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Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Resistivity, Sheet Resistance returned 157 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
2A route to low temperature growth of single crystal GaN on sapphire
3Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
4Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
5Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
6Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
7Atmospheric pressure plasma enhanced spatial ALD of silver
8Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
9Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
10Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
11Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
12Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
13Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
14Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
15Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
16Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
17Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
18Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
19Atomic layer deposition of titanium nitride from TDMAT precursor
20Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
21Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
22Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
23Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
24Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
25Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
26Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
27Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
28Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
29Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
30Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
31Copper-ALD Seed Layer as an Enabler for Device Scaling
32Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
33Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
34Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
35Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
36Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
37Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
38Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
39Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
40Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
41Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
42Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
43Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
44Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
45Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
46Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
47Evaluation of plasma parameters on PEALD deposited TaCN
48Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
49Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
50Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
51Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
52Fully CMOS-compatible titanium nitride nanoantennas
53Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
54Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
55Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
56High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
57High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
58Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
59Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
60Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
61Hydrogen plasma-enhanced atomic layer deposition of copper thin films
62Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
63Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
64In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
65In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
66Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
67Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
68Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
69Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
70Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
71Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
72Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
73Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
74Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
75Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
76Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
77Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
78Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
79Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
80Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
81Microwave properties of superconducting atomic-layer deposited TiN films
82Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
83Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
84PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
85PEALD of Copper using New Precursors for Next Generation of Interconnections
86Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
87Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
88Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
89Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
90Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
91Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
92Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
93Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
94Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
95Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
96Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
97Plasma-Enhanced Atomic Layer Deposition of Ni
98Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
99Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
100Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
101Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
102Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
103Plasma-enhanced atomic layer deposition of superconducting niobium nitride
104Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
105Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
106Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
107Plasma-enhanced atomic layer deposition of tungsten nitride
108Plasma-Modified Atomic Layer Deposition
109Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
110Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
111Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
112Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
113Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
114Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
115Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
116Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
117Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
118Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
119Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
120Remote Plasma ALD of Platinum and Platinum Oxide Films
121Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
122Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
123Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
124Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
125Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
126Room-Temperature Atomic Layer Deposition of Platinum
127Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
128Ru thin film grown on TaN by plasma enhanced atomic layer deposition
129Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
130Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
131Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
132Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
133Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
134Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
135Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
136Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
137Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
138Study on the characteristics of aluminum thin films prepared by atomic layer deposition
139Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
140Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
141Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
142The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
143The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
144The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
145The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
146The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
147Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
148Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
149Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
150TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
151Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
152Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
153Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
154Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
155Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
156Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
157Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon

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