Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
2Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
3Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
4Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
5Atomic layer epitaxy of Si using atomic H
6Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
7The effects of layering in ferroelectric Si-doped HfO2 thin films
8Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
9Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
10Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
11Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
12Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
13Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
14Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
15Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
16Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
17Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
18Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
19Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
20Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
21High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
22Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
23Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
24Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
25Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
26TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
27Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
28Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
29Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
30Plasma-enhanced atomic layer deposition of titanium vanadium nitride
31Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
32Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
33Plasma-enhanced atomic layer deposition of superconducting niobium nitride
34Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
35Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
36Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
37Atomic layer deposition of titanium nitride for quantum circuits
38Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
39Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
40Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
41Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
42Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
43Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
44Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
45Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
46The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
47Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
48Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
49TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
50Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
51Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
52Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
53Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
54Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
55Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
56Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
57Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
58Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
59Ru thin film grown on TaN by plasma enhanced atomic layer deposition
60Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
61PEALD AlN: controlling growth and film crystallinity
62Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
63Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
64Densification of Thin Aluminum Oxide Films by Thermal Treatments
65Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
66WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
67Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
68Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
69Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
70GeSbTe deposition for the PRAM application
71Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
72Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
73A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
74Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
75In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
76Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
77Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
78Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
79Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
80A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
81Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
82Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
83ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
84Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
85High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
86Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
87Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
88Low temperature plasma enhanced deposition of GaP films on Si substrate
89Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
90Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
91Plasma enhanced atomic layer deposition of Fe2O3 thin films
92Electron-enhanced atomic layer deposition of silicon thin films at room temperature
93Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
94Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
95Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
96P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
97Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
98Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
99Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
100Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
101Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
102Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
103A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
104Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
105Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
106Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
107Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
108Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
109A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
110Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
111Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
112PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
113New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
114High-Reflective Coatings For Ground and Space Based Applications
115Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
116Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
117High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
118In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
119Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
120Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
121Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
122Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
123Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
124Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
125Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
126Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
127Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
128Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
129In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
130Plasma enhanced atomic layer deposition of gallium sulfide thin films
131Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
132Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
133Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
134Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
135Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
136Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
137Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
138Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
139Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
140Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
141Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
142Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
143The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
144Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
145α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
146Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
147Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
148Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
149Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
150Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
151Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
152Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
153Texture of atomic layer deposited ruthenium
154Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
155Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
156Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
157Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
158Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
159In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
160The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
161Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
162Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
163AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
164Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
165The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
166Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
167Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
168Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
169Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
1703D structure evolution using metastable atomic layer deposition based on planar silver templates
171Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
172The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
173Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
174Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
175Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
176Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
177Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
178Oxygen migration in TiO2-based higher-k gate stacks
179Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
180Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
181Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
182In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
183Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
184Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
185Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
186Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
187Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
188Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
189Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
190Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
191Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
192High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
193Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
194Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
195Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
196Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
197Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
198Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
199Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
200Atomic hydrogen-assisted ALE of germanium
201In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
202Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
203Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
204Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
205Plasma-Modified Atomic Layer Deposition
206Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
207Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
208Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
209Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
210Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
211Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
212Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
213Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
214Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
215Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
216Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
217Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
218Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
219Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
220Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
221CeO2 Doping of Hf0.5Zr0.5O2 Thin Films for High Endurance Ferroelectric Memories
222The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
223Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
224The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
225Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
226Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
227Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
228Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
229Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
230Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
231Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
232Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
233Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
234Gallium nitride thin films by microwave plasma-assisted ALD
235Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
236Plasma-enhanced atomic layer deposition of BaTiO3
237Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
238A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
239Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
240Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
241The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
242Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
243Comparative study of ALD SiO2 thin films for optical applications
244Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
245Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
246Plasma enhanced atomic layer deposition of Ga2O3 thin films
247Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
248Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
249Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
250The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
251Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
252Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
253Atomic layer deposition of InN using trimethylindium and ammonia plasma
254Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
255Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
256Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
257Room-Temperature Atomic Layer Deposition of Platinum
258Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
259Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
260Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
261Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
262Properties of AlN grown by plasma enhanced atomic layer deposition
263Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
264Atomic layer deposition of GaN at low temperatures
265Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
266Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
267Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
268Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
269Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
270Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
271Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
272Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
273Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
274Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
275Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
276Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
277Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
278Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
279Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
280High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
281Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
282Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
283Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
284In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
285Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
286HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
287Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
288Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
289Remote Plasma ALD of Platinum and Platinum Oxide Films
290Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
291Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
292Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
293Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
294Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
295X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
296Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
297Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
298Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
299Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
300Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
301Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
302Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
303Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
304Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
305Plasma-Assisted Atomic Layer Deposition of Palladium
306Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
307NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
308Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
309Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
310Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
311Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
312Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
313Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
314ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
315Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
316Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
317In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
318Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
319Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
320A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
321Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
322Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
323Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
324Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
325Formation of aluminum nitride thin films as gate dielectrics on Si(100)
326Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
327Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
328Trilayer Tunnel Selectors for Memristor Memory Cells
329Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
330Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
331Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
332Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
333Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
334Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
335Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
336Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
337Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
338Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
339Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
340Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
341Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
342Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
343ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
344Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
345Tribological properties of thin films made by atomic layer deposition sliding against silicon
346Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
347Atomic Layer Deposition of the Conductive Delafossite PtCoO2
348Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
349Plasma-enhanced atomic layer deposition of vanadium nitride
350Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
351Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
352Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
353Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
354Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
355Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
356Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
357Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
358Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
359Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
360Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
361Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
362A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
363Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
364Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
365Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
366Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
367Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
368Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
369Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
370Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
371Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
372Evaluation of plasma parameters on PEALD deposited TaCN
373Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
374ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
375Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
376Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
377HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
378PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
379Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
380Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
381Structural and optical characterization of low-temperature ALD crystalline AlN
382Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
383Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
384Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
385Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
386Nitride memristors
387Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
388Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
389Experimental and theoretical determination of the role of ions in atomic layer annealing
390Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
391Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
392Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
393Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
394Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
395Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
396Plasma enhanced atomic layer deposition of aluminum sulfide thin films
397Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
398Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
399Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
400Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
401Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
402Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
403PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
404Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
405An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
406Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
407Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
408Fully CMOS-compatible titanium nitride nanoantennas
409Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
410Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
411Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
412Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
413Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
414Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
415Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
416Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
417Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
418Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
419Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
420Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
421Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
422Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
423Layer-by-layer epitaxial growth of GaN at low temperatures
424Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
425Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
426Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
427Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
428Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
429Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
430Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
431Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
432Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
433Characteristics of HfO2 thin films grown by plasma atomic layer deposition
434Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
435Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
436Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
437TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
438The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
439Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
440Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
441Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
442Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
443Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
444Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
445Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
446Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
447Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
448Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
449Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
450Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
451Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
452Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
453Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
454Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
455Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
456Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
457Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
458Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
459Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
460Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
461Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
462Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
463Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
464Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
465Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
466Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
467Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
468Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
469Study on the characteristics of aluminum thin films prepared by atomic layer deposition
470Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
471Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
472A route to low temperature growth of single crystal GaN on sapphire
473The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
474Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
475Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
476Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
477Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
478Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
479Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
480Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
481Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
482Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
483Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
484Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
485Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
486Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
487Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
488Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
489From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
490Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
491Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
492Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
493Thin film GaP for solar cell application
494Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
495TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
496Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
497Fast PEALD ZnO Thin-Film Transistor Circuits
498Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
499Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
500Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
501High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
502Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
503Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
504Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
505Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
506Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
507Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
508Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
509Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
510Atomic layer deposition of YMnO3 thin films
511Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
512Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
513Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
514Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
515Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
516Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
517Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
518Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
519HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
520Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
521Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
522A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
523Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
524Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
525Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
526Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
527Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
528Plasma enhanced atomic layer deposition of zinc sulfide thin films
529Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
530Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
531Sub-10-nm ferroelectric Gd-doped HfO2 layers
532Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
533A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
534Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
535Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
536Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
537Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
538Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
539Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
540Perspectives on future directions in III-N semiconductor research
541Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
542Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
543Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
544Sub-nanometer heating depth of atomic layer annealing
545Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
546Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
547Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
548Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
549Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
550Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
551Atomic layer deposition of metal-oxide thin films on cellulose fibers
552Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
553Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
554Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
555Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
556Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
557Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
558Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
559The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
560SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
561Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
562Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
563Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
564Plasma-Enhanced Atomic Layer Deposition of Ni
565Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
566Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
567Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
568Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
569Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
570Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
571Crystalline growth of AlN thin films by atomic layer deposition
572Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
573Sub-7-nm textured ZrO2 with giant ferroelectricity
574Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
575Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
576Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
577Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
578Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
579The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
580AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers