Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 154 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A route to low temperature growth of single crystal GaN on sapphire
4Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
7Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
8Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
9Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
10Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
11Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
12Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
13Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
14Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
15Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
16Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
17Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
18Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
19Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
20Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
21Atomic layer deposition of InN using trimethylindium and ammonia plasma
22Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
23Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
24Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
25Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
26Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
27Breakdown and Protection of ALD Moisture Barrier Thin Films
28Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
29Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
30Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
31Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
32Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
33Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
34Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
35Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
36Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
37Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
38Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
39Densification of Thin Aluminum Oxide Films by Thermal Treatments
40Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
41Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
42Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
43Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
44Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
45Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
46Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
47Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
48Evaluation of plasma parameters on PEALD deposited TaCN
49Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
50Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
51GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
52Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
53Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
54Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
55High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
56High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
57High-Reflective Coatings For Ground and Space Based Applications
58Hydrogen plasma-enhanced atomic layer deposition of copper thin films
59Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
60In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
61Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
62Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
63Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
64Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
65Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
66Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
67Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
68Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
69Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
70Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
71Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
72Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
73Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
74Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
75Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
76Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
77Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
78Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
79PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
80PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
81Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
82Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
83Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
84Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
85Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
86Plasma enhanced atomic layer deposition of SiNx:H and SiO2
87Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
88Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
89Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
90Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
91Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
92Plasma-Assisted Atomic Layer Deposition of Palladium
93Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
94Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
95Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
96Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
97Plasma-enhanced atomic layer deposition of BaTiO3
98Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
99Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
100Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
101Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
102Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
103Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
104Plasma-enhanced atomic layer deposition of superconducting niobium nitride
105Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
106Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
107Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
108Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
109Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
110Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
111Plasma-enhanced atomic layer deposition of titanium vanadium nitride
112Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
113Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
114Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
115Properties of AlN grown by plasma enhanced atomic layer deposition
116Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
117Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
118Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
119Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
120Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
121Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
122Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
123Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
124Remote Plasma ALD of Platinum and Platinum Oxide Films
125Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
126Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
127Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
128Room-Temperature Atomic Layer Deposition of Platinum
129Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
130Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
131Structural and optical characterization of low-temperature ALD crystalline AlN
132Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
133Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
134Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
135Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
136Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
137Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
138Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
139The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
140Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
141Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
142Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
143TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
144Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
145Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
146Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
147ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium