Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Morphology, Roughness, Topography returned 316 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
2A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
4A route to low temperature growth of single crystal GaN on sapphire
5Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
6Advances in the fabrication of graphene transistors on flexible substrates
7Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
8Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
9AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
10Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
11Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
12An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
13An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
14Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
15Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
16Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
17Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
18Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
19Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
20Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
21Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
22Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
23Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
24Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
25Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
26Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
27Atomic layer deposition of GaN at low temperatures
28Atomic Layer Deposition of Gold Metal
29Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
30Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
31Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
32Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
33Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
34Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
35Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
36Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
37Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
38Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
39Atomic Layer Deposition of the Solid Electrolyte LiPON
40Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
41Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
42Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
43Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
44Biofilm prevention on cochlear implants
45Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
46Breakdown and Protection of ALD Moisture Barrier Thin Films
47Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
48Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
49Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
50Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
51Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
52Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
53Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
54Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
55Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
56Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
57Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
58Comparative study of ALD SiO2 thin films for optical applications
59Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
60Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
61Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
62Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
63Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
64Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
65Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
66Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
67Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
68Copper-ALD Seed Layer as an Enabler for Device Scaling
69Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
70Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
71Crystalline growth of AlN thin films by atomic layer deposition
72Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
73Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
74Densification of Thin Aluminum Oxide Films by Thermal Treatments
75Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
76Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
77Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
78Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
79Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
80Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
81Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
82Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
83Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
84Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
85Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
86Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
87Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
88Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
89Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
90Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
91Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
92Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
93Electrical characteristics of β-Ga2O3 thin films grown by PEALD
94Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
95Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
96Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
97Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
98Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
99Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
100Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
101Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
102Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
103Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
104Evaluation of plasma parameters on PEALD deposited TaCN
105Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
106Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
107Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
108Fast PEALD ZnO Thin-Film Transistor Circuits
109Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
110Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
111Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
112Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
113Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
114Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
115Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
116Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
117Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
118Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
119Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
120Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
121High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
122High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
123High-Reflective Coatings For Ground and Space Based Applications
124High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
125Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
126Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
127Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
128Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
129Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
130Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
131Hydrogen plasma-enhanced atomic layer deposition of copper thin films
132Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
133Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
134Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
135Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
136Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
137Improved understanding of recombination at the Si/Al2O3 interface
138Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
139Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
140Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
141In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
142Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
143Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
144Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
145Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
146Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
147Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
148Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
149Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
150Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
151Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
152Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
153Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
154Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
155Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
156Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
157Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
158Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
159Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
160Low temperature plasma enhanced deposition of GaP films on Si substrate
161Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
162Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
163Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
164Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
165Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
166Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
167Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
168Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
169Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
170Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
171Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
172Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
173Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
174Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
175Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
176Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
177Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
178Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
179Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
180Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
181Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
182Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
183Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
184Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
185Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
186New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
187Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
188Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
189Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
190Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
191Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
192Oxygen migration in TiO2-based higher-k gate stacks
193PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
194PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
195Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
196Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
197Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
198Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
199Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
200Plasma enhanced atomic layer deposition of Fe2O3 thin films
201Plasma enhanced atomic layer deposition of Ga2O3 thin films
202Plasma enhanced atomic layer deposition of gallium sulfide thin films
203Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
204Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
205Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
206Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
207Plasma enhanced atomic layer deposition of zinc sulfide thin films
208Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
209Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
210Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
211Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
212Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
213Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
214Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
215Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
216Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
217Plasma-Assisted Atomic Layer Deposition of Palladium
218Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
219Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
220Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
221Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
222Plasma-enhanced ALD system for SRF cavity
223Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
224Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
225Plasma-enhanced atomic layer deposition of BaTiO3
226Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
227Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
228Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
229Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
230Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
231Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
232Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
233Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
234Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
235Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
236Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
237Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
238Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
239Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
240Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
241Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
242Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
243Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
244Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
245Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
246Properties of AlN grown by plasma enhanced atomic layer deposition
247Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
248Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
249Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
250Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
251Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
252Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
253Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
254Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
255Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
256Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition
257Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
258Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
259Remote Plasma ALD of Platinum and Platinum Oxide Films
260Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
261Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
262Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
263Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
264Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
265Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
266Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
267Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
268Room-Temperature Atomic Layer Deposition of Platinum
269Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
270Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
271Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
272Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
273Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
274Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
275Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
276Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
277SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
278Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
279Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
280Structural and optical characterization of low-temperature ALD crystalline AlN
281Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
282Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
283Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
284Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
285Study on the characteristics of aluminum thin films prepared by atomic layer deposition
286Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
287Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
288Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
289Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
290Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
291Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
292The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
293The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
294The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
295The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
296The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
297The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
298The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
299Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
300Thin film GaP for solar cell application
301Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
302TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
303Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
304Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
305Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
306Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
307Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
308Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
309Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
310Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
311Very high frequency plasma reactant for atomic layer deposition
312Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
313WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
314ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
315ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
316ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition


Shortcuts



© 2014-2019 plasma-ald.com