Density Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
2Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
3Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
4Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
5Room-Temperature Atomic Layer Deposition of Platinum
6Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
7High-Reflective Coatings For Ground and Space Based Applications
8A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
9Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
10Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
11Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
12Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
13Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
14Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
15Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
16Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
17Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
18Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
19Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
20Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
21Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
22Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
23Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
24Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
25Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
26Properties of AlN grown by plasma enhanced atomic layer deposition
27Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
28Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
29Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
30Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
31Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
32Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
33Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
34Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
35Hydrogen plasma-enhanced atomic layer deposition of copper thin films
36Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
37Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
38Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
39Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
40Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
41Plasma-enhanced atomic layer deposition of titanium vanadium nitride
42Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
43Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
44Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
45Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
46High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
47Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
48Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
49Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
50ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
51Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
52Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
53A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
54Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
55Remote Plasma ALD of Platinum and Platinum Oxide Films
56Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
57Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
58Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
59Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
60Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
61Plasma-Assisted Atomic Layer Deposition of Palladium
62Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
63Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
64Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
65Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
66Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
67Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
68Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
69Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
70Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
71Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
72Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
73Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
74TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
75Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
76Plasma-enhanced atomic layer deposition of BaTiO3
77Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
78Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
79Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
80Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
81Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
82Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
83Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
84Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
85The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
86Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
87Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
88Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
89Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
90Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
91Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
92Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
93Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
94PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
95Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
96Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
97High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
98Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
99Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
100Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
101Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
102Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
103Plasma-enhanced atomic layer deposition of superconducting niobium nitride
104Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
105Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
106Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
107Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
108Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
109Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
110Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
111Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
112Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
113Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
114Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
115Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
116Sub-nanometer heating depth of atomic layer annealing
117Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
118Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
119Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
120A route to low temperature growth of single crystal GaN on sapphire
121Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
122Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
123GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
124Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
125Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
126Structural and optical characterization of low-temperature ALD crystalline AlN
127Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
128Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
129Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
130Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
131Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
132Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
133Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
134Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
135In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
136Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
137Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
138Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
139Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
140Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
141Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
142Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
143Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
144Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
145Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
146Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
147Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
148Densification of Thin Aluminum Oxide Films by Thermal Treatments
149Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
150Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
151Atomic layer deposition of InN using trimethylindium and ammonia plasma
152Evaluation of plasma parameters on PEALD deposited TaCN
153Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
154Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
155Plasma enhanced atomic layer deposition of SiNx:H and SiO2
156Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
157Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
158Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
159Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
160Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
161Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
162PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
163Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
164A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
165Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
166Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
167Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
168Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
169Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
170Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
171Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
172Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
173Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
174Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
175ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
176Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
177Breakdown and Protection of ALD Moisture Barrier Thin Films
178Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
179Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
180Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
181Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
182Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
183Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
184Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
185Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
186Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
187Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
188Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
189Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
190Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
191Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
192High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films