1 | Plasma-enhanced atomic layer deposition of superconducting niobium nitride |
2 | Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films |
3 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
4 | Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition |
5 | Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide |
6 | Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements |
7 | Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range |
8 | Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
9 | A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology |
10 | Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time |
11 | Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films |
12 | Optical properties and bandgap evolution of ALD HfSiOx films |
13 | Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition |
14 | Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature |
15 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film |
16 | Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs |
17 | Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers |
18 | AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition |
19 | SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition |
20 | Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma |
21 | Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma |
22 | Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching |
23 | Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition |
24 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
25 | Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure |
26 | Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells |
27 | Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions |
28 | Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma |
29 | Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition |
30 | Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors |
31 | Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces |
32 | Plasma-enhanced atomic layer deposition of tungsten nitride |
33 | Densification of Thin Aluminum Oxide Films by Thermal Treatments |
34 | Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 |
35 | Properties of AlN grown by plasma enhanced atomic layer deposition |
36 | Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes |
37 | Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources |
38 | Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors |
39 | Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films |
40 | ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window" |
41 | Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions |
42 | Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing |
43 | Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition |
44 | Plasma-enhanced atomic layer deposition of titanium vanadium nitride |
45 | AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms |
46 | Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure |
47 | Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition |
48 | Low temperature temporal and spatial atomic layer deposition of TiO2 films |
49 | Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension |
50 | High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors |
51 | Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films |
52 | Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma |
53 | Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution |
54 | Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions |
55 | Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3 |
56 | Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride |
57 | Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors |
58 | Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets |
59 | Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition |
60 | Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia |
61 | Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy |
62 | A route to low temperature growth of single crystal GaN on sapphire |
63 | Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods |
64 | Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide |
65 | ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition |
66 | Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy |
67 | Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma |
68 | Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD |
69 | Plasma-enhanced atomic layer deposition of vanadium nitride |
70 | Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material |
71 | Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition |
72 | A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition |
73 | Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor |
74 | Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study |
75 | Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition |
76 | Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing |
77 | Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate |
78 | Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting |
79 | Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage |
80 | Ag films grown by remote plasma enhanced atomic layer deposition on different substrates |
81 | Optical and Electrical Properties of AlxTi1-xO Films |
82 | Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers |
83 | Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films |
84 | Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma |
85 | Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition |
86 | Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition |
87 | Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition |
88 | Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma |
89 | Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition |
90 | PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity |
91 | Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma |
92 | Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection |
93 | Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties |
94 | Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration |
95 | Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry |
96 | An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor |
97 | Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition |
98 | Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide |
99 | Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET |
100 | Plasma enhanced atomic layer deposition of gallium sulfide thin films |
101 | In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices |
102 | The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition |
103 | Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction |
104 | Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties |
105 | Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition |
106 | Atomic layer deposition of InN using trimethylindium and ammonia plasma |
107 | Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films |
108 | Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor |
109 | Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials |
110 | Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx |
111 | Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature |
112 | Growth of aluminum nitride films by plasma-enhanced atomic layer deposition |
113 | Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD |
114 | Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2 |
115 | Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors |
116 | HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition |
117 | Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition |
118 | Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films |
119 | Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition |
120 | Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation |
121 | Composite materials and nanoporous thin layers made by atomic layer deposition |
122 | Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3 |
123 | Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD |
124 | Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy |
125 | Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc |
126 | Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma |
127 | Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2 |
128 | Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition |
129 | Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD |
130 | Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition |
131 | Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide |
132 | Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS |
133 | Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition |
134 | Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films |
135 | On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR |
136 | Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum |
137 | Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma |
138 | Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films |
139 | A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films |
140 | Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films |
141 | Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers |
142 | High-Reflective Coatings For Ground and Space Based Applications |
143 | Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films |
144 | Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films |
145 | Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator |
146 | Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma |
147 | Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2 |
148 | Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane |
149 | Plasma enhanced atomic layer deposition of aluminum sulfide thin films |
150 | Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries |
151 | In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition |
152 | Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies |
153 | Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3 |
154 | Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide |
155 | Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films |
156 | Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor |
157 | In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides |
158 | Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources |
159 | The role of plasma in plasma-enhanced atomic layer deposition of crystalline films |
160 | Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
161 | Antireflection Coating on PMMA Substrates by Atomic Layer Deposition |
162 | Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane |
163 | Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures |
164 | Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application |
165 | Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition |
166 | Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride |
167 | Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition |
168 | Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition |
169 | Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing |
170 | Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells |
171 | Thin film GaP for solar cell application |
172 | Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor |
173 | Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy |
174 | Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition |
175 | Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications |
176 | In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells |
177 | Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage |
178 | Innovative remote plasma source for atomic layer deposition for GaN devices |
179 | Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice |
180 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films |
181 | Plasma enhanced atomic layer deposition of Ga2O3 thin films |
182 | Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition |
183 | Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma |
184 | Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material |
185 | An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD |
186 | Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition |
187 | Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies |
188 | Optical and Electrical Properties of TixSi1-xOy Films |
189 | Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers |
190 | Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs |
191 | Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier |
192 | Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes |
193 | Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process |
194 | Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma |
195 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
196 | Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures |
197 | Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition |
198 | Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4 |
199 | Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition |
200 | Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors |
201 | Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes |
202 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
203 | GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation |
204 | Plasma enhanced atomic layer deposition of SiNx:H and SiO2 |
205 | Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers |
206 | Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques |
207 | Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries |
208 | In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition |
209 | Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries |
210 | Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor |
211 | Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor |
212 | ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium |
213 | Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization |
214 | Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition |