Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of tungsten nitride
2Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
3Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
4Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
5Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
6Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
7Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
8Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
9High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
10Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
11Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
12Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
13WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
14Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
15Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
16Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
17Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
18Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
19Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
20Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
21Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
22Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
23Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
24Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
25Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
26Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
27Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
28Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
29In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
30Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
31Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
32High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
33Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
34Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
35Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
36Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
37Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
38Room-Temperature Atomic Layer Deposition of Platinum
39Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
40Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
41Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
42Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
43Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
44Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
45Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
46Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
47Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
48Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
49Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
50The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
51Atmospheric pressure plasma enhanced spatial ALD of silver
52Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
53All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
54Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
55Fully CMOS-compatible titanium nitride nanoantennas
56Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
57Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
58Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
59Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
60Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
61Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
62Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
63Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
64Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
65Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
66Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
67Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
68Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
69Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
70Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
71PEALD of Copper using New Precursors for Next Generation of Interconnections
72Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
73Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
74Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
75Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
76Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
77Copper-ALD Seed Layer as an Enabler for Device Scaling
78A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
79Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
80Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
81Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
82Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
83Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
84Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
85Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
86Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
87PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
88Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
89Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
90Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
91Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
92Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
93Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
94Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
95Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
96Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
97Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
98High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
99Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
100Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
101Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
102Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
103The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
104Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
105Atomic Layer Deposition of the Conductive Delafossite PtCoO2
106In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
107Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
108Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
109Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
110Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
111Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
112Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
113Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
114Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
115Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
116Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
117Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
118Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
119Microwave properties of superconducting atomic-layer deposited TiN films
120Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
121Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
122Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
123Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
124High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
125Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
126Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
127Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
128Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
129Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
130Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
131Atomic layer deposition of titanium nitride for quantum circuits
132Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
133In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
134Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
135A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
136Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
137Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
138Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
139Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
140Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
141Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
142Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
143Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
144Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
145Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
146The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
147Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
148Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
149Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
150Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
151Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
152Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
153A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
154Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
155Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
156Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
157Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
158Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
159Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
160In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
161Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
162Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
163Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
164Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
165Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
166Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
167Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
168Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
169Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
170Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
171Plasma-enhanced atomic layer deposition of vanadium nitride
172Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
173Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
174Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
175Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
176Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
177GeSbTe deposition for the PRAM application
178Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
179ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
180Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
181Hydrogen plasma-enhanced atomic layer deposition of copper thin films
182The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
183Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
184Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
185Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
186Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
187Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
188TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
189Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
190Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
191Evaluation of plasma parameters on PEALD deposited TaCN
192Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
193Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
194Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
195Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
196Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
197Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
198Plasma-Modified Atomic Layer Deposition
199Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
200Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
201In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
202Atomic layer deposition of titanium nitride from TDMAT precursor
203Remote Plasma ALD of Platinum and Platinum Oxide Films
204Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
205Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
206Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
207Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
208Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
209Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
210Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
211Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
212A route to low temperature growth of single crystal GaN on sapphire
213Film Uniformity in Atomic Layer Deposition
214Plasma-enhanced atomic layer deposition of superconducting niobium nitride
215Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
216Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
217Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
218Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
219Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
220Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
221Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
222Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
223Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
224Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
225Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
226Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
227Plasma-enhanced atomic layer deposition of Co on metal surfaces
228Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
229Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
230TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
231Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
232Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
233A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
234Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
235Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
236The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
237Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
238Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
239Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
240Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
241Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
242Plasma-enhanced atomic layer deposition of titanium vanadium nitride
243Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
244Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
245Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
246Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
247Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
248Plasma-Enhanced Atomic Layer Deposition of Ni
249Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
250Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
251Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
252Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
253Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
254Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
255Study on the characteristics of aluminum thin films prepared by atomic layer deposition
256Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
257Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
258Ru thin film grown on TaN by plasma enhanced atomic layer deposition
259Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
260Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
261Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
262Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
263Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
264Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
265Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
266The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
267Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
268Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
269Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
270Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
271Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals