Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Resistivity, Sheet Resistance returned 222 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
3A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
4A route to low temperature growth of single crystal GaN on sapphire
5Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
6Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
7Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
8Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
9Atmospheric pressure plasma enhanced spatial ALD of silver
10Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
11Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
12Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
13Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
14Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
15Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
16Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
17Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
18Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
19Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
20Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
21Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
22Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
23Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
24Atomic layer deposition of titanium nitride for quantum circuits
25Atomic layer deposition of titanium nitride from TDMAT precursor
26Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
27Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
28Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
29Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
30Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
31Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
32Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
33Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
34Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
35Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
36Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
37Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
38Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
39Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
40Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
41Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
42Copper-ALD Seed Layer as an Enabler for Device Scaling
43Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
44Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
45Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
46Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
47Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
48Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
49Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
50Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
51Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
52Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
53Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
54Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
55Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
56Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
57Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
58Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
59Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
60Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
61Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
62Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
63Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
64Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
65Evaluation of plasma parameters on PEALD deposited TaCN
66Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
67Film Uniformity in Atomic Layer Deposition
68Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
69Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
70Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
71Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
72Fully CMOS-compatible titanium nitride nanoantennas
73GeSbTe deposition for the PRAM application
74Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
75Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
76Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
77Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
78Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
79High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
80High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
81High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
82Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
83Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
84Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
85Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
86Hydrogen plasma-enhanced atomic layer deposition of copper thin films
87Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
88Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
89Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
90Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
91Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
92In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
93In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
94In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
95In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
96Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
97Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
98Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
99Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
100Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
101Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
102Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
103Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
104Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
105Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
106Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
107Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
108Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
109Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
110Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
111Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
112Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
113Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
114Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
115Microwave properties of superconducting atomic-layer deposited TiN films
116Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
117Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
118Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
119Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
120Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
121PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
122PEALD of Copper using New Precursors for Next Generation of Interconnections
123Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
124Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
125Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
126Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
127Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
128Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
129Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
130Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
131Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
132Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
133Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
134Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
135Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
136Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
137Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
138Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
139Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
140Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
141Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
142Plasma-Enhanced Atomic Layer Deposition of Ni
143Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
144Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
145Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
146Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
147Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
148Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
149Plasma-enhanced atomic layer deposition of superconducting niobium nitride
150Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
151Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
152Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
153Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
154Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
155Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
156Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
157Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
158Plasma-enhanced atomic layer deposition of titanium vanadium nitride
159Plasma-enhanced atomic layer deposition of tungsten nitride
160Plasma-enhanced atomic layer deposition of vanadium nitride
161Plasma-Modified Atomic Layer Deposition
162Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
163Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
164Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
165Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
166Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
167Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
168Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
169Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
170Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
171Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
172Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
173Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
174Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
175Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
176Remote Plasma ALD of Platinum and Platinum Oxide Films
177Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
178Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
179Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
180Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
181Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
182Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
183Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
184Room-Temperature Atomic Layer Deposition of Platinum
185Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
186Ru thin film grown on TaN by plasma enhanced atomic layer deposition
187Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
188Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
189Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
190Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
191Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
192Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
193Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
194Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
195Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
196Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
197Study on the characteristics of aluminum thin films prepared by atomic layer deposition
198Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
199Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
200Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
201TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
202Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
203The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
204The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
205The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
206The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
207The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
208The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
209Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
210Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
211Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
212Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
213TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
214Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
215Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
216Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
217Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
218Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
219Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
220Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
221WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications


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