Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
2A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
4A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
5A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
6A route to low temperature growth of single crystal GaN on sapphire
7Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
8Advances in the fabrication of graphene transistors on flexible substrates
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
11ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
12AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
13AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
14Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
15Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
16An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
17An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
18Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
19Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
20Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
21Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
22Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
23Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
24Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
25Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
26Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
27Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
28Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
29Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
30Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
31Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
32Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
33Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
34Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
35Atomic layer deposition of GaN at low temperatures
36Atomic Layer Deposition of Gold Metal
37Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
38Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
39Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
40Atomic layer deposition of InN using trimethylindium and ammonia plasma
41Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
42Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
43Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
44Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
45Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
46Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
47Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
48Atomic Layer Deposition of the Solid Electrolyte LiPON
49Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
50Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
51Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
52Atomic layer epitaxy of Si using atomic H
53Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
54Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
55Biofilm prevention on cochlear implants
56Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
57Breakdown and Protection of ALD Moisture Barrier Thin Films
58Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
59Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
60Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
61Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
62Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
63Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
64Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
65Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
66Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
67Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
68Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
69Comparative study of ALD SiO2 thin films for optical applications
70Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
71Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
72Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
73Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
74Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
75Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
76Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
77Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
78Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
79Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
80Copper-ALD Seed Layer as an Enabler for Device Scaling
81Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
82Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
83Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
84Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
85Crystalline growth of AlN thin films by atomic layer deposition
86Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
87Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
88Densification of Thin Aluminum Oxide Films by Thermal Treatments
89Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
90Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
91Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
92Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
93Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
94Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
95Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
96Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
97Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
98Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
99Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
100Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
101Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
102Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
103Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
104Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
105Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
106Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
107Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
108Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
109Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
110Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
111Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
112Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
113Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
114Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
115Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
116Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
117Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
118Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
119Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
120Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
121Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
122Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
123Evaluation of plasma parameters on PEALD deposited TaCN
124Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
125Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
126Fast PEALD ZnO Thin-Film Transistor Circuits
127Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
128Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
129Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
130Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
131Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
132Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
133Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
134Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
135Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
136Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
137Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
138Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
139Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
140Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
141Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
142Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
143Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
144High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
145High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
146High-Reflective Coatings For Ground and Space Based Applications
147High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
148Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
149Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
150Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
151Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
152Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
153Hydrogen plasma-enhanced atomic layer deposition of copper thin films
154Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
155Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
156Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
157Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
158Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
159Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
160Improved understanding of recombination at the Si/Al2O3 interface
161Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
162Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
163Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
164Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
165In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
166In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
167Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
168Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
169Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
170Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
171Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
172Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
173Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
174Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
175Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
176Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
177Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
178Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
179Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
180Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
181Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
182Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
183Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
184Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
185Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
186Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
187Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
188Layer-by-layer epitaxial growth of GaN at low temperatures
189Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
190Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
191Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
192Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
193Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
194Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
195Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
196Low temperature plasma enhanced deposition of GaP films on Si substrate
197Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
198Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
199Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
200Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
201Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
202Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
203Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
204Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
205Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
206Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
207Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
208Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
209Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
210Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
211Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
212Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
213Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
214Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
215Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
216Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
217Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
218Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
219MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
220Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
221Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
222New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
223Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
224Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
225Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
226Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
227Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
228Oxygen migration in TiO2-based higher-k gate stacks
229PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
230PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
231PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
232Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
233Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
234Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
235Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
236Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
237Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
238Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
239Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
240Plasma enhanced atomic layer deposition of Fe2O3 thin films
241Plasma enhanced atomic layer deposition of Ga2O3 thin films
242Plasma enhanced atomic layer deposition of gallium sulfide thin films
243Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
244Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
245Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
246Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
247Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
248Plasma enhanced atomic layer deposition of zinc sulfide thin films
249Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
250Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
251Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
252Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
253Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
254Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
255Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
256Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
257Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
258Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
259Plasma-Assisted Atomic Layer Deposition of Palladium
260Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
261Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
262Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
263Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
264Plasma-enhanced ALD system for SRF cavity
265Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
266Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
267Plasma-enhanced atomic layer deposition of BaTiO3
268Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
269Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
270Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
271Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
272Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
273Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
274Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
275Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
276Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
277Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
278Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
279Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
280Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
281Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
282Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
283Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
284Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
285Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
286Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
287Properties of AlN grown by plasma enhanced atomic layer deposition
288Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
289Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
290Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
291Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
292Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
293Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
294Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
295Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
296Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
297Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
298Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
299Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
300Remote Plasma ALD of Platinum and Platinum Oxide Films
301Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
302Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
303Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
304Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
305Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
306Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
307Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
308Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
309Room-Temperature Atomic Layer Deposition of Platinum
310Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
311Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
312Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
313Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
314Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
315Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
316Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
317Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
318Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
319SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
320Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
321Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
322Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
323Structural and optical characterization of low-temperature ALD crystalline AlN
324Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
325Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
326Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
327Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
328Study on the characteristics of aluminum thin films prepared by atomic layer deposition
329Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
330Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
331Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
332Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
333Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
334The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
335The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
336The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
337The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
338The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
339The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
340The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
341The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
342The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
343The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
344Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
345Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
346Thin film GaP for solar cell application
347Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
348TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
349Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
350Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
351Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
352Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
353Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
354Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
355Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
356Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
357Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
358Very high frequency plasma reactant for atomic layer deposition
359Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
360WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
361XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
362ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
363ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
364ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition