Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
2Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
3Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
4Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
5Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
6Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
7Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
8Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
9High-Reflective Coatings For Ground and Space Based Applications
10Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
11Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
12Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
13Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
14Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
15Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
16A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
17Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
18In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
19Low temperature temporal and spatial atomic layer deposition of TiO2 films
20Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
21Plasma-enhanced atomic layer deposition of titanium vanadium nitride
22Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
23Plasma enhanced atomic layer deposition of SiNx:H and SiO2
24Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
25Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
26Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
27Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
28Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
29Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
30Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
31Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
32Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
33Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
34Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
35On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
36Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
37Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
38Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
39Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
40A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
41Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
42Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
43Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
44Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
45AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
46Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
47Innovative remote plasma source for atomic layer deposition for GaN devices
48Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
49Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
50Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
51Densification of Thin Aluminum Oxide Films by Thermal Treatments
52Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
53Plasma enhanced atomic layer deposition of aluminum sulfide thin films
54Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
55Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
56Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
57Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
58Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
59Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
60The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
61Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
62Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
63Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
64Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
65Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
66Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
67Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
68Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
69Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
70GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
71Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
72SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
73Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
74Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
75Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
76Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
77ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
78Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
79Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
80An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
81Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
82Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
83An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
84Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
85The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
86ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
87Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
88Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
89Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
90Properties of AlN grown by plasma enhanced atomic layer deposition
91Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
92Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
93Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
94Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
95Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
96Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
97Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
98Composite materials and nanoporous thin layers made by atomic layer deposition
99Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
100Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
101Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
102Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
103Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
104A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
105Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
106Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
107A route to low temperature growth of single crystal GaN on sapphire
108Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
109Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
110Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
111Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
112Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
113Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
114Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
115Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
116Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
117HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
118Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
119Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
120Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
121Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
122High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
123In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
124Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
125Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
126Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
127Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
128Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
129Plasma-enhanced atomic layer deposition of superconducting niobium nitride
130Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
131Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
132Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
133Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
134In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
135Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
136Plasma enhanced atomic layer deposition of gallium sulfide thin films
137Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
138Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
139Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
140Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
141Thin film GaP for solar cell application
142Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
143Plasma enhanced atomic layer deposition of Ga2O3 thin films
144Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
145Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
146Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
147Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
148Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
149PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
150Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
151Optical and Electrical Properties of TixSi1-xOy Films
152Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
153Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
154Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
155Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
156Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
157ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
158In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
159Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
160Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
161Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
162Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
163Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
164Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
165Optical properties and bandgap evolution of ALD HfSiOx films
166Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
167Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
168Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
169Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
170Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
171Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
172Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
173Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
174Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
175Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
176Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
177Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
178Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
179Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
180Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
181Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
182Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
183Plasma-enhanced atomic layer deposition of vanadium nitride
184Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
185Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
186Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
187Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
188Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
189Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
190Plasma-enhanced atomic layer deposition of tungsten nitride
191Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
192Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
193Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
194ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
195Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
196Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
197Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
198In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
199Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
200Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
201Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
202Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
203Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
204Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
205Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
206Atomic layer deposition of InN using trimethylindium and ammonia plasma
207Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
208Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
209Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
210Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
211Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
212Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
213Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
214Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
215Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
216Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
217Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
218Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
219Optical and Electrical Properties of AlxTi1-xO Films
220Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
221Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
222Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
223Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
224Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
225Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
226AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition