Images Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
2Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
3Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
4Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
5Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
6Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
7Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
8Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
9Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
10Flexible Memristive Memory Array on Plastic Substrates
11Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
12Atmospheric pressure plasma enhanced spatial ALD of silver
13Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
14Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
15Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
16Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
17Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
18Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
19Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
20Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
21Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
22Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
23Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
24Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
25Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
26Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
27Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
28Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
29High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
30Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
31Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
32Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
33Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
34Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
35Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
36Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
37Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
38Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
39Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
40Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
41Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
42Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
43Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
44On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
45Plasma enhanced atomic layer deposition of zinc sulfide thin films
46Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
47Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
48Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
49Sub-7-nm textured ZrO2 with giant ferroelectricity
50Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
51Atomic layer deposition of metal-oxide thin films on cellulose fibers
52Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
53In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
54A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
55Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
56Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
57IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
58Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
59Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
60Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
61Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
62Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
63Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
64Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
65Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
66Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
67Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
68MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
69Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
70Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
71Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
72Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
73Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
74Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
75Atomic layer deposition of YMnO3 thin films
76Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
77Nitride memristors
78Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
79Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
80Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
81Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
82Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
83Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
84Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
85Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
86High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
87Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
88Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
89Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
90Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
91Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
92Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
93Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
94Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
95Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
96Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
97Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
98Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
99Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
100Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
101Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
102TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
103Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
104Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
105Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
106Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
107Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
108Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
109Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
110Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
111Atomic Layer Deposition of Gold Metal
112Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
113n-GaP/p-Si Heterojunction Solar Cells Fabricated by PE-ALD
114Encapsulation method for atom probe tomography analysis of nanoparticles
115Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
116Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
117Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
118ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
119Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
120Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
121Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
122Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
123Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
124Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
125Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
126Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
127Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
128Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
129Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
130Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
131Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
132Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
133Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
134Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
135Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
136A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
137Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
138Modal properties of a strip-loaded horizontal slot waveguide
139Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
140Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
141Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
142NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
143Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
144Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
145On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
146Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
147Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
148Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
149Atomic Layer Deposition of Nanolayered Carbon Films
150Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
151Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
152Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
153Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
154Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
155Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
156Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
157Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
158Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
159Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
160Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
161Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
162Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
163High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
164Protective capping and surface passivation of III-V nanowires by atomic layer deposition
165Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
166Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
167Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
168Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
169Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
170Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
171Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
172Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
173Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
174Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
175Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
176Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
177Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
178Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
179Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
180TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
181In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
182Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
183Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
184Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
185Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
186Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
187Plasma enhanced atomic layer deposition of gallium sulfide thin films
188Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
189Thin film GaP for solar cell application
190Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
191Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
192Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
193Self-limiting diamond growth from alternating CFx and H fluxes
194Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
195Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
196Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
197Improved understanding of recombination at the Si/Al2O3 interface
198Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
199Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
200Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
201Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
202High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
203Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
204Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
205Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
206Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
207Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
208Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
209Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
210Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
211Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
212A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
213Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
214GeSbTe deposition for the PRAM application
215WS2 transistors on 300 mm wafers with BEOL compatibility
216A route to low temperature growth of single crystal GaN on sapphire
217Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
218A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
219Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
220Oxygen migration in TiO2-based higher-k gate stacks
221Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
222Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
223Bipolar resistive switching in amorphous titanium oxide thin film
224Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
225Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
226Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
227Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
228Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
229Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
230Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
231Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
232Atomic Layer Deposition of the Solid Electrolyte LiPON
233A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
234In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
235Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
236Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
237Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
238Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
239Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
240Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition