Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
2Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
3Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
4Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
5Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
6Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
7Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
8Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
9Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
10Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
11Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
12Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
13Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
14Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
15High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
16Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
17The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
18Atomic layer deposition of InN using trimethylindium and ammonia plasma
19Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
20Atomic Layer Deposition of Gold Metal
21Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
22Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
23Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
24Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
25Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
26Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
27Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
28Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
29The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
30Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
31Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
32Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
33Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
34Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
35Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
36Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
37Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
38Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
39Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
40Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
41Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
42Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
43Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
44Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
45Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
46Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
47Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
48Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
49Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
50Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
51Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
52Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
53Oxygen migration in TiO2-based higher-k gate stacks
54Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
55Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
56Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
57Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
58Room-Temperature Atomic Layer Deposition of Platinum
59Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
60Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
61Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
62Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
63Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
64Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
65Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
66Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
67Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
68Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
69The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
70Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
71Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
72Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
73Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
74Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
75Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
76Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
77Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
78Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
79Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
80Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
81Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
82Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
83Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
84Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
85A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
86Very high frequency plasma reactant for atomic layer deposition
87Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
88Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
89Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
90Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
91Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
92Fast PEALD ZnO Thin-Film Transistor Circuits
93Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
94A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
95Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
96Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
97Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
98Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
99Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
100Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
101Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
102ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
103Sub-nanometer heating depth of atomic layer annealing
104Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
105Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
106Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
107PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
108Densification of Thin Aluminum Oxide Films by Thermal Treatments
109Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
110Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
111Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
112Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
113Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
114Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
115Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
116Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
117PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
118Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
119Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
120Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
121Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
122Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
123Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
124Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
125Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
126Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
127Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
128Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
129Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
130Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
131In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
132Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
133ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
134Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
135The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
136Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
137Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
138Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
139Comparative study of ALD SiO2 thin films for optical applications
140Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
141Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
142Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
143Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
144Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
145The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
146Plasma enhanced atomic layer deposition of Fe2O3 thin films
147Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
148Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
149Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
150Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
151High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
152WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
153Study on the characteristics of aluminum thin films prepared by atomic layer deposition
154Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
155Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
156Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
157Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
158Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
159Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
160(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
161Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
162Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
163Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
164Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
165Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
166Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
167Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
168A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
169Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
170Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
171Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
172Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
173Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
174Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
175Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
176Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
177Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
178Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
179Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
180Sub-7-nm textured ZrO2 with giant ferroelectricity
181Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
182High-Reflective Coatings For Ground and Space Based Applications
183Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
184Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
185Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
186Improved understanding of recombination at the Si/Al2O3 interface
187Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
188Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
189Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
190Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
191Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
192In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
193From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
194Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
195Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
196Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
197Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
198Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
199New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
200An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
201Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
202Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
203Plasma-enhanced ALD system for SRF cavity
204Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
205Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
206Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
207Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
208Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
209Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
210Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
211Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
212Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
213Plasma enhanced atomic layer deposition of Ga2O3 thin films
214Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
215Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
216Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
217Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
218Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
219Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
220Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
221Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
222Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
223Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
224Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
225Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
226Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
227XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
228Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
229Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
230The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
231Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
232Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
233Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
234Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
235Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
236Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
237Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
238Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
239Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
240PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
241Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
242Experimental and theoretical determination of the role of ions in atomic layer annealing
243Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
244Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
245Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
246Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
247Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
248High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
249Atomic layer epitaxy of Si using atomic H
250Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
251Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
252Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
253Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
254Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
255Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
256Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
257Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
258Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
259Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
260Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
261Atomic Layer Deposition of the Solid Electrolyte LiPON
262AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
263Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
264Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
265Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
266Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
267In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
268Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
269Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
270Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
271The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
272Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
273Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
274Thin film GaP for solar cell application
275Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
276Low temperature plasma enhanced deposition of GaP films on Si substrate
277Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
278Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
279Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
280Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
281Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
282Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
283Atomic hydrogen-assisted ALE of germanium
284Breakdown and Protection of ALD Moisture Barrier Thin Films
285Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
286Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
287Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
288Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
289Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
290Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
291Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
292Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
293Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
294Plasma-enhanced atomic layer deposition of BaTiO3
295Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
296Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
297Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
298Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
299Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
300Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
301Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
302Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
303Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
304Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
305Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
306Biofilm prevention on cochlear implants
307Evaluation of plasma parameters on PEALD deposited TaCN
308Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
309Advances in the fabrication of graphene transistors on flexible substrates
310Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
311Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
312Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
313Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
314Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
315Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
316Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
317A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
318Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
319Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
320Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
321Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
322Remote Plasma ALD of Platinum and Platinum Oxide Films
323Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
324Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
325In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
326Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
327Layer-by-layer epitaxial growth of GaN at low temperatures
328Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
329Plasma enhanced atomic layer deposition of gallium sulfide thin films
330Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
331Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
332A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
333Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
334Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
335Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
336Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
337Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
338Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
339Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
340The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
341Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
342Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
343Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
344In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
345Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
346Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
347Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
348Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
349Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
350Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
351Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
352Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
353Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
354Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
355Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
356Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
357Structural and optical characterization of low-temperature ALD crystalline AlN
358Atomic layer deposition of GaN at low temperatures
359Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
360A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
361Plasma-Assisted Atomic Layer Deposition of Palladium
362Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
363Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
364Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
365Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
366Hydrogen plasma-enhanced atomic layer deposition of copper thin films
367Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
368Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
369Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
370Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
371Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
372Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
373Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
374Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
375Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
376Crystalline growth of AlN thin films by atomic layer deposition
377Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
378The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
379Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
380TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
381Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
382Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
383Copper-ALD Seed Layer as an Enabler for Device Scaling
384Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
385Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
386Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
387An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
388Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
389Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
390Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
391Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
392Tuning size and coverage of Pd nanoparticles using atomic layer deposition
393Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
394Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
395Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
396Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
397Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
398Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
399Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
400Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
401Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
402Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
403Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
404Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
405Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
406The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
407Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
408Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
409Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
410Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
411Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
412Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
413Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
414Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
415Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
416Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
417Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
418Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
419Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
420ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
421Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
422Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
423Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
424A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
425Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
426Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
427Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
428SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
429Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
430Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
431The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
432A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
433Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
434A route to low temperature growth of single crystal GaN on sapphire
435Plasma enhanced atomic layer deposition of zinc sulfide thin films
436Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
437Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
438Properties of AlN grown by plasma enhanced atomic layer deposition
439Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
440Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
441Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
442Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
443Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
444Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
445Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
446Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
447Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
448Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
449Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
450Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
451Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
452Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
453Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
454Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
455Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
456Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
457Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
458Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
459Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
460Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
461Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
462Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
463Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
464Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
465Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
466Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
467Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
468Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
469Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
470AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
471Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
472Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
473MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
474Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
475Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
476Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
477ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
478Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
479Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy