Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Refractive Index returned 162 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
3A route to low temperature growth of single crystal GaN on sapphire
4Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
5Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
6AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
7Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
8An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
9An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
10Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
11Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
12Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
13Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
14Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
15Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
16Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
17Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
18Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
19Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
20Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
21Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
22Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
23Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
24Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
25Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
26Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
27Composite materials and nanoporous thin layers made by atomic layer deposition
28Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
29Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
30Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
31Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
32Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
33Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
34Densification of Thin Aluminum Oxide Films by Thermal Treatments
35Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
36Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
37Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
38Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
39Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
40Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
41Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
42Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
43Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
44Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
45GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
46Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
47Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
48Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
49Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
50Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
51Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
52Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
53Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
54Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
55High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
56High-Reflective Coatings For Ground and Space Based Applications
57In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
58In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
59In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
60In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
61Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
62Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
63Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
64Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
65Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
66Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
67Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
68Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
69Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
70Low temperature temporal and spatial atomic layer deposition of TiO2 films
71Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
72Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
73Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
74Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
75Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
76Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
77Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
78Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
79Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
80Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
81Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
82Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
83Optical and Electrical Properties of AlxTi1-xO Films
84Optical and Electrical Properties of TixSi1-xOy Films
85Optical properties and bandgap evolution of ALD HfSiOx films
86Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
87Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
88Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
89PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
90Plasma enhanced atomic layer deposition of aluminum sulfide thin films
91Plasma enhanced atomic layer deposition of Ga2O3 thin films
92Plasma enhanced atomic layer deposition of gallium sulfide thin films
93Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
94Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
95Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
96Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
97Plasma enhanced atomic layer deposition of SiNx:H and SiO2
98Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
99Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
100Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
101Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
102Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
103Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
104Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
105Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
106Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
107Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
108Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
109Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
110Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
111Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
112Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
113Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
114Plasma-enhanced atomic layer deposition of superconducting niobium nitride
115Plasma-enhanced atomic layer deposition of titanium vanadium nitride
116Plasma-enhanced atomic layer deposition of tungsten nitride
117Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
118Plasma-enhanced atomic layer deposition of vanadium nitride
119Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
120Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
121Properties of AlN grown by plasma enhanced atomic layer deposition
122Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
123Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
124Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
125Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
126Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
127Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
128Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
129Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
130Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
131Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
132Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
133Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
134Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
135Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
136Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
137Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
138Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
139Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
140Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
141The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
142Thin film GaP for solar cell application
143Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
144Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
145Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
146ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
147ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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