Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
2A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
4A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
5A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
6A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
7A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
8A route to low temperature growth of single crystal GaN on sapphire
9Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
10Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
11Advances in the fabrication of graphene transistors on flexible substrates
12Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
13Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
15AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
16AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
17Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
18Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
19Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
20Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
21Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
22An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
23An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
24Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
25Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
26Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
27Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
28Atomic hydrogen-assisted ALE of germanium
29Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
30Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
31Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
32Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
33Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
34Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
35Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
36Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
37Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
38Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
39Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
40Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
41Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
42Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
43Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
44Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
45Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
46Atomic layer deposition of GaN at low temperatures
47Atomic Layer Deposition of Gold Metal
48Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
49Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
50Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
51Atomic layer deposition of InN using trimethylindium and ammonia plasma
52Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
53Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
54Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
55Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
56Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
57Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
58Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
59Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
60Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
61Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
62Atomic Layer Deposition of the Solid Electrolyte LiPON
63Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
64Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
65Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
66Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
67Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
68Atomic layer epitaxy of Si using atomic H
69Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
70Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
71Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
72Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
73Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
74Biofilm prevention on cochlear implants
75Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
76Breakdown and Protection of ALD Moisture Barrier Thin Films
77Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
78Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
79Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
80Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
81Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
82Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
83Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
84Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
85Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
86Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
87Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
88Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
89Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
90Comparative study of ALD SiO2 thin films for optical applications
91Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
92Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
93Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
94Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
95Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
96Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
97Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
98Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
99Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
100Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
101Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
102Copper-ALD Seed Layer as an Enabler for Device Scaling
103Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
104Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
105Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
106Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
107Crystalline growth of AlN thin films by atomic layer deposition
108Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
109Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
110Densification of Thin Aluminum Oxide Films by Thermal Treatments
111Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
112Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
113Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
114Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
115Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
116Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
117Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
118Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
119Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
120Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
121Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
122Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
123Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
124Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
125Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
126Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
127Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
128Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
129Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
130Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
131Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
132Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
133Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
134Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
135Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
136Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
137Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
138Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
139Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
140Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
141Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
142Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
143Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
144Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
145Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
146Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
147Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
148Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
149Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
150Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
151Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
152Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
153Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
154Evaluation of plasma parameters on PEALD deposited TaCN
155Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
156Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
157Fast PEALD ZnO Thin-Film Transistor Circuits
158Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
159Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
160Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
161Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
162Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
163From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
164Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
165Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
166Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
167Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
168Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
169Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
170Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
171Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
172Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
173Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
174Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
175Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
176Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
177Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
178High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
179High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
180High-Reflective Coatings For Ground and Space Based Applications
181High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
182Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
183Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
184Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
185Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
186Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
187Hydrogen plasma-enhanced atomic layer deposition of copper thin films
188Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
189Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
190Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
191Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
192Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
193Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
194Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
195Improved understanding of recombination at the Si/Al2O3 interface
196Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
197Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
198Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
199Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
200In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
201In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
202In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
203In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
204Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
205Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
206Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
207Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
208Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
209Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
210Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
211Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
212Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
213Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
214Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
215Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
216Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
217Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
218Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
219Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
220Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
221Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
222Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
223Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
224Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
225Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
226Layer-by-layer epitaxial growth of GaN at low temperatures
227Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
228Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
229Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
230Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
231Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
232Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
233Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
234Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
235Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
236Low temperature plasma enhanced deposition of GaP films on Si substrate
237Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
238Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
239Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
240Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
241Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
242Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
243Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
244Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
245Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
246Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
247Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
248Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
249Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
250Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
251Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
252Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
253Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
254Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
255Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
256Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
257Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
258Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
259Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
260Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
261Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
262MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
263Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
264Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
265Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
266New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
267Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
268Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
269Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
270Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
271Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
272Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
273Oxygen migration in TiO2-based higher-k gate stacks
274PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
275PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
276PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
277Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
278Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
279Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
280Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
281Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
282Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
283Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
284Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
285Plasma enhanced atomic layer deposition of Fe2O3 thin films
286Plasma enhanced atomic layer deposition of Ga2O3 thin films
287Plasma enhanced atomic layer deposition of gallium sulfide thin films
288Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
289Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
290Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
291Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
292Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
293Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
294Plasma enhanced atomic layer deposition of zinc sulfide thin films
295Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
296Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
297Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
298Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
299Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
300Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
301Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
302Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
303Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
304Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
305Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
306Plasma-Assisted Atomic Layer Deposition of Palladium
307Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
308Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
309Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
310Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
311Plasma-enhanced ALD system for SRF cavity
312Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
313Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
314Plasma-enhanced atomic layer deposition of BaTiO3
315Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
316Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
317Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
318Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
319Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
320Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
321Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
322Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
323Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
324Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
325Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
326Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
327Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
328Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
329Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
330Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
331Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
332Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
333Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
334Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
335Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
336Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
337Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
338Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
339Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
340Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
341Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
342Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
343Properties of AlN grown by plasma enhanced atomic layer deposition
344Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
345Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
346Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
347Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
348Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
349Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
350Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
351Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
352Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
353Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
354Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
355Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
356Remote Plasma ALD of Platinum and Platinum Oxide Films
357Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
358Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
359Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
360Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
361Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
362Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
363Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
364Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
365Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
366Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
367Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
368Room-Temperature Atomic Layer Deposition of Platinum
369Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
370Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
371Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
372Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
373Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
374Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
375Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
376Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
377Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
378SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
379Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
380Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
381Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
382Structural and optical characterization of low-temperature ALD crystalline AlN
383Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
384Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
385Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
386Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
387Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
388Study on the characteristics of aluminum thin films prepared by atomic layer deposition
389Sub-7-nm textured ZrO2 with giant ferroelectricity
390Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
391Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
392Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
393Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
394Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
395Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
396Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
397Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
398Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
399The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
400The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
401The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
402The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
403The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
404The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
405The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
406The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
407The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
408The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
409Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
410Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
411Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
412Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
413Thin film GaP for solar cell application
414Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
415TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
416Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
417Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
418Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
419Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
420Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
421Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
422Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
423Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
424Tuning size and coverage of Pd nanoparticles using atomic layer deposition
425Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
426Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
427Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
428Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
429Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
430Very high frequency plasma reactant for atomic layer deposition
431Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
432Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
433WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
434XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
435ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
436ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
437ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition