Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
2Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
3Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
4In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
5Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
6Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
7TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
8Plasma-enhanced atomic layer deposition of Co on metal surfaces
9Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
10Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
11Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
12Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
13Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
14High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
15Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
16Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
17Plasma-enhanced atomic layer deposition of vanadium nitride
18Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
19Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
20A route to low temperature growth of single crystal GaN on sapphire
21Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
22Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
23Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
24Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
25Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
26Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
27Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
28Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
29Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
30Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
31Atomic layer deposition of titanium nitride for quantum circuits
32Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
33Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
34Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
35Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
36A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
37Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
38Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
39Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
40Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
41Atomic Layer Deposition of the Conductive Delafossite PtCoO2
42Fully CMOS-compatible titanium nitride nanoantennas
43Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
44Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
45Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
46Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
47Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
48Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
49Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
50Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
51Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
52Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
53Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
54Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
55Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
56Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
57Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
58Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
59Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
60Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
61Plasma-Modified Atomic Layer Deposition
62Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
63Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
64Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
65Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
66Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
67Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
68Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
69Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
70Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
71Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
72Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
73Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
74Plasma-enhanced atomic layer deposition of superconducting niobium nitride
75Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
76The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
77Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
78PEALD of Copper using New Precursors for Next Generation of Interconnections
79GeSbTe deposition for the PRAM application
80Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
81Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
82The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
83Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
84Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
85In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
86Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
87High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
88Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
89Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
90Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
91Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
92Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
93Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
94In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
95Atmospheric pressure plasma enhanced spatial ALD of silver
96Copper-ALD Seed Layer as an Enabler for Device Scaling
97Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
98Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
99Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
100Study on the characteristics of aluminum thin films prepared by atomic layer deposition
101Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
102Plasma-Enhanced Atomic Layer Deposition of Ni
103Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
104Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
105Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
106Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
107Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
108Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
109Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
110Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
111Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
112Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
113Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
114Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
115Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
116Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
117Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
118Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
119Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
120Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
121All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
122Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
123Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
124Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
125Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
126Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
127Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
128Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
129The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
130Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
131Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
132Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
133Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
134Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
135A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
136Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
137Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
138Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
139High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
140WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
141A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
142Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
143Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
144Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
145Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
146Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
147Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
148Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
149Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
150The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
151Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
152Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
153Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
154Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
155Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
156Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
157Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
158Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
159Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
160Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
161Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
162Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
163Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
164Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
165Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
166Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
167TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
168Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
169Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
170Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
171Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
172Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
173Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
174Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
175Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
176Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
177Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
178Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
179Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
180Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
181Plasma-enhanced atomic layer deposition of tungsten nitride
182Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
183Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
184Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
185Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
186Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
187In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
188Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
189Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
190Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
191Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
192Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
193Microwave properties of superconducting atomic-layer deposited TiN films
194The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
195Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
196Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
197Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
198Ru thin film grown on TaN by plasma enhanced atomic layer deposition
199Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
200Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
201Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
202Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
203Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
204Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
205Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
206Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
207Hydrogen plasma-enhanced atomic layer deposition of copper thin films
208Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
209Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
210PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
211In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
212Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
213Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
214Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
215Film Uniformity in Atomic Layer Deposition
216Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
217Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
218Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
219Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
220Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
221Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
222The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
223High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
224Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
225Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
226Evaluation of plasma parameters on PEALD deposited TaCN
227Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
228Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
229A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
230Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
231Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
232Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
233Plasma-enhanced atomic layer deposition of titanium vanadium nitride
234Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
235Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
236Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
237Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
238Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
239Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
240Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
241Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
242Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
243Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
244Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
245Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
246Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
247Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
248Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
249Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
250Room-Temperature Atomic Layer Deposition of Platinum
251Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
252Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
253Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
254Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
255Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
256Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
257Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
258Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
259Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
260Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
261Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
262Remote Plasma ALD of Platinum and Platinum Oxide Films
263ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
264Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
265Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
266Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
267Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
268Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
269Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
270Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
271Atomic layer deposition of titanium nitride from TDMAT precursor