Morphology, Roughness, Topography Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Morphology, Roughness, Topography returned 263 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
2	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
3	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
4	A route to low temperature growth of single crystal GaN on sapphire
5	Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
6	Advances in the fabrication of graphene transistors on flexible substrates
7	Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
8	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
9	Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
10	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
11	An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
12	Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
13	Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
14	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
15	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
16	Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
17	Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
18	Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
19	Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
20	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
21	Atomic layer deposition of GaN at low temperatures
22	Atomic Layer Deposition of Gold Metal
23	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
24	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
25	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
26	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
27	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
28	Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
29	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
30	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
31	Atomic Layer Deposition of the Solid Electrolyte LiPON
32	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
33	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
34	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
35	Biofilm prevention on cochlear implants
36	Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
37	Breakdown and Protection of ALD Moisture Barrier Thin Films
38	Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
39	Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
40	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
41	Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
42	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
43	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
44	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
45	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
46	Comparative study of ALD SiO2 thin films for optical applications
47	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
48	Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
49	Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
50	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
51	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
52	Copper-ALD Seed Layer as an Enabler for Device Scaling
53	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
54	Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
55	Crystalline growth of AlN thin films by atomic layer deposition
56	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
57	Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
58	Densification of Thin Aluminum Oxide Films by Thermal Treatments
59	Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
60	Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
61	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
62	Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
63	Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
64	Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
65	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
66	Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
67	Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
68	Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
69	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
70	Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
71	Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
72	Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
73	Electrical characteristics of β-Ga2O3 thin films grown by PEALD
74	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
75	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
76	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
77	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
78	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
79	Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
80	Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
81	Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
82	Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
83	Evaluation of plasma parameters on PEALD deposited TaCN
84	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
85	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
86	Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
87	Fast PEALD ZnO Thin-Film Transistor Circuits
88	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
89	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
90	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
91	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
92	Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
93	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
94	Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
95	Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
96	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
97	Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
98	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
99	High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
100	High-Reflective Coatings For Ground and Space Based Applications
101	Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
102	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
103	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
104	Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
105	Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
106	Hydrogen plasma-enhanced atomic layer deposition of copper thin films
107	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
108	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
109	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
110	Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
111	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
112	Improved understanding of recombination at the Si/Al2O3 interface
113	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
114	Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
115	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
116	In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
117	Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
118	Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
119	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
120	Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
121	Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
122	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
123	Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
124	Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
125	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
126	Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
127	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
128	Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
129	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
130	Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
131	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
132	Low temperature plasma enhanced deposition of GaP films on Si substrate
133	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
134	Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
135	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
136	Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
137	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
138	Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
139	Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
140	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
141	Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
142	Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
143	Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
144	Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
145	Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
146	Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
147	Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
148	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
149	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
150	Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
151	Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
152	Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
153	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
154	Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
155	Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
156	New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
157	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
158	Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
159	Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
160	Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
161	Oxygen migration in TiO2-based higher-k gate stacks
162	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
163	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
164	Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
165	Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
166	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
167	Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
168	Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
169	Plasma enhanced atomic layer deposition of Fe2O3 thin films
170	Plasma enhanced atomic layer deposition of Ga2O3 thin films
171	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
172	Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
173	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
174	Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
175	Plasma enhanced atomic layer deposition of zinc sulfide thin films
176	Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
177	Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
178	Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
179	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
180	Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
181	Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
182	Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
183	Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
184	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
185	Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
186	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
187	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
188	Plasma-enhanced ALD system for SRF cavity
189	Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
190	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
191	Plasma-enhanced atomic layer deposition of BaTiO3
192	Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
193	Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
194	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
195	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
196	Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
197	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
198	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
199	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
200	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
201	Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
202	Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
203	Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
204	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
205	Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
206	Properties of AlN grown by plasma enhanced atomic layer deposition
207	Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
208	Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
209	Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
210	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
211	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
212	Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
213	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
214	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
215	Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
216	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
217	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
218	Remote Plasma ALD of Platinum and Platinum Oxide Films
219	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
220	Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
221	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
222	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
223	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
224	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
225	Room-Temperature Atomic Layer Deposition of Platinum
226	Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
227	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
228	Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
229	Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
230	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
231	Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
232	Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
233	SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
234	Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
235	Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
236	Structural and optical characterization of low-temperature ALD crystalline AlN
237	Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
238	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
239	Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
240	Study on the characteristics of aluminum thin films prepared by atomic layer deposition
241	Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
242	Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
243	Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
244	Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
245	Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
246	Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
247	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
248	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
249	The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
250	The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
251	The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
252	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
253	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
254	Thin film GaP for solar cell application
255	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
256	TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
257	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
258	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
259	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
260	Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
261	Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
262	Very high frequency plasma reactant for atomic layer deposition
263	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

Follow @PlasmaALDGuy

Shortcuts

© 2014-2018 plasma-ald.com