1 | Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing |
2 | Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu |
3 | Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition |
4 | Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 |
5 | Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates |
6 | Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition |
7 | Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition |
8 | Atomic layer deposition of high-mobility hydrogen-doped zinc oxide |
9 | Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent |
10 | Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices |
11 | Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources |
12 | Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition |
13 | Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition |
14 | Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity |
15 | Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects |
16 | Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells |
17 | Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient |
18 | Film Uniformity in Atomic Layer Deposition |
19 | Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer |
20 | ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window" |
21 | Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy |
22 | Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices |
23 | Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth |
24 | Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films |
25 | Ag films grown by remote plasma enhanced atomic layer deposition on different substrates |
26 | Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization |
27 | Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma |
28 | Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN |
29 | Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells |
30 | Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications |
31 | Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films |
32 | Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases |
33 | Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film |
34 | Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor |
35 | Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma |
36 | Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications |
37 | Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology |
38 | Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications |
39 | Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor |
40 | Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition |
41 | PEALD of a Ruthenium Adhesion Layer for Copper Interconnects |
42 | Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films |
43 | Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM |
44 | Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films |
45 | High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition |
46 | Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition |
47 | Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors |
48 | Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma |
49 | Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition |
50 | Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method |
51 | Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage |
52 | All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process |
53 | Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films |
54 | Ru thin film grown on TaN by plasma enhanced atomic layer deposition |
55 | Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas |
56 | Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier |
57 | Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma |
58 | Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor |
59 | A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition |
60 | Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition |
61 | Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers |
62 | Atomic layer deposition of titanium nitride for quantum circuits |
63 | Plasma-enhanced atomic layer deposition of tungsten nitride |
64 | Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures |
65 | Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition |
66 | Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition |
67 | Copper-ALD Seed Layer as an Enabler for Device Scaling |
68 | Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition |
69 | Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing |
70 | Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition |
71 | Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum |
72 | Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor |
73 | Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy |
74 | Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells |
75 | Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas |
76 | Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material |
77 | Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT) |
78 | Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer |
79 | GeSbTe deposition for the PRAM application |
80 | Fully CMOS-compatible titanium nitride nanoantennas |
81 | Evaluation of plasma parameters on PEALD deposited TaCN |
82 | Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition |
83 | Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD |
84 | Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions |
85 | A route to low temperature growth of single crystal GaN on sapphire |
86 | Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition |
87 | Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma |
88 | Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition |
89 | Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films |
90 | The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition |
91 | Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor |
92 | Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell |
93 | Atomic Layer Deposition of the Conductive Delafossite PtCoO2 |
94 | Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications |
95 | High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition |
96 | Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films |
97 | Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
98 | Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier |
99 | Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect |
100 | Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt |
101 | Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition |
102 | Hydrogen plasma-enhanced atomic layer deposition of copper thin films |
103 | Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators |
104 | Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma |
105 | Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide |
106 | Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications |
107 | Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications |
108 | Atmospheric pressure plasma enhanced spatial ALD of silver |
109 | Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition |
110 | Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics |
111 | Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition |
112 | Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure |
113 | Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films |
114 | Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition |
115 | Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity |
116 | High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating |
117 | Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant |
118 | Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor |
119 | PEALD of Copper using New Precursors for Next Generation of Interconnections |
120 | Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization |
121 | Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel |
122 | Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties |
123 | Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor |
124 | Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier |
125 | Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2 |
126 | Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma |
127 | Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications |
128 | Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition |
129 | Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides |
130 | Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature |
131 | Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor |
132 | Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies |
133 | Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition |
134 | The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications |
135 | Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes |
136 | Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy |
137 | Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor |
138 | Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications |
139 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films |
140 | Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon |
141 | Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers |
142 | The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor |
143 | Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications |
144 | Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition |
145 | Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition |
146 | Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition |
147 | Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films |
148 | Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process |
149 | The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition |
150 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film |
151 | Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten |
152 | Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant |
153 | Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique |
154 | Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
155 | Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures |
156 | Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor |
157 | Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films |
158 | Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper |
159 | In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition |
160 | Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors |
161 | Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier |
162 | Plasma-enhanced atomic layer deposition of superconducting niobium nitride |
163 | Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD |
164 | Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors |
165 | Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition |
166 | Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition |
167 | High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications |
168 | Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu |
169 | Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion |
170 | Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals |
171 | Plasma-enhanced atomic layer deposition of vanadium nitride |
172 | Plasma-Modified Atomic Layer Deposition |
173 | The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties |
174 | Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor |
175 | Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications |
176 | Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure |
177 | Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN |
178 | Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD |
179 | Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers |
180 | Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu |
181 | Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry |
182 | Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality |
183 | Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor |
184 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
185 | In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating |
186 | Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc |
187 | Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration |
188 | Plasma-Enhanced Atomic Layer Deposition of Ni |
189 | Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties |
190 | Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure |
191 | Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers |
192 | Microwave properties of superconducting atomic-layer deposited TiN films |
193 | Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier |
194 | In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films |
195 | Plasma-enhanced atomic layer deposition of Co on metal surfaces |
196 | Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition |
197 | Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage |
198 | Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition |
199 | Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition |
200 | Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment |
201 | Plasma-enhanced atomic layer deposition of titanium vanadium nitride |
202 | Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum |
203 | Nanowire single-photon detectors made of atomic layer-deposited niobium nitride |
204 | Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method |
205 | Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate |
206 | Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application |
207 | The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2 |
208 | Atomic layer deposition of titanium nitride from TDMAT precursor |
209 | Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition |
210 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
211 | A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films |
212 | Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization |
213 | Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films |
214 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma |
215 | Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects |
216 | Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics |
217 | Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma |
218 | Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling |
219 | Room-Temperature Atomic Layer Deposition of Platinum |
220 | A controlled growth of WNx and WCx thin films prepared by atomic layer deposition |
221 | Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon |
222 | Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment |
223 | Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions |
224 | Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia |
225 | Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications |
226 | Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application |
227 | Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition |
228 | Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films |
229 | Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition |
230 | Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer |
231 | Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films |
232 | Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition |
233 | Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates |
234 | Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films |
235 | Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals |
236 | Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition |
237 | Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films |
238 | Remote Plasma ALD of Platinum and Platinum Oxide Films |
239 | In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition |
240 | WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications |
241 | A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu |
242 | Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition |
243 | Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties |
244 | Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices |
245 | Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods |
246 | TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition |
247 | Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma |
248 | Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition |
249 | Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition |
250 | Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications |
251 | Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex |
252 | Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition |
253 | Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode |
254 | Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers |
255 | In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd |
256 | Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates |
257 | Study on the characteristics of aluminum thin films prepared by atomic layer deposition |
258 | TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD |
259 | Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization |
260 | Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics |
261 | Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition |
262 | Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition |