Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
2Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
3Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
4Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
5Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
6Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
7Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
8Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
9Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
10Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
11Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
12PEALD of Copper using New Precursors for Next Generation of Interconnections
13Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
14Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
15Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
16Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
17Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
18The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
19Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
20Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
21Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
22Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
23Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
24Atomic layer deposition of titanium nitride for quantum circuits
25Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
26Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
27In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
28Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
29Plasma-enhanced atomic layer deposition of titanium vanadium nitride
30Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
31Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
32Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
33Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
34Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
35Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
36Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
37Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
38Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
39The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
40Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
41Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
42Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
43Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
44Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
45Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
46Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
47Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
48Microwave properties of superconducting atomic-layer deposited TiN films
49Atomic Layer Deposition of the Conductive Delafossite PtCoO2
50Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
51Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
52Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
53Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
54Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
55Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
56Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
57Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
58Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
59Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
60Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
61High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
62Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
63Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
64Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
65Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
66Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
67Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
68Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
69Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
70Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
71PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
72Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
73Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
74Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
75Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
76Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
77GeSbTe deposition for the PRAM application
78Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
79Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
80Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
81Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
82Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
83Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
84Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
85High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
86The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
87The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
88Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
89Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
90Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
91Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
92Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
93Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
94Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
95Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
96Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
97Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
98High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
99Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
100Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
101Evaluation of plasma parameters on PEALD deposited TaCN
102Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
103Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
104Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
105ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
106Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
107Atmospheric pressure plasma enhanced spatial ALD of silver
108Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
109A route to low temperature growth of single crystal GaN on sapphire
110Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
111Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
112Room-Temperature Atomic Layer Deposition of Platinum
113Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
114Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
115Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
116Hydrogen plasma-enhanced atomic layer deposition of copper thin films
117Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
118Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
119Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
120Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
121Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
122A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
123Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
124Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
125Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
126Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
127Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
128Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
129Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
130Plasma-Enhanced Atomic Layer Deposition of Ni
131Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
132Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
133Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
134Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
135Plasma-enhanced atomic layer deposition of vanadium nitride
136Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
137Atomic layer deposition of titanium nitride from TDMAT precursor
138Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
139Fully CMOS-compatible titanium nitride nanoantennas
140Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
141Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
142TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
143Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
144Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
145Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
146Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
147Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
148Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
149TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
150The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
151Study on the characteristics of aluminum thin films prepared by atomic layer deposition
152Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
153Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
154Plasma-enhanced atomic layer deposition of Co on metal surfaces
155Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
156Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
157Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
158Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
159Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
160In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
161Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
162Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
163Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
164Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
165Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
166Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
167Ru thin film grown on TaN by plasma enhanced atomic layer deposition
168Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
169Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
170Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
171Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
172The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
173Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
174Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
175Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
176Remote Plasma ALD of Platinum and Platinum Oxide Films
177Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
178In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
179Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
180Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
181Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
182Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
183Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
184In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
185Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
186Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
187Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
188Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
189Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
190Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
191Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
192Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
193Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
194All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
195Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
196Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
197Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
198A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
199Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
200A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
201Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
202Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
203Plasma-enhanced atomic layer deposition of tungsten nitride
204Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
205Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
206Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
207Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
208Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
209Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
210Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
211WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
212Copper-ALD Seed Layer as an Enabler for Device Scaling
213Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
214Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
215Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
216Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
217Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
218Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
219Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
220Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
221Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
222Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
223Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
224Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
225Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
226Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
227Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
228Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
229Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
230Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
231Plasma-Modified Atomic Layer Deposition
232Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
233Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
234Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
235Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
236Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
237Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
238Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
239Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
240Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
241Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
242Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
243Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
244Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
245Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
246Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
247Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
248Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
249Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
250Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
251Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
252Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
253Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
254Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
255Film Uniformity in Atomic Layer Deposition
256Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
257Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
258Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
259Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
260Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
261In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
262Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
263Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
264Plasma-enhanced atomic layer deposition of superconducting niobium nitride
265Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
266High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
267A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
268Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
269Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
270Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
271Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications