Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Morphology, Roughness, Topography returned 343 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
2A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
4A route to low temperature growth of single crystal GaN on sapphire
5Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
6Advances in the fabrication of graphene transistors on flexible substrates
7Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
8Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
9AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
10Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
11Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
12An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
13An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
14Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
15Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
16Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
17Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
18Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
19Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
20Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
21Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
22Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
23Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
24Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
25Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
26Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
27Atomic layer deposition of GaN at low temperatures
28Atomic Layer Deposition of Gold Metal
29Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
30Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
31Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
32Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
33Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
34Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
35Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
36Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
37Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
38Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
39Atomic Layer Deposition of the Solid Electrolyte LiPON
40Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
41Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
42Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
43Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
44Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
45Biofilm prevention on cochlear implants
46Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
47Breakdown and Protection of ALD Moisture Barrier Thin Films
48Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
49Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
50Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
51Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
52Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
53Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
54Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
55Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
56Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
57Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
58Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
59Comparative study of ALD SiO2 thin films for optical applications
60Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
61Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
62Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
63Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
64Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
65Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
66Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
67Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
68Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
69Copper-ALD Seed Layer as an Enabler for Device Scaling
70Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
71Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
72Crystalline growth of AlN thin films by atomic layer deposition
73Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
74Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
75Densification of Thin Aluminum Oxide Films by Thermal Treatments
76Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
77Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
78Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
79Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
80Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
81Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
82Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
83Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
84Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
85Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
86Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
87Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
88Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
89Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
90Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
91Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
92Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
93Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
94Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
95Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
96Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
97Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
98Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
99Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
100Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
101Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
102Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
103Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
104Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
105Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
106Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
107Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
108Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
109Evaluation of plasma parameters on PEALD deposited TaCN
110Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
111Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
112Fast PEALD ZnO Thin-Film Transistor Circuits
113Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
114Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
115Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
116Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
117Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
118Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
119Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
120Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
121Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
122Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
123Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
124Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
125High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
126High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
127High-Reflective Coatings For Ground and Space Based Applications
128High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
129Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
130Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
131Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
132Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
133Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
134Hydrogen plasma-enhanced atomic layer deposition of copper thin films
135Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
136Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
137Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
138Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
139Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
140Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
141Improved understanding of recombination at the Si/Al2O3 interface
142Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
143Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
144Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
145Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
146In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
147In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
148Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
149Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
150Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
151Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
152Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
153Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
154Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
155Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
156Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
157Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
158Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
159Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
160Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
161Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
162Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
163Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
164Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
165Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
166Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
167Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
168Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
169Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
170Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
171Low temperature plasma enhanced deposition of GaP films on Si substrate
172Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
173Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
174Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
175Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
176Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
177Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
178Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
179Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
180Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
181Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
182Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
183Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
184Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
185Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
186Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
187Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
188Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
189Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
190Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
191Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
192Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
193Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
194Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
195New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
196Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
197Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
198Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
199Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
200Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
201Oxygen migration in TiO2-based higher-k gate stacks
202PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
203PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
204PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
205Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
206Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
207Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
208Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
209Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
210Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
211Plasma enhanced atomic layer deposition of Fe2O3 thin films
212Plasma enhanced atomic layer deposition of Ga2O3 thin films
213Plasma enhanced atomic layer deposition of gallium sulfide thin films
214Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
215Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
216Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
217Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
218Plasma enhanced atomic layer deposition of zinc sulfide thin films
219Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
220Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
221Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
222Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
223Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
224Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
225Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
226Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
227Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
228Plasma-Assisted Atomic Layer Deposition of Palladium
229Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
230Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
231Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
232Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
233Plasma-enhanced ALD system for SRF cavity
234Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
235Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
236Plasma-enhanced atomic layer deposition of BaTiO3
237Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
238Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
239Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
240Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
241Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
242Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
243Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
244Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
245Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
246Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
247Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
248Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
249Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
250Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
251Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
252Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
253Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
254Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
255Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
256Properties of AlN grown by plasma enhanced atomic layer deposition
257Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
258Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
259Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
260Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
261Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
262Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
263Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
264Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
265Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
266Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
267Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
268Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
269Remote Plasma ALD of Platinum and Platinum Oxide Films
270Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
271Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
272Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
273Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
274Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
275Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
276Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
277Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
278Room-Temperature Atomic Layer Deposition of Platinum
279Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
280Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
281Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
282Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
283Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
284Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
285Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
286Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
287SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
288Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
289Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
290Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
291Structural and optical characterization of low-temperature ALD crystalline AlN
292Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
293Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
294Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
295Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
296Study on the characteristics of aluminum thin films prepared by atomic layer deposition
297Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
298Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
299Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
300Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
301Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
302The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
303The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
304The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
305The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
306The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
307The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
308The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
309Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
310Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
311Thin film GaP for solar cell application
312Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
313TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
314Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
315Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
316Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
317Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
318Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
319Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
320Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
321Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
322Very high frequency plasma reactant for atomic layer deposition
323Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
324WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
325ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
326ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
327ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition


Shortcuts



© 2014-2019 plasma-ald.com