Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
2Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
3Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
4Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
5Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
6Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
7Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
8Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
9Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
10Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
11Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
12Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
13TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
14Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
15Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
16Ru thin film grown on TaN by plasma enhanced atomic layer deposition
17Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
18Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
19Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
20Room-Temperature Atomic Layer Deposition of Platinum
21Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
22In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
23TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
24Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
25Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
26Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
27Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
28Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
29Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
30Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
31Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
32Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
33In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
34Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
35Plasma-enhanced atomic layer deposition of vanadium nitride
36Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
37Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
38Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
39Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
40Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
41Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
42Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
43Film Uniformity in Atomic Layer Deposition
44Study on the characteristics of aluminum thin films prepared by atomic layer deposition
45Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
46Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
47Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
48Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
49Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
50Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
51Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
52Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
53Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
54Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
55Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
56Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
57Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
58Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
59Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
60Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
61Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
62Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
63Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
64Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
65Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
66Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
67The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
68Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
69Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
70Plasma-enhanced atomic layer deposition of Co on metal surfaces
71Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
72Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
73PEALD of Copper using New Precursors for Next Generation of Interconnections
74Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
75Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
76Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
77A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
78A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
79WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
80Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
81GeSbTe deposition for the PRAM application
82The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
83ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
84Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
85Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
86Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
87Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
88Copper-ALD Seed Layer as an Enabler for Device Scaling
89Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
90Atomic layer deposition of titanium nitride from TDMAT precursor
91Fully CMOS-compatible titanium nitride nanoantennas
92Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
93Evaluation of plasma parameters on PEALD deposited TaCN
94Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
95Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
96Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
97In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
98Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
99Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
100Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
101Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
102Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
103High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
104Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
105Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
106Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
107Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
108Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
109Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
110Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
111Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
112Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
113Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
114Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
115Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
116Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
117Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
118The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
119Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
120Atomic layer deposition of titanium nitride for quantum circuits
121The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
122Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
123Hydrogen plasma-enhanced atomic layer deposition of copper thin films
124All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
125Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
126Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
127Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
128Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
129Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
130A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
131Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
132Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
133Remote Plasma ALD of Platinum and Platinum Oxide Films
134Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
135Plasma-enhanced atomic layer deposition of tungsten nitride
136Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
137Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
138Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
139Plasma-enhanced atomic layer deposition of titanium vanadium nitride
140Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
141Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
142Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
143Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
144Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
145Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
146Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
147Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
148Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
149Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
150Plasma-Modified Atomic Layer Deposition
151Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
152Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
153Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
154Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
155Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
156Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
157Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
158Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
159Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
160Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
161Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
162Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
163Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
164Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
165Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
166Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
167Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
168Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
169Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
170Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
171Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
172Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
173Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
174Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
175Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
176Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
177Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
178Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
179Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
180Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
181Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
182Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
183Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
184Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
185Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
186Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
187The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
188Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
189Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
190Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
191A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
192Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
193Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
194Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
195Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
196Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
197Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
198Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
199Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
200Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
201Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
202Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
203Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
204Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
205Plasma-enhanced atomic layer deposition of superconducting niobium nitride
206Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
207Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
208Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
209Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
210Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
211Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
212Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
213Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
214Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
215In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
216Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
217Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
218Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
219Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
220Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
221Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
222A route to low temperature growth of single crystal GaN on sapphire
223Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
224Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
225Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
226Atmospheric pressure plasma enhanced spatial ALD of silver
227Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
228Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
229Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
230Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
231High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
232Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
233Atomic Layer Deposition of the Conductive Delafossite PtCoO2
234Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
235Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
236Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
237Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
238Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
239Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
240Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
241Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
242High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
243Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
244Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
245Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
246Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
247Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
248Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
249PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
250The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
251Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
252Plasma-Enhanced Atomic Layer Deposition of Ni
253Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
254Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
255Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
256Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
257Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
258Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
259Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
260Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
261Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
262Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
263Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
264Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
265High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
266Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
267Microwave properties of superconducting atomic-layer deposited TiN films
268Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
269Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
270In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
271Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers