Images Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Images returned 163 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
3A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
4A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
5A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
6A route to low temperature growth of single crystal GaN on sapphire
7Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
8Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
9Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
10Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
11Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
12ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
13Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
14Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
15Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
16Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
17Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
18Atmospheric pressure plasma enhanced spatial ALD of silver
19Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
20Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
21Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
22Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
23Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
24Atomic Layer Deposition of Gold Metal
25Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
26Atomic layer deposition of metal-oxide thin films on cellulose fibers
27Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
28Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
29Atomic Layer Deposition of the Solid Electrolyte LiPON
30Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
31Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
32Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
33Bipolar resistive switching in amorphous titanium oxide thin film
34Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
35Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
36Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
37Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
38Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
39Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
40Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
41Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
42Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
43Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
44Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
45Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
46Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
47Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
48Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
49Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
50Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
51Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
52Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
53Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
54Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
55Encapsulation method for atom probe tomography analysis of nanoparticles
56Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
57Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
58Enhanced non-volatile memory characteristics with quattro-layer graphene nanoplatelets vs. 2.85-nm Si nanoparticles with asymmetric Al2O3/HfO2 tunnel oxide
59Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
60Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
61Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
62Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
63Fabrication of flexible polymer-GaN core-shell nanofibers by the combination of electrospinning and hollow cathode plasma-assisted atomic layer deposition
64Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
65Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
66Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
67Flexible Memristive Memory Array on Plastic Substrates
68Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
69Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
70High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
71High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
72High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
73Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
74Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
75Improved understanding of recombination at the Si/Al2O3 interface
76Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
77In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
78Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
79Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
80Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
81Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
82Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
83IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
84Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
85Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
86Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
87Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
88Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
89Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
90Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
91Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
92Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
93Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
94Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
95Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
96Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
97Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
98Modal properties of a strip-loaded horizontal slot waveguide
99n-GaP/p-Si Heterojunction Solar Cells Fabricated by PE-ALD
100Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
101NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
102Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
103Nitride memristors
104Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
105Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
106On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
107Oxygen migration in TiO2-based higher-k gate stacks
108Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
109Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
110Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
111Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
112Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
113Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
114Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
115Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
116Plasma enhanced atomic layer deposition of zinc sulfide thin films
117Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
118Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
119Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
120Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
121Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
122Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
123Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
124Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
125Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
126Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
127Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
128Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
129Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
130Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
131Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
132Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
133Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
134Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
135Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
136Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
137Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
138Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
139Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
140Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
141Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
142Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
143Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
144Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
145Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
146Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
147Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
148Thin film GaP for solar cell application
149TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
150TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
151Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
152Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
153Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
154Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
155Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
156Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
157Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
158Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
159Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
160Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
161Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
162Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
163WS2 transistors on 300 mm wafers with BEOL compatibility


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