Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
2Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
3Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
4Characteristics of HfO2 thin films grown by plasma atomic layer deposition
5Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
6Atomic layer deposition of InN using trimethylindium and ammonia plasma
7Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
8Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
9Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
10An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
11Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
12Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
13A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
14Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
15Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
16Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
17Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
18Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
19Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
20Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
21The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
22Tribological properties of thin films made by atomic layer deposition sliding against silicon
23Thin film GaP for solar cell application
24Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
25High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
26Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
27Nitride memristors
28Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
29Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
30Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
31Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
32Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
33Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
34Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
35A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
36HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
37Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
38Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
39Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
40Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
41Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
42Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
43Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
44Atomic layer deposition of titanium nitride for quantum circuits
45Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
46Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
47Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
48The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
49Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
50Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
51Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
52Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
53Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
54Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
55Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
56Plasma-Assisted Atomic Layer Deposition of Palladium
57Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
58ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
59Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
60Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
61Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
62Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
63Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
64Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
65Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
66Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
67AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
68Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
69NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
70High-Reflective Coatings For Ground and Space Based Applications
71A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
72Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
73Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
74A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
75Sub-nanometer heating depth of atomic layer annealing
76Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
77Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
78Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
79Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
80Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
81Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
82Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
83Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
84Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
85Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
86The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
87Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
88Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
89Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
90Oxygen migration in TiO2-based higher-k gate stacks
91The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
92Electron-enhanced atomic layer deposition of silicon thin films at room temperature
93Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
94PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
95Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
96Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
97Plasma-enhanced atomic layer deposition of vanadium nitride
98Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
99The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
100The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
101Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
102Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
103Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
104Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
105Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
106Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
107High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
108Atomic hydrogen-assisted ALE of germanium
109Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
110In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
111Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
112Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
113Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
114Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
115Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
116Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
117Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
118Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
119Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
120Crystalline growth of AlN thin films by atomic layer deposition
121Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
122Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
123Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
124Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
125Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
126Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
127Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
128In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
129Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
130Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
131Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
132Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
133Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
134Fast PEALD ZnO Thin-Film Transistor Circuits
135Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
136Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
137Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
138Evaluation of plasma parameters on PEALD deposited TaCN
139Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
140Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
141Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
142Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
143Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
144Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
145Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
146Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
147Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
148Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
149Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
150Trilayer Tunnel Selectors for Memristor Memory Cells
151Plasma enhanced atomic layer deposition of gallium sulfide thin films
152Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
153Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
154Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
155Texture of atomic layer deposited ruthenium
156Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
157Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
158Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
159Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
160Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
161Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
162Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
163Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
164Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
165Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
166Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
167Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
168Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
169Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
170Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
171The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
172Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
173Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
174Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
175Layer-by-layer epitaxial growth of GaN at low temperatures
176Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
177Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
178High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
179Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
180Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
181Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
182Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
183Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
184Experimental and theoretical determination of the role of ions in atomic layer annealing
185Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
186Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
187A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
188Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
189ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
190Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
191Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
192Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
193Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
194Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
195Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
196Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
197Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
198Atomic Layer Deposition of the Conductive Delafossite PtCoO2
199Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
200Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
201Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
202Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
203Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
204Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
205Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
206Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
207AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
208Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
209Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
210Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
211PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
212Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
213X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
214Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
215Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
216Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
217Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
218Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
219Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
220Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
221Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
222Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
223Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
224Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
225Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
226Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
227Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
228Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
229Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
230Plasma-enhanced atomic layer deposition of titanium vanadium nitride
231Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
232Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
233Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
234Remote Plasma ALD of Platinum and Platinum Oxide Films
235Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
236Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
237Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
238A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
239Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
240Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
241Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
242Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
243GeSbTe deposition for the PRAM application
244Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
245Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
246Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
247Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
248Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
249Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
250Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
251Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
252Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
253Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
254Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
255Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
256Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
257Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
258Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
259Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
260Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
261High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
262Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
263Plasma-enhanced atomic layer deposition of BaTiO3
264Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
265Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
266Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
267New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
268Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
269Atomic layer epitaxy of Si using atomic H
270Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
271Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
272Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
273Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
274Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
275Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
276Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
277A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
278Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
279Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
280Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
281The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
282Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
283Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
284Study on the characteristics of aluminum thin films prepared by atomic layer deposition
285Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
286Plasma-enhanced atomic layer deposition of superconducting niobium nitride
287Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
288Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
289Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
290Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
291Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
292Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
293Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
294Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
295Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
296Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
297Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
298Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
299Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
300Sub-10-nm ferroelectric Gd-doped HfO2 layers
301Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
302Plasma enhanced atomic layer deposition of zinc sulfide thin films
303Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
304Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
305Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
306Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
307Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
308Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
309Atomic layer deposition of GaN at low temperatures
310Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
311Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
312Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
313Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
314Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
315Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
316Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
317A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
318Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
319Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
320Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
321Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
322Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
323Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
324Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
325Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
326Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
327Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
328Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
329Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
330Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
331Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
332Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
333Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
334Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
335Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
336Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
337SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
338Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
339Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
340Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
341Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
342Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
343ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
344Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
345Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
346Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
347Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
348Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
349Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
350Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
351Plasma-Enhanced Atomic Layer Deposition of Ni
352Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
353Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
354CeO2 Doping of Hf0.5Zr0.5O2 Thin Films for High Endurance Ferroelectric Memories
355RF Characterization of Novel Superconducting Materials and Multilayers
356Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
357Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
358Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
359Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
360Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
361Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
362Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
363Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
364Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
365Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
366Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
367Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
368Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
369Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
370Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
371Plasma-Modified Atomic Layer Deposition
372In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
373Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
374Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
375Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
376Formation of aluminum nitride thin films as gate dielectrics on Si(100)
377TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
378Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
379Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
380Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
381Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
382Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
383Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
384Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
385In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
386Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
387Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
388Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
389Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
390P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
391Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
392Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
393Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
394Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
395Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
396Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
397Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
398Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
399TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
400PEALD AlN: controlling growth and film crystallinity
401Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
402Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
403Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
404Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
405Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
406Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
407Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
408Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
409Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
410Densification of Thin Aluminum Oxide Films by Thermal Treatments
411Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
412Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
413Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
414Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
415Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
416The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
417Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
418Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
419WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
420Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
421Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
422The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
423Sub-7-nm textured ZrO2 with giant ferroelectricity
424Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
425Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
426Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
427Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
428Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
429Comparative study of ALD SiO2 thin films for optical applications
430Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
431The effects of layering in ferroelectric Si-doped HfO2 thin films
432Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
433Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
434Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
435Ru thin film grown on TaN by plasma enhanced atomic layer deposition
436A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
437Fully CMOS-compatible titanium nitride nanoantennas
438Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
439Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
440Atomic layer deposition of YMnO3 thin films
441Plasma enhanced atomic layer deposition of Ga2O3 thin films
442High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
443Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
444Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
445Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
446Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
447Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
448Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
449Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
450Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
451Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
452Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
453Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
454Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
455Gallium nitride thin films by microwave plasma-assisted ALD
456Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
457Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
458ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
459Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
460Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
461Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
462Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
463The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
464Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
465Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
466Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
467Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
468Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
469Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
470Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
471Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
472Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
473Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
474TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
475Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
476Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
477Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
478Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
479In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
480Perspectives on future directions in III-N semiconductor research
481Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
482Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
4833D structure evolution using metastable atomic layer deposition based on planar silver templates
484Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
485Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
486The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
487Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
488Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
489Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
490Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
491Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
492HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
493Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
494Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
495In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
496Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
497From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
498Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
499Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
500Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
501Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
502Atomic layer deposition of metal-oxide thin films on cellulose fibers
503Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
504Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
505Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
506Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
507Plasma enhanced atomic layer deposition of aluminum sulfide thin films
508Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
509HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
510Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
511High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
512Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
513Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
514Properties of AlN grown by plasma enhanced atomic layer deposition
515Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
516Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
517Plasma enhanced atomic layer deposition of Fe2O3 thin films
518Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
519Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
520Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
521In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
522Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
523Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
524Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
525Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
526Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
527Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
528Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
529Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
530Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
531Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
532Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
533Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
534Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
535Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
536Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
537Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
538ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
539Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
540Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
541Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
542Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
543Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
544Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
545Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
546Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
547Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
548Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
549Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
550Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
551Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
552Room-Temperature Atomic Layer Deposition of Platinum
553Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
554Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
555Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
556Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
557Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
558Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
559Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
560Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
561Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
562Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
563Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
564Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
565Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
566Structural and optical characterization of low-temperature ALD crystalline AlN
567The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
568Low temperature plasma enhanced deposition of GaP films on Si substrate
569Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
570Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
571Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
572Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
573PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
574α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
575In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
576Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
577Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
578Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
579Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
580Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
581Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
582Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
583Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
584Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
585Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
586Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
587Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
588Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
589Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
590A route to low temperature growth of single crystal GaN on sapphire
591Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
592Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
593Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
594Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
595Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
596Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
597Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
598Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
599Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
600TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
601Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
602Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor