Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
2α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
3Thin film GaP for solar cell application
4Plasma-Assisted Atomic Layer Deposition of Palladium
5Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
6Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
7Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
8Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
9Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
10Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
11In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
12Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
13Remote Plasma ALD of Platinum and Platinum Oxide Films
14Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
15Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
16Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
17Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
18Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
19Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
20Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
21Trilayer Tunnel Selectors for Memristor Memory Cells
22Atomic Layer Deposition of the Conductive Delafossite PtCoO2
23Plasma enhanced atomic layer deposition of zinc sulfide thin films
24Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
25Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
26Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
27A route to low temperature growth of single crystal GaN on sapphire
28Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
29Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
30Plasma-Enhanced Atomic Layer Deposition of Ni
31Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
32Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
33Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
34Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
35Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
36Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
37Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
38Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
39Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
40Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
41Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
42Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
43Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
44A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
45Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
46A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
47Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
48Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
49Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
50A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
51Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
52Plasma-enhanced atomic layer deposition of BaTiO3
53Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
54PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
55Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
56Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
57TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
58Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
59Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
60ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
61Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
62Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
63Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
64Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
65Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
66Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
67HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
68Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
69Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
70Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
71Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
72Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
73Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
74Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
75Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
76Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
77Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
78Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
79Characteristics of HfO2 thin films grown by plasma atomic layer deposition
80Atomic layer deposition of YMnO3 thin films
81Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
82Evaluation of plasma parameters on PEALD deposited TaCN
83Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
84Atomic layer deposition of metal-oxide thin films on cellulose fibers
85Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
863D structure evolution using metastable atomic layer deposition based on planar silver templates
87Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
88Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
89Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
90Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
91Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
92Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
93Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
94Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
95Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
96Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
97Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
98Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
99Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
100Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
101Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
102Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
103Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
104Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
105A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
106Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
107Nitride memristors
108GeSbTe deposition for the PRAM application
109The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
110Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
111Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
112The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
113Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
114Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
115Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
116Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
117Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
118Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
119The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
120Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
121Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
122Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
123Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
124Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
125Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
126AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
127The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
128Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
129Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
130Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
131Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
132Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
133Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
134Oxygen migration in TiO2-based higher-k gate stacks
135Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
136Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
137Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
138Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
139Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
140Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
141Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
142Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
143Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
144PEALD AlN: controlling growth and film crystallinity
145Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
146Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
147Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
148Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
149Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
150Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
151Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
152Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
153Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
154Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
155The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
156Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
157Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
158Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
159Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
160A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
161Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
162Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
163Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
164Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
165Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
166Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
167Plasma enhanced atomic layer deposition of gallium sulfide thin films
168High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
169Properties of AlN grown by plasma enhanced atomic layer deposition
170Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
171Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
172Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
173From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
174Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
175Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
176Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
177Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
178Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
179Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
180Electron-enhanced atomic layer deposition of silicon thin films at room temperature
181Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
182Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
183Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
184Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
185Densification of Thin Aluminum Oxide Films by Thermal Treatments
186Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
187Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
188TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
189Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
190Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
191Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
192Experimental and theoretical determination of the role of ions in atomic layer annealing
193Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
194Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
195Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
196Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
197Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
198Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
199Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
200Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
201An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
202Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
203Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
204Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
205Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
206Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
207Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
208Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
209NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
210Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
211Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
212Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
213Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
214Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
215Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
216Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
217Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
218Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
219Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
220Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
221Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
222Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
223Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
224Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
225Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
226Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
227Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
228Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
229Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
230Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
231Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
232Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
233Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
234Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
235Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
236Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
237Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
238AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
239HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
240High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
241Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
242Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
243In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
244Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
245The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
246Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
247Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
248Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
249Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
250Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
251Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
252Layer-by-layer epitaxial growth of GaN at low temperatures
253Sub-nanometer heating depth of atomic layer annealing
254Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
255Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
256Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
257Plasma enhanced atomic layer deposition of Fe2O3 thin films
258Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
259Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
260High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
261Plasma-Modified Atomic Layer Deposition
262Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
263Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
264Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
265Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
266Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
267Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
268Structural and optical characterization of low-temperature ALD crystalline AlN
269Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
270Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
271Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
272Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
273Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
274ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
275Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
276Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
277ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
278Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
279Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
280Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
281Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
282The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
283Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
284Perspectives on future directions in III-N semiconductor research
285Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
286Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
287Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
288Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
289A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
290Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
291Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
292Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
293Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
294Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
295Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
296Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
297Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
298Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
299Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
300Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
301Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
302Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
303Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
304In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
305Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
306High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
307Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
308Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
309Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
310Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
311Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
312Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
313Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
314Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
315Low temperature plasma enhanced deposition of GaP films on Si substrate
316Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
317Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
318Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
319Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
320Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
321Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
322Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
323Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
324Atomic layer epitaxy of Si using atomic H
325Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
326Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
327Plasma enhanced atomic layer deposition of aluminum sulfide thin films
328Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
329Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
330Study on the characteristics of aluminum thin films prepared by atomic layer deposition
331Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
332Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
333Comparative study of ALD SiO2 thin films for optical applications
334Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
335Atomic hydrogen-assisted ALE of germanium
336Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
337Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
338High-Reflective Coatings For Ground and Space Based Applications
339Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
340The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
341Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
342Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
343Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
344Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
345Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
346Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
347Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
348Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
349Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
350ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
351Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
352Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
353Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
354Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
355Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
356In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
357Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
358Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
359Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
360Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
361Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
362Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
363Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
364Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
365Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
366Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
367Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
368Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
369Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
370Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
371Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
372Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
373Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
374Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
375Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
376Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
377Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
378Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
379Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
380Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
381Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
382The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
383Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
384Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
385Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
386Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
387HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
388Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
389Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
390Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
391Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
392Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
393Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
394Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
395Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
396Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
397Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
398Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
399Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
400WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
401Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
402Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
403Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
404Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
405CeO2 Doping of Hf0.5Zr0.5O2 Thin Films for High Endurance Ferroelectric Memories
406Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
407Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
408The effects of layering in ferroelectric Si-doped HfO2 thin films
409Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
410Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
411Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
412Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
413Atomic layer deposition of GaN at low temperatures
414Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
415Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
416The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
417Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
418Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
419PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
420Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
421Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
422Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
423Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
424Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
425Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
426Plasma enhanced atomic layer deposition of Ga2O3 thin films
427Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
428New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
429Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
430Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
431Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
432Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
433Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
434Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
435Plasma-enhanced atomic layer deposition of superconducting niobium nitride
436Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
437Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
438Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
439Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
440Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
441Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
442Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
443Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
444Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
445Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
446Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
447A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
448Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
449Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
450Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
451Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
452Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
453In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
454Crystalline growth of AlN thin films by atomic layer deposition
455Atomic layer deposition of titanium nitride for quantum circuits
456Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
457Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
458Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
459Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
460Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
461Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
462Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
463Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
464In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
465Plasma-enhanced atomic layer deposition of titanium vanadium nitride
466Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
467Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
468Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
469P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
470Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
471Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
472Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
473Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
474A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
475Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
476High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
477Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
478Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
479Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
480Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
481In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
482Sub-7-nm textured ZrO2 with giant ferroelectricity
483Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
484Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
485Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
486Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
487Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
488Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
489Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
490Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
491Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
492Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
493Tribological properties of thin films made by atomic layer deposition sliding against silicon
494Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
495Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
496Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
497Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
498Texture of atomic layer deposited ruthenium
499Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
500Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
501Fast PEALD ZnO Thin-Film Transistor Circuits
502Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
503Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
504TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
505Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
506Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
507Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
508Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
509Room-Temperature Atomic Layer Deposition of Platinum
510Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
511Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
512Atomic layer deposition of InN using trimethylindium and ammonia plasma
513Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
514A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
515SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
516Sub-10-nm ferroelectric Gd-doped HfO2 layers
517Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
518Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
519Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
520Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
521Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
522Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
523Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
524Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
525Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
526Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
527Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
528The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
529Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
530Plasma-enhanced atomic layer deposition of vanadium nitride
531Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
532Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
533Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
534Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
535Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
536PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
537Fully CMOS-compatible titanium nitride nanoantennas
538Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
539Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
540Gallium nitride thin films by microwave plasma-assisted ALD
541Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
542Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
543Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
544Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
545Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
546Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
547High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
548Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
549In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
550Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
551Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
552Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
553Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
554Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
555Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
556Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
557Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
558Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
559Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
560Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
561Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
562Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
563Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
564Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
565TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
566Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
567Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
568Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
569Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
570Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
571Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
572Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
573Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
574The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
575Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
576X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
577Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
578Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
579Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
580Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
581Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
582Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
583Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
584Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
585The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
586Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
587Ru thin film grown on TaN by plasma enhanced atomic layer deposition
588Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
589Formation of aluminum nitride thin films as gate dielectrics on Si(100)
590Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
591Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
592Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
593Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices