1 | Plasma-enhanced atomic layer deposition of tungsten nitride |
2 | Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition |
3 | Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition |
4 | Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition |
5 | Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications |
6 | Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications |
7 | Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth |
8 | Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer |
9 | High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating |
10 | Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films |
11 | Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects |
12 | Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition |
13 | WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications |
14 | Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition |
15 | Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films |
16 | Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects |
17 | Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum |
18 | Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor |
19 | Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD |
20 | Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film |
21 | Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization |
22 | Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources |
23 | Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition |
24 | Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition |
25 | Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications |
26 | Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications |
27 | Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition |
28 | Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films |
29 | In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating |
30 | Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate |
31 | Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition |
32 | High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition |
33 | Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer |
34 | Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films |
35 | Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition |
36 | Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer |
37 | Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas |
38 | Room-Temperature Atomic Layer Deposition of Platinum |
39 | Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition |
40 | Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application |
41 | Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition |
42 | Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent |
43 | Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals |
44 | Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics |
45 | Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage |
46 | Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment |
47 | Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition |
48 | Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition |
49 | Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma |
50 | The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor |
51 | Atmospheric pressure plasma enhanced spatial ALD of silver |
52 | Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors |
53 | All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process |
54 | Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma |
55 | Fully CMOS-compatible titanium nitride nanoantennas |
56 | Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt |
57 | Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition |
58 | Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition |
59 | Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu |
60 | Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers |
61 | Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality |
62 | Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia |
63 | Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor |
64 | Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications |
65 | Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM |
66 | Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity |
67 | Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition |
68 | Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications |
69 | Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma |
70 | Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc |
71 | PEALD of Copper using New Precursors for Next Generation of Interconnections |
72 | Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy |
73 | Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition |
74 | Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant |
75 | Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition |
76 | Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors |
77 | Copper-ALD Seed Layer as an Enabler for Device Scaling |
78 | A controlled growth of WNx and WCx thin films prepared by atomic layer deposition |
79 | Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma |
80 | Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor |
81 | Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition |
82 | Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates |
83 | Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application |
84 | Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma |
85 | Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers |
86 | Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells |
87 | PEALD of a Ruthenium Adhesion Layer for Copper Interconnects |
88 | Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods |
89 | Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells |
90 | Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition |
91 | Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers |
92 | Ag films grown by remote plasma enhanced atomic layer deposition on different substrates |
93 | Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu |
94 | Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN |
95 | Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2 |
96 | Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 |
97 | Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy |
98 | High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications |
99 | Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications |
100 | Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling |
101 | Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition |
102 | Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN |
103 | The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2 |
104 | Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor |
105 | Atomic Layer Deposition of the Conductive Delafossite PtCoO2 |
106 | In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition |
107 | Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices |
108 | Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition |
109 | Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier |
110 | Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD |
111 | Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides |
112 | Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma |
113 | Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD |
114 | Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition |
115 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
116 | Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators |
117 | Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films |
118 | Nanowire single-photon detectors made of atomic layer-deposited niobium nitride |
119 | Microwave properties of superconducting atomic-layer deposited TiN films |
120 | Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures |
121 | Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma |
122 | Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure |
123 | Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics |
124 | High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition |
125 | Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique |
126 | Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies |
127 | Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor |
128 | Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition |
129 | Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization |
130 | Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers |
131 | Atomic layer deposition of titanium nitride for quantum circuits |
132 | Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition |
133 | In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd |
134 | Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor |
135 | A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu |
136 | Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates |
137 | Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition |
138 | Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition |
139 | Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma |
140 | Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition |
141 | Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor |
142 | Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition |
143 | Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices |
144 | Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper |
145 | Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity |
146 | The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications |
147 | Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel |
148 | Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films |
149 | Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor |
150 | Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films |
151 | Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties |
152 | Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films |
153 | A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films |
154 | Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma |
155 | Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition |
156 | Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications |
157 | Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor |
158 | Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor |
159 | Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition |
160 | In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films |
161 | Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex |
162 | Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions |
163 | Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma |
164 | Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor |
165 | Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier |
166 | Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers |
167 | Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films |
168 | Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon |
169 | Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases |
170 | Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant |
171 | Plasma-enhanced atomic layer deposition of vanadium nitride |
172 | Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient |
173 | Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion |
174 | Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices |
175 | Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties |
176 | Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications |
177 | GeSbTe deposition for the PRAM application |
178 | Atomic layer deposition of high-mobility hydrogen-doped zinc oxide |
179 | ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window" |
180 | Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition |
181 | Hydrogen plasma-enhanced atomic layer deposition of copper thin films |
182 | The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition |
183 | Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
184 | Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon |
185 | Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition |
186 | Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature |
187 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
188 | TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD |
189 | Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry |
190 | Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics |
191 | Evaluation of plasma parameters on PEALD deposited TaCN |
192 | Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process |
193 | Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
194 | Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure |
195 | Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode |
196 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film |
197 | Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures |
198 | Plasma-Modified Atomic Layer Deposition |
199 | Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas |
200 | Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition |
201 | In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition |
202 | Atomic layer deposition of titanium nitride from TDMAT precursor |
203 | Remote Plasma ALD of Platinum and Platinum Oxide Films |
204 | Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition |
205 | Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method |
206 | Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method |
207 | Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu |
208 | Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration |
209 | Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films |
210 | Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect |
211 | Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications |
212 | A route to low temperature growth of single crystal GaN on sapphire |
213 | Film Uniformity in Atomic Layer Deposition |
214 | Plasma-enhanced atomic layer deposition of superconducting niobium nitride |
215 | Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications |
216 | Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor |
217 | Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films |
218 | Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure |
219 | Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition |
220 | Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications |
221 | Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films |
222 | Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage |
223 | Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes |
224 | Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization |
225 | Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition |
226 | Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material |
227 | Plasma-enhanced atomic layer deposition of Co on metal surfaces |
228 | Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology |
229 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films |
230 | TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition |
231 | Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing |
232 | Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition |
233 | A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition |
234 | Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier |
235 | Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions |
236 | The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties |
237 | Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry |
238 | Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT) |
239 | Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment |
240 | Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride |
241 | Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells |
242 | Plasma-enhanced atomic layer deposition of titanium vanadium nitride |
243 | Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties |
244 | Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide |
245 | Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy |
246 | Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films |
247 | Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum |
248 | Plasma-Enhanced Atomic Layer Deposition of Ni |
249 | Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer |
250 | Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell |
251 | Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors |
252 | Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization |
253 | Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films |
254 | Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition |
255 | Study on the characteristics of aluminum thin films prepared by atomic layer deposition |
256 | Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten |
257 | Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors |
258 | Ru thin film grown on TaN by plasma enhanced atomic layer deposition |
259 | Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition |
260 | Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier |
261 | Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition |
262 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma |
263 | Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates |
264 | Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate |
265 | Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films |
266 | The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition |
267 | Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing |
268 | Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films |
269 | Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier |
270 | Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor |
271 | Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals |