Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
3A route to low temperature growth of single crystal GaN on sapphire
4A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
5Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
6Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
7Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
8AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
9AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
10Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
11An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
12An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
13Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
14Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
15Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
16Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
17Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
18Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
19Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
20Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
21Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
22Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
23Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
24Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
25Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
26Atomic layer deposition of InN using trimethylindium and ammonia plasma
27Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
28Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
29Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
30Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
31Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
32Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
33Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
34Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
35Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
36Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
37Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
38Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
39Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
40Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
41Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
42Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
43Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
44Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
45Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
46Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
47Composite materials and nanoporous thin layers made by atomic layer deposition
48Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
49Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
50Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
51Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
52Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
53Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
54Densification of Thin Aluminum Oxide Films by Thermal Treatments
55Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
56Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
57Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
58Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
59Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
60Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
61Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
62Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
63Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
64Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
65Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
66Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
67Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
68Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
69Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
70GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
71Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
72Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
73Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
74Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
75Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
76Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
77Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
78Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
79Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
80Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
81HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
82High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
83High-Reflective Coatings For Ground and Space Based Applications
84Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
85Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
86In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
87In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
88In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
89In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
90In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
91Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
92Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
93Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
94Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
95Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
96Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
97Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
98Innovative remote plasma source for atomic layer deposition for GaN devices
99Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
100Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
101Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
102Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
103Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
104Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
105Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
106Low temperature temporal and spatial atomic layer deposition of TiO2 films
107Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
108Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
109Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
110Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
111Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
112Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
113Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
114Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
115Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
116Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
117Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
118Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
119Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
120Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
121Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
122Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
123On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
124Optical and Electrical Properties of AlxTi1-xO Films
125Optical and Electrical Properties of TixSi1-xOy Films
126Optical properties and bandgap evolution of ALD HfSiOx films
127Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
128Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
129Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
130PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
131Plasma enhanced atomic layer deposition of aluminum sulfide thin films
132Plasma enhanced atomic layer deposition of Ga2O3 thin films
133Plasma enhanced atomic layer deposition of gallium sulfide thin films
134Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
135Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
136Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
137Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
138Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
139Plasma enhanced atomic layer deposition of SiNx:H and SiO2
140Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
141Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
142Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
143Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
144Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
145Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
146Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
147Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
148Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
149Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
150Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
151Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
152Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
153Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
154Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
155Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
156Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
157Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
158Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
159Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
160Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
161Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
162Plasma-enhanced atomic layer deposition of superconducting niobium nitride
163Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
164Plasma-enhanced atomic layer deposition of titanium vanadium nitride
165Plasma-enhanced atomic layer deposition of tungsten nitride
166Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
167Plasma-enhanced atomic layer deposition of vanadium nitride
168Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
169Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
170Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
171Properties of AlN grown by plasma enhanced atomic layer deposition
172Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
173Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
174Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
175Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
176Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
177Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
178Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
179Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
180Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
181Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
182Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
183Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
184Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
185SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
186Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
187Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
188Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
189Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
190Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
191Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
192Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
193Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
194Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
195Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
196Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
197The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
198The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
199Thin film GaP for solar cell application
200Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
201Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
202Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
203Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
204Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
205Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
206ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
207ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
208ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium