Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

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Number	Title
1	(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
2	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3	A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
4	A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
5	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
6	A route to low temperature growth of single crystal GaN on sapphire
7	Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
8	Advances in the fabrication of graphene transistors on flexible substrates
9	Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
11	ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
12	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
13	AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
14	Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
15	Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
16	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
17	An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
18	Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
19	Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
20	Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
21	Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
22	Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
23	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
24	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
25	Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
26	Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
27	Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
28	Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
29	Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
30	Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
31	Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
32	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
33	Atomic layer deposition of GaN at low temperatures
34	Atomic Layer Deposition of Gold Metal
35	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
36	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
37	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
38	Atomic layer deposition of InN using trimethylindium and ammonia plasma
39	Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
40	Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
41	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
42	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
43	Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
44	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
45	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
46	Atomic Layer Deposition of the Solid Electrolyte LiPON
47	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
48	Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
49	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
50	Atomic layer epitaxy of Si using atomic H
51	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
52	Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
53	Biofilm prevention on cochlear implants
54	Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
55	Breakdown and Protection of ALD Moisture Barrier Thin Films
56	Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
57	Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
58	Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
59	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
60	Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
61	Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
62	Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
63	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
64	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
65	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
66	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
67	Comparative study of ALD SiO2 thin films for optical applications
68	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
69	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
70	Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
71	Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
72	Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
73	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
74	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
75	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
76	Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
77	Copper-ALD Seed Layer as an Enabler for Device Scaling
78	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
79	Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
80	Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
81	Crystalline growth of AlN thin films by atomic layer deposition
82	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
83	Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
84	Densification of Thin Aluminum Oxide Films by Thermal Treatments
85	Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
86	Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
87	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
88	Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
89	Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
90	Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
91	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
92	Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
93	Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
94	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
95	Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
96	Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
97	Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
98	Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
99	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
100	Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
101	Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
102	Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
103	Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
104	Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
105	Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
106	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
107	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
108	Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
109	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
110	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
111	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
112	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
113	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
114	Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
115	Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
116	Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
117	Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
118	Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
119	Evaluation of plasma parameters on PEALD deposited TaCN
120	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
121	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
122	Fast PEALD ZnO Thin-Film Transistor Circuits
123	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
124	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
125	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
126	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
127	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
128	Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
129	Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
130	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
131	Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
132	Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
133	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
134	Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
135	Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
136	High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
137	High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
138	High-Reflective Coatings For Ground and Space Based Applications
139	High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
140	Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
141	Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
142	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
143	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
144	Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
145	Hydrogen plasma-enhanced atomic layer deposition of copper thin films
146	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
147	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
148	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
149	Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
150	Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
151	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
152	Improved understanding of recombination at the Si/Al2O3 interface
153	Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
154	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
155	Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
156	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
157	In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
158	In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
159	Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
160	Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
161	Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
162	Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
163	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
164	Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
165	Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
166	Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
167	Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
168	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
169	Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
170	Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
171	Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
172	Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
173	Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
174	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
175	Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
176	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
177	Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
178	Layer-by-layer epitaxial growth of GaN at low temperatures
179	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
180	Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
181	Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
182	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
183	Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
184	Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
185	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
186	Low temperature plasma enhanced deposition of GaP films on Si substrate
187	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
188	Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
189	Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
190	Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
191	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
192	Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
193	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
194	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
195	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
196	Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
197	Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
198	Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
199	Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
200	Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
201	Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
202	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
203	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
204	Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
205	Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
206	Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
207	Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
208	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
209	MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
210	Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
211	Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
212	New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
213	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
214	Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
215	Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
216	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
217	Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
218	Oxygen migration in TiO2-based higher-k gate stacks
219	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
220	PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
221	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
222	Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
223	Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
224	Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
225	Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
226	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
227	Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
228	Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
229	Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
230	Plasma enhanced atomic layer deposition of Fe2O3 thin films
231	Plasma enhanced atomic layer deposition of Ga2O3 thin films
232	Plasma enhanced atomic layer deposition of gallium sulfide thin films
233	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
234	Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
235	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
236	Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
237	Plasma enhanced atomic layer deposition of zinc sulfide thin films
238	Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
239	Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
240	Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
241	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
242	Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
243	Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
244	Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
245	Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
246	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
247	Plasma-Assisted Atomic Layer Deposition of Palladium
248	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
249	Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
250	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
251	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
252	Plasma-enhanced ALD system for SRF cavity
253	Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
254	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
255	Plasma-enhanced atomic layer deposition of BaTiO3
256	Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
257	Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
258	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
259	Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
260	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
261	Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
262	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
263	Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
264	Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
265	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
266	Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
267	Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
268	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
269	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
270	Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
271	Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
272	Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
273	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
274	Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
275	Properties of AlN grown by plasma enhanced atomic layer deposition
276	Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
277	Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
278	Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
279	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
280	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
281	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
282	Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
283	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
284	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
285	Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
286	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
287	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
288	Remote Plasma ALD of Platinum and Platinum Oxide Films
289	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
290	Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
291	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
292	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
293	Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
294	Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
295	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
296	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
297	Room-Temperature Atomic Layer Deposition of Platinum
298	Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
299	Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
300	Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
301	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
302	Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
303	Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
304	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
305	Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
306	Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
307	SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
308	Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
309	Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
310	Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
311	Structural and optical characterization of low-temperature ALD crystalline AlN
312	Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
313	Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
314	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
315	Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
316	Study on the characteristics of aluminum thin films prepared by atomic layer deposition
317	Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
318	Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
319	Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
320	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
321	Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
322	The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
323	The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
324	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
325	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
326	The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
327	The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
328	The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
329	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
330	The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
331	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
332	Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
333	Thin film GaP for solar cell application
334	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
335	TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
336	Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
337	Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
338	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
339	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
340	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
341	Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
342	Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
343	Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
344	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
345	Very high frequency plasma reactant for atomic layer deposition
346	Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
347	WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
348	ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
349	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
350	ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition

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