2021 Year in Review

The publication database currently has 1628 entries.

Search from:

272 Precursors and Plasma Gases

251 Film and Plasma Characteristics

90 Theses

Use Advanced Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)

ALD Links
Contact Us

Recent Database Additions

Effect of atomic layer plasma treatment on TALD-ZrO₂ film to improve the corrosion protection of Mg-Ca alloy Deposition and Characterization of RP-ALD SiO₂ Thin Films with Different Oxygen Plasma Powers Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation

Search 1628 plasma ALD publications by:

203 Films Compositions

272 Precursors and Plasma Gases

77 Deposition Hardwares

251 Film and Plasma Characteristics

Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Refractive Index returned 213 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2	A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
3	A route to low temperature growth of single crystal GaN on sapphire
4	Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al₂O₃/organic-inorganic nanohybrid layers
5	Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
6	Al₂O₃/SiN_x-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
7	AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
8	AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
9	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
10	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
11	An efficient PE-ALD process for TiO₂ thin films employing a new Ti-precursor
12	Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
13	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
14	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
15	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnO_x as conductive gas diffusion barrier
16	Atomic layer deposition of AlN from AlCl₃ using NH₃ and Ar/NH₃ plasma
17	Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
18	Atomic layer deposition of aluminum fluoride using Al(CH₃)₃ and SF₆ plasma
19	Atomic Layer Deposition of Aluminum Phosphate Using AlMe₃, PO(OMe)₃, and O₂ Plasma: Film Growth and Surface Reactions
20	Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O₂ plasma
21	Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
22	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
23	Atomic layer deposition of HfO₂ using HfCp(NMe₂)₃ and O₂ plasma
24	Atomic layer deposition of InN using trimethylindium and ammonia plasma
25	Atomic Layer Deposition of LiCoO₂ Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
26	Atomic layer deposition of LiF using LiN(SiMe₃)₂ and SF₆ plasma
27	Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
28	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N₂ Plasma
29	Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N₂ Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
30	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N₂ Plasma on Planar and 3D Substrate Topographies
31	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
32	Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
33	Blistering mechanisms of atomic-layer-deposited AlN and Al₂O₃ films
34	Characterization of plasma-enhanced atomic layer deposition of Al₂O₃ using dimethylaluminum isopropoxide
35	Chemical, optical, and electrical characterization of Ga₂O₃ thin films grown by plasma-enhanced atomic layer deposition
36	Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
37	Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO₂ dielectric layers
38	Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
39	Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
40	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
41	Composite materials and nanoporous thin layers made by atomic layer deposition
42	Controlling mechanical, structural, and optical properties of Al₂O₃ thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
43	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
44	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
45	Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
46	Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
47	Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p⁺ Regions
48	Densification of Thin Aluminum Oxide Films by Thermal Treatments
49	Deposition and Characterization of RP-ALD SiO₂ Thin Films with Different Oxygen Plasma Powers
50	Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
51	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
52	Effect of Oxygen Source on the Various Properties of SnO₂ Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
53	Effect of postdeposition annealing on the electrical properties of beta-Ga₂O₃ thin films grown on p-Si by plasma-enhanced atomic layer deposition
54	Electrical Properties of Al₂O₃ Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
55	Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
56	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al₂O₃-films
57	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
58	Engineering high quality and conformal ultrathin SiN_x films by PEALD for downscaled and advanced CMOS nodes
59	Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
60	Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
61	Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
62	Evaluation of Thermal Versus Plasma-Assisted ALD Al₂O₃ as Passivation for InAlN/AlN/GaN HEMTs
63	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
64	GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
65	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
66	Gate-tunable high mobility remote-doped InSb/In_1-xAl_xSb quantum well heterostructures
67	Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
68	Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
69	Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
70	Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
71	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
72	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
73	Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
74	Growth of Bi₂O₃ Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
75	HfO₂/SiO₂ anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
76	High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
77	High-Reflective Coatings For Ground and Space Based Applications
78	Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO₂
79	Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
80	In situ control of oxygen vacancies in TiO₂ by atomic layer deposition for resistive switching devices
81	In situ real-time and ex situ spectroscopic analysis of Al₂O₃ films prepared by plasma enhanced atomic layer deposition
82	In situ surface cleaning on a Ge substrate using TMA and MgCp₂ for HfO₂-based gate oxides
83	In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WO_x as hole-selective contacts for Si solar cells
84	In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
85	Influence of Atomic Layer Deposition Temperatures on TiO₂/n-Si MOS Capacitor
86	Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
87	Influence of plasma power on deposition mechanism and structural properties of MoO_x thin films by plasma enhanced atomic layer deposition
88	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al₂O₃ Films Synthesized by ALD and PECVD
89	Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al₂O₃
90	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
91	Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
92	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
93	Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
94	Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
95	Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H₂ + 95% N₂) plasma
96	Low temperature SiO_x thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
97	Low temperature temporal and spatial atomic layer deposition of TiO₂ films
98	Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
99	Low-temperature atomic layer deposition of TiO₂, Al₂O₃,and ZnO thin films
100	Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
101	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
102	Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
103	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
104	Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
105	Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO₂ as an Electron Transport Layer in Planar Perovskite Solar Cells
106	Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO₂ Using Carbon Dioxide
107	Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
108	Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
109	Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
110	Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
111	Nanoporous SiO₂ thin films made by atomic layer deposition and atomic etching
112	Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
113	Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
114	On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
115	Optical and Electrical Properties of Al_xTi_1-xO Films
116	Optical and Electrical Properties of Ti_xSi_1-xO_y Films
117	Optical properties and bandgap evolution of ALD HfSiO_x films
118	Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
119	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
120	Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
121	PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
122	Plasma enhanced atomic layer deposition of aluminum sulfide thin films
123	Plasma enhanced atomic layer deposition of Ga₂O₃ thin films
124	Plasma enhanced atomic layer deposition of gallium sulfide thin films
125	Plasma enhanced atomic layer deposition of HfO₂ and ZrO₂ high-k thin films
126	Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
127	Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH₃
128	Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
129	Plasma Enhanced Atomic Layer Deposition of SiN:H Using N₂ and Silane
130	Plasma enhanced atomic layer deposition of SiN_x:H and SiO₂
131	Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
132	Plasma Modeling of a PEALD System for the Deposition of TiO₂ and HfO₂
133	Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnO_x infrared transparent conductive thin films
134	Plasma-Assisted ALD for the Conformal Deposition of SiO₂: Process, Material and Electronic Properties
135	Plasma-Assisted ALD of Highly Conductive HfN_x: On the Effect of Energetic Ions on Film Microstructure
136	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
137	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li₂CO₃
138	Plasma-Assisted Atomic Layer Deposition of Al₂O₃ at Room Temperature
139	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO₂
140	Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
141	Plasma-assisted atomic layer deposition of Ta₂O₅ from alkylamide precursor and remote O₂ plasma
142	Plasma-Enhanced ALD of TiO₂ Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe₂)₃] and O₂ Plasma
143	Plasma-enhanced and thermal atomic layer deposition of Al₂O₃ using dimethylaluminum isopropoxide, [Al(CH₃)₂(μ-OiPr)]₂, as an alternative aluminum precursor
144	Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
145	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO₂ as low-refractive index material
146	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO₂ Using TiCl₄
147	Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
148	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
149	Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
150	Plasma-enhanced atomic layer deposition of SiO₂ for channel isolation of colloidal quantum dots phototransistors
151	Plasma-enhanced atomic layer deposition of SnO₂ thin films using SnCl₄ and O₂ plasma
152	Plasma-enhanced atomic layer deposition of superconducting niobium nitride
153	Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
154	Plasma-enhanced atomic layer deposition of titanium vanadium nitride
155	Plasma-enhanced atomic layer deposition of tungsten nitride
156	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)₂(Me₂N)₂W and O₂ plasma
157	Plasma-enhanced atomic layer deposition of vanadium nitride
158	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
159	Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
160	Preliminary investigation of high-k materials - TiO₂ doped Ta₂O₅ films by remote plasma ALD
161	Properties of AlN grown by plasma enhanced atomic layer deposition
162	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
163	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
164	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
165	Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
166	Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
167	Remote Plasma ALD of SrTiO₃ Using Cyclopentadienlyl-Based Ti and Sr Precursors
168	Remote Plasma Atomic Layer Deposition of Co₃O₄ Thin Film
169	Remote Plasma Atomic Layer Deposition of Co₃O₄ Thin Films
170	Remote Plasma Atomic Layer Deposition of SiN_x Using Cyclosilazane and H₂/N₂ Plasma
171	Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO₂
172	Room temperature plasma enhanced atomic layer deposition for TiO₂ and WO₃ films
173	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
174	Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
175	SiC_xN_y-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
176	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
177	Silicon surface passivation by ultrathin Al₂O₃ films synthesized by thermal and plasma atomic layer deposition
178	Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO₂
179	Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
180	Structural and electrical properties of ultra-thin high-k ZrO₂ film on nitride passivated Ge(100) prepared by PEALD
181	Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
182	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
183	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
184	Surface reactions of aminosilane precursors during N₂ plasma-assisted atomic layer deposition of SiN_x
185	Systematic Study of the SiO_x Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiO_x/SiO₂ Super-Lattice
186	Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
187	The influence of N₂/H₂ and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
188	The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
189	Thin film GaP for solar cell application
190	Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
191	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
192	Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
193	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
194	Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
195	Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
196	ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
197	ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
198	ZrO₂ Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium