Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
2Plasma enhanced atomic layer deposition of aluminum sulfide thin films
3Properties of AlN grown by plasma enhanced atomic layer deposition
4Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
5A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
6Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
7Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
8Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
9GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
10Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
11HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
12Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
13On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
14Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
15High-Reflective Coatings For Ground and Space Based Applications
16Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
17ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
18Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
19Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
20Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
21Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
22Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
23Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
24Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
25Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
26Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
27The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
28Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
29Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
30Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
31Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
32Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
33Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
34Plasma-enhanced atomic layer deposition of titanium vanadium nitride
35Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
36Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
37Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
38A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
39A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
40Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
41Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
42Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
43Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
44Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
45Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
46Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
47An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
48Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
49Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
50Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
51Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
52Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
53In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
54Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
55Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
56Plasma enhanced atomic layer deposition of gallium sulfide thin films
57Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
58Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
59Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
60Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
61Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
62Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
63Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
64Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
65Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
66Optical and Electrical Properties of AlxTi1-xO Films
67Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
68Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
69Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
70Plasma enhanced atomic layer deposition of SiNx:H and SiO2
71Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
72Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
73Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
74Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
75In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
76Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
77Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
78Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
79Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
80Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
81Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
82Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
83Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
84Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
85Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
86Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
87Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
88Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
89Composite materials and nanoporous thin layers made by atomic layer deposition
90Densification of Thin Aluminum Oxide Films by Thermal Treatments
91Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
92Innovative remote plasma source for atomic layer deposition for GaN devices
93Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
94Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
95Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
96Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
97Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
98Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
99Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
100Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
101Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
102Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
103Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
104Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
105Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
106AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
107Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
108Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
109Optical properties and bandgap evolution of ALD HfSiOx films
110Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
111Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
112Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
113Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
114Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
115Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
116Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
117Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
118Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
119Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
120A route to low temperature growth of single crystal GaN on sapphire
121In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
122Plasma enhanced atomic layer deposition of Ga2O3 thin films
123Plasma-enhanced atomic layer deposition of vanadium nitride
124Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
125Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
126Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
127Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
128Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
129Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
130Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
131Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
132Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
133Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
134Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
135Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
136Plasma-enhanced atomic layer deposition of superconducting niobium nitride
137Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
138Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
139Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
140Optical and Electrical Properties of TixSi1-xOy Films
141Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
142Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
143Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
144Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
145Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
146AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
147Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
148Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
149Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
150Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
151Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
152Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
153Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
154An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
155Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
156In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
157Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
158High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
159Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
160Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
161ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
162Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
163Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
164Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
165Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
166Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
167Thin film GaP for solar cell application
168Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
169Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
170Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
171Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
172Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
173Atomic layer deposition of InN using trimethylindium and ammonia plasma
174Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
175Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
176Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
177Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
178Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
179Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
180Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
181Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
182Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
183Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
184Plasma-enhanced atomic layer deposition of tungsten nitride
185Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
186Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
187Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
188Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
189Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
190Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
191In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
192Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
193Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
194Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
195ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
196PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
197Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
198The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
199Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
200Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
201Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
202Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
203Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
204Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
205Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
206Low temperature temporal and spatial atomic layer deposition of TiO2 films
207Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
208Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
209ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
210Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
211Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
212Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
213Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
214Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
215Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
216Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
217Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
218Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
219Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
220Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
221Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
222SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
223Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
224Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
225Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
226Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration