Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 167 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A route to low temperature growth of single crystal GaN on sapphire
4Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
7Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
8Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
9Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
10Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
11Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
12Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
13Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
14Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
15Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
16Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
17Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
18Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
19Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
20Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
21Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
22Atomic layer deposition of InN using trimethylindium and ammonia plasma
23Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
24Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
25Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
26Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
27Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
28Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
29Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
30Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
31Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
32Breakdown and Protection of ALD Moisture Barrier Thin Films
33Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
34Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
35Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
36Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
37Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
38Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
39Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
40Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
41Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
42Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
43Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
44Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
45Densification of Thin Aluminum Oxide Films by Thermal Treatments
46Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
47Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
48Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
49Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
50Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
51Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
52Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
53Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
54Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
55Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
56Evaluation of plasma parameters on PEALD deposited TaCN
57Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
58Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
59GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
60Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
61Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
62Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
63High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
64High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
65High-Reflective Coatings For Ground and Space Based Applications
66Hydrogen plasma-enhanced atomic layer deposition of copper thin films
67Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
68In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
69Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
70Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
71Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
72Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
73Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
74Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
75Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
76Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
77Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
78Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
79Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
80Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
81Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
82Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
83Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
84Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
85Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
86Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
87Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
88PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
89PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
90Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
91Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
92Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
93Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
94Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
95Plasma enhanced atomic layer deposition of SiNx:H and SiO2
96Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
97Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
98Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
99Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
100Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
101Plasma-Assisted Atomic Layer Deposition of Palladium
102Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
103Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
104Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
105Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
106Plasma-enhanced atomic layer deposition of BaTiO3
107Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
108Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
109Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
110Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
111Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
112Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
113Plasma-enhanced atomic layer deposition of superconducting niobium nitride
114Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
115Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
116Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
117Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
118Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
119Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
120Plasma-enhanced atomic layer deposition of titanium vanadium nitride
121Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
122Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
123Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
124Properties of AlN grown by plasma enhanced atomic layer deposition
125Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
126Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
127Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
128Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
129Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
130Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
131Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
132Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
133Remote Plasma ALD of Platinum and Platinum Oxide Films
134Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
135Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
136Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
137Room-Temperature Atomic Layer Deposition of Platinum
138Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
139Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
140Structural and optical characterization of low-temperature ALD crystalline AlN
141Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
142Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
143Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
144Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
145Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
146Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
147Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
148Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
149The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
150Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
151Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
152Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
153Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
154TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
155Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
156Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
157Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
158Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
159ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
160ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium