Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
3A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
4A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
5A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
6A route to low temperature growth of single crystal GaN on sapphire
7Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
8Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
11AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
12Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
13Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
14An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
15Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
16Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
17Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
18Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
19Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
20Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
21Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
22Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
23Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
24Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
25Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
26Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
27Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
28Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
29Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
30Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
31Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
32Atomic layer deposition of GaN at low temperatures
33Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
34Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
35Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
36Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
37Atomic layer deposition of metal-oxide thin films on cellulose fibers
38Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
39Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
40Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
41Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
42Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
43Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
44Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
45Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
46Atomic layer deposition of titanium nitride for quantum circuits
47Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
48Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
49Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
50Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
51Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
52Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
53Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
54Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
55Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
56Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
57Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
58Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
59Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
60Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
61Characteristics of HfO2 thin films grown by plasma atomic layer deposition
62Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
63Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
64Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
65Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
66Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
67Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
68Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
69Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
70Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
71Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
72Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
73Comparative study of ALD SiO2 thin films for optical applications
74Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
75Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
76Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
77Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
78Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
79Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
80Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
81Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
82Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
83Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
84Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
85Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
86Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
87Crystalline growth of AlN thin films by atomic layer deposition
88Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
89Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
90Densification of Thin Aluminum Oxide Films by Thermal Treatments
91Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
92Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
93Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
94Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
95Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
96Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
97Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
98Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
99Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
100Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
101Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
102Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
103Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
104Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
105Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
106Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
107Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
108Electrical characteristics of β-Ga2O3 thin films grown by PEALD
109Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
110Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
111Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
112Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
113Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
114Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
115Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
116Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
117Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
118Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
119Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
120Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
121Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
122Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
123Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
124Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
125Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
126Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
127Evaluation of plasma parameters on PEALD deposited TaCN
128Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
129Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
130Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
131Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
132Fast PEALD ZnO Thin-Film Transistor Circuits
133Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
134Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
135Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
136Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
137Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
138Formation of aluminum nitride thin films as gate dielectrics on Si(100)
139Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
140Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
141Fully CMOS-compatible titanium nitride nanoantennas
142Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
143Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
144Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
145Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
146Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
147Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
148Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
149Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
150Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
151Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
152Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
153Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
154HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
155HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
156High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
157High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
158High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
159High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
160High-Reflective Coatings For Ground and Space Based Applications
161High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
162Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
163Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
164Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
165Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
166Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
167Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
168Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
169Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
170Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
171Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
172In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
173In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
174In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
175In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
176Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
177Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
178Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
179Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
180Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
181Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
182Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
183Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
184Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
185Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
186Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
187Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
188Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
189Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
190Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
191Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
192Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
193Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
194Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
195Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
196Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
197Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
198Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
199Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
200Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
201Low temperature plasma enhanced deposition of GaP films on Si substrate
202Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
203Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
204Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
205Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
206Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
207Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
208Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
209Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
210Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
211Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
212Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
213Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
214Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
215Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
216Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
217Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
218Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
219Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
220Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
221Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
222Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
223Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
224Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
225New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
226NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
227Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
228Nitride memristors
229Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
230Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
231Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
232Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
233Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
234Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
235Oxygen migration in TiO2-based higher-k gate stacks
236Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
237PEALD AlN: controlling growth and film crystallinity
238PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
239PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
240Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
241Perspectives on future directions in III-N semiconductor research
242Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
243Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
244Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
245Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
246Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
247Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
248Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
249Plasma enhanced atomic layer deposition of aluminum sulfide thin films
250Plasma enhanced atomic layer deposition of Fe2O3 thin films
251Plasma enhanced atomic layer deposition of Ga2O3 thin films
252Plasma enhanced atomic layer deposition of gallium sulfide thin films
253Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
254Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
255Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
256Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
257Plasma enhanced atomic layer deposition of zinc sulfide thin films
258Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
259Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
260Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
261Plasma-Assisted Atomic Layer Deposition of Palladium
262Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
263Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
264Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
265Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
266Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
267Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
268Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
269Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
270Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
271Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
272Plasma-enhanced atomic layer deposition of BaTiO3
273Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
274Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
275Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
276Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
277Plasma-Enhanced Atomic Layer Deposition of Ni
278Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
279Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
280Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
281Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
282Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
283Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
284Plasma-enhanced atomic layer deposition of superconducting niobium nitride
285Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
286Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
287Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
288Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
289Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
290Plasma-enhanced atomic layer deposition of titanium vanadium nitride
291Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
292Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
293Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
294Plasma-Modified Atomic Layer Deposition
295Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
296Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
297Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
298Properties of AlN grown by plasma enhanced atomic layer deposition
299Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
300Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
301Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
302Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
303Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
304Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
305Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
306Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
307Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
308Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
309Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
310Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition
311Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
312Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
313Remote Plasma ALD of Platinum and Platinum Oxide Films
314Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
315Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
316Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
317Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
318Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
319Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
320Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
321Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
322Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
323Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
324Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
325Room-Temperature Atomic Layer Deposition of Platinum
326Ru thin film grown on TaN by plasma enhanced atomic layer deposition
327Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
328Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
329Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
330Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
331Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
332Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
333SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
334Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
335Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
336Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
337Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
338Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
339Structural and optical characterization of low-temperature ALD crystalline AlN
340Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
341Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
342Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
343Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
344Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
345Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
346Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
347Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
348Study on the characteristics of aluminum thin films prepared by atomic layer deposition
349Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
350Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
351Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
352Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
353Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
354Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
355Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
356Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
357Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
358Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
359Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
360Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
361Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
362Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
363TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
364Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
365Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
366Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
367The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
368The effects of layering in ferroelectric Si-doped HfO2 thin films
369The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
370The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
371The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
372The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
373The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
374The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
375The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
376The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
377Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
378Thin film GaP for solar cell application
379Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
380TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
381TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
382Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
383Tribological properties of thin films made by atomic layer deposition sliding against silicon
384Trilayer Tunnel Selectors for Memristor Memory Cells
385Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
386Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
387Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
388Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
389Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
390Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
391Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
392Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
393Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
394WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
395Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
396X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
397ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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