Images Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
3A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
4A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
5A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
6A route to low temperature growth of single crystal GaN on sapphire
7Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
8Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
11Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
12ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
13Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
14Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
15Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
16Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
17Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
18Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
19Atmospheric pressure plasma enhanced spatial ALD of silver
20Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
21Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
22Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
23Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
24Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
25Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
26Atomic Layer Deposition of Gold Metal
27Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
28Atomic layer deposition of metal-oxide thin films on cellulose fibers
29Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
30Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
31Atomic Layer Deposition of the Solid Electrolyte LiPON
32Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
33Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
34Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
35Bipolar resistive switching in amorphous titanium oxide thin film
36Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
37Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
38Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
39Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
40Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
41Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
42Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
43Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
44Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
45Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
46Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
47Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
48Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
49Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
50Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
51Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
52Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
53Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
54Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
55Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
56Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
57Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
58Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
59Encapsulation method for atom probe tomography analysis of nanoparticles
60Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
61Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
62Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
63Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
64Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
65Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
66Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
67Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
68Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
69Flexible Memristive Memory Array on Plastic Substrates
70Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
71GeSbTe deposition for the PRAM application
72Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
73High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
74High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
75High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
76Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
77Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
78Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
79Improved understanding of recombination at the Si/Al2O3 interface
80Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
81In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
82In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
83In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
84Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
85Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
86Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
87Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
88Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
89Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
90IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
91Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
92Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
93Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
94Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
95Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
96Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
97Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
98Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
99Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
100Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
101Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
102Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
103Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
104Modal properties of a strip-loaded horizontal slot waveguide
105n-GaP/p-Si Heterojunction Solar Cells Fabricated by PE-ALD
106Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
107NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
108Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
109Nitride memristors
110Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
111Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
112On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
113Oxygen migration in TiO2-based higher-k gate stacks
114Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
115Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
116Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
117Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
118Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
119Plasma enhanced atomic layer deposition of gallium sulfide thin films
120Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
121Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
122Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
123Plasma enhanced atomic layer deposition of zinc sulfide thin films
124Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
125Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
126Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
127Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
128Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
129Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
130Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
131Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
132Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
133Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
134Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
135Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
136Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
137Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
138Protective capping and surface passivation of III-V nanowires by atomic layer deposition
139Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
140Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
141Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
142Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
143Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
144Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
145Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
146Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
147Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
148Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
149Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
150Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
151Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
152Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
153Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
154Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
155Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
156Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
157Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
158Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
159Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
160Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
161Thin film GaP for solar cell application
162TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
163TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
164Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
165Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
166Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
167Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
168Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
169Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
170Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
171Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
172Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
173Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
174Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
175Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
176WS2 transistors on 300 mm wafers with BEOL compatibility


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