Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Resistivity, Sheet Resistance returned 157 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
2	A route to low temperature growth of single crystal GaN on sapphire
3	Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
4	Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
5	Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
6	Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
7	Atmospheric pressure plasma enhanced spatial ALD of silver
8	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
9	Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
10	Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
11	Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
12	Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
13	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
14	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
15	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
16	Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
17	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
18	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
19	Atomic layer deposition of titanium nitride from TDMAT precursor
20	Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
21	Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
22	Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
23	Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
24	Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
25	Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
26	Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
27	Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
28	Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
29	Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
30	Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
31	Copper-ALD Seed Layer as an Enabler for Device Scaling
32	Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
33	Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
34	Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
35	Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
36	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
37	Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
38	Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
39	Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
40	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
41	Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
42	Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
43	Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
44	Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
45	Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
46	Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
47	Evaluation of plasma parameters on PEALD deposited TaCN
48	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
49	Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
50	Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
51	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
52	Fully CMOS-compatible titanium nitride nanoantennas
53	Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
54	Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
55	Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
56	High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
57	High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
58	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
59	Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
60	Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
61	Hydrogen plasma-enhanced atomic layer deposition of copper thin films
62	Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
63	Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
64	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
65	In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
66	Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
67	Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
68	Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
69	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
70	Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
71	Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
72	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
73	Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
74	Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
75	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
76	Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
77	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
78	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
79	Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
80	Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
81	Microwave properties of superconducting atomic-layer deposited TiN films
82	Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
83	Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
84	PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
85	PEALD of Copper using New Precursors for Next Generation of Interconnections
86	Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
87	Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
88	Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
89	Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
90	Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
91	Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
92	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
93	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
94	Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
95	Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
96	Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
97	Plasma-Enhanced Atomic Layer Deposition of Ni
98	Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
99	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
100	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
101	Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
102	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
103	Plasma-enhanced atomic layer deposition of superconducting niobium nitride
104	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
105	Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
106	Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
107	Plasma-enhanced atomic layer deposition of tungsten nitride
108	Plasma-Modified Atomic Layer Deposition
109	Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
110	Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
111	Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
112	Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
113	Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
114	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
115	Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
116	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
117	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
118	Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
119	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
120	Remote Plasma ALD of Platinum and Platinum Oxide Films
121	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
122	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
123	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
124	Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
125	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
126	Room-Temperature Atomic Layer Deposition of Platinum
127	Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
128	Ru thin film grown on TaN by plasma enhanced atomic layer deposition
129	Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
130	Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
131	Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
132	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
133	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
134	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
135	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
136	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
137	Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
138	Study on the characteristics of aluminum thin films prepared by atomic layer deposition
139	Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
140	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
141	Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
142	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
143	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
144	The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
145	The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
146	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
147	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
148	Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
149	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
150	TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
151	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
152	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
153	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
154	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
155	Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
156	Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
157	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon

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