Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Crystallinity, Crystal Structure, Grain Size, Atomic Structure returned 576 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
13D structure evolution using metastable atomic layer deposition based on planar silver templates
2A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
3A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
6A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
7A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
8A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
9A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
10A route to low temperature growth of single crystal GaN on sapphire
11A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
12Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
13Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
14Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
15ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
16ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
17AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
18AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
19Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
20Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
21Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
22An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
23Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
24Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
25Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
26Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
27Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
28Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
29Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
30Atomic hydrogen-assisted ALE of germanium
31Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
32Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
33Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
34Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
35Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
36Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
37Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
38Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
39Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
40Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
41Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
42Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
43Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
44Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
45Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
46Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
47Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
48Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
49Atomic layer deposition of GaN at low temperatures
50Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
51Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
52Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
53Atomic layer deposition of InN using trimethylindium and ammonia plasma
54Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
55Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
56Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
57Atomic layer deposition of metal-oxide thin films on cellulose fibers
58Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
59Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
60Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
61Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
62Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
63Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
64Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
65Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
66Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
67Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
68Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
69Atomic layer deposition of titanium nitride for quantum circuits
70Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
71Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
72Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
73Atomic layer deposition of YMnO3 thin films
74Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
75Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
76Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
77Atomic layer epitaxy of Si using atomic H
78Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
79Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
80Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
81Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
82Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
83Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
84Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
85Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
86Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
87Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
88Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
89Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
90Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
91Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
92Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
93Characteristics of HfO2 thin films grown by plasma atomic layer deposition
94Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
95Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
96Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
97Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
98Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
99Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
100Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
101Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
102Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
103Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
104Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
105Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
106Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
107Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
108Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
109Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
110Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
111Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
112Comparative study of ALD SiO2 thin films for optical applications
113Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
114Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
115Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
116Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
117Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
118Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
119Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
120Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
121Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
122Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
123Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
124Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
125Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
126Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
127Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
128Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
129Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
130Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
131Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
132Crystalline growth of AlN thin films by atomic layer deposition
133Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
134Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
135Densification of Thin Aluminum Oxide Films by Thermal Treatments
136Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
137Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
138Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
139Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
140Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
141Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
142Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
143Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
144Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
145Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
146Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
147Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
148Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
149Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
150Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
151Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
152Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
153Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
154Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
155Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
156Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
157Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
158Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
159Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
160Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
161Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
162Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
163Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
164Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
165Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
166Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
167Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
168Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
169Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
170Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
171Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
172Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
173Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
174Electron-enhanced atomic layer deposition of silicon thin films at room temperature
175Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
176Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
177Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
178Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
179Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
180Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
181Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
182Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
183Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
184Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
185Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
186Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
187Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
188Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
189Evaluation of plasma parameters on PEALD deposited TaCN
190Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
191Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
192Fast PEALD ZnO Thin-Film Transistor Circuits
193Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
194Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
195Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
196Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
197Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
198Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
199Formation of aluminum nitride thin films as gate dielectrics on Si(100)
200Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
201Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
202From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
203Fully CMOS-compatible titanium nitride nanoantennas
204Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
205GeSbTe deposition for the PRAM application
206Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
207Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
208Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
209Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
210Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
211Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
212Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
213Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
214Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
215Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
216Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
217Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
218Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
219Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
220Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
221Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
222Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
223Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
224Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
225Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
226Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
227HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
228HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
229HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
230High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
231High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
232High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
233High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
234High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
235High-Reflective Coatings For Ground and Space Based Applications
236High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
237Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
238Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
239Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
240Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
241Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
242Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
243Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
244Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
245Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
246Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
247Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
248Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
249Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
250In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
251In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
252In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
253In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
254In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
255In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
256In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
257In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
258Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
259Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
260Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
261Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
262Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
263Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
264Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
265Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
266Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
267Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
268Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
269Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
270Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
271Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
272Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
273Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
274Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
275Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
276Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
277Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
278Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
279Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
280Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
281Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
282Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
283Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
284Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
285Layer-by-layer epitaxial growth of GaN at low temperatures
286Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
287Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
288Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
289Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
290Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
291Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
292Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
293Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
294Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
295Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
296Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
297Low temperature plasma enhanced deposition of GaP films on Si substrate
298Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
299Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
300Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
301Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
302Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
303Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
304Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
305Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
306Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
307Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
308Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
309Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
310Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
311Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
312Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
313Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
314Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
315Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
316Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
317Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
318Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
319Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
320Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
321Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
322Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
323Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
324Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
325Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
326New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
327Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
328NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
329Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
330Nitride memristors
331Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
332Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
333Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
334Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
335Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
336Oxygen migration in TiO2-based higher-k gate stacks
337P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
338Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
339PEALD AlN: controlling growth and film crystallinity
340PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
341PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
342PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
343Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
344Perspectives on future directions in III-N semiconductor research
345Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
346Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
347Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
348Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
349Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
350Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
351Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
352Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
353Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
354Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
355Plasma enhanced atomic layer deposition of aluminum sulfide thin films
356Plasma enhanced atomic layer deposition of Fe2O3 thin films
357Plasma enhanced atomic layer deposition of Ga2O3 thin films
358Plasma enhanced atomic layer deposition of gallium sulfide thin films
359Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
360Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
361Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
362Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
363Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
364Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
365Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
366Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
367Plasma enhanced atomic layer deposition of zinc sulfide thin films
368Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
369Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
370Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
371Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
372Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
373Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
374Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
375Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
376Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
377Plasma-Assisted Atomic Layer Deposition of Palladium
378Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
379Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
380Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
381Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
382Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
383Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
384Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
385Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
386Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
387Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
388Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
389Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
390Plasma-enhanced atomic layer deposition of BaTiO3
391Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
392Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
393Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
394Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
395Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
396Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
397Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
398Plasma-Enhanced Atomic Layer Deposition of Ni
399Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
400Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
401Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
402Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
403Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
404Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
405Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
406Plasma-enhanced atomic layer deposition of superconducting niobium nitride
407Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
408Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
409Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
410Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
411Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
412Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
413Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
414Plasma-enhanced atomic layer deposition of titanium vanadium nitride
415Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
416Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
417Plasma-enhanced atomic layer deposition of vanadium nitride
418Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
419Plasma-Modified Atomic Layer Deposition
420Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
421Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
422Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
423Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
424Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
425Properties of AlN grown by plasma enhanced atomic layer deposition
426Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
427Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
428Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
429Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
430Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
431Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
432Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
433Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
434Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
435Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
436Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
437Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
438Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
439Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
440Remote Plasma ALD of Platinum and Platinum Oxide Films
441Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
442Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
443Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
444Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
445Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
446Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
447Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
448Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
449Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
450Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
451Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
452Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
453Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
454Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
455Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
456Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
457Room-Temperature Atomic Layer Deposition of Platinum
458Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
459Ru thin film grown on TaN by plasma enhanced atomic layer deposition
460Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
461Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
462Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
463Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
464Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
465Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
466Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
467SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
468Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
469Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
470Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
471Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
472Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
473Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
474Structural and optical characterization of low-temperature ALD crystalline AlN
475Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
476Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
477Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
478Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
479Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
480Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
481Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
482Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
483Study on the characteristics of aluminum thin films prepared by atomic layer deposition
484Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
485Sub-7-nm textured ZrO2 with giant ferroelectricity
486Sub-nanometer heating depth of atomic layer annealing
487Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
488Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
489Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
490Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
491Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
492Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
493Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
494Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
495Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
496Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
497Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
498Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
499TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
500Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
501Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
502Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
503TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
504Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
505Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
506Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
507Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
508Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
509Texture of atomic layer deposited ruthenium
510The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
511The effects of layering in ferroelectric Si-doped HfO2 thin films
512The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
513The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
514The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
515The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
516The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
517The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
518The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
519The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
520The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
521The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
522The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
523The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
524Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
525Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
526Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
527Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
528Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
529Thin film GaP for solar cell application
530Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
531TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
532TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
533Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
534Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
535Tribological properties of thin films made by atomic layer deposition sliding against silicon
536Trilayer Tunnel Selectors for Memristor Memory Cells
537Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
538Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
539Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
540Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
541Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
542Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
543Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
544Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
545Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
546Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
547Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
548Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
549Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
550WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
551Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
552X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
553ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
554ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
555α-Ga2O3 grown by low temperature atomic layer deposition on sapphire