Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 141 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3	A route to low temperature growth of single crystal GaN on sapphire
4	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6	Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
7	Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
8	Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
9	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
10	Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
11	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
12	Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
13	Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
14	Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
15	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
16	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
17	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
18	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
19	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
20	Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
21	Breakdown and Protection of ALD Moisture Barrier Thin Films
22	Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
23	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
24	Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
25	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
26	Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
27	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
28	Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
29	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
30	Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
31	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
32	Densification of Thin Aluminum Oxide Films by Thermal Treatments
33	Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
34	Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
35	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
36	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
37	Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
38	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
39	Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
40	Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
41	Evaluation of plasma parameters on PEALD deposited TaCN
42	Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
43	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
44	GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
45	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
46	Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
47	Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
48	High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
49	High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
50	High-Reflective Coatings For Ground and Space Based Applications
51	Hydrogen plasma-enhanced atomic layer deposition of copper thin films
52	Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
53	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
54	Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
55	Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
56	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
57	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
58	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
59	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
60	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
61	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
62	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
63	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
64	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
65	Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
66	Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
67	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
68	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
69	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
70	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
71	PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
72	PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
73	Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
74	Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
75	Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
76	Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
77	Plasma enhanced atomic layer deposition of SiNx:H and SiO2
78	Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
79	Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
80	Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
81	Plasma-Assisted Atomic Layer Deposition of Palladium
82	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
83	Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
84	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
85	Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
86	Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
87	Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
88	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
89	Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
90	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
91	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
92	Plasma-enhanced atomic layer deposition of superconducting niobium nitride
93	Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
94	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
95	Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
96	Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
97	Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
98	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
99	Plasma-enhanced atomic layer deposition of titanium vanadium nitride
100	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
101	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
102	Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
103	Properties of AlN grown by plasma enhanced atomic layer deposition
104	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
105	Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
106	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
107	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
108	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
109	Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
110	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
111	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
112	Remote Plasma ALD of Platinum and Platinum Oxide Films
113	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
114	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
115	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
116	Room-Temperature Atomic Layer Deposition of Platinum
117	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
118	Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
119	Structural and optical characterization of low-temperature ALD crystalline AlN
120	Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
121	Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
122	Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
123	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
124	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
125	Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
126	Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
127	The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
128	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
129	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
130	TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
131	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
132	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
133	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
134	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium

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