Crystallinity, Crystal Structure, Grain Size, Atomic Structure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Crystallinity, Crystal Structure, Grain Size, Atomic Structure returned 397 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2	A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
3	A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
4	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
5	A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
6	A route to low temperature growth of single crystal GaN on sapphire
7	Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
8	Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
9	Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10	ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
11	AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
12	Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
13	Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
14	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
15	Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
16	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
17	Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
18	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
19	Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
20	Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
21	Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
22	Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
23	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
24	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
25	Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
26	Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
27	Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
28	Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
29	Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
30	Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
31	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
32	Atomic layer deposition of GaN at low temperatures
33	Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
34	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
35	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
36	Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
37	Atomic layer deposition of metal-oxide thin films on cellulose fibers
38	Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
39	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
40	Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
41	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
42	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
43	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
44	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
45	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
46	Atomic layer deposition of titanium nitride for quantum circuits
47	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
48	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
49	Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
50	Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
51	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
52	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
53	Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
54	Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
55	Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
56	Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
57	Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
58	Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
59	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
60	Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
61	Characteristics of HfO2 thin films grown by plasma atomic layer deposition
62	Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
63	Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
64	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
65	Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
66	Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
67	Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
68	Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
69	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
70	Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
71	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
72	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
73	Comparative study of ALD SiO2 thin films for optical applications
74	Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
75	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
76	Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
77	Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
78	Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
79	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
80	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
81	Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
82	Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
83	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
84	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
85	Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
86	Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
87	Crystalline growth of AlN thin films by atomic layer deposition
88	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
89	Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
90	Densification of Thin Aluminum Oxide Films by Thermal Treatments
91	Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
92	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
93	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
94	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
95	Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
96	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
97	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
98	Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
99	Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
100	Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
101	Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
102	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
103	Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
104	Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
105	Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
106	Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
107	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
108	Electrical characteristics of β-Ga2O3 thin films grown by PEALD
109	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
110	Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
111	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
112	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
113	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
114	Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
115	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
116	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
117	Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
118	Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
119	Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
120	Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
121	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
122	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
123	Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
124	Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
125	Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
126	Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
127	Evaluation of plasma parameters on PEALD deposited TaCN
128	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
129	Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
130	Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
131	Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
132	Fast PEALD ZnO Thin-Film Transistor Circuits
133	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
134	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
135	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
136	Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
137	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
138	Formation of aluminum nitride thin films as gate dielectrics on Si(100)
139	Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
140	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
141	Fully CMOS-compatible titanium nitride nanoantennas
142	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
143	Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
144	Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
145	Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
146	Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
147	Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
148	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
149	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
150	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
151	Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
152	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
153	Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
154	HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
155	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
156	High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
157	High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
158	High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
159	High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
160	High-Reflective Coatings For Ground and Space Based Applications
161	High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
162	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
163	Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
164	Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
165	Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
166	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
167	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
168	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
169	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
170	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
171	Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
172	In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
173	In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
174	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
175	In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
176	Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
177	Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
178	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
179	Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
180	Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
181	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
182	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
183	Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
184	Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
185	Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
186	Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
187	Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
188	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
189	Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
190	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
191	Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
192	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
193	Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
194	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
195	Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
196	Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
197	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
198	Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
199	Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
200	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
201	Low temperature plasma enhanced deposition of GaP films on Si substrate
202	Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
203	Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
204	Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
205	Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
206	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
207	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
208	Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
209	Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
210	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
211	Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
212	Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
213	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
214	Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
215	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
216	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
217	Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
218	Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
219	Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
220	Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
221	Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
222	Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
223	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
224	Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
225	New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
226	NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
227	Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
228	Nitride memristors
229	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
230	Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
231	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
232	Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
233	Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
234	Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
235	Oxygen migration in TiO2-based higher-k gate stacks
236	Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
237	PEALD AlN: controlling growth and film crystallinity
238	PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
239	PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
240	Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
241	Perspectives on future directions in III-N semiconductor research
242	Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
243	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
244	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
245	Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
246	Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
247	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
248	Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
249	Plasma enhanced atomic layer deposition of aluminum sulfide thin films
250	Plasma enhanced atomic layer deposition of Fe2O3 thin films
251	Plasma enhanced atomic layer deposition of Ga2O3 thin films
252	Plasma enhanced atomic layer deposition of gallium sulfide thin films
253	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
254	Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
255	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
256	Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
257	Plasma enhanced atomic layer deposition of zinc sulfide thin films
258	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
259	Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
260	Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
261	Plasma-Assisted Atomic Layer Deposition of Palladium
262	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
263	Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
264	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
265	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
266	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
267	Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
268	Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
269	Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
270	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
271	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
272	Plasma-enhanced atomic layer deposition of BaTiO3
273	Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
274	Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
275	Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
276	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
277	Plasma-Enhanced Atomic Layer Deposition of Ni
278	Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
279	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
280	Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
281	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
282	Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
283	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
284	Plasma-enhanced atomic layer deposition of superconducting niobium nitride
285	Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
286	Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
287	Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
288	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
289	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
290	Plasma-enhanced atomic layer deposition of titanium vanadium nitride
291	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
292	Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
293	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
294	Plasma-Modified Atomic Layer Deposition
295	Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
296	Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
297	Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
298	Properties of AlN grown by plasma enhanced atomic layer deposition
299	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
300	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
301	Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
302	Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
303	Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
304	Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
305	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
306	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
307	Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
308	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
309	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
310	Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition
311	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
312	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
313	Remote Plasma ALD of Platinum and Platinum Oxide Films
314	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
315	Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
316	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
317	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
318	Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
319	Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
320	Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
321	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
322	Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
323	Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
324	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
325	Room-Temperature Atomic Layer Deposition of Platinum
326	Ru thin film grown on TaN by plasma enhanced atomic layer deposition
327	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
328	Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
329	Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
330	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
331	Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
332	Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
333	SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
334	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
335	Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
336	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
337	Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
338	Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
339	Structural and optical characterization of low-temperature ALD crystalline AlN
340	Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
341	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
342	Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
343	Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
344	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
345	Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
346	Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
347	Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
348	Study on the characteristics of aluminum thin films prepared by atomic layer deposition
349	Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
350	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
351	Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
352	Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
353	Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
354	Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
355	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
356	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
357	Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
358	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
359	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
360	Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
361	Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
362	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
363	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
364	Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
365	Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
366	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
367	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
368	The effects of layering in ferroelectric Si-doped HfO2 thin films
369	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
370	The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
371	The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
372	The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
373	The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
374	The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
375	The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
376	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
377	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
378	Thin film GaP for solar cell application
379	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
380	TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
381	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
382	Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
383	Tribological properties of thin films made by atomic layer deposition sliding against silicon
384	Trilayer Tunnel Selectors for Memristor Memory Cells
385	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
386	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
387	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
388	Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
389	Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
390	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
391	Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
392	Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
393	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
394	WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
395	Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
396	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
397	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

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