Images Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
2Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
3Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
4Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
5Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
6Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
7Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
8In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
9Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
10Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
11Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
12Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
13Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
14Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
15Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
16Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
17Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
18Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
19Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
20Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
21Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
22Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
23Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
24Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
25MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
26Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
27Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
28Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
29Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
30Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
31ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
32Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
33Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
34Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
35Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
36Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
37TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
38Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
39Atomic layer deposition of metal-oxide thin films on cellulose fibers
40Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
41Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
42Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
43Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
44Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
45Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
46Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
47Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
48Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
49On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
50Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
51Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
52A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
53Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
54Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
55Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
56Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
57Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
58Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
59Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
60Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
61Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
62A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
63Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
64Bipolar resistive switching in amorphous titanium oxide thin film
65Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
66Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
67Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
68Atomic layer deposition of YMnO3 thin films
69Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
70Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
71Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
72Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
73Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
74Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
75Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
76Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
77NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
78Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
79Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
80Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
81Atomic Layer Deposition of Nanolayered Carbon Films
82In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
83Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
84Nitride memristors
85Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
86Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
87Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
88Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
89Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
90Ferroelectricity of HfZrO2 in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors
91Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
92Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
93n-GaP/p-Si Heterojunction Solar Cells Fabricated by PE-ALD
94Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
95Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
96Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
97Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
98Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
99Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
100Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
101High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
102Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
103A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
104Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
105Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
106Modal properties of a strip-loaded horizontal slot waveguide
107Oxygen migration in TiO2-based higher-k gate stacks
108Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
109GeSbTe deposition for the PRAM application
110Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
111Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
112Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
113Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
114Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
115Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
116Thin film GaP for solar cell application
117Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
118Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
119Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
120Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
121Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
122Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
123Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
124Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
125Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
126Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
127Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
128Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
129Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
130Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
131Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
132Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
133Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
134IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
135Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
136Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
137Sub-7-nm textured ZrO2 with giant ferroelectricity
138TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
139Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
140Atmospheric pressure plasma enhanced spatial ALD of silver
141Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
142On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
143Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
144Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
145Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
146Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
147Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
148Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
149Self-limiting diamond growth from alternating CFx and H fluxes
150Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
151Plasma enhanced atomic layer deposition of zinc sulfide thin films
152Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
153Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
154Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
155Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
156Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
157Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
158Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
159Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
160Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
161Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
162Encapsulation method for atom probe tomography analysis of nanoparticles
163Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
164Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
165Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
166Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
167Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
168Improved understanding of recombination at the Si/Al2O3 interface
169Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
170Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
171Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
172A route to low temperature growth of single crystal GaN on sapphire
173Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
174Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
175High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
176Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
177Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
178Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
179In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
180A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
181Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
182Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
183Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
184Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
185Plasma enhanced atomic layer deposition of gallium sulfide thin films
186Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
187Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
188Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
189Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
190Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
191Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
192A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
193Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
194Protective capping and surface passivation of III-V nanowires by atomic layer deposition
195Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
196Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
197Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
198Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
199Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
200Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
201Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
202Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
203Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
204Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
205Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
206Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
207Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
208Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
209Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
210Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
211High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
212Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
213Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
214Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
215Atomic Layer Deposition of the Solid Electrolyte LiPON
216WS2 transistors on 300 mm wafers with BEOL compatibility
217Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
218Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
219Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
220Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
221Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
222Flexible Memristive Memory Array on Plastic Substrates
223Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
224Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
225Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
226Atomic Layer Deposition of Gold Metal
227High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
228Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
229Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
230Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
231Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
232Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
233Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
234Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
235Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
236Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
237Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
238Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
239Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films