Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Morphology, Roughness, Topography returned 367 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
2A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
4A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
5A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
6A route to low temperature growth of single crystal GaN on sapphire
7Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
8Advances in the fabrication of graphene transistors on flexible substrates
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
11ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
12AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
13AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
14Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
15Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
16An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
17An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
18Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
19Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
20Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
21Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
22Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
23Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
24Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
25Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
26Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
27Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
28Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
29Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
30Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
31Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
32Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
33Atomic layer deposition of GaN at low temperatures
34Atomic Layer Deposition of Gold Metal
35Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
36Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
37Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
38Atomic layer deposition of InN using trimethylindium and ammonia plasma
39Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
40Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
41Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
42Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
43Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
44Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
45Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
46Atomic Layer Deposition of the Solid Electrolyte LiPON
47Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
48Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
49Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
50Atomic layer epitaxy of Si using atomic H
51Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
52Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
53Biofilm prevention on cochlear implants
54Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
55Breakdown and Protection of ALD Moisture Barrier Thin Films
56Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
57Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
58Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
59Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
60Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
61Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
62Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
63Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
64Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
65Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
66Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
67Comparative study of ALD SiO2 thin films for optical applications
68Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
69Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
70Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
71Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
72Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
73Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
74Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
75Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
76Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
77Copper-ALD Seed Layer as an Enabler for Device Scaling
78Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
79Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
80Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
81Crystalline growth of AlN thin films by atomic layer deposition
82Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
83Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
84Densification of Thin Aluminum Oxide Films by Thermal Treatments
85Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
86Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
87Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
88Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
89Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
90Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
91Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
92Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
93Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
94Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
95Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
96Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
97Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
98Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
99Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
100Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
101Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
102Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
103Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
104Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
105Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
106Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
107Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
108Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
109Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
110Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
111Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
112Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
113Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
114Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
115Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
116Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
117Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
118Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
119Evaluation of plasma parameters on PEALD deposited TaCN
120Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
121Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
122Fast PEALD ZnO Thin-Film Transistor Circuits
123Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
124Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
125Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
126Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
127Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
128Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
129Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
130Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
131Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
132Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
133Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
134Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
135Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
136High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
137High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
138High-Reflective Coatings For Ground and Space Based Applications
139High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
140Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
141Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
142Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
143Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
144Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
145Hydrogen plasma-enhanced atomic layer deposition of copper thin films
146Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
147Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
148Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
149Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
150Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
151Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
152Improved understanding of recombination at the Si/Al2O3 interface
153Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
154Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
155Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
156Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
157In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
158In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
159Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
160Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
161Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
162Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
163Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
164Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
165Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
166Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
167Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
168Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
169Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
170Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
171Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
172Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
173Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
174Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
175Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
176Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
177Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
178Layer-by-layer epitaxial growth of GaN at low temperatures
179Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
180Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
181Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
182Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
183Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
184Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
185Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
186Low temperature plasma enhanced deposition of GaP films on Si substrate
187Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
188Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
189Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
190Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
191Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
192Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
193Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
194Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
195Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
196Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
197Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
198Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
199Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
200Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
201Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
202Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
203Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
204Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
205Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
206Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
207Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
208Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
209MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
210Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
211Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
212New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
213Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
214Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
215Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
216Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
217Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
218Oxygen migration in TiO2-based higher-k gate stacks
219PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
220PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
221PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
222Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
223Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
224Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
225Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
226Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
227Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
228Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
229Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
230Plasma enhanced atomic layer deposition of Fe2O3 thin films
231Plasma enhanced atomic layer deposition of Ga2O3 thin films
232Plasma enhanced atomic layer deposition of gallium sulfide thin films
233Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
234Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
235Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
236Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
237Plasma enhanced atomic layer deposition of zinc sulfide thin films
238Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
239Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
240Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
241Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
242Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
243Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
244Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
245Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
246Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
247Plasma-Assisted Atomic Layer Deposition of Palladium
248Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
249Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
250Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
251Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
252Plasma-enhanced ALD system for SRF cavity
253Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
254Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
255Plasma-enhanced atomic layer deposition of BaTiO3
256Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
257Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
258Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
259Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
260Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
261Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
262Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
263Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
264Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
265Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
266Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
267Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
268Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
269Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
270Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
271Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
272Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
273Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
274Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
275Properties of AlN grown by plasma enhanced atomic layer deposition
276Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
277Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
278Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
279Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
280Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
281Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
282Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
283Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
284Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
285Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
286Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
287Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
288Remote Plasma ALD of Platinum and Platinum Oxide Films
289Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
290Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
291Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
292Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
293Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
294Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
295Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
296Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
297Room-Temperature Atomic Layer Deposition of Platinum
298Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
299Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
300Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
301Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
302Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
303Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
304Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
305Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
306Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
307SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
308Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
309Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
310Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
311Structural and optical characterization of low-temperature ALD crystalline AlN
312Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
313Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
314Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
315Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
316Study on the characteristics of aluminum thin films prepared by atomic layer deposition
317Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
318Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
319Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
320Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
321Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
322The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
323The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
324The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
325The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
326The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
327The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
328The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
329The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
330The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
331Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
332Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
333Thin film GaP for solar cell application
334Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
335TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
336Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
337Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
338Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
339Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
340Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
341Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
342Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
343Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
344Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
345Very high frequency plasma reactant for atomic layer deposition
346Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
347WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
348ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
349ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
350ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition


Shortcuts



© 2014-2020 plasma-ald.com