Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
2Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
3Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
4Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
5Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
6Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
7Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
8High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
9Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
10Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
11Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
12High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
13Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
14Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
15Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
16Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
17Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
18Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
19Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
20Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
21PEALD of Copper using New Precursors for Next Generation of Interconnections
22Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
23Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
24Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
25Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
26Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
27Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
28Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
29Plasma-Modified Atomic Layer Deposition
30WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
31Remote Plasma ALD of Platinum and Platinum Oxide Films
32Film Uniformity in Atomic Layer Deposition
33In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
34Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
35Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
36Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
37In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
38High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
39Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
40Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
41Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
42Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
43Plasma-enhanced atomic layer deposition of titanium vanadium nitride
44Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
45Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
46Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
47Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
48Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
49TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
50Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
51Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
52Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
53Hydrogen plasma-enhanced atomic layer deposition of copper thin films
54Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
55Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
56A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
57Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
58Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
59Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
60Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
61Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
62Plasma-Enhanced Atomic Layer Deposition of Ni
63Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
64Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
65Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
66Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
67Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
68Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
69A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
70Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
71Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
72Microwave properties of superconducting atomic-layer deposited TiN films
73Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
74Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
75Ru thin film grown on TaN by plasma enhanced atomic layer deposition
76Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
77ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
78Copper-ALD Seed Layer as an Enabler for Device Scaling
79Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
80Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
81Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
82Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
83Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
84A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
85The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
86Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
87Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
88Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
89Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
90Study on the characteristics of aluminum thin films prepared by atomic layer deposition
91Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
92Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
93Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
94Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
95Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
96Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
97Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
98Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
99Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
100Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
101Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
102Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
103Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
104Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
105The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
106Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
107Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
108Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
109Plasma-enhanced atomic layer deposition of superconducting niobium nitride
110Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
111Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
112Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
113In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
114A route to low temperature growth of single crystal GaN on sapphire
115Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
116Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
117Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
118Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
119Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
120Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
121High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
122Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
123Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
124Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
125Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
126Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
127Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
128Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
129Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
130Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
131Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
132A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
133Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
134Evaluation of plasma parameters on PEALD deposited TaCN
135Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
136Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
137Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
138Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
139Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
140Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
141Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
142Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
143The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
144Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
145Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
146Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
147Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
148Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
149Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
150The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
151Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
152Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
153Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
154Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
155Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
156Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
157Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
158Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
159Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
160Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
161Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
162Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
163Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
164Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
165Plasma-enhanced atomic layer deposition of tungsten nitride
166Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
167Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
168Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
169Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
170Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
171Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
172Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
173GeSbTe deposition for the PRAM application
174Atomic layer deposition of titanium nitride for quantum circuits
175Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
176Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
177Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
178Fully CMOS-compatible titanium nitride nanoantennas
179Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
180Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
181Atomic layer deposition of titanium nitride from TDMAT precursor
182Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
183Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
184Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
185Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
186Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
187Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
188Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
189Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
190The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
191Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
192Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
193Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
194In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
195Atmospheric pressure plasma enhanced spatial ALD of silver
196Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
197Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
198Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
199Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
200Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
201Atomic Layer Deposition of the Conductive Delafossite PtCoO2
202Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
203Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
204Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
205Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
206Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
207Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
208Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
209Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
210Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
211Plasma-enhanced atomic layer deposition of Co on metal surfaces
212Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
213Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
214Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
215Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
216Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
217Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
218Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
219Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
220Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
221Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
222Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
223Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
224Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
225Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
226Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
227Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
228In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
229Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
230Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
231Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
232Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
233Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
234Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
235Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
236Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
237Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
238Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
239Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
240Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
241Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
242Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
243Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
244Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
245Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
246Room-Temperature Atomic Layer Deposition of Platinum
247Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
248Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
249Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
250Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
251Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
252Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
253Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
254Plasma-enhanced atomic layer deposition of vanadium nitride
255Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
256Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
257Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
258All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
259Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
260The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
261Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
262Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
263Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
264Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
265PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
266Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
267TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
268Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
269Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
270Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
271Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films