Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
2Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
3Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
4Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
5Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
6Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
7Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
8PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
9Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
10Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
11Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
12Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
13A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
14Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
15Atomic layer deposition of InN using trimethylindium and ammonia plasma
16In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
17Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
18Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
19Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
20Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
21Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
22Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
23Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
24Plasma enhanced atomic layer deposition of aluminum sulfide thin films
25Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
26Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
27Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
28Plasma-enhanced atomic layer deposition of titanium vanadium nitride
29ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
30Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
31On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
32HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
33Optical and Electrical Properties of AlxTi1-xO Films
34Composite materials and nanoporous thin layers made by atomic layer deposition
35Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
36Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
37Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
38Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
39Plasma enhanced atomic layer deposition of gallium sulfide thin films
40Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
41Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
42Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
43Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
44An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
45Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
46Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
47Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
48Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
49Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
50Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
51In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
52Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
53Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
54Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
55Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
56A route to low temperature growth of single crystal GaN on sapphire
57Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
58Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
59Plasma enhanced atomic layer deposition of SiNx:H and SiO2
60Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
61Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
62Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
63Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
64Low temperature temporal and spatial atomic layer deposition of TiO2 films
65Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
66A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
67Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
68Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
69In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
70Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
71A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
72Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
73Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
74Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
75Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
76Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
77Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
78Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
79Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
80Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
81The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
82Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
83Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
84SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
85Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
86Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
87Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
88Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
89Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
90Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
91Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
92In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
93Plasma-enhanced atomic layer deposition of vanadium nitride
94Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
95Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
96Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
97Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
98Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
99Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
100Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
101Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
102Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
103Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
104Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
105Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
106Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
107Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
108High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
109Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
110Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
111Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
112Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
113Properties of AlN grown by plasma enhanced atomic layer deposition
114Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
115Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
116Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
117Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
118AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
119Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
120Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
121Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
122Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
123Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
124Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
125Densification of Thin Aluminum Oxide Films by Thermal Treatments
126Plasma enhanced atomic layer deposition of Ga2O3 thin films
127Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
128Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
129Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
130Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
131Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
132Innovative remote plasma source for atomic layer deposition for GaN devices
133Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
134Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
135Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
136Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
137ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
138Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
139Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
140Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
141Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
142Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
143Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
144Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
145ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
146Thin film GaP for solar cell application
147Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
148Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
149Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
150Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
151Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
152Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
153Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
154Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
155Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
156Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
157Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
158Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
159Plasma-enhanced atomic layer deposition of tungsten nitride
160Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
161Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
162Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
163Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
164Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
165Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
166Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
167Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
168High-Reflective Coatings For Ground and Space Based Applications
169Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
170Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
171Optical properties and bandgap evolution of ALD HfSiOx films
172Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
173Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
174Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
175Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
176Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
177Plasma-enhanced atomic layer deposition of superconducting niobium nitride
178Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
179Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
180Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
181Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
182Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
183Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
184Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
185The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
186ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
187Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
188Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
189Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
190Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
191Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
192AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
193Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
194Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
195Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
196Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
197Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
198Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
199Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
200Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
201Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
202GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
203Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
204Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
205Optical and Electrical Properties of TixSi1-xOy Films
206Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
207Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
208Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
209Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
210An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
211Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
212Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
213Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
214Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
215Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
216Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
217Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
218Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
219Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
220Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
221Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
222Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
223Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
224Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
225In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
226Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure