Images Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
3A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
4A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
5A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
6A route to low temperature growth of single crystal GaN on sapphire
7Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
8Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
11Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
12ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
13Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
14Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
15Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
16Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
17Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
18Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
19Atmospheric pressure plasma enhanced spatial ALD of silver
20Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
21Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
22Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
23Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
24Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
25Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
26Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
27Atomic Layer Deposition of Gold Metal
28Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
29Atomic layer deposition of metal-oxide thin films on cellulose fibers
30Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
31Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
32Atomic Layer Deposition of the Solid Electrolyte LiPON
33Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
34Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
35Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
36Bipolar resistive switching in amorphous titanium oxide thin film
37Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
38Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
39Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
40Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
41Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
42Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
43Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
44Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
45Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
46Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
47Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
48Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
49Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
50Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
51Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
52Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
53Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
54Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
55Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
56Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
57Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
58Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
59Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
60Encapsulation method for atom probe tomography analysis of nanoparticles
61Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
62Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
63Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
64Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
65Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
66Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
67Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
68Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
69Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
70Flexible Memristive Memory Array on Plastic Substrates
71Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
72GeSbTe deposition for the PRAM application
73Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
74High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
75High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
76High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
77Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
78Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
79Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
80Improved understanding of recombination at the Si/Al2O3 interface
81Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
82In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
83In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
84In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
85Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
86Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
87Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
88Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
89Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
90Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
91IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
92Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
93Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
94Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
95Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
96Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
97Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
98Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
99Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
100Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
101Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
102Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
103Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
104Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
105Modal properties of a strip-loaded horizontal slot waveguide
106MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
107n-GaP/p-Si Heterojunction Solar Cells Fabricated by PE-ALD
108Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
109NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
110Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
111Nitride memristors
112Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
113Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
114On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
115Oxygen migration in TiO2-based higher-k gate stacks
116Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
117Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
118Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
119Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
120Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
121Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
122Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
123Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
124Plasma enhanced atomic layer deposition of gallium sulfide thin films
125Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
126Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
127Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
128Plasma enhanced atomic layer deposition of zinc sulfide thin films
129Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
130Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
131Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
132Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
133Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
134Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
135Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
136Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
137Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
138Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
139Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
140Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
141Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
142Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
143Protective capping and surface passivation of III-V nanowires by atomic layer deposition
144Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
145Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
146Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
147Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
148Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
149Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
150Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
151Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
152Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
153Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
154Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
155Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
156Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
157Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
158Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
159Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
160Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
161Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
162Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
163Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
164Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
165Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
166Thin film GaP for solar cell application
167TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
168TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
169Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
170Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
171Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
172Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
173Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
174Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
175Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
176Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
177Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
178Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
179Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
180Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
181Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
182WS2 transistors on 300 mm wafers with BEOL compatibility


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