Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Refractive Index returned 141 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2A route to low temperature growth of single crystal GaN on sapphire
3Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
4Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
5AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
6Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
7An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
8Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
9Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
10Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
11Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
12Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
13Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
14Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
15Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
16Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
17Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
18Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
19Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
20Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
21Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
22Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
23Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
24Comparison of trimethylgallium and triethylgallium as 'Ga' source materials for the growth of ultrathin GaN films on Si(100) substrates via hollow-cathode plasma-assisted atomic layer deposition
25Composite materials and nanoporous thin layers made by atomic layer deposition
26Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
27Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
28Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
29Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
30Densification of Thin Aluminum Oxide Films by Thermal Treatments
31Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
32Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
33Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
34Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
35Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
36Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
37Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
38Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
39GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
40Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
41Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
42Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
43Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
44Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
45Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
46Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
47Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
48Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
49High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
50High-Reflective Coatings For Ground and Space Based Applications
51Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
52In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
53In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
54Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
55Influence of N2/H2 and N2 plasma on binary III-nitride films prepared by hollow-cathode plasma-assisted atomic layer deposition
56Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
57Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
58Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
59Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
60Investigation of native oxide removing from HCPA ALD grown GaN thin films surface utilizing HF solutions
61Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
62Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
63Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
64Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
65Low temperature temporal and spatial atomic layer deposition of TiO2 films
66Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
67Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
68Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
69Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
70Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
71Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
72Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
73Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
74Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
75Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN and BxIn1-xN thin film alloys
76Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
77Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
78Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
79Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
80Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
81Optical and Electrical Properties of AlxTi1-xO Films
82Optical and Electrical Properties of TixSi1-xOy Films
83Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
84Optical properties and bandgap evolution of ALD HfSiOx films
85Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
86PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
87Plasma enhanced atomic layer deposition of aluminum sulfide thin films
88Plasma enhanced atomic layer deposition of Ga2O3 thin films
89Plasma enhanced atomic layer deposition of gallium sulfide thin films
90Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
91Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
92Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
93Plasma enhanced atomic layer deposition of SiNx:H and SiO2
94Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
95Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
96Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
97Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
98Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
99Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
100Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
101Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
102Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
103Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
104Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
105Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
106Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
107Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
108Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
109Plasma-enhanced atomic layer deposition of superconducting niobium nitride
110Plasma-enhanced atomic layer deposition of titanium vanadium nitride
111Plasma-enhanced atomic layer deposition of tungsten nitride
112Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
113Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
114Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
115Properties of AlN grown by plasma enhanced atomic layer deposition
116Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
117Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
118Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
119Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition
120Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
121Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
122Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
123Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
124Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
125Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
126Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
127Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
128Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
129Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
130Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
131Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
132Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
133Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
134Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
135Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
136The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
137Thin film GaP for solar cell application
138Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
139Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
140Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
141ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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