Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 128 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A route to low temperature growth of single crystal GaN on sapphire
4Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
7Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
8Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
9Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
10Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
11Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
12Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
13Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
14Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
15Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
16Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
17Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
18Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
19Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
20Breakdown and Protection of ALD Moisture Barrier Thin Films
21Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
22Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
23Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
24Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
25Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
26Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
27Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
28Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
29Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
30Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
31Densification of Thin Aluminum Oxide Films by Thermal Treatments
32Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
33Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
34Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
35Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
36Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
37Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
38Evaluation of plasma parameters on PEALD deposited TaCN
39Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
40GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
41Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
42Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
43Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
44High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
45High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
46High-Reflective Coatings For Ground and Space Based Applications
47Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
48Hydrogen plasma-enhanced atomic layer deposition of copper thin films
49In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
50Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
51Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
52Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
53Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
54Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
55Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
56Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
57Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
58Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
59Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
60Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
61Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
62Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
63Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
64Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
65Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
66Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
67Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
68Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
69PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
70PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
71Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
72Plasma enhanced atomic layer deposition of SiNx:H and SiO2
73Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
74Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
75Plasma-Assisted Atomic Layer Deposition of Palladium
76Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
77Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
78Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
79Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
80Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
81Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
82Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
83Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
84Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
85Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
86Plasma-enhanced atomic layer deposition of superconducting niobium nitride
87Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
88Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
89Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
90Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
91Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
92Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
93Plasma-enhanced atomic layer deposition of titanium vanadium nitride
94Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
95Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
96Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
97Properties of AlN grown by plasma enhanced atomic layer deposition
98Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
99Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
100Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
101Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
102Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
103Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
104Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
105Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition
106Remote Plasma ALD of Platinum and Platinum Oxide Films
107Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
108Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
109Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
110Room-Temperature Atomic Layer Deposition of Platinum
111Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
112Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
113Structural and optical characterization of low-temperature ALD crystalline AlN
114Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
115Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
116Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
117Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
118Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
119Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
120Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
121The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
122Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
123Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
124TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
125Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
126Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
127Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
128ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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