Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
2A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
4A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
5A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
6A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
7A route to low temperature growth of single crystal GaN on sapphire
8Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
9Advances in the fabrication of graphene transistors on flexible substrates
10Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
11Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
12ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
13AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
14AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
15Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
16Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
17An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
18An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
19Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
20Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
21Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
22Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
23Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
24Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
25Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
26Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
27Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
28Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
29Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
30Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
31Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
32Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
33Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
34Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
35Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
36Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
37Atomic layer deposition of GaN at low temperatures
38Atomic Layer Deposition of Gold Metal
39Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
40Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
41Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
42Atomic layer deposition of InN using trimethylindium and ammonia plasma
43Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
44Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
45Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
46Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
47Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
48Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
49Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
50Atomic Layer Deposition of the Solid Electrolyte LiPON
51Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
52Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
53Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
54Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
55Atomic layer epitaxy of Si using atomic H
56Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
57Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
58Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
59Biofilm prevention on cochlear implants
60Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
61Breakdown and Protection of ALD Moisture Barrier Thin Films
62Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
63Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
64Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
65Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
66Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
67Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
68Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
69Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
70Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
71Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
72Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
73Comparative study of ALD SiO2 thin films for optical applications
74Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
75Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
76Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
77Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
78Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
79Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
80Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
81Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
82Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
83Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
84Copper-ALD Seed Layer as an Enabler for Device Scaling
85Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
86Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
87Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
88Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
89Crystalline growth of AlN thin films by atomic layer deposition
90Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
91Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
92Densification of Thin Aluminum Oxide Films by Thermal Treatments
93Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
94Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
95Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
96Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
97Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
98Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
99Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
100Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
101Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
102Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
103Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
104Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
105Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
106Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
107Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
108Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
109Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
110Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
111Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
112Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
113Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
114Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
115Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
116Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
117Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
118Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
119Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
120Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
121Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
122Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
123Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
124Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
125Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
126Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
127Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
128Evaluation of plasma parameters on PEALD deposited TaCN
129Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
130Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
131Fast PEALD ZnO Thin-Film Transistor Circuits
132Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
133Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
134Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
135Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
136Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
137From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
138Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
139Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
140Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
141Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
142Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
143Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
144Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
145Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
146Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
147Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
148Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
149Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
150High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
151High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
152High-Reflective Coatings For Ground and Space Based Applications
153High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
154Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
155Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
156Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
157Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
158Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
159Hydrogen plasma-enhanced atomic layer deposition of copper thin films
160Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
161Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
162Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
163Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
164Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
165Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
166Improved understanding of recombination at the Si/Al2O3 interface
167Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
168Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
169Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
170Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
171In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
172In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
173In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
174Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
175Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
176Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
177Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
178Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
179Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
180Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
181Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
182Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
183Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
184Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
185Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
186Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
187Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
188Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
189Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
190Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
191Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
192Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
193Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
194Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
195Layer-by-layer epitaxial growth of GaN at low temperatures
196Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
197Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
198Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
199Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
200Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
201Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
202Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
203Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
204Low temperature plasma enhanced deposition of GaP films on Si substrate
205Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
206Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
207Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
208Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
209Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
210Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
211Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
212Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
213Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
214Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
215Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
216Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
217Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
218Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
219Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
220Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
221Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
222Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
223Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
224Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
225Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
226Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
227Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
228MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
229Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
230Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
231New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
232Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
233Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
234Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
235Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
236Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
237Oxygen migration in TiO2-based higher-k gate stacks
238PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
239PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
240PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
241Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
242Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
243Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
244Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
245Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
246Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
247Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
248Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
249Plasma enhanced atomic layer deposition of Fe2O3 thin films
250Plasma enhanced atomic layer deposition of Ga2O3 thin films
251Plasma enhanced atomic layer deposition of gallium sulfide thin films
252Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
253Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
254Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
255Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
256Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
257Plasma enhanced atomic layer deposition of zinc sulfide thin films
258Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
259Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
260Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
261Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
262Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
263Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
264Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
265Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
266Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
267Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
268Plasma-Assisted Atomic Layer Deposition of Palladium
269Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
270Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
271Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
272Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
273Plasma-enhanced ALD system for SRF cavity
274Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
275Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
276Plasma-enhanced atomic layer deposition of BaTiO3
277Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
278Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
279Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
280Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
281Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
282Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
283Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
284Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
285Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
286Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
287Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
288Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
289Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
290Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
291Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
292Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
293Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
294Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
295Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
296Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
297Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
298Properties of AlN grown by plasma enhanced atomic layer deposition
299Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
300Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
301Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
302Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
303Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
304Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
305Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
306Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
307Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
308Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
309Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
310Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
311Remote Plasma ALD of Platinum and Platinum Oxide Films
312Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
313Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
314Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
315Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
316Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
317Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
318Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
319Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
320Room-Temperature Atomic Layer Deposition of Platinum
321Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
322Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
323Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
324Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
325Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
326Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
327Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
328Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
329Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
330SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
331Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
332Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
333Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
334Structural and optical characterization of low-temperature ALD crystalline AlN
335Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
336Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
337Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
338Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
339Study on the characteristics of aluminum thin films prepared by atomic layer deposition
340Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
341Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
342Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
343Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
344Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
345The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
346The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
347The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
348The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
349The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
350The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
351The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
352The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
353The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
354The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
355Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
356Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
357Thin film GaP for solar cell application
358Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
359TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
360Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
361Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
362Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
363Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
364Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
365Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
366Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
367Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
368Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
369Very high frequency plasma reactant for atomic layer deposition
370Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
371WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
372XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
373ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
374ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
375ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition