Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
2Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
3SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
4Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
5Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
6Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
7Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
8Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
9Low temperature temporal and spatial atomic layer deposition of TiO2 films
10Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
11Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
12Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
13Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
14Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
15Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
16Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
17Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
18Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
19Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
20Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
21Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
22Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
23Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
24Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
25Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
26Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
27Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
28Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
29Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
30Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
31Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
32Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
33Composite materials and nanoporous thin layers made by atomic layer deposition
34A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
35Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
36Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
37Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
38Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
39Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
40ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
41Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
42Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
43Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
44Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
45Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
46Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
47Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
48Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
49Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
50Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
51Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
52Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
53Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
54Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
55Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
56Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
57Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
58Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
59Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
60Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
61Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
62Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
63Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
64Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
65Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
66Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
67Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
68Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
69Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
70Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
71Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
72Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
73Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
74Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
75Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
76Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
77Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
78Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
79Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
80Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
81Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
82Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
83In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
84Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
85Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
86Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
87Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
88Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
89Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
90In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
91Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
92Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
93Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
94Plasma enhanced atomic layer deposition of gallium sulfide thin films
95Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
96An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
97Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
98A route to low temperature growth of single crystal GaN on sapphire
99Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
100Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
101Innovative remote plasma source for atomic layer deposition for GaN devices
102Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
103Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
104In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
105Plasma enhanced atomic layer deposition of aluminum sulfide thin films
106Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
107Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
108The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
109Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
110Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
111Plasma enhanced atomic layer deposition of Ga2O3 thin films
112In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
113Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
114Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
115Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
116Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
117Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
118In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
119Optical and Electrical Properties of AlxTi1-xO Films
120Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
121Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
122Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
123Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
124An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
125Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
126Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
127Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
128Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
129Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
130Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
131Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
132Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
133Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
134Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
135Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
136Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
137Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
138Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
139Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
140Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
141Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
142Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
143Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
144Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
145Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
146Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
147Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
148Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
149AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
150Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
151Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
152Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
153Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
154Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
155Thin film GaP for solar cell application
156Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
157A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
158Plasma-enhanced atomic layer deposition of titanium vanadium nitride
159PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
160On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
161Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
162Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
163Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
164Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
165Plasma-enhanced atomic layer deposition of tungsten nitride
166High-Reflective Coatings For Ground and Space Based Applications
167Plasma-enhanced atomic layer deposition of superconducting niobium nitride
168Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
169Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
170Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
171Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
172Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
173Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
174GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
175Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
176Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
177The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
178Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
179Atomic layer deposition of InN using trimethylindium and ammonia plasma
180Plasma-enhanced atomic layer deposition of vanadium nitride
181Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
182ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
183Plasma enhanced atomic layer deposition of SiNx:H and SiO2
184Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
185Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
186Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
187Optical properties and bandgap evolution of ALD HfSiOx films
188Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
189Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
190Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
191Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
192Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
193HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
194Densification of Thin Aluminum Oxide Films by Thermal Treatments
195Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
196Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
197Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
198AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
199Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
200Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
201Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
202Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
203Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
204Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
205Properties of AlN grown by plasma enhanced atomic layer deposition
206Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
207A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
208High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
209Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
210Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
211Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
212Optical and Electrical Properties of TixSi1-xOy Films
213Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2