Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Refractive Index returned 234 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
2Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
3Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
4Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
5Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
6Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
7Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
8Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
9Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
10In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
11Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
12Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
13Low temperature temporal and spatial atomic layer deposition of TiO2 films
14Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
15Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
16Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
17Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
18Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
19Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
20Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
21Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
22Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
23Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
24Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
25Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
26Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
27Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
28Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
29Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
30Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
31Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
32Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
33Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
34Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
35Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
36Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
37Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
38Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
39The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
40Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
41Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
42Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
43Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
44Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
45Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
46Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
47Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
48Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
49Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
50Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
51Plasma enhanced atomic layer deposition of Ga2O3 thin films
52Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
53Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
54Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
55Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
56Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
57On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
58Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
59Optical properties and bandgap evolution of ALD HfSiOx films
60Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
61Plasma enhanced atomic layer deposition of aluminum sulfide thin films
62Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
63Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
64Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
65Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
66Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
67AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
68Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
69Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
70Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
71Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
72Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
73Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
74Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
75Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
76Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
77Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
78Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
79Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
80Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
81Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
82Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
83Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
84A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
85Composite materials and nanoporous thin layers made by atomic layer deposition
86The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
87Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
88Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
89Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
90Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
91Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
92Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
93In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
94Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
95Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
96Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
97Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
98Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
99Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
100Innovative remote plasma source for atomic layer deposition for GaN devices
101An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
102Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
103PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
104Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
105Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
106In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
107Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
108Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
109Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
110Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
111Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
112Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
113Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
114Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
115Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
116Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
117Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
118Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
119Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
120Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
121Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
122Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
123Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
124Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
125Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
126Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
127Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
128Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
129Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
130Densification of Thin Aluminum Oxide Films by Thermal Treatments
131Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
132Thin film GaP for solar cell application
133Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
134Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
135Plasma-enhanced atomic layer deposition of vanadium nitride
136A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
137Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
138Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
139Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
140Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
141Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
142Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
143Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
144Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
145Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
146Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
147Plasma enhanced atomic layer deposition of gallium sulfide thin films
148Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
149Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
150Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
151Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
152Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
153Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
154Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
155HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
156In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
157Atomic layer deposition of InN using trimethylindium and ammonia plasma
158Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
159Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
160Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
161Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
162Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
163Plasma-enhanced atomic layer deposition of tungsten nitride
164Plasma enhanced atomic layer deposition of SiNx:H and SiO2
165High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
166Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
167SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
168Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
169Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
170GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
171Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
172Optical and Electrical Properties of TixSi1-xOy Films
173Plasma-enhanced atomic layer deposition of superconducting niobium nitride
174Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
175Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
176Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
177Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
178Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
179High-Reflective Coatings For Ground and Space Based Applications
180A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
181AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
182Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
183Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
184Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
185Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
186Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
187ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
188Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
189Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
190Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
191Plasma-enhanced atomic layer deposition of titanium vanadium nitride
192Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
193Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
194Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
195Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
196Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
197Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
198Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
199Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
200Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
201ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
202Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
203Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
204Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
205Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
206Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
207A route to low temperature growth of single crystal GaN on sapphire
208An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
209Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
210ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
211Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
212Properties of AlN grown by plasma enhanced atomic layer deposition
213Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
214Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
215Optical and Electrical Properties of AlxTi1-xO Films
216Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
217Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
218In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
219Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma