Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
13D structure evolution using metastable atomic layer deposition based on planar silver templates
2A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
3A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
6A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
7A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
8A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
9A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
10A route to low temperature growth of single crystal GaN on sapphire
11Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
12Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
13Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
14ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
15ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
16AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
17AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
18Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
19Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
20Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
21An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
22Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
23Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
24Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
25Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
26Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
27Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
28Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
29Atomic hydrogen-assisted ALE of germanium
30Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
31Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
32Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
33Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
34Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
35Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
36Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
37Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
38Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
39Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
40Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
41Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
42Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
43Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
44Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
45Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
46Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
47Atomic layer deposition of GaN at low temperatures
48Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
49Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
50Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
51Atomic layer deposition of InN using trimethylindium and ammonia plasma
52Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
53Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
54Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
55Atomic layer deposition of metal-oxide thin films on cellulose fibers
56Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
57Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
58Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
59Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
60Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
61Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
62Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
63Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
64Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
65Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
66Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
67Atomic layer deposition of titanium nitride for quantum circuits
68Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
69Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
70Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
71Atomic layer deposition of YMnO3 thin films
72Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
73Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
74Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
75Atomic layer epitaxy of Si using atomic H
76Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
77Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
78Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
79Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
80Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
81Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
82Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
83Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
84Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
85Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
86Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
87Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
88Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
89Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
90Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
91Characteristics of HfO2 thin films grown by plasma atomic layer deposition
92Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
93Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
94Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
95Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
96Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
97Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
98Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
99Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
100Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
101Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
102Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
103Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
104Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
105Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
106Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
107Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
108Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
109Comparative study of ALD SiO2 thin films for optical applications
110Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
111Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
112Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
113Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
114Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
115Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
116Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
117Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
118Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
119Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
120Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
121Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
122Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
123Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
124Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
125Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
126Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
127Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
128Crystalline growth of AlN thin films by atomic layer deposition
129Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
130Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
131Densification of Thin Aluminum Oxide Films by Thermal Treatments
132Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
133Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
134Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
135Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
136Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
137Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
138Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
139Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
140Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
141Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
142Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
143Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
144Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
145Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
146Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
147Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
148Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
149Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
150Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
151Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
152Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
153Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
154Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
155Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
156Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
157Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
158Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
159Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
160Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
161Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
162Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
163Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
164Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
165Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
166Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
167Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
168Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
169Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
170Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
171Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
172Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
173Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
174Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
175Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
176Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
177Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
178Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
179Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
180Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
181Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
182Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
183Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
184Evaluation of plasma parameters on PEALD deposited TaCN
185Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
186Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
187Fast PEALD ZnO Thin-Film Transistor Circuits
188Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
189Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
190Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
191Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
192Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
193Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
194Formation of aluminum nitride thin films as gate dielectrics on Si(100)
195Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
196Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
197From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
198Fully CMOS-compatible titanium nitride nanoantennas
199Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
200GeSbTe deposition for the PRAM application
201Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
202Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
203Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
204Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
205Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
206Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
207Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
208Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
209Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
210Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
211Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
212Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
213Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
214Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
215Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
216Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
217Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
218Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
219Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
220Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
221Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
222HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
223HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
224HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
225High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
226High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
227High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
228High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
229High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
230High-Reflective Coatings For Ground and Space Based Applications
231High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
232Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
233Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
234Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
235Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
236Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
237Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
238Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
239Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
240Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
241Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
242Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
243Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
244Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
245In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
246In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
247In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
248In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
249In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
250In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
251In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
252Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
253Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
254Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
255Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
256Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
257Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
258Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
259Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
260Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
261Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
262Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
263Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
264Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
265Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
266Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
267Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
268Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
269Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
270Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
271Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
272Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
273Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
274Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
275Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
276Layer-by-layer epitaxial growth of GaN at low temperatures
277Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
278Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
279Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
280Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
281Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
282Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
283Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
284Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
285Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
286Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
287Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
288Low temperature plasma enhanced deposition of GaP films on Si substrate
289Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
290Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
291Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
292Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
293Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
294Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
295Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
296Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
297Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
298Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
299Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
300Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
301Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
302Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
303Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
304Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
305Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
306Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
307Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
308Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
309Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
310Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
311Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
312Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
313Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
314Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
315Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
316Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
317New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
318Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
319NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
320Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
321Nitride memristors
322Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
323Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
324Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
325Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
326Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
327Oxygen migration in TiO2-based higher-k gate stacks
328P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
329Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
330PEALD AlN: controlling growth and film crystallinity
331PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
332PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
333PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
334Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
335Perspectives on future directions in III-N semiconductor research
336Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
337Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
338Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
339Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
340Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
341Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
342Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
343Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
344Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
345Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
346Plasma enhanced atomic layer deposition of aluminum sulfide thin films
347Plasma enhanced atomic layer deposition of Fe2O3 thin films
348Plasma enhanced atomic layer deposition of Ga2O3 thin films
349Plasma enhanced atomic layer deposition of gallium sulfide thin films
350Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
351Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
352Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
353Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
354Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
355Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
356Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
357Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
358Plasma enhanced atomic layer deposition of zinc sulfide thin films
359Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
360Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
361Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
362Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
363Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
364Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
365Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
366Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
367Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
368Plasma-Assisted Atomic Layer Deposition of Palladium
369Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
370Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
371Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
372Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
373Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
374Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
375Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
376Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
377Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
378Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
379Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
380Plasma-enhanced atomic layer deposition of BaTiO3
381Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
382Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
383Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
384Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
385Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
386Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
387Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
388Plasma-Enhanced Atomic Layer Deposition of Ni
389Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
390Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
391Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
392Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
393Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
394Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
395Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
396Plasma-enhanced atomic layer deposition of superconducting niobium nitride
397Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
398Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
399Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
400Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
401Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
402Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
403Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
404Plasma-enhanced atomic layer deposition of titanium vanadium nitride
405Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
406Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
407Plasma-enhanced atomic layer deposition of vanadium nitride
408Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
409Plasma-Modified Atomic Layer Deposition
410Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
411Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
412Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
413Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
414Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
415Properties of AlN grown by plasma enhanced atomic layer deposition
416Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
417Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
418Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
419Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
420Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
421Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
422Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
423Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
424Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
425Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
426Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
427Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
428Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
429Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
430Remote Plasma ALD of Platinum and Platinum Oxide Films
431Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
432Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
433Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
434Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
435Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
436Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
437Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
438Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
439Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
440Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
441Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
442Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
443Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
444Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
445Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
446Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
447Room-Temperature Atomic Layer Deposition of Platinum
448Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
449Ru thin film grown on TaN by plasma enhanced atomic layer deposition
450Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
451Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
452Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
453Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
454Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
455Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
456Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
457SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
458Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
459Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
460Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
461Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
462Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
463Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
464Structural and optical characterization of low-temperature ALD crystalline AlN
465Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
466Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
467Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
468Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
469Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
470Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
471Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
472Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
473Study on the characteristics of aluminum thin films prepared by atomic layer deposition
474Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
475Sub-7-nm textured ZrO2 with giant ferroelectricity
476Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
477Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
478Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
479Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
480Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
481Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
482Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
483Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
484Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
485Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
486Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
487Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
488TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
489Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
490Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
491Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
492TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
493Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
494Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
495Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
496Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
497Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
498The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
499The effects of layering in ferroelectric Si-doped HfO2 thin films
500The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
501The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
502The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
503The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
504The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
505The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
506The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
507The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
508The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
509The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
510The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
511Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
512Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
513Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
514Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
515Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
516Thin film GaP for solar cell application
517Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
518TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
519TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
520Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
521Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
522Tribological properties of thin films made by atomic layer deposition sliding against silicon
523Trilayer Tunnel Selectors for Memristor Memory Cells
524Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
525Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
526Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
527Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
528Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
529Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
530Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
531Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
532Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
533Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
534Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
535Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
536Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
537WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
538Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
539X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
540ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
541ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
542α-Ga2O3 grown by low temperature atomic layer deposition on sapphire