Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Crystallinity, Crystal Structure, Grain Size, Atomic Structure returned 462 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
3A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
4A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
5A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
6A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
7A route to low temperature growth of single crystal GaN on sapphire
8Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
9Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
10Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
11ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
12ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
13AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
14AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
15Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
16Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
17An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
18Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
19Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
20Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
21Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
22Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
23Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
24Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
25Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
26Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
27Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
28Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
29Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
30Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
31Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
32Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
33Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
34Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
35Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
36Atomic layer deposition of GaN at low temperatures
37Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
38Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
39Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
40Atomic layer deposition of InN using trimethylindium and ammonia plasma
41Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
42Atomic layer deposition of metal-oxide thin films on cellulose fibers
43Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
44Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
45Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
46Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
47Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
48Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
49Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
50Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
51Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
52Atomic layer deposition of titanium nitride for quantum circuits
53Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
54Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
55Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
56Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
57Atomic layer epitaxy of Si using atomic H
58Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
59Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
60Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
61Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
62Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
63Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
64Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
65Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
66Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
67Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
68Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
69Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
70Characteristics of HfO2 thin films grown by plasma atomic layer deposition
71Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
72Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
73Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
74Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
75Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
76Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
77Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
78Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
79Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
80Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
81Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
82Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
83Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
84Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
85Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
86Comparative study of ALD SiO2 thin films for optical applications
87Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
88Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
89Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
90Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
91Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
92Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
93Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
94Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
95Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
96Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
97Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
98Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
99Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
100Crystalline growth of AlN thin films by atomic layer deposition
101Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
102Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
103Densification of Thin Aluminum Oxide Films by Thermal Treatments
104Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
105Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
106Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
107Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
108Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
109Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
110Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
111Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
112Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
113Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
114Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
115Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
116Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
117Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
118Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
119Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
120Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
121Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
122Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
123Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
124Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
125Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
126Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
127Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
128Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
129Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
130Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
131Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
132Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
133Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
134Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
135Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
136Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
137Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
138Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
139Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
140Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
141Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
142Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
143Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
144Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
145Evaluation of plasma parameters on PEALD deposited TaCN
146Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
147Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
148Fast PEALD ZnO Thin-Film Transistor Circuits
149Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
150Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
151Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
152Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
153Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
154Formation of aluminum nitride thin films as gate dielectrics on Si(100)
155Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
156Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
157Fully CMOS-compatible titanium nitride nanoantennas
158Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
159GeSbTe deposition for the PRAM application
160Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
161Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
162Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
163Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
164Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
165Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
166Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
167Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
168Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
169Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
170Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
171Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
172Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
173Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
174Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
175Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
176HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
177HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
178High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
179High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
180High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
181High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
182High-Reflective Coatings For Ground and Space Based Applications
183High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
184Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
185Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
186Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
187Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
188Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
189Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
190Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
191Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
192Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
193Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
194Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
195Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
196In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
197In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
198In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
199In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
200In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
201In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
202Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
203Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
204Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
205Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
206Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
207Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
208Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
209Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
210Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
211Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
212Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
213Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
214Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
215Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
216Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
217Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
218Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
219Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
220Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
221Layer-by-layer epitaxial growth of GaN at low temperatures
222Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
223Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
224Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
225Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
226Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
227Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
228Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
229Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
230Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
231Low temperature plasma enhanced deposition of GaP films on Si substrate
232Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
233Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
234Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
235Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
236Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
237Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
238Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
239Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
240Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
241Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
242Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
243Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
244Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
245Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
246Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
247Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
248Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
249Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
250Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
251Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
252Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
253Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
254Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
255New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
256NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
257Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
258Nitride memristors
259Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
260Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
261Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
262Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
263Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
264Oxygen migration in TiO2-based higher-k gate stacks
265P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
266Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
267PEALD AlN: controlling growth and film crystallinity
268PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
269PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
270PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
271Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
272Perspectives on future directions in III-N semiconductor research
273Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
274Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
275Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
276Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
277Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
278Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
279Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
280Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
281Plasma enhanced atomic layer deposition of aluminum sulfide thin films
282Plasma enhanced atomic layer deposition of Fe2O3 thin films
283Plasma enhanced atomic layer deposition of Ga2O3 thin films
284Plasma enhanced atomic layer deposition of gallium sulfide thin films
285Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
286Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
287Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
288Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
289Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
290Plasma enhanced atomic layer deposition of zinc sulfide thin films
291Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
292Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
293Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
294Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
295Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
296Plasma-Assisted Atomic Layer Deposition of Palladium
297Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
298Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
299Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
300Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
301Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
302Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
303Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
304Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
305Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
306Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
307Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
308Plasma-enhanced atomic layer deposition of BaTiO3
309Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
310Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
311Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
312Plasma-Enhanced Atomic Layer Deposition of Ni
313Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
314Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
315Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
316Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
317Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
318Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
319Plasma-enhanced atomic layer deposition of superconducting niobium nitride
320Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
321Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
322Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
323Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
324Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
325Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
326Plasma-enhanced atomic layer deposition of titanium vanadium nitride
327Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
328Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
329Plasma-enhanced atomic layer deposition of vanadium nitride
330Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
331Plasma-Modified Atomic Layer Deposition
332Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
333Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
334Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
335Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
336Properties of AlN grown by plasma enhanced atomic layer deposition
337Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
338Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
339Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
340Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
341Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
342Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
343Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
344Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
345Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
346Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
347Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
348Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
349Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
350Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
351Remote Plasma ALD of Platinum and Platinum Oxide Films
352Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
353Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
354Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
355Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
356Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
357Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
358Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
359Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
360Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
361Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
362Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
363Room-Temperature Atomic Layer Deposition of Platinum
364Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
365Ru thin film grown on TaN by plasma enhanced atomic layer deposition
366Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
367Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
368Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
369Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
370Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
371Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
372Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
373SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
374Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
375Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
376Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
377Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
378Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
379Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
380Structural and optical characterization of low-temperature ALD crystalline AlN
381Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
382Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
383Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
384Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
385Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
386Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
387Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
388Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
389Study on the characteristics of aluminum thin films prepared by atomic layer deposition
390Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
391Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
392Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
393Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
394Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
395Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
396Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
397Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
398Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
399Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
400Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
401Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
402Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
403TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
404Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
405Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
406Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
407The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
408The effects of layering in ferroelectric Si-doped HfO2 thin films
409The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
410The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
411The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
412The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
413The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
414The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
415The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
416The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
417The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
418The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
419Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
420Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
421Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
422Thin film GaP for solar cell application
423Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
424TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
425TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
426Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
427Tribological properties of thin films made by atomic layer deposition sliding against silicon
428Trilayer Tunnel Selectors for Memristor Memory Cells
429Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
430Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
431Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
432Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
433Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
434Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
435Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
436Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
437Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
438Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
439WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
440Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
441X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
442ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


Shortcuts



© 2014-2020 plasma-ald.com