Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
2Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
3Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
4Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
5Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
6HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
7Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
8Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
9Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
10Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
11Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
12Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
13Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
14Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
15Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
16Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
17Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
18Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
19Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
20Densification of Thin Aluminum Oxide Films by Thermal Treatments
21Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
22Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
23Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
24Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
25Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
26Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
27Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
28Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
29Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
30Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
31Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
32Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
33Plasma enhanced atomic layer deposition of Ga2O3 thin films
34Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
35SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
36Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
37Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
38Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
39Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
40Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
41Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
42Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
43Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
44Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
45A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
46Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
47Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
48Composite materials and nanoporous thin layers made by atomic layer deposition
49Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
50In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
51Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
52Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
53Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
54Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
55Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
56Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
57Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
58Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
59Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
60Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
61Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
62Plasma enhanced atomic layer deposition of aluminum sulfide thin films
63Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
64Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
65Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
66Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
67Optical and Electrical Properties of TixSi1-xOy Films
68Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
69Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
70Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
71Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
72High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
73Innovative remote plasma source for atomic layer deposition for GaN devices
74Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
75The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
76Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
77Atomic layer deposition of InN using trimethylindium and ammonia plasma
78Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
79Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
80Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
81Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
82ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
83Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
84Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
85Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
86Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
87Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
88Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
89Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
90Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
91Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
92Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
93Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
94Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
95Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
96Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
97Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
98Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
99Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
100An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
101Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
102Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
103Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
104Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
105Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
106Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
107Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
108In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
109Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
110High-Reflective Coatings For Ground and Space Based Applications
111Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
112Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
113Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
114Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
115Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
116The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
117Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
118Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
119Optical properties and bandgap evolution of ALD HfSiOx films
120Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
121Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
122Plasma-enhanced atomic layer deposition of superconducting niobium nitride
123Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
124Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
125Plasma-enhanced atomic layer deposition of titanium vanadium nitride
126Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
127Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
128Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
129Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
130Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
131Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
132Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
133Plasma enhanced atomic layer deposition of gallium sulfide thin films
134Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
135Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
136Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
137Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
138Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
139Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
140Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
141AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
142ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
143Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
144Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
145Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
146Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
147Plasma enhanced atomic layer deposition of SiNx:H and SiO2
148Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
149Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
150Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
151Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
152In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
153Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
154Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
155Plasma-enhanced atomic layer deposition of tungsten nitride
156Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
157In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
158Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
159Low temperature temporal and spatial atomic layer deposition of TiO2 films
160PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
161Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
162Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
163Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
164Optical and Electrical Properties of AlxTi1-xO Films
165GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
166Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
167Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
168On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
169ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
170Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
171Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
172Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
173Plasma-enhanced atomic layer deposition of vanadium nitride
174Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
175Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
176Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
177Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
178Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
179Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
180Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
181Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
182Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
183Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
184Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
185Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
186Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
187Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
188Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
189Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
190Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
191Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
192Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
193An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
194AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
195A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
196Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
197Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
198Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
199Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
200Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
201Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
202Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
203Thin film GaP for solar cell application
204A route to low temperature growth of single crystal GaN on sapphire
205Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
206Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
207In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
208Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
209Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
210Properties of AlN grown by plasma enhanced atomic layer deposition
211Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
212Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
213Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
214A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology