Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Crystallinity, Crystal Structure, Grain Size, Atomic Structure returned 388 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
3A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
4A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
5A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
6A route to low temperature growth of single crystal GaN on sapphire
7Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
8Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
11AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
12Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
13Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
14An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
15Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
16Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
17Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
18Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
19Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
20Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
21Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
22Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
23Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
24Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
25Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
26Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
27Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
28Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
29Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
30Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
31Atomic layer deposition of GaN at low temperatures
32Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
33Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
34Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
35Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
36Atomic layer deposition of metal-oxide thin films on cellulose fibers
37Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
38Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
39Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
40Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
41Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
42Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
43Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
44Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
45Atomic layer deposition of titanium nitride for quantum circuits
46Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
47Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
48Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
49Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
50Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
51Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
52Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
53Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
54Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
55Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
56Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
57Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
58Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
59Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
60Characteristics of HfO2 thin films grown by plasma atomic layer deposition
61Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
62Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
63Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
64Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
65Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
66Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
67Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
68Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
69Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
70Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
71Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
72Comparative study of ALD SiO2 thin films for optical applications
73Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
74Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
75Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
76Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
77Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
78Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
79Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
80Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
81Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
82Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
83Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
84Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
85Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
86Crystalline growth of AlN thin films by atomic layer deposition
87Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
88Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
89Densification of Thin Aluminum Oxide Films by Thermal Treatments
90Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
91Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
92Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
93Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
94Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
95Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
96Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
97Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
98Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
99Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
100Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
101Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
102Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
103Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
104Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
105Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
106Electrical characteristics of β-Ga2O3 thin films grown by PEALD
107Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
108Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
109Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
110Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
111Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
112Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
113Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
114Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
115Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
116Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
117Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
118Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
119Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
120Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
121Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
122Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
123Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
124Evaluation of plasma parameters on PEALD deposited TaCN
125Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
126Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
127Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
128Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
129Fast PEALD ZnO Thin-Film Transistor Circuits
130Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
131Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
132Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
133Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
134Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
135Formation of aluminum nitride thin films as gate dielectrics on Si(100)
136Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
137Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
138Fully CMOS-compatible titanium nitride nanoantennas
139Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
140Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
141Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
142Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
143Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
144Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
145Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
146Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
147Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
148Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
149Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
150Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
151HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
152HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
153High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
154High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
155High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
156High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
157High-Reflective Coatings For Ground and Space Based Applications
158Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
159Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
160Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
161Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
162Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
163Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
164Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
165Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
166Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
167Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
168In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
169In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
170In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
171In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
172Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
173Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
174Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
175Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
176Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
177Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
178Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
179Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
180Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
181Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
182Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
183Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
184Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
185Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
186Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
187Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
188Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
189Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
190Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
191Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
192Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
193Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
194Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
195Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
196Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
197Low temperature plasma enhanced deposition of GaP films on Si substrate
198Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
199Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
200Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
201Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
202Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
203Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
204Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
205Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
206Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
207Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
208Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
209Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
210Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
211Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
212Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
213Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
214Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
215Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
216Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
217Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
218Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
219Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
220Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
221New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
222NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
223Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
224Nitride memristors
225Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
226Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
227Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
228Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
229Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
230Oxygen migration in TiO2-based higher-k gate stacks
231Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
232PEALD AlN: controlling growth and film crystallinity
233PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
234PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
235Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
236Perspectives on future directions in III-N semiconductor research
237Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
238Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
239Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
240Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
241Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
242Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
243Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
244Plasma enhanced atomic layer deposition of aluminum sulfide thin films
245Plasma enhanced atomic layer deposition of Fe2O3 thin films
246Plasma enhanced atomic layer deposition of Ga2O3 thin films
247Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
248Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
249Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
250Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
251Plasma enhanced atomic layer deposition of zinc sulfide thin films
252Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
253Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
254Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
255Plasma-Assisted Atomic Layer Deposition of Palladium
256Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
257Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
258Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
259Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
260Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
261Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
262Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
263Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
264Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
265Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
266Plasma-enhanced atomic layer deposition of BaTiO3
267Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
268Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
269Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
270Plasma-Enhanced Atomic Layer Deposition of Ni
271Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
272Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
273Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
274Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
275Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
276Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
277Plasma-enhanced atomic layer deposition of superconducting niobium nitride
278Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
279Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
280Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
281Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
282Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
283Plasma-enhanced atomic layer deposition of titanium vanadium nitride
284Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
285Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
286Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
287Plasma-Modified Atomic Layer Deposition
288Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
289Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
290Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
291Properties of AlN grown by plasma enhanced atomic layer deposition
292Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
293Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
294Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
295Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
296Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
297Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
298Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
299Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
300Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
301Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
302Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
303Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
304Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
305Remote Plasma ALD of Platinum and Platinum Oxide Films
306Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
307Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
308Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
309Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
310Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
311Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
312Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
313Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
314Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
315Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
316Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
317Room-Temperature Atomic Layer Deposition of Platinum
318Ru thin film grown on TaN by plasma enhanced atomic layer deposition
319Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
320Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
321Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
322Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
323Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
324Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
325SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
326Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
327Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
328Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
329Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
330Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
331Structural and optical characterization of low-temperature ALD crystalline AlN
332Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
333Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
334Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
335Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
336Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
337Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
338Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
339Study on the characteristics of aluminum thin films prepared by atomic layer deposition
340Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
341Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
342Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
343Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
344Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
345Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
346Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
347Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
348Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
349Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
350Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
351Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
352Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
353Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
354TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
355Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
356Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
357Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
358The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
359The effects of layering in ferroelectric Si-doped HfO2 thin films
360The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
361The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
362The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
363The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
364The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
365The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
366The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
367The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
368Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
369Thin film GaP for solar cell application
370Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
371TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
372TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
373Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
374Tribological properties of thin films made by atomic layer deposition sliding against silicon
375Trilayer Tunnel Selectors for Memristor Memory Cells
376Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
377Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
378Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
379Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
380Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
381Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
382Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
383Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
384Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
385WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
386Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
387X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
388ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


Shortcuts

Films
Precursors
Deposition Hardware
Authors
Film and Plasma Characteristics
Multi-factor Search
ALD and PEALD Background
On-line PEALD Theses
About plasma-ald.com

Contact Us
ALD Links

© 2014-2019 plasma-ald.com