Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
3A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
4A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
5A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
6A route to low temperature growth of single crystal GaN on sapphire
7Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
8Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
11AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
12Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
13Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
14An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
15Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
16Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
17Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
18Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
19Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
20Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
21Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
22Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
23Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
24Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
25Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
26Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
27Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
28Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
29Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
30Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
31Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
32Atomic layer deposition of GaN at low temperatures
33Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
34Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
35Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
36Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
37Atomic layer deposition of metal-oxide thin films on cellulose fibers
38Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
39Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
40Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
41Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
42Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
43Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
44Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
45Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
46Atomic layer deposition of titanium nitride for quantum circuits
47Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
48Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
49Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
50Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
51Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
52Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
53Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
54Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
55Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
56Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
57Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
58Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
59Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
60Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
61Characteristics of HfO2 thin films grown by plasma atomic layer deposition
62Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
63Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
64Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
65Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
66Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
67Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
68Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
69Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
70Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
71Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
72Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
73Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
74Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
75Comparative study of ALD SiO2 thin films for optical applications
76Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
77Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
78Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
79Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
80Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
81Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
82Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
83Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
84Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
85Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
86Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
87Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
88Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
89Crystalline growth of AlN thin films by atomic layer deposition
90Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
91Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
92Densification of Thin Aluminum Oxide Films by Thermal Treatments
93Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
94Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
95Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
96Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
97Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
98Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
99Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
100Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
101Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
102Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
103Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
104Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
105Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
106Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
107Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
108Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
109Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
110Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
111Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
112Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
113Electrical characteristics of β-Ga2O3 thin films grown by PEALD
114Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
115Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
116Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
117Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
118Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
119Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
120Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
121Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
122Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
123Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
124Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
125Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
126Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
127Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
128Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
129Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
130Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
131Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
132Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
133Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
134Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
135Evaluation of plasma parameters on PEALD deposited TaCN
136Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
137Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
138Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
139Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
140Fast PEALD ZnO Thin-Film Transistor Circuits
141Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
142Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
143Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
144Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
145Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
146Formation of aluminum nitride thin films as gate dielectrics on Si(100)
147Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
148Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
149Fully CMOS-compatible titanium nitride nanoantennas
150Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
151GeSbTe deposition for the PRAM application
152Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
153Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
154Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
155Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
156Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
157Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
158Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
159Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
160Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
161Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
162Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
163Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
164Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
165Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
166HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
167HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
168High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
169High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
170High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
171High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
172High-Reflective Coatings For Ground and Space Based Applications
173High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
174Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
175Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
176Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
177Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
178Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
179Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
180Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
181Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
182Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
183Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
184Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
185Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
186Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
187In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
188In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
189In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
190In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
191In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
192In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
193Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
194Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
195Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
196Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
197Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
198Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
199Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
200Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
201Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
202Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
203Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
204Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
205Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
206Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
207Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
208Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
209Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
210Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
211Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
212Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
213Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
214Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
215Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
216Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
217Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
218Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
219Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
220Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
221Low temperature plasma enhanced deposition of GaP films on Si substrate
222Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
223Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
224Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
225Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
226Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
227Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
228Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
229Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
230Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
231Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
232Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
233Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
234Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
235Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
236Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
237Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
238Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
239Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
240Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
241Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
242Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
243Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
244Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
245Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
246Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
247Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
248Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
249Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
250New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
251NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
252Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
253Nitride memristors
254Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
255Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
256Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
257Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
258Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
259Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
260Oxygen migration in TiO2-based higher-k gate stacks
261Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
262PEALD AlN: controlling growth and film crystallinity
263PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
264PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
265Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
266Perspectives on future directions in III-N semiconductor research
267Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
268Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
269Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
270Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
271Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
272Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
273Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
274Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
275Plasma enhanced atomic layer deposition of aluminum sulfide thin films
276Plasma enhanced atomic layer deposition of Fe2O3 thin films
277Plasma enhanced atomic layer deposition of Ga2O3 thin films
278Plasma enhanced atomic layer deposition of gallium sulfide thin films
279Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
280Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
281Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
282Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
283Plasma enhanced atomic layer deposition of zinc sulfide thin films
284Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
285Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
286Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
287Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
288Plasma-Assisted Atomic Layer Deposition of Palladium
289Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
290Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
291Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
292Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
293Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
294Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
295Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
296Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
297Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
298Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
299Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
300Plasma-enhanced atomic layer deposition of BaTiO3
301Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
302Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
303Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
304Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
305Plasma-Enhanced Atomic Layer Deposition of Ni
306Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
307Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
308Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
309Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
310Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
311Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
312Plasma-enhanced atomic layer deposition of superconducting niobium nitride
313Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
314Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
315Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
316Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
317Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
318Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
319Plasma-enhanced atomic layer deposition of titanium vanadium nitride
320Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
321Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
322Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
323Plasma-Modified Atomic Layer Deposition
324Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
325Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
326Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
327Properties of AlN grown by plasma enhanced atomic layer deposition
328Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
329Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
330Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
331Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
332Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
333Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
334Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
335Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
336Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
337Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
338Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
339Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
340Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition
341Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
342Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
343Remote Plasma ALD of Platinum and Platinum Oxide Films
344Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
345Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
346Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
347Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
348Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
349Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
350Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
351Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
352Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
353Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
354Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
355Room-Temperature Atomic Layer Deposition of Platinum
356Ru thin film grown on TaN by plasma enhanced atomic layer deposition
357Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
358Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
359Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
360Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
361Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
362Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
363SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
364Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
365Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
366Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
367Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
368Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
369Structural and optical characterization of low-temperature ALD crystalline AlN
370Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
371Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
372Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
373Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
374Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
375Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
376Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
377Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
378Study on the characteristics of aluminum thin films prepared by atomic layer deposition
379Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
380Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
381Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
382Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
383Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
384Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
385Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
386Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
387Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
388Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
389Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
390Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
391Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
392Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
393Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
394TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
395Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
396Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
397Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
398The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
399The effects of layering in ferroelectric Si-doped HfO2 thin films
400The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
401The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
402The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
403The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
404The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
405The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
406The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
407The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
408Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
409Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
410Thin film GaP for solar cell application
411Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
412TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
413TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
414Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
415Tribological properties of thin films made by atomic layer deposition sliding against silicon
416Trilayer Tunnel Selectors for Memristor Memory Cells
417Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
418Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
419Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
420Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
421Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
422Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
423Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
424Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
425Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
426WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
427Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
428X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
429ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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