Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
2Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
3Atomic hydrogen-assisted ALE of germanium
4Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
5Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
6New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
7Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
8Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
9Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
10Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
11Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
12Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
13Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
14Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
15The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
16Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
17Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
18Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
19ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
20Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
21Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
22Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
23Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
24Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
25Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
26ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
27Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
28Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
29Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
30Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
31Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
32Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
33Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
34Atomic layer deposition of metal-oxide thin films on cellulose fibers
35Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
36Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
37Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
38A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
39Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
40Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
41Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
42Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
433D structure evolution using metastable atomic layer deposition based on planar silver templates
44Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
45Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
46Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
47Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
48Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
49Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
50Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
51Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
52Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
53Formation of aluminum nitride thin films as gate dielectrics on Si(100)
54Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
55Sub-7-nm textured ZrO2 with giant ferroelectricity
56Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
57Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
58Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
59Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
60Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
61Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
62Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
63Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
64Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
65Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
66Atomic layer deposition of InN using trimethylindium and ammonia plasma
67Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
68Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
69Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
70Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
71Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
72Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
73Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
74Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
75Atomic layer deposition of titanium nitride for quantum circuits
76In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
77Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
78Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
79Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
80Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
81Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
82Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
83Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
84Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
85Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
86Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
87In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
88Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
89Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
90Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
91Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
92Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
93Plasma-enhanced atomic layer deposition of titanium vanadium nitride
94NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
95Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
96Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
97Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
98PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
99Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
100Sub-10-nm ferroelectric Gd-doped HfO2 layers
101Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
102Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
103Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
104Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
105Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
106Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
107Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
108Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
109Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
110Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
111Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
112Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
113Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
114Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
115Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
116Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
117TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
118Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
119In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
120Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
121PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
122Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
123Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
124Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
125Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
126Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
127Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
128Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
129Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
130Comparative study of ALD SiO2 thin films for optical applications
131Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
132Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
133Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
134Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
135Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
136Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
137Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
138Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
139The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
140Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
141Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
142Plasma enhanced atomic layer deposition of Ga2O3 thin films
143Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
144Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
145A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
146Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
147Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
148The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
149Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
150The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
151Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
152High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
153Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
154Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
155High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
156TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
157Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
158Perspectives on future directions in III-N semiconductor research
159Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
160Characteristics of HfO2 thin films grown by plasma atomic layer deposition
161Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
162Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
163Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
164Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
165Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
166Electron-enhanced atomic layer deposition of silicon thin films at room temperature
167SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
168Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
169Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
170Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
171Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
172Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
173Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
174Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
175Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
176Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
177Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
178Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
179Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
180Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
181Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
182Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
183Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
184Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
185Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
186Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
187Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
188Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
189Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
190Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
191Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
192Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
193Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
194Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
195Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
196Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
197Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
198Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
199Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
200Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
201Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
202Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
203Plasma enhanced atomic layer deposition of Fe2O3 thin films
204Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
205Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
206Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
207Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
208Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
209Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
210Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
211Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
212Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
213Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
214Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
215Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
216Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
217Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
218Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
219Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
220Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
221A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
222Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
223Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
224A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
225Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
226Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
227Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
228PEALD AlN: controlling growth and film crystallinity
229Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
230Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
231Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
232Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
233Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
234Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
235Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
236Texture of atomic layer deposited ruthenium
237Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
238Densification of Thin Aluminum Oxide Films by Thermal Treatments
239HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
240Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
241Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
242Thin film GaP for solar cell application
243HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
244Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
245Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
246Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
247Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
248Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
249Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
250Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
251P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
252Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
253Plasma-Enhanced Atomic Layer Deposition of Ni
254Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
255In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
256Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
257Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
258An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
259Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
260Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
261Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
262TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
263Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
264Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
265Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
266Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
267The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
268Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
269Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
270Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
271Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
272Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
273Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
274Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
275Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
276Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
277Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
278Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
279In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
280Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
281Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
282Atomic layer epitaxy of Si using atomic H
283Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
284Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
285Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
286Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
287Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
288Nitride memristors
289Plasma enhanced atomic layer deposition of gallium sulfide thin films
290Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
291Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
292Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
293Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
294Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
295Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
296Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
297High-Reflective Coatings For Ground and Space Based Applications
298Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
299Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
300Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
301Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
302Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
303Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
304Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
305Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
306ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
307Ru thin film grown on TaN by plasma enhanced atomic layer deposition
308Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
309Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
310Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
311The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
312Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
313Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
314Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
315Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
316High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
317Structural and optical characterization of low-temperature ALD crystalline AlN
318Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
319Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
320Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
321The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
322Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
323Oxygen migration in TiO2-based higher-k gate stacks
324Atomic layer deposition of GaN at low temperatures
325Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
326Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
327Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
328Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
329Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
330Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
331Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
332Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
333Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
334Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
335Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
336Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
337Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
338Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
339Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
340Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
341Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
342Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
343Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
344Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
345Plasma-enhanced atomic layer deposition of superconducting niobium nitride
346Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
347Layer-by-layer epitaxial growth of GaN at low temperatures
348Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
349Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
350Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
351Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
352Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
353Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
354Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
355Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
356High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
357Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
358Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
359Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
360Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
361Plasma enhanced atomic layer deposition of zinc sulfide thin films
362Fast PEALD ZnO Thin-Film Transistor Circuits
363Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
364Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
365Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
366Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
367Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
368Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
369Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
370Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
371Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
372Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
373Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
374Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
375Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
376Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
377Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
378In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
379Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
380Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
381Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
382Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
383Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
384Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
385Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
386Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
387Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
388Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
389Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
390Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
391Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
392Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
393Atomic layer deposition of YMnO3 thin films
394Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
395Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
396Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
397Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
398Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
399Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
400Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
401In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
402Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
403Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
404Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
405Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
406Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
407Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
408High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
409Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
410Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
411Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
412Plasma-Modified Atomic Layer Deposition
413Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
414Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
415Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
416Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
417α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
418ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
419Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
420Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
421Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
422Plasma-enhanced atomic layer deposition of BaTiO3
423Experimental and theoretical determination of the role of ions in atomic layer annealing
424In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
425Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
426Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
427Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
428Low temperature plasma enhanced deposition of GaP films on Si substrate
429Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
430Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
431Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
432Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
433Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
434Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
435Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
436The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
437Trilayer Tunnel Selectors for Memristor Memory Cells
438The effects of layering in ferroelectric Si-doped HfO2 thin films
439Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
440Tribological properties of thin films made by atomic layer deposition sliding against silicon
441Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
442Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
443Plasma-Assisted Atomic Layer Deposition of Palladium
444Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
445TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
446Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
447Sub-nanometer heating depth of atomic layer annealing
448Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
449High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
450From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
451Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
452Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
453Crystalline growth of AlN thin films by atomic layer deposition
454The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
455Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
456Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
457Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
458Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
459Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
460Plasma-enhanced atomic layer deposition of vanadium nitride
461Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
462Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
463Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
464Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
465Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
466Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
467The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
468Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
469PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
470The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
471Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
472A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
473Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
474Study on the characteristics of aluminum thin films prepared by atomic layer deposition
475The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
476Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
477Room-Temperature Atomic Layer Deposition of Platinum
478Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
479Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
480Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
481Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
482Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
483Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
484Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
485Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
486Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
487Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
488Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
489Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
490Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
491Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
492Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
493A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
494Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
495Plasma enhanced atomic layer deposition of aluminum sulfide thin films
496Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
497AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
498Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
499Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
500Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
501Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
502Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
503Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
504A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
505The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
506GeSbTe deposition for the PRAM application
507Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
508Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
509Evaluation of plasma parameters on PEALD deposited TaCN
510Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
511Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
512Properties of AlN grown by plasma enhanced atomic layer deposition
513Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
514Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
515Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
516Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
517Remote Plasma ALD of Platinum and Platinum Oxide Films
518Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
519Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
520Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
521Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
522Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
523WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
524Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
525Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
526Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
527Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
528Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
529A route to low temperature growth of single crystal GaN on sapphire
530Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
531Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
532A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
533Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
534Fully CMOS-compatible titanium nitride nanoantennas
535Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
536HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
537Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
538Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
539Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
540Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
541Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
542Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
543Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
544Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
545Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
546Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
547X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
548Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
549Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
550Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
551Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
552Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
553Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
554Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
555Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
556Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
557Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
558Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
559Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
560Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
561A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
562Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
563Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
564Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
565AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
566Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
567Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
568Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
569Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
570Atomic Layer Deposition of the Conductive Delafossite PtCoO2
571Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
572Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
573Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
574Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
575Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys