Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
3A route to low temperature growth of single crystal GaN on sapphire
4Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
5Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
6AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
7Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
8An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
9An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
10Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
11Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
12Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
13Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
14Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
15Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
16Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
17Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
18Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
19Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
20Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
21Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
22Atomic layer deposition of InN using trimethylindium and ammonia plasma
23Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
24Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
25Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
26Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
27Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
28Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
29Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
30Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
31Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
32Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
33Composite materials and nanoporous thin layers made by atomic layer deposition
34Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
35Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
36Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
37Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
38Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
39Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
40Densification of Thin Aluminum Oxide Films by Thermal Treatments
41Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
42Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
43Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
44Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
45Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
46Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
47Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
48Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
49Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
50Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
51Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
52GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
53Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
54Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
55Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
56Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
57Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
58Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
59Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
60Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
61Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
62High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
63High-Reflective Coatings For Ground and Space Based Applications
64In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
65In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
66In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
67In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
68Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
69Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
70Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
71Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
72Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
73Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
74Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
75Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
76Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
77Low temperature temporal and spatial atomic layer deposition of TiO2 films
78Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
79Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
80Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
81Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
82Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
83Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
84Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
85Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
86Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
87Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
88Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
89Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
90Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
91On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
92Optical and Electrical Properties of AlxTi1-xO Films
93Optical and Electrical Properties of TixSi1-xOy Films
94Optical properties and bandgap evolution of ALD HfSiOx films
95Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
96Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
97Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
98PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
99Plasma enhanced atomic layer deposition of aluminum sulfide thin films
100Plasma enhanced atomic layer deposition of Ga2O3 thin films
101Plasma enhanced atomic layer deposition of gallium sulfide thin films
102Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
103Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
104Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
105Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
106Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
107Plasma enhanced atomic layer deposition of SiNx:H and SiO2
108Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
109Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
110Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
111Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
112Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
113Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
114Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
115Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
116Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
117Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
118Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
119Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
120Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
121Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
122Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
123Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
124Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
125Plasma-enhanced atomic layer deposition of superconducting niobium nitride
126Plasma-enhanced atomic layer deposition of titanium vanadium nitride
127Plasma-enhanced atomic layer deposition of tungsten nitride
128Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
129Plasma-enhanced atomic layer deposition of vanadium nitride
130Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
131Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
132Properties of AlN grown by plasma enhanced atomic layer deposition
133Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
134Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
135Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
136Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
137Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
138Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
139Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
140Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
141Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
142Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
143Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
144Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
145Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
146Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
147Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
148Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
149Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
150Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
151Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
152Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
153The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
154The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
155Thin film GaP for solar cell application
156Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
157Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
158Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
159Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
160ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
161ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium