Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Resistivity, Sheet Resistance returned 264 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Hydrogen plasma-enhanced atomic layer deposition of copper thin films
2Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
3Atomic layer deposition of titanium nitride for quantum circuits
4WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
5Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
6Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
7Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
8Plasma-enhanced atomic layer deposition of Co on metal surfaces
9Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
10Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
11High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
12Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
13Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
14In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
15Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
16Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
17Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
18Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
19Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
20Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
21Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
22Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
23Atomic layer deposition of titanium nitride from TDMAT precursor
24Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
25Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
26Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
27Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
28Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
29Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
30Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
31Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
32Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
33Plasma-enhanced atomic layer deposition of vanadium nitride
34Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
35Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
36Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
37Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
38Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
39Plasma-Enhanced Atomic Layer Deposition of Ni
40Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
41Plasma-enhanced atomic layer deposition of tungsten nitride
42Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
43Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
44Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
45Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
46Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
47ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
48Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
49Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
50Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
51A route to low temperature growth of single crystal GaN on sapphire
52Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
53Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
54Fully CMOS-compatible titanium nitride nanoantennas
55Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
56Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
57Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
58Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
59Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
60Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
61Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
62Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
63Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
64Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
65Microwave properties of superconducting atomic-layer deposited TiN films
66Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
67Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
68Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
69Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
70Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
71Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
72The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
73Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
74Plasma-Modified Atomic Layer Deposition
75Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
76Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
77Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
78Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
79Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
80Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
81The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
82Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
83Copper-ALD Seed Layer as an Enabler for Device Scaling
84A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
85Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
86In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
87Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
88Plasma-enhanced atomic layer deposition of superconducting niobium nitride
89Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
90Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
91Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
92Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
93Film Uniformity in Atomic Layer Deposition
94Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
95PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
96Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
97Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
98Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
99The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
100Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
101Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
102GeSbTe deposition for the PRAM application
103Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
104Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
105Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
106Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
107Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
108Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
109Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
110Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
111Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
112Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
113Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
114Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
115Room-Temperature Atomic Layer Deposition of Platinum
116Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
117Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
118Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
119Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
120Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
121Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
122Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
123Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
124Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
125Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
126Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
127Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
128Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
129Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
130A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
131Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
132Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
133Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
134Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
135Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
136Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
137Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
138Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
139Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
140Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
141The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
142Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
143Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
144Evaluation of plasma parameters on PEALD deposited TaCN
145In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
146Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
147Atmospheric pressure plasma enhanced spatial ALD of silver
148Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
149Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
150Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
151Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
152Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
153Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
154High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
155Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
156Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
157Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
158Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
159Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
160Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
161Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
162Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
163In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
164Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
165Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
166Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
167Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
168Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
169Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
170Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
171PEALD of Copper using New Precursors for Next Generation of Interconnections
172Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
173Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
174Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
175Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
176Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
177Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
178Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
179Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
180Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
181Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
182Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
183Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
184Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
185Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
186Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
187Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
188Remote Plasma ALD of Platinum and Platinum Oxide Films
189In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
190Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
191Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
192Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
193A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
194Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
195Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
196Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
197TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
198Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
199Plasma-enhanced atomic layer deposition of titanium vanadium nitride
200Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
201Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
202Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
203Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
204The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
205Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
206Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
207Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
208Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
209Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
210Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
211Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
212Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
213Atomic Layer Deposition of the Conductive Delafossite PtCoO2
214Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
215Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
216Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
217Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
218Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
219Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
220High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
221All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
222Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
223Study on the characteristics of aluminum thin films prepared by atomic layer deposition
224Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
225Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
226Ru thin film grown on TaN by plasma enhanced atomic layer deposition
227Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
228Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
229Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
230Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
231Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
232Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
233Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
234Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
235Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
236Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
237Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
238Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
239Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
240Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
241Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
242Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
243Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
244Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
245High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
246The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
247A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
248Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
249Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
250Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
251Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
252Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
253Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
254Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
255Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
256Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
257TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
258Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
259Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
260Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
261Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
262Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
263Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition