
218Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
219TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
220Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
221Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
222Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
223Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
224Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
225Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
226Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
227Crystalline growth of AlN thin films by atomic layer deposition
228Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
229Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
230Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
231Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
232Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
233High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
234Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
235Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
236Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
237High-Reflective Coatings For Ground and Space Based Applications
238Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
239Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
240Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
241A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
242Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
243Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
244Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
245Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
246Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
247PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
248P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
249In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
250Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
251Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
252Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
253Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
254Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
255Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
256Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
257Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
258Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
259Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
260Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
261Sub-7-nm textured ZrO2 with giant ferroelectricity
262Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
263Atomic layer deposition of YMnO3 thin films
264Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
265Experimental and theoretical determination of the role of ions in atomic layer annealing
266Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
267Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
268Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
269An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
270PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
271Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
272Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
273Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
274PEALD AlN: controlling growth and film crystallinity
275Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
276Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
277Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
278Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
279Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
280Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
281Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
282Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
283Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
284High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
285Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
286Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
287Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
288Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
289Densification of Thin Aluminum Oxide Films by Thermal Treatments
290Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
291Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
292High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
293Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
294Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
295Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
296Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
297Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
298Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
299Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
300Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
301Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
302Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
303Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
304Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
305Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
306Atomic Layer Deposition of the Conductive Delafossite PtCoO2
307Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
308Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
309Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
310Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
311Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
312Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
313Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
314X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
315The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
316Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
317Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
318Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
319ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
320Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
321Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
322Plasma-Enhanced Atomic Layer Deposition of Ni
323Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
324Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
325Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
326Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
327Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
328α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
329Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
330Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
331Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
332Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
333Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
334Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
335Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
336Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
337Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
338Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
339Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
340A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
341Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
342Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
343Atomic layer deposition of InN using trimethylindium and ammonia plasma
344Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
345Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
346Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
347Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
348Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
349Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
350Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
351Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
352Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
353Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
354Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
355A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
356Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
357Remote Plasma ALD of Platinum and Platinum Oxide Films
358Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
359Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
360Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
361Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
362AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
363In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
364Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
365Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
366Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
367Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
368Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
369Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
370Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
371HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
372Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
373Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
374Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
375Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
376Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
377Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
378Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
379Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
380Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
381Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
382Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
383Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
384Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
385Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
386Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
387Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
388Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
389Study on the characteristics of aluminum thin films prepared by atomic layer deposition
390Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
391Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
392Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
393Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
394Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
395Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
396HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
397Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
398Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
399Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
400Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
401Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
402Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
403Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
404Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
405In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
406Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
407Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
408Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
409In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
410Atomic layer deposition of metal-oxide thin films on cellulose fibers
411Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
412Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
413Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
414Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
415Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
416Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
417The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
418Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
419Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
420Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
421Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
422Room-Temperature Atomic Layer Deposition of Platinum
423Atomic layer deposition of GaN at low temperatures
424In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
425Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
426Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
427Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
428Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
429High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
430Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
431Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
432Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
433Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
434Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
435Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
436Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
437Plasma-enhanced atomic layer deposition of vanadium nitride
438Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
439Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
440Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
441Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
442Sub-nanometer heating depth of atomic layer annealing
443A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
444Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
445Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
446Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
447Layer-by-layer epitaxial growth of GaN at low temperatures
448Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
449Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
450Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
451Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
452Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
453Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
454Plasma enhanced atomic layer deposition of Ga2O3 thin films
455A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
456Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
457Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
458Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
459Gallium nitride thin films by microwave plasma-assisted ALD
460Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
461Oxygen migration in TiO2-based higher-k gate stacks
462Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
463Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
464Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
465Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
466Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
467Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
468Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
469Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
470Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
471Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
472Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
473Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
474Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
475Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
476Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
477Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
478Sub-10-nm ferroelectric Gd-doped HfO2 layers
479Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
480Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
481Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
482Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
483In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
484Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
485Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
486Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
487Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
488Atomic layer deposition of titanium nitride for quantum circuits
489Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
490Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
491Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
492Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
493Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
494Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
495Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
496Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
497PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
498Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
499Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
500Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
501Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
502Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
503Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
504Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
505Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
506Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
507ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
508Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
509Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
510Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
511Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
512Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
513TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
514Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
515Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
516Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
517Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
518Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
519Plasma-enhanced atomic layer deposition of superconducting niobium nitride
520Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
521Evaluation of plasma parameters on PEALD deposited TaCN
522Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
523Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
524Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
525Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
526Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
527Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
528Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
529Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
530Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
531Characteristics of HfO2 thin films grown by plasma atomic layer deposition
532Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
533Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
534Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
535Plasma-enhanced atomic layer deposition of titanium vanadium nitride
536Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
537Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
538Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
539Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
540Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
541Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
542The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
543Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
544Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
545Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
546Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
547Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
548Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
549Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
550Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
551Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
552Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
553Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
554Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
555Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
556TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
557A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
558Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
559Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
560Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
561New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
562Trilayer Tunnel Selectors for Memristor Memory Cells
563Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
564Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
565Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
566Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
567Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
568Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
569Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
570Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
571Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
572A route to low temperature growth of single crystal GaN on sapphire
573WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
574Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
575Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
576Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
577Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
578Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
579Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
580Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
581Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
582Formation of aluminum nitride thin films as gate dielectrics on Si(100)
583A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
584Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
585Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
586Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
587Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
588Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
589Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
590Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
591Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
592Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
593Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
594Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
595Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
596Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
597Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
598The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
599Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
600Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
601ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
602Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition