Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Crystallinity, Crystal Structure, Grain Size, Atomic Structure returned 338 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
2	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3	A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
4	A route to low temperature growth of single crystal GaN on sapphire
5	Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
6	Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
7	ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
8	AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
9	Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
10	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
11	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
12	Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
13	Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
14	Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
15	Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
16	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
17	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
18	Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
19	Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
20	Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
21	Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
22	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
23	Atomic layer deposition of GaN at low temperatures
24	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
25	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
26	Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
27	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
28	Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
29	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
30	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
31	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
32	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
33	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
34	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
35	Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
36	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
37	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
38	Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
39	Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
40	Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
41	Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
42	Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
43	Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
44	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
45	Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
46	Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
47	Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
48	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
49	Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
50	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
51	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
52	Comparative study of ALD SiO2 thin films for optical applications
53	Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
54	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
55	Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
56	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
57	Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
58	Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
59	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
60	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
61	Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
62	Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
63	Crystalline growth of AlN thin films by atomic layer deposition
64	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
65	Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
66	Densification of Thin Aluminum Oxide Films by Thermal Treatments
67	Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
68	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
69	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
70	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
71	Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
72	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
73	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
74	Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
75	Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
76	Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
77	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
78	Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
79	Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
80	Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
81	Electrical characteristics of β-Ga2O3 thin films grown by PEALD
82	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
83	Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
84	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
85	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
86	Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
87	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
88	Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
89	Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
90	Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
91	Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
92	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
93	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
94	Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
95	Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
96	Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
97	Evaluation of plasma parameters on PEALD deposited TaCN
98	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
99	Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
100	Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
101	Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
102	Fast PEALD ZnO Thin-Film Transistor Circuits
103	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
104	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
105	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
106	Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
107	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
108	Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
109	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
110	Fully CMOS-compatible titanium nitride nanoantennas
111	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
112	Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
113	Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
114	Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
115	Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
116	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
117	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
118	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
119	Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
120	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
121	Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
122	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
123	High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
124	High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
125	High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
126	High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
127	High-Reflective Coatings For Ground and Space Based Applications
128	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
129	Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
130	Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
131	Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
132	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
133	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
134	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
135	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
136	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
137	Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
138	In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
139	In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
140	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
141	In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
142	Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
143	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
144	Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
145	Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
146	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
147	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
148	Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
149	Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
150	Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
151	Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
152	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
153	Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
154	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
155	Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
156	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
157	Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
158	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
159	Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
160	Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
161	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
162	Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
163	Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
164	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
165	Low temperature plasma enhanced deposition of GaP films on Si substrate
166	Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
167	Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
168	Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
169	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
170	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
171	Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
172	Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
173	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
174	Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
175	Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
176	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
177	Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
178	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
179	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
180	Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
181	Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
182	Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
183	Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
184	Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
185	Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
186	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
187	Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
188	New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
189	NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
190	Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
191	Nitride memristors
192	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
193	Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
194	Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
195	Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
196	Oxygen migration in TiO2-based higher-k gate stacks
197	Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
198	PEALD AlN: controlling growth and film crystallinity
199	PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
200	PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
201	Perspectives on future directions in III-N semiconductor research
202	Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
203	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
204	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
205	Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
206	Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
207	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
208	Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
209	Plasma enhanced atomic layer deposition of aluminum sulfide thin films
210	Plasma enhanced atomic layer deposition of Fe2O3 thin films
211	Plasma enhanced atomic layer deposition of Ga2O3 thin films
212	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
213	Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
214	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
215	Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
216	Plasma enhanced atomic layer deposition of zinc sulfide thin films
217	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
218	Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
219	Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
220	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
221	Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
222	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
223	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
224	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
225	Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
226	Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
227	Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
228	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
229	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
230	Plasma-enhanced atomic layer deposition of BaTiO3
231	Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
232	Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
233	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
234	Plasma-Enhanced Atomic Layer Deposition of Ni
235	Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
236	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
237	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
238	Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
239	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
240	Plasma-enhanced atomic layer deposition of superconducting niobium nitride
241	Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
242	Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
243	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
244	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
245	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
246	Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
247	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
248	Plasma-Modified Atomic Layer Deposition
249	Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
250	Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
251	Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
252	Properties of AlN grown by plasma enhanced atomic layer deposition
253	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
254	Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
255	Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
256	Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
257	Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
258	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
259	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
260	Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
261	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
262	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
263	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
264	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
265	Remote Plasma ALD of Platinum and Platinum Oxide Films
266	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
267	Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
268	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
269	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
270	Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
271	Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
272	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
273	Room-Temperature Atomic Layer Deposition of Platinum
274	Ru thin film grown on TaN by plasma enhanced atomic layer deposition
275	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
276	Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
277	Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
278	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
279	Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
280	Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
281	SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
282	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
283	Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
284	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
285	Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
286	Structural and optical characterization of low-temperature ALD crystalline AlN
287	Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
288	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
289	Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
290	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
291	Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
292	Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
293	Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
294	Study on the characteristics of aluminum thin films prepared by atomic layer deposition
295	Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
296	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
297	Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
298	Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
299	Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
300	Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
301	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
302	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
303	Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
304	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
305	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
306	Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
307	Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
308	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
309	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
310	Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
311	Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
312	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
313	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
314	The effects of layering in ferroelectric Si-doped HfO2 thin films
315	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
316	The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
317	The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
318	The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
319	The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
320	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
321	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
322	Thin film GaP for solar cell application
323	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
324	TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
325	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
326	Trilayer Tunnel Selectors for Memristor Memory Cells
327	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
328	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
329	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
330	Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
331	Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
332	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
333	Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
334	Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
335	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
336	Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
337	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
338	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

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