Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 135 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3	A route to low temperature growth of single crystal GaN on sapphire
4	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6	Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
7	Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
8	Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
9	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
10	Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
11	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
12	Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
13	Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
14	Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
15	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
16	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
17	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
18	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
19	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
20	Breakdown and Protection of ALD Moisture Barrier Thin Films
21	Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
22	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
23	Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
24	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
25	Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
26	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
27	Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
28	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
29	Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
30	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
31	Densification of Thin Aluminum Oxide Films by Thermal Treatments
32	Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
33	Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
34	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
35	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
36	Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
37	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
38	Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
39	Evaluation of plasma parameters on PEALD deposited TaCN
40	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
41	GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
42	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
43	Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
44	Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
45	High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
46	High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
47	High-Reflective Coatings For Ground and Space Based Applications
48	Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
49	Hydrogen plasma-enhanced atomic layer deposition of copper thin films
50	Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
51	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
52	Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
53	Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
54	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
55	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
56	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
57	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
58	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
59	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
60	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
61	Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
62	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
63	Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
64	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
65	Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
66	Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
67	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
68	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
69	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
70	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
71	PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
72	PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
73	Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
74	Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
75	Plasma enhanced atomic layer deposition of SiNx:H and SiO2
76	Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
77	Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
78	Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
79	Plasma-Assisted Atomic Layer Deposition of Palladium
80	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
81	Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
82	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
83	Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
84	Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
85	Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
86	Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
87	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
88	Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
89	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
90	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
91	Plasma-enhanced atomic layer deposition of superconducting niobium nitride
92	Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
93	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
94	Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
95	Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
96	Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
97	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
98	Plasma-enhanced atomic layer deposition of titanium vanadium nitride
99	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
100	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
101	Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
102	Properties of AlN grown by plasma enhanced atomic layer deposition
103	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
104	Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
105	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
106	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
107	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
108	Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
109	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
110	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
111	Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition
112	Remote Plasma ALD of Platinum and Platinum Oxide Films
113	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
114	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
115	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
116	Room-Temperature Atomic Layer Deposition of Platinum
117	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
118	Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
119	Structural and optical characterization of low-temperature ALD crystalline AlN
120	Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
121	Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
122	Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
123	Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
124	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
125	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
126	Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
127	Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
128	The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
129	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
130	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
131	TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
132	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
133	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
134	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
135	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

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