Refractive Index Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
2Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
3In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
4Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
5Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
6ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
7Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
8Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
9Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
10Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
11Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
12Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
13Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
14Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
15A route to low temperature growth of single crystal GaN on sapphire
16Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
17Composite materials and nanoporous thin layers made by atomic layer deposition
18Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
19Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
20Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
21Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
22Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
23High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
24Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
25Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
26In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
27Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
28Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
29Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
30Thin film GaP for solar cell application
31Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
32Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
33Plasma enhanced atomic layer deposition of SiNx:H and SiO2
34Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
35GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
36Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
37Innovative remote plasma source for atomic layer deposition for GaN devices
38Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
39Atomic layer deposition of InN using trimethylindium and ammonia plasma
40Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
41Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
42In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
43Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
44Plasma-enhanced atomic layer deposition of tungsten nitride
45Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
46Plasma enhanced atomic layer deposition of gallium sulfide thin films
47Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
48Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
49Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
50Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
51Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
52Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
53Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
54Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
55Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
56Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
57Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
58Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
59Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
60Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
61Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
62Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
63Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
64Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
65Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
66In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
67Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
68Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
69Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
70Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
71Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
72Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
73Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
74Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
75Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
76Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
77AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
78Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
79Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
80Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
81Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
82Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
83Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
84Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
85In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
86Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
87Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
88Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
89Properties of AlN grown by plasma enhanced atomic layer deposition
90Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
91Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
92Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
93Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
94Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
95Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
96Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
97Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
98On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
99A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
100Low temperature temporal and spatial atomic layer deposition of TiO2 films
101Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
102Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
103Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
104Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
105PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
106Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
107Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
108ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
109Optical and Electrical Properties of AlxTi1-xO Films
110Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
111An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
112Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
113Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
114Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
115Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
116Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
117Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
118Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
119Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
120Densification of Thin Aluminum Oxide Films by Thermal Treatments
121Plasma enhanced atomic layer deposition of Ga2O3 thin films
122SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition
123Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
124Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
125Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
126Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
127Plasma-enhanced atomic layer deposition of vanadium nitride
128Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
129Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
130A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
131Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
132Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
133Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
134Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
135Plasma enhanced atomic layer deposition of aluminum sulfide thin films
136Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
137A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
138ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
139Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
140An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
141Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
142Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
143ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
144Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
145Plasma-enhanced atomic layer deposition of superconducting niobium nitride
146Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
147The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
148HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
149Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
150Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
151Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
152Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
153Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
154Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
155Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
156The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
157AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
158Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
159Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
160Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
161Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
162Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
163High-Reflective Coatings For Ground and Space Based Applications
164Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
165Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
166Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
167Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
168Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
169Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
170Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
171Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
172Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
173Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
174Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
175Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
176Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
177Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
178Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
179Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
180Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
181Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
182Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
183Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
184Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
185Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
186Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
187Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
188Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma
189Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
190Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
191Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
192Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
193Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
194Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
195Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
196Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
197Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
198Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
199Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
200Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
201Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
202Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
203Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
204Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
205Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
206Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
207Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
208Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
209Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
210Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
211Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
212Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
213Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
214Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
215Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
216Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
217Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
218Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
219Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
220Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
221Optical and Electrical Properties of TixSi1-xOy Films
222Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
223Optical properties and bandgap evolution of ALD HfSiOx films
224Plasma-enhanced atomic layer deposition of titanium vanadium nitride
225Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
226Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries