Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
2Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
3Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
4Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
5Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
6Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
7Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
8Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
9Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
10Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
11Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
12Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
13Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
14Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
15Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
16A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
17Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
18Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
19Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
20Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
21Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
22Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
23Plasma-enhanced atomic layer deposition of tungsten nitride
24Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
25Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
26Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
27Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
28Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
29Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
30Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
31ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
32Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
33Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
34Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
35Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
36Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
37Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
38Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
39Low temperature temporal and spatial atomic layer deposition of TiO2 films
40Optical and Electrical Properties of TixSi1-xOy Films
41Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
42Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
43Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
44ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
45Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
46Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
47Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
48ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
49Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
50Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
51High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
52Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
53SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
54Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
55Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
56AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
57The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
58Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
59Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
60Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
61Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
62Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
63In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
64Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
65Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
66Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
67Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
68AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
69Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
70Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
71Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
72Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
73Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
74PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
75Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
76Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
77Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
78Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
79Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
80Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
81Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
82Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
83Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
84Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
85Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
86Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
87Plasma enhanced atomic layer deposition of gallium sulfide thin films
88Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
89Plasma-enhanced atomic layer deposition of vanadium nitride
90Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
91Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
92An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
93Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
94Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
95Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
96Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
97Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
98In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
99Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
100Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
101Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
102Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
103Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
104Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
105Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
106Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
107Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
108Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
109Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
110Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
111Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
112Innovative remote plasma source for atomic layer deposition for GaN devices
113On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
114An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
115Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
116Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
117Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
118Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
119Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
120The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
121Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
122Optical and Electrical Properties of AlxTi1-xO Films
123Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
124Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
125A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
126HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
127Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
128Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
129Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
130Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
131In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
132Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
133Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
134Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
135Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
136Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
137Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
138Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
139Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
140Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
141Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
142Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
143A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
144In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
145Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
146GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
147Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
148Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
149Properties of AlN grown by plasma enhanced atomic layer deposition
150Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
151Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
152Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
153Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
154Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
155Plasma enhanced atomic layer deposition of aluminum sulfide thin films
156Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
157Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
158Composite materials and nanoporous thin layers made by atomic layer deposition
159Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
160Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
161High-Reflective Coatings For Ground and Space Based Applications
162Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
163Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
164Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
165Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
166Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
167Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
168Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
169Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
170Optical properties and bandgap evolution of ALD HfSiOx films
171Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
172Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
173Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
174Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
175Thin film GaP for solar cell application
176Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
177Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
178Plasma enhanced atomic layer deposition of SiNx:H and SiO2
179In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
180Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
181Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
182Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
183Densification of Thin Aluminum Oxide Films by Thermal Treatments
184Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
185Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
186Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
187Plasma enhanced atomic layer deposition of Ga2O3 thin films
188Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
189Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
190Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
191Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
192Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
193Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
194Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
195Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
196Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
197Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
198Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
199Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
200Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
201Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
202Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
203Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
204Plasma-enhanced atomic layer deposition of superconducting niobium nitride
205Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
206Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
207Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
208Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
209A route to low temperature growth of single crystal GaN on sapphire
210Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
211Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
212Atomic layer deposition of InN using trimethylindium and ammonia plasma
213Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
214Plasma-enhanced atomic layer deposition of titanium vanadium nitride
215Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
216Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
217Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
218Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
219Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
220Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
221Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
222Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
223Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
224Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
225Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers