Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Morphology, Roughness, Topography returned 414 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
2A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
4A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
5A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
6A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
7A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
8A route to low temperature growth of single crystal GaN on sapphire
9Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
10Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
11Advances in the fabrication of graphene transistors on flexible substrates
12Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
13Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
15AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
16AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
17Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
18Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
19Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
20An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
21An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
22Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
23Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
24Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
25Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
26Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
27Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
28Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
29Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
30Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
31Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
32Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
33Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
34Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
35Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
36Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
37Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
38Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
39Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
40Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
41Atomic layer deposition of GaN at low temperatures
42Atomic Layer Deposition of Gold Metal
43Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
44Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
45Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
46Atomic layer deposition of InN using trimethylindium and ammonia plasma
47Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
48Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
49Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
50Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
51Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
52Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
53Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
54Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
55Atomic Layer Deposition of the Solid Electrolyte LiPON
56Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
57Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
58Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
59Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
60Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
61Atomic layer epitaxy of Si using atomic H
62Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
63Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
64Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
65Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
66Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
67Biofilm prevention on cochlear implants
68Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
69Breakdown and Protection of ALD Moisture Barrier Thin Films
70Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
71Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
72Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
73Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
74Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
75Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
76Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
77Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
78Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
79Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
80Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
81Comparative study of ALD SiO2 thin films for optical applications
82Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
83Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
84Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
85Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
86Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
87Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
88Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
89Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
90Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
91Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
92Copper-ALD Seed Layer as an Enabler for Device Scaling
93Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
94Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
95Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
96Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
97Crystalline growth of AlN thin films by atomic layer deposition
98Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
99Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
100Densification of Thin Aluminum Oxide Films by Thermal Treatments
101Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
102Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
103Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
104Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
105Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
106Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
107Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
108Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
109Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
110Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
111Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
112Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
113Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
114Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
115Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
116Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
117Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
118Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
119Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
120Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
121Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
122Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
123Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
124Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
125Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
126Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
127Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
128Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
129Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
130Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
131Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
132Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
133Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
134Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
135Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
136Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
137Evaluation of plasma parameters on PEALD deposited TaCN
138Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
139Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
140Fast PEALD ZnO Thin-Film Transistor Circuits
141Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
142Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
143Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
144Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
145Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
146From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
147Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
148Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
149Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
150Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
151Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
152Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
153Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
154Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
155Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
156Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
157Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
158Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
159High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
160High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
161High-Reflective Coatings For Ground and Space Based Applications
162High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
163Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
164Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
165Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
166Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
167Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
168Hydrogen plasma-enhanced atomic layer deposition of copper thin films
169Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
170Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
171Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
172Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
173Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
174Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
175Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
176Improved understanding of recombination at the Si/Al2O3 interface
177Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
178Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
179Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
180Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
181In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
182In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
183In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
184Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
185Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
186Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
187Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
188Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
189Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
190Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
191Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
192Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
193Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
194Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
195Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
196Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
197Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
198Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
199Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
200Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
201Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
202Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
203Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
204Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
205Layer-by-layer epitaxial growth of GaN at low temperatures
206Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
207Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
208Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
209Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
210Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
211Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
212Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
213Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
214Low temperature plasma enhanced deposition of GaP films on Si substrate
215Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
216Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
217Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
218Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
219Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
220Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
221Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
222Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
223Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
224Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
225Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
226Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
227Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
228Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
229Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
230Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
231Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
232Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
233Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
234Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
235Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
236Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
237Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
238Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
239MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
240Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
241Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
242Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
243New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
244Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
245Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
246Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
247Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
248Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
249Oxygen migration in TiO2-based higher-k gate stacks
250PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
251PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
252PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
253Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
254Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
255Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
256Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
257Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
258Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
259Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
260Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
261Plasma enhanced atomic layer deposition of Fe2O3 thin films
262Plasma enhanced atomic layer deposition of Ga2O3 thin films
263Plasma enhanced atomic layer deposition of gallium sulfide thin films
264Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
265Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
266Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
267Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
268Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
269Plasma enhanced atomic layer deposition of zinc sulfide thin films
270Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
271Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
272Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
273Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
274Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
275Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
276Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
277Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
278Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
279Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
280Plasma-Assisted Atomic Layer Deposition of Palladium
281Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
282Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
283Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
284Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
285Plasma-enhanced ALD system for SRF cavity
286Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
287Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
288Plasma-enhanced atomic layer deposition of BaTiO3
289Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
290Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
291Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
292Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
293Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
294Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
295Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
296Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
297Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
298Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
299Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
300Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
301Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
302Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
303Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
304Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
305Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
306Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
307Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
308Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
309Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
310Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
311Properties of AlN grown by plasma enhanced atomic layer deposition
312Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
313Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
314Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
315Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
316Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
317Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
318Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
319Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
320Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
321Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
322Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
323Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
324Remote Plasma ALD of Platinum and Platinum Oxide Films
325Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
326Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
327Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
328Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
329Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
330Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
331Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
332Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
333Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
334Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
335Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
336Room-Temperature Atomic Layer Deposition of Platinum
337Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
338Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
339Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
340Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
341Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
342Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
343Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
344Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
345Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
346SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
347Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
348Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
349Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
350Structural and optical characterization of low-temperature ALD crystalline AlN
351Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
352Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
353Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
354Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
355Study on the characteristics of aluminum thin films prepared by atomic layer deposition
356Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
357Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
358Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
359Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
360Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
361Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
362Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
363Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
364Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
365The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
366The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
367The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
368The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
369The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
370The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
371The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
372The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
373The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
374The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
375Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
376Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
377Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
378Thin film GaP for solar cell application
379Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
380TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
381Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
382Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
383Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
384Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
385Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
386Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
387Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
388Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
389Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
390Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
391Very high frequency plasma reactant for atomic layer deposition
392Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
393WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
394XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
395ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
396ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
397ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition