Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Morphology, Roughness, Topography returned 300 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
2A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
4A route to low temperature growth of single crystal GaN on sapphire
5Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
6Advances in the fabrication of graphene transistors on flexible substrates
7Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
8Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
9AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
10Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
11Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
12An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
13An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
14Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
15Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
16Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
17Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
18Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
19Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
20Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
21Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
22Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
23Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
24Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
25Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
26Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
27Atomic layer deposition of GaN at low temperatures
28Atomic Layer Deposition of Gold Metal
29Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
30Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
31Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
32Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
33Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
34Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
35Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
36Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
37Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
38Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
39Atomic Layer Deposition of the Solid Electrolyte LiPON
40Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
41Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
42Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
43Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
44Biofilm prevention on cochlear implants
45Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
46Breakdown and Protection of ALD Moisture Barrier Thin Films
47Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
48Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
49Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
50Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
51Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
52Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
53Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
54Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
55Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
56Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
57Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
58Comparative study of ALD SiO2 thin films for optical applications
59Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
60Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
61Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
62Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
63Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
64Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
65Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
66Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
67Copper-ALD Seed Layer as an Enabler for Device Scaling
68Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
69Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
70Crystalline growth of AlN thin films by atomic layer deposition
71Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
72Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
73Densification of Thin Aluminum Oxide Films by Thermal Treatments
74Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
75Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
76Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
77Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
78Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
79Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
80Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
81Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
82Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
83Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
84Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
85Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
86Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
87Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
88Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
89Electrical characteristics of β-Ga2O3 thin films grown by PEALD
90Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
91Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
92Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
93Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
94Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
95Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
96Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
97Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
98Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
99Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
100Evaluation of plasma parameters on PEALD deposited TaCN
101Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
102Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
103Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
104Fast PEALD ZnO Thin-Film Transistor Circuits
105Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
106Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
107Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
108Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
109Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
110Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
111Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
112Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
113Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
114Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
115Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
116Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
117High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
118High-Reflective Coatings For Ground and Space Based Applications
119Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
120Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
121Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
122Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
123Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
124Hydrogen plasma-enhanced atomic layer deposition of copper thin films
125Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
126Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
127Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
128Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
129Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
130Improved understanding of recombination at the Si/Al2O3 interface
131Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
132Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
133Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
134In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
135Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
136Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
137Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
138Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
139Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
140Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
141Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
142Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
143Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
144Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
145Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
146Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
147Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
148Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
149Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
150Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
151Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
152Low temperature plasma enhanced deposition of GaP films on Si substrate
153Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
154Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
155Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
156Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
157Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
158Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
159Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
160Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
161Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
162Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
163Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
164Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
165Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
166Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
167Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
168Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
169Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
170Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
171Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
172Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
173Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
174Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
175Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
176Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
177New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
178Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
179Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
180Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
181Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
182Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
183Oxygen migration in TiO2-based higher-k gate stacks
184PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
185PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
186Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
187Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
188Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
189Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
190Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
191Plasma enhanced atomic layer deposition of Fe2O3 thin films
192Plasma enhanced atomic layer deposition of Ga2O3 thin films
193Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
194Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
195Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
196Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
197Plasma enhanced atomic layer deposition of zinc sulfide thin films
198Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
199Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
200Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
201Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
202Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
203Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
204Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
205Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
206Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
207Plasma-Assisted Atomic Layer Deposition of Palladium
208Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
209Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
210Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
211Plasma-enhanced ALD system for SRF cavity
212Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
213Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
214Plasma-enhanced atomic layer deposition of BaTiO3
215Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
216Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
217Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
218Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
219Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
220Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
221Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
222Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
223Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
224Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
225Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
226Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
227Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
228Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
229Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
230Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
231Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
232Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
233Properties of AlN grown by plasma enhanced atomic layer deposition
234Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
235Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
236Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
237Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
238Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
239Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
240Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
241Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
242Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
243Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
244Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
245Remote Plasma ALD of Platinum and Platinum Oxide Films
246Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
247Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
248Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
249Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
250Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
251Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
252Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
253Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
254Room-Temperature Atomic Layer Deposition of Platinum
255Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
256Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
257Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
258Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
259Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
260Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
261Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
262Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
263SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
264Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
265Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
266Structural and optical characterization of low-temperature ALD crystalline AlN
267Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
268Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
269Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
270Study on the characteristics of aluminum thin films prepared by atomic layer deposition
271Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
272Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
273Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
274Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
275Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
276Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
277The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
278The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
279The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
280The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
281The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
282The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
283The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
284Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
285Thin film GaP for solar cell application
286Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
287TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
288Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
289Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
290Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
291Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
292Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
293Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
294Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
295Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
296Very high frequency plasma reactant for atomic layer deposition
297Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
298WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
299ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
300ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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