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Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Resistivity, Sheet Resistance returned 272 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
2Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
3Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
4Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
5Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
6In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
7Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
8Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
9Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
10Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
11Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
12Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
13High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
14Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
15Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
16The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
17Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
18Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
19Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
20Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
21Atomic Layer Deposition of the Conductive Delafossite PtCoO2
22Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
23Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
24Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
25Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
26Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
27Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
28Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
29Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
30Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
31Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
32Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
33Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
34Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
35Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
36Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
37Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
38Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
39Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
40Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
41Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
42Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
43Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
44Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
45Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
46Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
47Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
48Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
49Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
50Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
51Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
52Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
53Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
54Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
55Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
56Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
57Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
58Plasma-Modified Atomic Layer Deposition
59Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
60Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
61Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
62Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
63Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
64Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
65Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
66Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
67Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
68Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
69Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
70Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
71Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
72Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
73Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
74High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
75Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
76Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
77TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
78Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
79Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
80Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
81Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
82In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
83Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
84GeSbTe deposition for the PRAM application
85Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
86Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
87Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
88Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
89Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
90Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
91Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
92WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
93Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
94Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
95Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
96Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
97Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
98PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
99Ru thin film grown on TaN by plasma enhanced atomic layer deposition
100In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
101Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
102Atomic layer deposition of titanium nitride from TDMAT precursor
103Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
104High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
105Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
106Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
107ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
108In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
109Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
110A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
111Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
112A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
113Plasma-enhanced atomic layer deposition of superconducting niobium nitride
114Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
115Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
116Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
117Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
118Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
119Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
120Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
121Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
122Microwave properties of superconducting atomic-layer deposited TiN films
123Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
124Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
125Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
126Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
127Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
128Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
129Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
130Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
131Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
132Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
133Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
134Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
135Fully CMOS-compatible titanium nitride nanoantennas
136Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
137The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
138Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
139Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
140Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
141Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
142Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
143Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
144Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
145Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
146Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
147Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
148Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
149Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
150Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
151Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
152All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
153Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
154Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
155Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
156Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
157Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
158Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
159Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
160Study on the characteristics of aluminum thin films prepared by atomic layer deposition
161Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
162Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
163Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
164Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
165Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
166Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
167Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
168Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
169Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
170Atmospheric pressure plasma enhanced spatial ALD of silver
171Evaluation of plasma parameters on PEALD deposited TaCN
172Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
173Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
174Room-Temperature Atomic Layer Deposition of Platinum
175Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
176Plasma-enhanced atomic layer deposition of tungsten nitride
177Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
178Hydrogen plasma-enhanced atomic layer deposition of copper thin films
179Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
180Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
181Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
182Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
183The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
184Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
185Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
186Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
187Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
188Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
189Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
190Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
191The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
192Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
193A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
194Plasma-enhanced atomic layer deposition of titanium vanadium nitride
195Plasma-enhanced atomic layer deposition of Co on metal surfaces
196Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
197Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
198High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
199Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
200Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
201Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
202Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
203Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
204Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
205Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
206A route to low temperature growth of single crystal GaN on sapphire
207Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
208Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
209Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
210Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
211Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
212A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
213Atomic layer deposition of titanium nitride for quantum circuits
214TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
215Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
216Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
217Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
218PEALD of Copper using New Precursors for Next Generation of Interconnections
219Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
220Plasma-enhanced atomic layer deposition of vanadium nitride
221Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
222Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
223Copper-ALD Seed Layer as an Enabler for Device Scaling
224Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
225Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
226Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
227Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
228Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
229Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
230Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
231Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
232Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
233Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
234Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
235Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
236Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
237Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
238Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
239Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
240The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
241Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
242Film Uniformity in Atomic Layer Deposition
243Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
244Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
245Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
246The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
247Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
248Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
249Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
250Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
251Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
252Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
253Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
254Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
255Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
256Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
257Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
258Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
259Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
260Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
261In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
262Remote Plasma ALD of Platinum and Platinum Oxide Films
263Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
264Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
265Plasma-Enhanced Atomic Layer Deposition of Ni
266Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
267Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
268Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
269Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
270Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
271Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor