Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
2Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
3Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
4Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
5Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
6Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
7High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
8Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
9Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
10Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
11Optical properties and bandgap evolution of ALD HfSiOx films
12Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
13Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
14Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
15On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
16Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
17Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
18An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
19Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
20Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
21Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
22Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
23Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
24Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
25In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
26Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
27Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
28Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
29Innovative remote plasma source for atomic layer deposition for GaN devices
30Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
31PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
32Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
33Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
34A route to low temperature growth of single crystal GaN on sapphire
35Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
36Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
37Plasma-enhanced atomic layer deposition of superconducting niobium nitride
38AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
39Plasma-enhanced atomic layer deposition of tungsten nitride
40Composite materials and nanoporous thin layers made by atomic layer deposition
41Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
42Plasma-enhanced atomic layer deposition of vanadium nitride
43In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
44Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
45Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
46Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
47Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
48Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
49In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
50Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
51Low temperature temporal and spatial atomic layer deposition of TiO2 films
52Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
53ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
54Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
55Plasma enhanced atomic layer deposition of Ga2O3 thin films
56Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
57Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
58Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
59Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
60The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
61Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
62Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
63Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
64Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
65Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
66Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
67Plasma enhanced atomic layer deposition of aluminum sulfide thin films
68Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
69Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
70Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
71Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
72Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
73Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
74Thin film GaP for solar cell application
75Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
76Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
77Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
78Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
79Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
80Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
81Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
82Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
83Plasma enhanced atomic layer deposition of gallium sulfide thin films
84Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
85Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
86Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
87Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
88Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
89Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
90Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
91Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
92Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
93The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
94Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
95Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
96Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
97Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
98Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
99Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
100Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
101Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
102Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
103Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
104ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
105High-Reflective Coatings For Ground and Space Based Applications
106In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
107Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
108Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
109Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
110Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
111Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
112Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
113Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
114Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
115Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
116Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
117Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
118Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
119Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
120AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
121Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
122Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
123Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
124Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
125Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
126Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
127Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
128Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
129Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
130Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
131Plasma-enhanced atomic layer deposition of titanium vanadium nitride
132Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
133Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
134Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
135An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
136Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
137Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
138Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
139Plasma enhanced atomic layer deposition of SiNx:H and SiO2
140Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
141Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
142Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
143Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
144Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
145Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
146Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
147A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
148Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
149HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
150Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
151Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
152Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
153Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
154ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
155Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
156Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
157Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
158Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
159Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
160Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
161Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
162Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
163Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
164Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
165Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
166Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
167Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
168A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
169Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
170Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
171Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
172Optical and Electrical Properties of TixSi1-xOy Films
173Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
174Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
175Optical and Electrical Properties of AlxTi1-xO Films
176Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
177Atomic layer deposition of InN using trimethylindium and ammonia plasma
178Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
179GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
180Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
181Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
182Properties of AlN grown by plasma enhanced atomic layer deposition
183Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
184Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
185Densification of Thin Aluminum Oxide Films by Thermal Treatments
186Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
187Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
188Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
189Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
190Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
191A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
192Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
193Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
194Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
195Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
196Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
197Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
198Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
199Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
200Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
201Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
202Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
203Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
204Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
205Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
206Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
207Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
208Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
209Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
210Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
211Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
212Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
213Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
214Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
215Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
216SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
217Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
218Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
219Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
220Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
221Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
222Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
223In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
224ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
225Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
226Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition