Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
2Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
3Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
4Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
5Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
6Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
7Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
8Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
9Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
10Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
11Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
12Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
13Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
14Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
15A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
16Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
17Tribological properties of thin films made by atomic layer deposition sliding against silicon
18Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
19Plasma-Assisted Atomic Layer Deposition of Palladium
20Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
21GeSbTe deposition for the PRAM application
22Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
23Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
24Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
25Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
26A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
27An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28Sub-7-nm textured ZrO2 with giant ferroelectricity
29Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
30Study on the characteristics of aluminum thin films prepared by atomic layer deposition
31Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
32PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
33The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
34High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
35Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
36Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
37Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
38Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
39Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
40Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
41Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
42Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
43Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
44Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
45Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
46Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
47Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
48Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
49Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
50Structural and optical characterization of low-temperature ALD crystalline AlN
51Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
52Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
53Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
54Room-Temperature Atomic Layer Deposition of Platinum
55Plasma-enhanced atomic layer deposition of vanadium nitride
56Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
57Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
58Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
59Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
60Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
61Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
62Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
63Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
64A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
65Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
66Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
67Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
68Plasma-Enhanced Atomic Layer Deposition of Ni
69Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
70Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
71Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
72Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
73Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
74Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
75Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
76Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
77Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
78Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
79Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
80The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
81Densification of Thin Aluminum Oxide Films by Thermal Treatments
82Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
83Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
84Atomic layer deposition of titanium nitride for quantum circuits
85AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
86Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
87Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
88Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
89Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
90Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
91Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
92From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
93Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
94Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
95Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
96Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
97Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
98Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
99Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
100Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
101α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
102Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
103Atomic layer deposition of GaN at low temperatures
104Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
105Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
106Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
107Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
108Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
109Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
110Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
111RF Characterization of Novel Superconducting Materials and Multilayers
112Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
113Oxygen migration in TiO2-based higher-k gate stacks
114Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
115Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
116Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
117Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
118Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
119Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
120Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
121Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
122Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
123ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
124Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
125Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
126Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
127Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
128In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
129Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
130Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
131Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
132Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
133Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
134Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
135Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
136Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
137Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
138Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
139Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
140Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
141Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
142Sub-10-nm ferroelectric Gd-doped HfO2 layers
143Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
144Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
145Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
146Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
147Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
148Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
149Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
150Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
151Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
152Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
153Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
154Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
155A route to low temperature growth of single crystal GaN on sapphire
156Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
157Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
158Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
159Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
160Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
161Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
162Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
163Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
164Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
165Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
166Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
167Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
168P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
169Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
170A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
171Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
172Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
173In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
174Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
175Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
176Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
177Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
178Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
179The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
180Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
181Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
182Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
183Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
184Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
185Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
186Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
187Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
188Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
189HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
190Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
191Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
192Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
193Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
194Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
195The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
196Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
197The effects of layering in ferroelectric Si-doped HfO2 thin films
198Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
199Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
200Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
201Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
202Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
203Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
204PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
205Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
206Gallium nitride thin films by microwave plasma-assisted ALD
207Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
208Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
209Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
210Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
211Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
212Trilayer Tunnel Selectors for Memristor Memory Cells
213Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
214Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
215Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
216Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
217Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
218Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
219A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
220Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
221Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
222Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
223Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
224Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
225Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
226Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
227Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
228Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
229Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
230Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
231Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
232Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
233Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
234Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
235Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
236Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
237Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
238Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
239Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
240Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
241Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
242Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
243Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
244HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
245Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
246Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
247Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
248Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
249Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
250Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
251Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
252Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
253Texture of atomic layer deposited ruthenium
254Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
255High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
256Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
257Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
258Plasma enhanced atomic layer deposition of aluminum sulfide thin films
259Plasma-enhanced atomic layer deposition of BaTiO3
260Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
261Atomic layer deposition of InN using trimethylindium and ammonia plasma
262Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
263Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
264Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
265Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
266Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
267Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
268Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
269Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
270Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
271Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
272Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
273Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
274Fast PEALD ZnO Thin-Film Transistor Circuits
275In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
276Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
277Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
278Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
279Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
280The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
281Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
282Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
283Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
284Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
285Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
286Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
287Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
288Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
289Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
290Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
291Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
292Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
293Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
294Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
295Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
296Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
297Plasma-Modified Atomic Layer Deposition
298ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
299Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
300Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
301Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
302Crystalline growth of AlN thin films by atomic layer deposition
303Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
304Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
305In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
306Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
307Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
308Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
309Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
310Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
311The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
312The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
313Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
314Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
315Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
316Plasma enhanced atomic layer deposition of gallium sulfide thin films
317Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
318Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
319The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
320HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
321Atomic layer epitaxy of Si using atomic H
322Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
323Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
324ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
325Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
326Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
327Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
328Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
329Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
330Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
331Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
332A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
333Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
334Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
335Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
336In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
337Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
338Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
339Low temperature plasma enhanced deposition of GaP films on Si substrate
340Fully CMOS-compatible titanium nitride nanoantennas
341High-Reflective Coatings For Ground and Space Based Applications
342Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
343Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
344A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
345Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
346Experimental and theoretical determination of the role of ions in atomic layer annealing
347Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
348Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
349Atomic hydrogen-assisted ALE of germanium
350Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
351Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
352Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
353Plasma enhanced atomic layer deposition of Fe2O3 thin films
354Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
355Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
356Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
357Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
358Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
359Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
360Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
361PEALD AlN: controlling growth and film crystallinity
362Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
363Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
364Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
365Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
366Plasma-enhanced atomic layer deposition of titanium vanadium nitride
367Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
368TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
369Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
370The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
371Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
372Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
373Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
374Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
375Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
376Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
377Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
378High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
379The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
380Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
381Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
382Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
383Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
384Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
385Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
386Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
387Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
388Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
389Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
390Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
391Nitride memristors
392Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
393Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
394Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
395Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
396Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
397Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
398Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
399Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
400Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
401Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
402Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
403Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
404TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
405Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
406Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
407Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
408Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
409Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
410Electron-enhanced atomic layer deposition of silicon thin films at room temperature
411High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
412Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
413Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
414Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
415Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
416Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
417Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
418Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
419Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
420Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
421Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
422Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
423Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
424Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
425Atomic layer deposition of YMnO3 thin films
426Plasma enhanced atomic layer deposition of Ga2O3 thin films
427In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
428Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
429The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
430Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
431Perspectives on future directions in III-N semiconductor research
432Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
433Sub-nanometer heating depth of atomic layer annealing
434Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
435Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
436Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
437Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
438Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
439Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
440Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
441Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
442Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
443AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
444Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
445Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
446Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
447Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
448High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
449Plasma-enhanced atomic layer deposition of superconducting niobium nitride
450Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
451Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
452Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
453Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
454Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
455Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
456Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
457Properties of AlN grown by plasma enhanced atomic layer deposition
458Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
459Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
460Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
461Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
462Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
463Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
464Atomic layer deposition of metal-oxide thin films on cellulose fibers
465Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
466Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
467Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
468The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
469Ru thin film grown on TaN by plasma enhanced atomic layer deposition
470Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
471Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
472Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
473Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
474Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
475Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
476New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
477Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
478Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
479Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
480Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
481Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
482Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
483Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
484Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
485Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
486Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
487ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
488SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
489Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
490Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
491Thin film GaP for solar cell application
492Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
493Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
494Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
495Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
4963D structure evolution using metastable atomic layer deposition based on planar silver templates
497Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
498NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
499Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
500Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
501Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
502Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
503Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
504Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
505Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
506Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
507Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
508WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
509Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
510Evaluation of plasma parameters on PEALD deposited TaCN
511Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
512Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
513PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
514Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
515Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
516Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
517Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
518Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
519Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
520Layer-by-layer epitaxial growth of GaN at low temperatures
521Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
522Remote Plasma ALD of Platinum and Platinum Oxide Films
523Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
524Characteristics of HfO2 thin films grown by plasma atomic layer deposition
525Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
526Atomic Layer Deposition of the Conductive Delafossite PtCoO2
527Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
528Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
529CeO2 Doping of Hf0.5Zr0.5O2 Thin Films for High Endurance Ferroelectric Memories
530Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
531Plasma enhanced atomic layer deposition of zinc sulfide thin films
532Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
533Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
534Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
535Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
536Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
537Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
538Formation of aluminum nitride thin films as gate dielectrics on Si(100)
539Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
540Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
541Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
542Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
543Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
544X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
545Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
546Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
547Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
548Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
549Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
550Comparative study of ALD SiO2 thin films for optical applications
551Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
552Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
553Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
554Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
555Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
556Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
557Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
558Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
559Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
560Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
561Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
562Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
563Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
564Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
565Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
566In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
567Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
568Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
569Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
570TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
571A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
572Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
573A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
574Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
575Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
576Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
577Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
578Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
579Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
580Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
581Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
582Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
583Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
584Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
585Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
586Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
587The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
588Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
589TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
590Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
591High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
592Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
593Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
594Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
595Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
596Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
597Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
598Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
599Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
600Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
601Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition