Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
2Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
3Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
4Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
5Atomic layer deposition of titanium nitride for quantum circuits
6Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
7Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
8Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
9Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
10Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
11Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
12Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
13Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
14Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
15Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
16Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
17The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
18Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
19Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
20High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
21Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
22Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
23Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
24Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
25Microwave properties of superconducting atomic-layer deposited TiN films
26Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
27Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
28Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
29Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
30Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
31Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
32Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
33Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
34Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
35Plasma-Enhanced Atomic Layer Deposition of Ni
36TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
37Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
38Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
39Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
40Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
41Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
42All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
43Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
44Plasma-enhanced atomic layer deposition of titanium vanadium nitride
45WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
46Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
47Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
48Plasma-enhanced atomic layer deposition of vanadium nitride
49Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
50Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
51Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
52Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
53Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
54Fully CMOS-compatible titanium nitride nanoantennas
55Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
56Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
57Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
58Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
59Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
60Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
61Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
62In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
63Plasma Enhanced Atomic Layer Deposition of Ru-Ta composite film as a Seed Layer for CVD Cu filling
64A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
65Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
66Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel
67Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
68Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
69Ru thin film grown on TaN by plasma enhanced atomic layer deposition
70GeSbTe deposition for the PRAM application
71Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
72The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
73Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
74Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
75Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
76Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
77Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
78Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
79A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
80Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
81Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
82Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
83Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
84Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
85Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
86Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
87Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
88Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
89Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
90Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
91Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
92Atomic Layer Deposition of the Conductive Delafossite PtCoO2
93PEALD of Copper using New Precursors for Next Generation of Interconnections
94Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
95Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
96Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
97Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
98Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
99Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
100Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
101Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
102Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
103Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
104Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
105Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
106Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
107Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
108Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
109Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
110Lateral conductivity of n-GaP/p-Si heterojunction with an inversion layer
111Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
112Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
113Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
114ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
115Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
116Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
117Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
118Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
119Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
120A route to low temperature growth of single crystal GaN on sapphire
121Room-Temperature Atomic Layer Deposition of Platinum
122Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
123Atmospheric pressure plasma enhanced spatial ALD of silver
124Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
125Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
126Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
127Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
128Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
129Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
130Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
131Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
132Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
133Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
134Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
135A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
136Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
137PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
138Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
139Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
140Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
141Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
142Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
143Remote Plasma ALD of Platinum and Platinum Oxide Films
144Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
145Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
146Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
147High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
148Evaluation of plasma parameters on PEALD deposited TaCN
149Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
150High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
151Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
152Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
153Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
154Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
155Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
156Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
157Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
158Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
159Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
160Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
161Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
162Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
163Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
164Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
165Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
166Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
167Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
168Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
169The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
170Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
171Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
172Plasma-enhanced atomic layer deposition of tungsten nitride
173Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
174Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
175Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
176In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
177Copper-ALD Seed Layer as an Enabler for Device Scaling
178Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
179Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
180Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
181Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
182In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
183Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
184Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
185Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
186Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
187Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
188The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
189Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
190Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
191Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
192Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
193Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
194Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
195Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
196Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
197Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
198Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
199Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
200Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
201Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
202Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
203A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
204Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
205Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
206Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
207The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
208Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
209Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
210Atomic layer deposition of titanium nitride from TDMAT precursor
211Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
212Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
213Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
214Hydrogen plasma-enhanced atomic layer deposition of copper thin films
215Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
216Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
217Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
218Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
219Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
220The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
221Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
222Study on the characteristics of aluminum thin films prepared by atomic layer deposition
223Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
224Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
225Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
226Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
227High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
228Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
229Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
230Plasma-Modified Atomic Layer Deposition
231Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
232Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
233Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
234Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
235Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
236In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
237TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
238Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
239Plasma-enhanced atomic layer deposition of Co on metal surfaces
240Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
241Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
242Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
243Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
244Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
245Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
246Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
247Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
248Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
249Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
250Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
251Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
252In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
253Film Uniformity in Atomic Layer Deposition
254Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
255Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
256Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
257Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
258Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
259Plasma-enhanced atomic layer deposition of superconducting niobium nitride
260Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
261Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
262Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
263Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
264Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
265Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
266Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
267Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
268Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
269Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
270Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
271Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates