Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
13D structure evolution using metastable atomic layer deposition based on planar silver templates
2A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
3A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
6A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
7A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
8A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
9A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
10A route to low temperature growth of single crystal GaN on sapphire
11Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
12Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
13Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
14ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
15ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
16AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
17AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
18Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
19Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
20Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
21An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
22Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
23Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
24Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
25Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
26Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
27Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
28Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
29Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
30Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
31Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
32Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
33Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
34Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
35Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
36Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
37Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
38Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
39Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
40Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
41Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
42Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
43Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
44Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
45Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
46Atomic layer deposition of GaN at low temperatures
47Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
48Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
49Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
50Atomic layer deposition of InN using trimethylindium and ammonia plasma
51Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
52Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
53Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
54Atomic layer deposition of metal-oxide thin films on cellulose fibers
55Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
56Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
57Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
58Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
59Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
60Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
61Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
62Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
63Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
64Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
65Atomic layer deposition of titanium nitride for quantum circuits
66Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
67Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
68Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
69Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
70Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
71Atomic layer epitaxy of Si using atomic H
72Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
73Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
74Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
75Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
76Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
77Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
78Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
79Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
80Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
81Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
82Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
83Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
84Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
85Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
86Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
87Characteristics of HfO2 thin films grown by plasma atomic layer deposition
88Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
89Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
90Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
91Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
92Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
93Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
94Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
95Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
96Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
97Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
98Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
99Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
100Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
101Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
102Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
103Comparative study of ALD SiO2 thin films for optical applications
104Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
105Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
106Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
107Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
108Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
109Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
110Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
111Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
112Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
113Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
114Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
115Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
116Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
117Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
118Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
119Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
120Crystalline growth of AlN thin films by atomic layer deposition
121Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
122Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
123Densification of Thin Aluminum Oxide Films by Thermal Treatments
124Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
125Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
126Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
127Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
128Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
129Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
130Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
131Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
132Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
133Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
134Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
135Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
136Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
137Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
138Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
139Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
140Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
141Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
142Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
143Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
144Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
145Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
146Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
147Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
148Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
149Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
150Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
151Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
152Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
153Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
154Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
155Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
156Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
157Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
158Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
159Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
160Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
161Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
162Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
163Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
164Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
165Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
166Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
167Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
168Evaluation of plasma parameters on PEALD deposited TaCN
169Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
170Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
171Fast PEALD ZnO Thin-Film Transistor Circuits
172Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
173Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
174Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
175Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
176Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
177Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
178Formation of aluminum nitride thin films as gate dielectrics on Si(100)
179Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
180Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
181From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
182Fully CMOS-compatible titanium nitride nanoantennas
183Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
184GeSbTe deposition for the PRAM application
185Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
186Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
187Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
188Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
189Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
190Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
191Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
192Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
193Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
194Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
195Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
196Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
197Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
198Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
199Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
200Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
201Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
202Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
203Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
204HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
205HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
206High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
207High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
208High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
209High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
210High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
211High-Reflective Coatings For Ground and Space Based Applications
212High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
213Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
214Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
215Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
216Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
217Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
218Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
219Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
220Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
221Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
222Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
223Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
224Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
225Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
226In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
227In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
228In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
229In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
230In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
231In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
232In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
233Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
234Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
235Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
236Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
237Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
238Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
239Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
240Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
241Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
242Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
243Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
244Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
245Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
246Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
247Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
248Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
249Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
250Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
251Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
252Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
253Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
254Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
255Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
256Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
257Layer-by-layer epitaxial growth of GaN at low temperatures
258Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
259Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
260Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
261Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
262Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
263Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
264Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
265Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
266Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
267Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
268Low temperature plasma enhanced deposition of GaP films on Si substrate
269Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
270Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
271Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
272Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
273Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
274Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
275Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
276Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
277Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
278Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
279Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
280Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
281Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
282Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
283Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
284Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
285Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
286Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
287Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
288Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
289Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
290Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
291Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
292Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
293Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
294Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
295New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
296NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
297Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
298Nitride memristors
299Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
300Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
301Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
302Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
303Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
304Oxygen migration in TiO2-based higher-k gate stacks
305P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
306Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
307PEALD AlN: controlling growth and film crystallinity
308PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
309PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
310PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
311Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
312Perspectives on future directions in III-N semiconductor research
313Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
314Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
315Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
316Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
317Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
318Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
319Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
320Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
321Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
322Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
323Plasma enhanced atomic layer deposition of aluminum sulfide thin films
324Plasma enhanced atomic layer deposition of Fe2O3 thin films
325Plasma enhanced atomic layer deposition of Ga2O3 thin films
326Plasma enhanced atomic layer deposition of gallium sulfide thin films
327Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
328Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
329Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
330Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
331Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
332Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
333Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
334Plasma enhanced atomic layer deposition of zinc sulfide thin films
335Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
336Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
337Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
338Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
339Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
340Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
341Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
342Plasma-Assisted Atomic Layer Deposition of Palladium
343Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
344Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
345Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
346Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
347Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
348Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
349Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
350Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
351Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
352Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
353Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
354Plasma-enhanced atomic layer deposition of BaTiO3
355Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
356Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
357Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
358Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
359Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
360Plasma-Enhanced Atomic Layer Deposition of Ni
361Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
362Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
363Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
364Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
365Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
366Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
367Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
368Plasma-enhanced atomic layer deposition of superconducting niobium nitride
369Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
370Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
371Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
372Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
373Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
374Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
375Plasma-enhanced atomic layer deposition of titanium vanadium nitride
376Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
377Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
378Plasma-enhanced atomic layer deposition of vanadium nitride
379Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
380Plasma-Modified Atomic Layer Deposition
381Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
382Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
383Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
384Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
385Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
386Properties of AlN grown by plasma enhanced atomic layer deposition
387Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
388Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
389Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
390Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
391Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
392Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
393Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
394Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
395Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
396Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
397Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
398Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
399Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
400Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
401Remote Plasma ALD of Platinum and Platinum Oxide Films
402Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
403Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
404Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
405Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
406Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
407Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
408Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
409Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
410Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
411Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
412Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
413Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
414Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
415Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
416Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
417Room-Temperature Atomic Layer Deposition of Platinum
418Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
419Ru thin film grown on TaN by plasma enhanced atomic layer deposition
420Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
421Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
422Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
423Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
424Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
425Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
426Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
427SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
428Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
429Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
430Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
431Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
432Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
433Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
434Structural and optical characterization of low-temperature ALD crystalline AlN
435Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
436Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
437Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
438Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
439Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
440Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
441Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
442Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
443Study on the characteristics of aluminum thin films prepared by atomic layer deposition
444Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
445Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
446Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
447Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
448Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
449Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
450Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
451Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
452Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
453Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
454Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
455Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
456Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
457TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
458Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
459Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
460TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
461Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
462Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
463Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
464Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
465Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
466The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
467The effects of layering in ferroelectric Si-doped HfO2 thin films
468The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
469The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
470The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
471The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
472The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
473The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
474The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
475The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
476The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
477The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
478The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
479Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
480Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
481Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
482Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
483Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
484Thin film GaP for solar cell application
485Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
486TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
487TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
488Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
489Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
490Tribological properties of thin films made by atomic layer deposition sliding against silicon
491Trilayer Tunnel Selectors for Memristor Memory Cells
492Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
493Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
494Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
495Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
496Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
497Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
498Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
499Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
500Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
501Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
502Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
503WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
504Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
505X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
506ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
507ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
508α-Ga2O3 grown by low temperature atomic layer deposition on sapphire