Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
3A route to low temperature growth of single crystal GaN on sapphire
4Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
5Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
6AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
7Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
8An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
9An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
10Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
11Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
12Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
13Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
14Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
15Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
16Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
17Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
18Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
19Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
20Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
21Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
22Atomic layer deposition of InN using trimethylindium and ammonia plasma
23Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
24Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
25Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
26Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
27Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
28Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
29Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
30Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
31Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
32Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
33Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
34Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
35Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
36Composite materials and nanoporous thin layers made by atomic layer deposition
37Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
38Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
39Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
40Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
41Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
42Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
43Densification of Thin Aluminum Oxide Films by Thermal Treatments
44Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
45Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
46Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
47Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
48Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
49Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
50Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
51Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
52Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
53Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
54Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
55GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
56Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
57Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
58Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
59Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
60Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
61Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
62Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
63Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
64Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
65High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
66High-Reflective Coatings For Ground and Space Based Applications
67In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
68In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
69In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
70In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
71Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
72Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
73Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
74Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
75Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
76Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
77Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
78Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
79Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
80Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
81Low temperature temporal and spatial atomic layer deposition of TiO2 films
82Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
83Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
84Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
85Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
86Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
87Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
88Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
89Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
90Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
91Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
92Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
93Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
94Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
95Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
96On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
97Optical and Electrical Properties of AlxTi1-xO Films
98Optical and Electrical Properties of TixSi1-xOy Films
99Optical properties and bandgap evolution of ALD HfSiOx films
100Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
101Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
102Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
103PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
104Plasma enhanced atomic layer deposition of aluminum sulfide thin films
105Plasma enhanced atomic layer deposition of Ga2O3 thin films
106Plasma enhanced atomic layer deposition of gallium sulfide thin films
107Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
108Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
109Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
110Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
111Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
112Plasma enhanced atomic layer deposition of SiNx:H and SiO2
113Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
114Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
115Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
116Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
117Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
118Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
119Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
120Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
121Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
122Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
123Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
124Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
125Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
126Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
127Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
128Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
129Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
130Plasma-enhanced atomic layer deposition of superconducting niobium nitride
131Plasma-enhanced atomic layer deposition of titanium vanadium nitride
132Plasma-enhanced atomic layer deposition of tungsten nitride
133Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
134Plasma-enhanced atomic layer deposition of vanadium nitride
135Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
136Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
137Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
138Properties of AlN grown by plasma enhanced atomic layer deposition
139Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
140Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
141Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
142Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
143Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
144Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
145Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
146Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
147Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
148Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
149Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
150Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
151Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
152Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
153Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
154Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
155Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
156Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
157Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
158Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
159The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
160The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
161Thin film GaP for solar cell application
162Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
163Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
164Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
165Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
166ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
167ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium