Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
3A route to low temperature growth of single crystal GaN on sapphire
4Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
5Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
6Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
7AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
8AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
9Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
10An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
11An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
12Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
13Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
14Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
15Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
16Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
17Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
18Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
19Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
20Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
21Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
22Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
23Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
24Atomic layer deposition of InN using trimethylindium and ammonia plasma
25Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
26Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
27Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
28Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
29Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
30Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
31Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
32Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
33Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
34Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
35Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
36Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
37Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
38Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
39Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
40Composite materials and nanoporous thin layers made by atomic layer deposition
41Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
42Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
43Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
44Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
45Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
46Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
47Densification of Thin Aluminum Oxide Films by Thermal Treatments
48Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
49Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
50Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
51Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
52Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
53Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
54Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
55Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
56Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
57Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
58Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
59GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
60Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
61Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
62Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
63Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
64Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
65Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
66Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
67Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
68Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
69Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
70HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
71High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
72High-Reflective Coatings For Ground and Space Based Applications
73Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
74Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
75In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
76In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
77In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
78In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
79In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
80Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
81Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
82Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
83Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
84Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
85Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
86Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
87Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
88Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
89Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
90Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
91Low temperature temporal and spatial atomic layer deposition of TiO2 films
92Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
93Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
94Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
95Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
96Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
97Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
98Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
99Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
100Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
101Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
102Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
103Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
104Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
105Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
106Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
107Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
108On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
109Optical and Electrical Properties of AlxTi1-xO Films
110Optical and Electrical Properties of TixSi1-xOy Films
111Optical properties and bandgap evolution of ALD HfSiOx films
112Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
113Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
114Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
115PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
116Plasma enhanced atomic layer deposition of aluminum sulfide thin films
117Plasma enhanced atomic layer deposition of Ga2O3 thin films
118Plasma enhanced atomic layer deposition of gallium sulfide thin films
119Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
120Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
121Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
122Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
123Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
124Plasma enhanced atomic layer deposition of SiNx:H and SiO2
125Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
126Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
127Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
128Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
129Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
130Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
131Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
132Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
133Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
134Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
135Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
136Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
137Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
138Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
139Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
140Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
141Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
142Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
143Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
144Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
145Plasma-enhanced atomic layer deposition of superconducting niobium nitride
146Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
147Plasma-enhanced atomic layer deposition of titanium vanadium nitride
148Plasma-enhanced atomic layer deposition of tungsten nitride
149Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
150Plasma-enhanced atomic layer deposition of vanadium nitride
151Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
152Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
153Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
154Properties of AlN grown by plasma enhanced atomic layer deposition
155Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
156Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
157Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
158Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
159Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
160Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
161Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
162Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
163Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
164Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
165Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
166Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
167Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
168SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
169Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
170Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
171Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
172Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
173Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
174Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
175Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
176Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
177Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
178Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
179Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
180The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
181The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
182Thin film GaP for solar cell application
183Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
184Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
185Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
186Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
187Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
188ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
189ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
190ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium