Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Resistivity, Sheet Resistance returned 263 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
2Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
3Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
4Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
5Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
6Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
7Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
8Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
9Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
10Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
11Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
12Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
13Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
14Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
15Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
16Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
17Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
18Film Uniformity in Atomic Layer Deposition
19Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
20ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
21Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
22Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
23Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
24Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
25Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
26Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
27Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
28Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
29Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
30Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
31Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
32Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
33Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
34Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
35Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
36Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
37Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
38Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
39Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
40Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
41PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
42Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
43Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
44Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
45High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
46Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
47Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
48Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
49Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
50Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
51Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
52All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
53Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
54Ru thin film grown on TaN by plasma enhanced atomic layer deposition
55Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
56Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
57Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
58Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
59A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
60Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
61Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
62Atomic layer deposition of titanium nitride for quantum circuits
63Plasma-enhanced atomic layer deposition of tungsten nitride
64Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
65Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
66Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
67Copper-ALD Seed Layer as an Enabler for Device Scaling
68Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
69Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
70Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
71Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
72Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
73Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
74Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
75Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
76Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
77Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
78Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
79GeSbTe deposition for the PRAM application
80Fully CMOS-compatible titanium nitride nanoantennas
81Evaluation of plasma parameters on PEALD deposited TaCN
82Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
83Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
84Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
85A route to low temperature growth of single crystal GaN on sapphire
86Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
87Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
88Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
89Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
90The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
91Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
92Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
93Atomic Layer Deposition of the Conductive Delafossite PtCoO2
94Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
95High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
96Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
97Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
98Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
99Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
100Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
101Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
102Hydrogen plasma-enhanced atomic layer deposition of copper thin films
103Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
104Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
105Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
106Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
107Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
108Atmospheric pressure plasma enhanced spatial ALD of silver
109Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
110Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
111Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
112Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
113Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
114Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
115Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
116High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
117Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
118Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
119PEALD of Copper using New Precursors for Next Generation of Interconnections
120Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
121Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
122Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
123Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
124Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
125Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
126Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
127Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
128Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
129Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
130Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
131Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
132Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
133Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
134The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
135Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
136Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
137Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
138Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
139Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
140Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
141Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
142The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
143Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
144Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
145Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
146Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
147Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
148Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
149The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
150Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
151Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
152Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
153Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
154Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
155Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
156Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
157Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
158Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
159In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
160Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
161Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
162Plasma-enhanced atomic layer deposition of superconducting niobium nitride
163Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
164Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
165Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
166Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
167High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
168Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
169Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
170Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
171Plasma-enhanced atomic layer deposition of vanadium nitride
172Plasma-Modified Atomic Layer Deposition
173The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
174Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
175Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
176Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
177Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
178Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
179Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
180Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
181Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
182Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
183Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
184Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
185In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
186Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
187Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
188Plasma-Enhanced Atomic Layer Deposition of Ni
189Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
190Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
191Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
192Microwave properties of superconducting atomic-layer deposited TiN films
193Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
194In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
195Plasma-enhanced atomic layer deposition of Co on metal surfaces
196Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
197Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
198Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
199Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
200Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
201Plasma-enhanced atomic layer deposition of titanium vanadium nitride
202Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
203Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
204Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
205Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
206Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
207The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
208Atomic layer deposition of titanium nitride from TDMAT precursor
209Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
210Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
211A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
212Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
213Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
214Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
215Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
216Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
217Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
218Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
219Room-Temperature Atomic Layer Deposition of Platinum
220A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
221Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
222Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
223Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
224Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
225Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
226Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
227Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
228Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
229Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
230Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
231Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
232Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
233Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
234Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
235Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
236Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
237Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
238Remote Plasma ALD of Platinum and Platinum Oxide Films
239In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
240WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
241A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
242Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
243Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
244Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
245Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
246TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
247Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
248Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
249Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
250Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
251Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
252Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
253Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
254Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
255In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
256Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
257Study on the characteristics of aluminum thin films prepared by atomic layer deposition
258TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
259Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
260Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
261Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
262Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition