Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
3A route to low temperature growth of single crystal GaN on sapphire
4Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
5Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
6Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
7AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
8Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
9An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
10An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
11Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
12Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
13Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
14Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
15Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
16Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
17Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
18Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
19Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
20Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
21Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
22Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
23Atomic layer deposition of InN using trimethylindium and ammonia plasma
24Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
25Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
26Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
27Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
28Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
29Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
30Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
31Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
32Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
33Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
34Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
35Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
36Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
37Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
38Composite materials and nanoporous thin layers made by atomic layer deposition
39Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
40Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
41Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
42Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
43Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
44Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
45Densification of Thin Aluminum Oxide Films by Thermal Treatments
46Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
47Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
48Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
49Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
50Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
51Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
52Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
53Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
54Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
55Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
56Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
57GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
58Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
59Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
60Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
61Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
62Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
63Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
64Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
65Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
66Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
67High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
68High-Reflective Coatings For Ground and Space Based Applications
69In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
70In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
71In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
72In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
73Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
74Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
75Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
76Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
77Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
78Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
79Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
80Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
81Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
82Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
83Low temperature temporal and spatial atomic layer deposition of TiO2 films
84Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
85Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
86Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
87Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
88Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
89Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
90Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
91Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
92Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
93Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
94Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
95Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
96Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
97Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
98Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
99On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
100Optical and Electrical Properties of AlxTi1-xO Films
101Optical and Electrical Properties of TixSi1-xOy Films
102Optical properties and bandgap evolution of ALD HfSiOx films
103Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
104Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
105Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
106PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
107Plasma enhanced atomic layer deposition of aluminum sulfide thin films
108Plasma enhanced atomic layer deposition of Ga2O3 thin films
109Plasma enhanced atomic layer deposition of gallium sulfide thin films
110Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
111Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
112Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
113Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
114Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
115Plasma enhanced atomic layer deposition of SiNx:H and SiO2
116Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
117Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
118Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
119Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
120Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
121Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
122Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
123Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
124Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
125Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
126Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
127Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
128Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
129Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
130Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
131Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
132Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
133Plasma-enhanced atomic layer deposition of superconducting niobium nitride
134Plasma-enhanced atomic layer deposition of titanium vanadium nitride
135Plasma-enhanced atomic layer deposition of tungsten nitride
136Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
137Plasma-enhanced atomic layer deposition of vanadium nitride
138Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
139Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
140Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
141Properties of AlN grown by plasma enhanced atomic layer deposition
142Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
143Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
144Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
145Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
146Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
147Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
148Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
149Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
150Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
151Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
152Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
153Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
154Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
155Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
156Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
157Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
158Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
159Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
160Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
161Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
162The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
163The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
164Thin film GaP for solar cell application
165Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
166Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
167Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
168Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
169ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
170ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
171ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium