Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 199 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
2Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
3Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
4Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
5Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
6Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
7Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
8Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
9Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
10Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
11Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
12Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
13Plasma-enhanced atomic layer deposition of superconducting niobium nitride
14Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
15Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
16A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
17Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
18Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
19Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
20Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
21Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
22Remote Plasma ALD of Platinum and Platinum Oxide Films
23Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
24Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
25Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
26Evaluation of plasma parameters on PEALD deposited TaCN
27Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
28Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
29A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
30Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
31ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
32Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
33Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
34Properties of AlN grown by plasma enhanced atomic layer deposition
35Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
36Plasma-enhanced atomic layer deposition of titanium vanadium nitride
37Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
38Structural and optical characterization of low-temperature ALD crystalline AlN
39Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
40GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
41Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
42Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
43Hydrogen plasma-enhanced atomic layer deposition of copper thin films
44Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
45Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
46A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
47Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
48Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
49Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
50Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
51Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
52Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
53Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
54Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
55Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
56Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
57Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
58Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
59Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
60Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
61Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
62Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
63High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
64PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
65Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
66Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
67High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
68Plasma-enhanced atomic layer deposition of BaTiO3
69Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
70Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
71Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
72Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
73Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
74Sub-nanometer heating depth of atomic layer annealing
75Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
76Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
77Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
78Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
79Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
80A route to low temperature growth of single crystal GaN on sapphire
81Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
82Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
83Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
84Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
85Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
86Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
87Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
88Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
89Plasma-Assisted Atomic Layer Deposition of Palladium
90Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
91Atomic layer deposition of InN using trimethylindium and ammonia plasma
92Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
93Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
94Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
95Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
96Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
97Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
98Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
99Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
100Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
101Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
102Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
103Breakdown and Protection of ALD Moisture Barrier Thin Films
104Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
105Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
106Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
107Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
108Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
109Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
110Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
111Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
112Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
113Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
114Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
115Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
116Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
117Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
118Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
119Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
120Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
121Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
122Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
123Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
124Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
125Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
126The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
127Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
128Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
129High-Reflective Coatings For Ground and Space Based Applications
130In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
131PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
132Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
133Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
134Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
135ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
136Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
137Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
138Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
139Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
140Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
141Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
142Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
143Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
144Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
145Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
146Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
147High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
148Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
149Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
150Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
151Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
152Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
153Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
154Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
155Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
156Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
157Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
158Room-Temperature Atomic Layer Deposition of Platinum
159Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
160Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
161Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
162Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
163Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
164Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
165Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
166Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
167Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
168Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
169Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
170Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
171Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
172Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
173Densification of Thin Aluminum Oxide Films by Thermal Treatments
174Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
175Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
176Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
177Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
178Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
179Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
180Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
181Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
182Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
183Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
184Plasma enhanced atomic layer deposition of SiNx:H and SiO2
185Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
186Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
187TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
188Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
189Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
190Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
191Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
192Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes