Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
3A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
4A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
5A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
6A route to low temperature growth of single crystal GaN on sapphire
7Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
8Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
11AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
12Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
13Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
14An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
15Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
16Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
17Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
18Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
19Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
20Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
21Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
22Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
23Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
24Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
25Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
26Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
27Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
28Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
29Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
30Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
31Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
32Atomic layer deposition of GaN at low temperatures
33Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
34Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
35Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
36Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
37Atomic layer deposition of metal-oxide thin films on cellulose fibers
38Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
39Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
40Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
41Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
42Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
43Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
44Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
45Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
46Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
47Atomic layer deposition of titanium nitride for quantum circuits
48Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
49Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
50Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
51Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
52Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
53Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
54Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
55Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
56Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
57Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
58Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
59Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
60Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
61Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
62Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
63Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
64Characteristics of HfO2 thin films grown by plasma atomic layer deposition
65Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
66Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
67Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
68Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
69Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
70Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
71Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
72Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
73Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
74Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
75Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
76Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
77Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
78Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
79Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
80Comparative study of ALD SiO2 thin films for optical applications
81Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
82Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
83Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
84Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
85Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
86Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
87Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
88Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
89Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
90Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
91Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
92Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
93Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
94Crystalline growth of AlN thin films by atomic layer deposition
95Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
96Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
97Densification of Thin Aluminum Oxide Films by Thermal Treatments
98Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
99Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
100Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
101Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
102Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
103Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
104Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
105Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
106Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
107Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
108Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
109Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
110Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
111Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
112Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
113Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
114Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
115Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
116Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
117Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
118Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
119Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
120Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
121Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
122Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
123Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
124Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
125Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
126Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
127Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
128Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
129Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
130Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
131Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
132Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
133Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
134Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
135Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
136Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
137Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
138Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
139Evaluation of plasma parameters on PEALD deposited TaCN
140Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
141Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
142Fast PEALD ZnO Thin-Film Transistor Circuits
143Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
144Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
145Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
146Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
147Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
148Formation of aluminum nitride thin films as gate dielectrics on Si(100)
149Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
150Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
151Fully CMOS-compatible titanium nitride nanoantennas
152Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
153GeSbTe deposition for the PRAM application
154Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
155Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
156Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
157Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
158Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
159Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
160Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
161Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
162Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
163Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
164Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
165Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
166Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
167Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
168Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
169HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
170HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
171High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
172High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
173High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
174High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
175High-Reflective Coatings For Ground and Space Based Applications
176High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
177Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
178Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
179Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
180Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
181Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
182Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
183Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
184Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
185Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
186Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
187Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
188Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
189In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
190In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
191In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
192In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
193In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
194In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
195Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
196Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
197Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
198Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
199Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
200Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
201Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
202Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
203Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
204Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
205Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
206Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
207Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
208Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
209Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
210Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
211Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
212Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
213Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
214Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
215Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
216Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
217Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
218Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
219Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
220Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
221Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
222Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
223Low temperature plasma enhanced deposition of GaP films on Si substrate
224Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
225Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
226Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
227Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
228Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
229Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
230Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
231Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
232Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
233Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
234Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
235Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
236Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
237Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
238Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
239Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
240Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
241Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
242Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
243Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
244Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
245Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
246New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
247NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
248Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
249Nitride memristors
250Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
251Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
252Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
253Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
254Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
255Oxygen migration in TiO2-based higher-k gate stacks
256P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
257Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
258PEALD AlN: controlling growth and film crystallinity
259PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
260PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
261PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
262Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
263Perspectives on future directions in III-N semiconductor research
264Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
265Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
266Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
267Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
268Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
269Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
270Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
271Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
272Plasma enhanced atomic layer deposition of aluminum sulfide thin films
273Plasma enhanced atomic layer deposition of Fe2O3 thin films
274Plasma enhanced atomic layer deposition of Ga2O3 thin films
275Plasma enhanced atomic layer deposition of gallium sulfide thin films
276Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
277Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
278Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
279Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
280Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
281Plasma enhanced atomic layer deposition of zinc sulfide thin films
282Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
283Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
284Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
285Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
286Plasma-Assisted Atomic Layer Deposition of Palladium
287Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
288Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
289Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
290Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
291Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
292Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
293Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
294Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
295Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
296Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
297Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
298Plasma-enhanced atomic layer deposition of BaTiO3
299Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
300Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
301Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
302Plasma-Enhanced Atomic Layer Deposition of Ni
303Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
304Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
305Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
306Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
307Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
308Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
309Plasma-enhanced atomic layer deposition of superconducting niobium nitride
310Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
311Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
312Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
313Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
314Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
315Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
316Plasma-enhanced atomic layer deposition of titanium vanadium nitride
317Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
318Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
319Plasma-enhanced atomic layer deposition of vanadium nitride
320Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
321Plasma-Modified Atomic Layer Deposition
322Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
323Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
324Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
325Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
326Properties of AlN grown by plasma enhanced atomic layer deposition
327Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
328Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
329Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
330Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
331Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
332Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
333Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
334Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
335Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
336Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
337Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
338Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
339Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
340Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
341Remote Plasma ALD of Platinum and Platinum Oxide Films
342Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
343Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
344Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
345Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
346Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
347Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
348Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
349Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
350Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
351Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
352Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
353Room-Temperature Atomic Layer Deposition of Platinum
354Ru thin film grown on TaN by plasma enhanced atomic layer deposition
355Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
356Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
357Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
358Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
359Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
360Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
361SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
362Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
363Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
364Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
365Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
366Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
367Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
368Structural and optical characterization of low-temperature ALD crystalline AlN
369Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
370Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
371Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
372Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
373Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
374Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
375Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
376Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
377Study on the characteristics of aluminum thin films prepared by atomic layer deposition
378Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
379Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
380Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
381Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
382Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
383Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
384Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
385Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
386Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
387Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
388Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
389Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
390Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
391TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
392Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
393Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
394Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
395The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
396The effects of layering in ferroelectric Si-doped HfO2 thin films
397The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
398The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
399The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
400The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
401The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
402The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
403The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
404The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
405Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
406Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
407Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
408Thin film GaP for solar cell application
409Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
410TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
411TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
412Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
413Tribological properties of thin films made by atomic layer deposition sliding against silicon
414Trilayer Tunnel Selectors for Memristor Memory Cells
415Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
416Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
417Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
418Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
419Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
420Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
421Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
422Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
423Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
424WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
425Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
426X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
427ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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