Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
2Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
3Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
4Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
5Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
6Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
7Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
8Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
9Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
10Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
11Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
12Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
13A route to low temperature growth of single crystal GaN on sapphire
14ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
15Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
16Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
17High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
18Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
19Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
20Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
21Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
22Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
23Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
24Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
25Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
26Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
27Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
28Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
29Room-Temperature Atomic Layer Deposition of Platinum
30Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
31The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
32Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
33The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
34Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
35Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
36Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
37Plasma-enhanced atomic layer deposition of vanadium nitride
38Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
39Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
40Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
41Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
42A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
43Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
44Atomic layer deposition of titanium nitride for quantum circuits
45Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
46TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
47Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
48Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
49Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
50Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
51Copper-ALD Seed Layer as an Enabler for Device Scaling
52Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
53Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
54Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
55Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
56Evaluation of plasma parameters on PEALD deposited TaCN
57Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
58A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
59GeSbTe deposition for the PRAM application
60Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
61Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
62Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
63Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
64Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
65Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
66Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
67Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
68Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
69The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
70Plasma-enhanced atomic layer deposition of titanium vanadium nitride
71Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
72Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
73Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
74Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
75Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
76Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
77Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
78Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
79Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
80Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
81Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
82Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
83All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
84Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
85Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
86Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
87In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
88Microwave properties of superconducting atomic-layer deposited TiN films
89Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
90Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
91Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
92Study on the characteristics of aluminum thin films prepared by atomic layer deposition
93Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
94Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
95In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
96Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
97Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
98Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
99Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
100Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
101Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
102Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
103Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
104Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
105Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
106Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
107Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
108Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
109Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
110Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
111Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
112Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
113Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
114Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
115Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
116Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
117Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
118Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
119Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
120Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
121Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
122Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
123Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
124Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
125Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
126Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
127Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
128Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
129Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
130Ru thin film grown on TaN by plasma enhanced atomic layer deposition
131Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
132Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
133Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
134Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
135Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
136Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
137Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
138Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
139The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
140Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
141Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
142Hydrogen plasma-enhanced atomic layer deposition of copper thin films
143Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
144Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
145High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
146Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
147Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
148Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
149Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
150Fully CMOS-compatible titanium nitride nanoantennas
151Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
152Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
153Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
154Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
155Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
156Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
157Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
158Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
159Film Uniformity in Atomic Layer Deposition
160Atomic Layer Deposition of the Conductive Delafossite PtCoO2
161Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
162Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
163In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
164Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
165High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
166Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
167Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
168Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
169Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
170Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
171Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
172Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
173Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
174Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
175In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
176Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
177Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
178Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
179Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
180Remote Plasma ALD of Platinum and Platinum Oxide Films
181Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
182Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
183Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
184Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
185Plasma-enhanced atomic layer deposition of Co on metal surfaces
186Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
187Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
188Atmospheric pressure plasma enhanced spatial ALD of silver
189Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
190Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
191Plasma-Enhanced Atomic Layer Deposition of Ni
192Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
193Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
194Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
195Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
196Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
197Plasma-enhanced atomic layer deposition of superconducting niobium nitride
198Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
199Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
200Plasma-Modified Atomic Layer Deposition
201Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
202A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
203Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
204Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
205Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
206Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
207Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
208PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
209WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
210Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
211Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
212Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
213High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
214In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
215Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
216Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
217Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
218Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
219Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
220Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
221Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
222Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
223Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
224Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
225Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
226Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
227Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
228Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
229Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
230Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
231Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
232Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
233Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
234Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
235Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
236Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
237Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
238Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
239Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
240Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
241Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
242Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
243Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
244Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
245The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
246Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
247Plasma-enhanced atomic layer deposition of tungsten nitride
248Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
249Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
250Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
251The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
252TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
253Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
254Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
255Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
256Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
257Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
258PEALD of Copper using New Precursors for Next Generation of Interconnections
259A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
260Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
261Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
262Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
263Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
264Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
265Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
266Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
267Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
268Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
269Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
270Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
271Atomic layer deposition of titanium nitride from TDMAT precursor