Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
2Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
3Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
4Remote Plasma ALD of Platinum and Platinum Oxide Films
5Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
6Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
7Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
8Film Uniformity in Atomic Layer Deposition
9Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
10Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
11Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
12Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
13Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
14Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
15Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
16Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
17Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
18Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
19Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
20Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
21Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
22Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
23Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
24Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
25Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
26Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
27Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
28Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
29Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
30Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
31Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
32Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
33Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
34Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
35Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
36Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
37Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
38Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
39Plasma-enhanced atomic layer deposition of Co on metal surfaces
40Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
41Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
42Ru thin film grown on TaN by plasma enhanced atomic layer deposition
43Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
44Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
45Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
46Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
47Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
48Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
49Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
50Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
51Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
52Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
53Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
54Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
55Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
56High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
57Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
58Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
59Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
60Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
61Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
62Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
63Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
64Plasma-Enhanced Atomic Layer Deposition of Ni
65Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
66In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
67High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
68Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
69The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
70Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
71Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
72Plasma-enhanced atomic layer deposition of titanium vanadium nitride
73Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
74Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
75Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
76Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
77Plasma-enhanced atomic layer deposition of tungsten nitride
78Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
79Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
80The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
81Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
82Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
83Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
84PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
85Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
86Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
87Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
88Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
89Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
90Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
91Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
92Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
93Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
94Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
95Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
96Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
97Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
98Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
99Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
100Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
101Atmospheric pressure plasma enhanced spatial ALD of silver
102Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
103Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
104Room-Temperature Atomic Layer Deposition of Platinum
105Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
106Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
107Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
108Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
109In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
110Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
111Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
112Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
113Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
114Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
115Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
116Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
117Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
118Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
119Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
120Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
121Hydrogen plasma-enhanced atomic layer deposition of copper thin films
122Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
123Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
124Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
125Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
126Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
127A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
128Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
129All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
130A route to low temperature growth of single crystal GaN on sapphire
131Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
132Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
133Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
134Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
135Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
136Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
137The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
138TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
139Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
140Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
141Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
142Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
143Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
144Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
145Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
146Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
147Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
148Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
149GeSbTe deposition for the PRAM application
150Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
151Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
152Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
153Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
154Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
155Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
156Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
157Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
158Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
159Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
160Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
161Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
162Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
163Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
164The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
165Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
166Atomic layer deposition of titanium nitride from TDMAT precursor
167Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
168Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
169Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
170Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
171WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
172Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
173Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
174Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
175Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
176Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
177Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
178Atomic Layer Deposition of the Conductive Delafossite PtCoO2
179Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
180Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
181Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
182Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
183Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
184Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
185Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
186Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
187Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
188Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
189The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
190Study on the characteristics of aluminum thin films prepared by atomic layer deposition
191Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
192The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
193Plasma-enhanced atomic layer deposition of vanadium nitride
194Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
195Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
196Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
197Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
198Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
199Copper-ALD Seed Layer as an Enabler for Device Scaling
200Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
201Atomic layer deposition of titanium nitride for quantum circuits
202PEALD of Copper using New Precursors for Next Generation of Interconnections
203Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
204Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
205In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
206Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
207Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
208Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
209Fully CMOS-compatible titanium nitride nanoantennas
210Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
211TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
212Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
213Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
214Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
215A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
216Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
217Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
218In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
219Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
220Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
221Plasma-enhanced atomic layer deposition of superconducting niobium nitride
222Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
223Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
224In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
225Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
226Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
227High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
228Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
229Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
230Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
231Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
232Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
233Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
234Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
235Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
236Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
237Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
238Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
239Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
240Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
241Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
242Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
243Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
244Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
245Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
246Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
247Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
248ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
249Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
250Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
251A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
252Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
253Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
254Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
255A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
256Plasma-Modified Atomic Layer Deposition
257Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
258Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
259Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
260Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
261Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
262Microwave properties of superconducting atomic-layer deposited TiN films
263Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
264Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
265Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
266Evaluation of plasma parameters on PEALD deposited TaCN
267Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
268Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
269Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
270Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
271High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications