Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Morphology, Roughness, Topography returned 505 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
2Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
3Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
4Remote Plasma ALD of Platinum and Platinum Oxide Films
5Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
6Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
7Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
8Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
9Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
10Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
11Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
12Densification of Thin Aluminum Oxide Films by Thermal Treatments
13ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
14The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
15Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
16Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
17Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
18The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
19Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
20Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
21Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
22Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
23Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
24Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
25PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
26Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
27Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
28Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
29Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
30Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
31Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
32XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
33Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
34Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
35Oxygen migration in TiO2-based higher-k gate stacks
36Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
37Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
38PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
39Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
40Plasma enhanced atomic layer deposition of Ga2O3 thin films
41Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
42Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
43Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
44Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
45Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
46WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
47RF Characterization of Novel Superconducting Materials and Multilayers
48A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
49Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
50Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
51Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
52Evaluation of plasma parameters on PEALD deposited TaCN
53Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
54Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
55Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
56Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
57Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
58Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
59Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
60Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
61Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
62Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
63Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
64Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
65Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
66Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
67Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
68Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
69Tuning size and coverage of Pd nanoparticles using atomic layer deposition
70Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
71Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
72MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
73Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
74Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
75Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
76Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
77Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
78Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
79Very high frequency plasma reactant for atomic layer deposition
80Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
81Hydrogen plasma-enhanced atomic layer deposition of copper thin films
82Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
83Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
84Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
85The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
86Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
87Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
88Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
89Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
90Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
91Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
92Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
93Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
94Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
95Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
96Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
97Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
98Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
99Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
100Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
101Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
102Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
103Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
104Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
105Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
106Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
107Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
108Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
109Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
110Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
111Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
112Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
113Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
114(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
115Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
116The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
117Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
118Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
119Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
120Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
121Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
122Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
123Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
124Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
125Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
126Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
127Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
128Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
129Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
130Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
131Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
132Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
133Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
134Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
135Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
136High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
137Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
138In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
139Copper-ALD Seed Layer as an Enabler for Device Scaling
140Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
141Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
142Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
143Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
144Low temperature plasma enhanced deposition of GaP films on Si substrate
145Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
146Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
147Room-Temperature Atomic Layer Deposition of Platinum
148Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
149Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
150ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
151The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
152Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
153Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
154Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
155Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
156Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
157Atomic hydrogen-assisted ALE of germanium
158Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
159Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
160Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
161Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
162Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
163Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
164Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
165Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
166Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
167Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
168Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
169Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
170Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
171Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
172Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
173Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
174Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
175Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
176Plasma-Assisted Atomic Layer Deposition of Palladium
177Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
178Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
179Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
180Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
181Thin film GaP for solar cell application
182Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
183Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
184Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
185Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
186Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
187Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
188AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
189Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
190Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
191Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
192An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
193Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
194Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
195Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
196Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
197Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
198Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
199Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
200Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
201Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
202Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
203Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
204Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
205Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
206Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
207Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
208Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
209Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
210Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
211A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
212Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
213Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
214Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
215Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
216Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
217Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
218In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
219Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
220Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
221Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
222Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
223Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
224Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
225Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
226A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
227Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
228Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
229High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
230High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
231Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
232Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
233Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
234Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
235Experimental and theoretical determination of the role of ions in atomic layer annealing
236Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
237Atomic layer epitaxy of Si using atomic H
238The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
239Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
240Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
241Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
242ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
243Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
244Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
245Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
246Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
247Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
248Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
249Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
250Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
251Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
252Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
253Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
254PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
255Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
256Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
257Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
258Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
259In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
260Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
261Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
262Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
263Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
264Crystalline growth of AlN thin films by atomic layer deposition
265Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
266Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
267Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
268Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
269Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
270Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
271Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
272Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
273Plasma enhanced atomic layer deposition of zinc sulfide thin films
274Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
275Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
276Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
277Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
278Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
279Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
280Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
281Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
282Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
283Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
284Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
285Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
286Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
287Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
288Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
289Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
290Atomic Layer Deposition of Gold Metal
291A route to low temperature growth of single crystal GaN on sapphire
292Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
293Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
294Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
295A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
296Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
297Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
298Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
299A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
300Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
301From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
302Plasma enhanced atomic layer deposition of gallium sulfide thin films
303Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
304Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
305Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
306Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
307Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
308Comparative study of ALD SiO2 thin films for optical applications
309Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
310The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
311Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
312Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
313TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
314Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
315Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
316Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
317Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
318Layer-by-layer epitaxial growth of GaN at low temperatures
319Plasma-enhanced atomic layer deposition of BaTiO3
320Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
321Improved understanding of recombination at the Si/Al2O3 interface
322Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
323Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
324Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
325Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
326Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
327Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
328Plasma enhanced atomic layer deposition of Fe2O3 thin films
329Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
330Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
331Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
332ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
333Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
334Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
335Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
336Biofilm prevention on cochlear implants
337Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
338Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
339The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
340Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
341Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
342Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
343Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
344Study on the characteristics of aluminum thin films prepared by atomic layer deposition
345Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
346Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
347Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
348Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
349Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
350Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
351Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
352Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
353Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
354Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
355Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
356Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
357Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
358Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
359A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
360Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
361Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
362Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
363Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
364Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
365Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
366Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
367Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
368Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
369Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
370Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
371Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
372Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
373Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
374Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
375Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
376Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
377Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
378Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
379Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
380In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
381Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
382Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
383Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
384Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
385Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
386Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
387AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
388Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
389Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
390Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
391SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
392Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
393Sub-nanometer heating depth of atomic layer annealing
394Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
395Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
396Atomic Layer Deposition of the Solid Electrolyte LiPON
397Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
398Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
399Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
400Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
401Atomic layer deposition of GaN at low temperatures
402Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
403Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
404Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
405Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
406Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
407Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
408Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
409Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
410Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
411A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
412Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
413Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
414Breakdown and Protection of ALD Moisture Barrier Thin Films
415Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
416Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
417Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
418Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
419Plasma-enhanced ALD system for SRF cavity
420Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
421Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
422An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
423High-Reflective Coatings For Ground and Space Based Applications
424Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
425Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
426Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
427Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
428Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
429Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
430Fast PEALD ZnO Thin-Film Transistor Circuits
431Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
432Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
433Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
434Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
435Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
436New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
437Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
438Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
439Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
440Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
441Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
442Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
443Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
444Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
445The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
446Advances in the fabrication of graphene transistors on flexible substrates
447Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
448Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
449Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
450Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
451Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
452Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
453Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
454Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
455Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
456Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
457Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
458Properties of AlN grown by plasma enhanced atomic layer deposition
459Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
460Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
461Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
462Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
463Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
464Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
465Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
466Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
467In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
468Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
469Sub-7-nm textured ZrO2 with giant ferroelectricity
470The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
471Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
472Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
473Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
474Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
475Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
476Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
477Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
478Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
479Atomic layer deposition of InN using trimethylindium and ammonia plasma
480Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
481Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
482Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
483ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
484The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
485Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
486Structural and optical characterization of low-temperature ALD crystalline AlN
487A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
488Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition