Images Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
3A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
4A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
5A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
6A route to low temperature growth of single crystal GaN on sapphire
7Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
8Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
11Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
12ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
13Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
14Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
15Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
16Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
17Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
18Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
19Atmospheric pressure plasma enhanced spatial ALD of silver
20Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
21Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
22Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
23Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
24Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
25Atomic Layer Deposition of Gold Metal
26Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
27Atomic layer deposition of metal-oxide thin films on cellulose fibers
28Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
29Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
30Atomic Layer Deposition of the Solid Electrolyte LiPON
31Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
32Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
33Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
34Bipolar resistive switching in amorphous titanium oxide thin film
35Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
36Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
37Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
38Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
39Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
40Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
41Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
42Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
43Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
44Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
45Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
46Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
47Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
48Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
49Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
50Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
51Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
52Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
53Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
54Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
55Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
56Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
57Encapsulation method for atom probe tomography analysis of nanoparticles
58Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
59Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
60Enhanced non-volatile memory characteristics with quattro-layer graphene nanoplatelets vs. 2.85-nm Si nanoparticles with asymmetric Al2O3/HfO2 tunnel oxide
61Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
62Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
63Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
64Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
65Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
66Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
67Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
68Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
69Flexible Memristive Memory Array on Plastic Substrates
70Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
71Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
72High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
73High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
74High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
75Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
76Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
77Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
78Improved understanding of recombination at the Si/Al2O3 interface
79Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
80In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
81In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
82In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
83Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
84Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
85Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
86Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
87Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
88Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
89IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
90Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
91Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
92Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
93Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
94Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
95Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
96Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
97Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
98Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
99Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
100Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
101Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
102Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
103Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
104Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
105Modal properties of a strip-loaded horizontal slot waveguide
106n-GaP/p-Si Heterojunction Solar Cells Fabricated by PE-ALD
107Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
108NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
109Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
110Nitride memristors
111Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
112Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
113On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
114Oxygen migration in TiO2-based higher-k gate stacks
115Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
116Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
117Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
118Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
119Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
120Plasma enhanced atomic layer deposition of gallium sulfide thin films
121Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
122Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
123Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
124Plasma enhanced atomic layer deposition of zinc sulfide thin films
125Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
126Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
127Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
128Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
129Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
130Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
131Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
132Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
133Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
134Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
135Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
136Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
137Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
138Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
139Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
140Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
141Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
142Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
143Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
144Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
145Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
146Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
147Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
148Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
149Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
150Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
151Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
152Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
153Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
154Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
155Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
156Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
157Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
158Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
159Thin film GaP for solar cell application
160TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
161TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
162Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
163Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
164Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
165Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
166Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
167Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
168Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
169Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
170Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
171Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
172Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
173Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
174WS2 transistors on 300 mm wafers with BEOL compatibility


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