Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Resistivity, Sheet Resistance returned 265 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
2GeSbTe deposition for the PRAM application
3Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
4Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
5Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
6Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
7Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
8Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
9Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
10Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
11Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
12Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
13Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
14Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
15Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
16In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
17Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
18Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
19Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
20Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
21Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
22Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
23Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
24Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
25Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
26Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
27Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
28Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
29Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
30Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
31Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
32Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
33Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
34Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
35Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
36Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
37Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
38Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
39Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
40Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
41The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
42Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
43Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
44In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
45Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
46Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
47Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
48High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
49Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
50Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
51Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
52Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
53Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
54Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
55Hydrogen plasma-enhanced atomic layer deposition of copper thin films
56Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
57Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
58Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
59Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
60Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
61Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
62Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
63Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
64The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
65Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
66Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
67TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
68Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
69Atomic layer deposition of titanium nitride from TDMAT precursor
70Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
71The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
72Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
73Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
74Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
75Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
76Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
77Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
78Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
79Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
80Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
81Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
82Atomic Layer Deposition of the Conductive Delafossite PtCoO2
83Remote Plasma ALD of Platinum and Platinum Oxide Films
84Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
85Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
86All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
87Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
88A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
89Plasma-enhanced atomic layer deposition of vanadium nitride
90Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
91Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
92Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
93Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
94High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
95Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
96Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
97Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
98Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
99Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
100The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
101Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
102Plasma-enhanced atomic layer deposition of superconducting niobium nitride
103Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
104Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
105Atomic layer deposition of titanium nitride for quantum circuits
106Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
107In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
108Microwave properties of superconducting atomic-layer deposited TiN films
109Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
110Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
111High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
112Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
113Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
114Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
115Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
116Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
117The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
118Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
119In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
120Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
121Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
122Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
123Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
124Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
125Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
126Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
127Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
128Film Uniformity in Atomic Layer Deposition
129Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
130Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
131Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
132In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
133Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
134A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
135Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
136Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
137Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
138Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
139Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
140Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
141Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
142Plasma-enhanced atomic layer deposition of Co on metal surfaces
143Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
144WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
145Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
146Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
147Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
148Ru thin film grown on TaN by plasma enhanced atomic layer deposition
149Plasma-enhanced atomic layer deposition of titanium vanadium nitride
150Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
151Fully CMOS-compatible titanium nitride nanoantennas
152Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
153Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
154Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
155Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
156Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
157Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
158Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
159Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
160Plasma-enhanced atomic layer deposition of tungsten nitride
161A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
162Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
163Atmospheric pressure plasma enhanced spatial ALD of silver
164PEALD of Copper using New Precursors for Next Generation of Interconnections
165Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
166Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
167Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
168Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
169Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
170Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
171Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
172Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
173Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
174Copper-ALD Seed Layer as an Enabler for Device Scaling
175High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
176Room-Temperature Atomic Layer Deposition of Platinum
177Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
178Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
179Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
180Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
181Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
182Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
183Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
184Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
185Study on the characteristics of aluminum thin films prepared by atomic layer deposition
186Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
187Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
188Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
189Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
190Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
191Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
192Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
193Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
194Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
195Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
196Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
197The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
198Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
199Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
200Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
201Evaluation of plasma parameters on PEALD deposited TaCN
202Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
203Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
204Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
205Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
206Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
207Plasma-Enhanced Atomic Layer Deposition of Ni
208Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
209Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
210TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
211Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
212Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
213Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
214Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
215Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
216Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
217Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
218Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
219Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
220ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
221Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
222Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
223Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
224Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
225Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
226Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
227Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
228Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
229Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
230Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
231PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
232Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
233A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
234Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
235Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
236Plasma-Modified Atomic Layer Deposition
237Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
238Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
239Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
240Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
241Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
242Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
243Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
244Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
245Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
246Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
247Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
248Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
249Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
250Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
251Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
252Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
253Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
254Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
255Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
256Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
257A route to low temperature growth of single crystal GaN on sapphire
258Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
259Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
260Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
261Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
262Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
263Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
264Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization