Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
2Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
3Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
4Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
5Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
6Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
7Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
8Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
9Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
10Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
11SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
12Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
13Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
14Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
15Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
16Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
17Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
18Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
19Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
20Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
21Low temperature temporal and spatial atomic layer deposition of TiO2 films
22Plasma enhanced atomic layer deposition of Ga2O3 thin films
23GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
24Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
25Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
26Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
27Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
28A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
29Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
30Thin film GaP for solar cell application
31Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
32Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
33Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
34Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
35Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
36Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
37Plasma enhanced atomic layer deposition of aluminum sulfide thin films
38Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
39Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
40Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
41Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
42Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
43Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
44A route to low temperature growth of single crystal GaN on sapphire
45Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
46Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
47Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
48Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
49Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
50Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
51Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
52Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
53Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
54Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
55Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
56Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
57Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
58Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
59Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
60Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
61Optical and Electrical Properties of AlxTi1-xO Films
62Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
63Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
64Composite materials and nanoporous thin layers made by atomic layer deposition
65Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
66Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
67Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
68Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
69Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
70Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
71Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
72Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
73Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
74Atomic layer deposition of InN using trimethylindium and ammonia plasma
75Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
76Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
77Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
78Plasma enhanced atomic layer deposition of SiNx:H and SiO2
79Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
80Plasma enhanced atomic layer deposition of gallium sulfide thin films
81ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
82Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
83Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
84Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
85Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
86Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
87In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
88Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
89Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
90Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
91Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
92Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
93Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
94Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
95Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
96Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
97Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
98Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
99Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
100Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
101Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
102Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
103Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
104Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
105Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
106Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
107Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
108Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
109Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
110Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
111Plasma-enhanced atomic layer deposition of tungsten nitride
112Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
113An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
114Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
115PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
116ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
117Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
118In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
119Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
120Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
121Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
122Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
123A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
124Plasma-enhanced atomic layer deposition of vanadium nitride
125Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
126Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
127Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
128Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
129ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
130Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
131Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
132Densification of Thin Aluminum Oxide Films by Thermal Treatments
133Innovative remote plasma source for atomic layer deposition for GaN devices
134Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
135Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
136Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
137High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
138Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
139Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
140Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
141Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
142Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
143Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
144Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
145Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
146Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
147Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
148Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
149Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
150Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
151Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
152Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
153Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
154Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
155Plasma-enhanced atomic layer deposition of titanium vanadium nitride
156Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
157Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
158Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
159Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
160Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
161On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
162Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
163AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
164HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
165The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
166Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
167Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
168An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
169AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
170Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
171Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
172Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
173Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
174Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
175Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
176High-Reflective Coatings For Ground and Space Based Applications
177Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
178The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
179In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
180Properties of AlN grown by plasma enhanced atomic layer deposition
181Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
182Plasma-enhanced atomic layer deposition of superconducting niobium nitride
183Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
184Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
185Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
186Optical properties and bandgap evolution of ALD HfSiOx films
187Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
188Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
189Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
190Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
191Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
192Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
193Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
194Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
195Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
196Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
197Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
198A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
199Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
200Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
201Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
202Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
203Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
204Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
205Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
206Optical and Electrical Properties of TixSi1-xOy Films
207Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
208Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
209Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
210Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
211Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
212Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
213Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
214Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
215In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
216Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
217Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
218Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
219Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
220Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
221Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study