2021 Year in Review

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Effect of atomic layer plasma treatment on TALD-ZrO₂ film to improve the corrosion protection of Mg-Ca alloy Deposition and Characterization of RP-ALD SiO₂ Thin Films with Different Oxygen Plasma Powers Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation

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Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 182 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3	A route to low temperature growth of single crystal GaN on sapphire
4	Al₂O₃/TiO₂ multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6	Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
7	Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
8	Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
9	Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
10	Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
11	Area selective deposition of TiO₂ by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
12	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnO_x as conductive gas diffusion barrier
13	Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
14	Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
15	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
16	Atomic layer deposition of AlN from AlCl₃ using NH₃ and Ar/NH₃ plasma
17	Atomic layer deposition of aluminum fluoride using Al(CH₃)₃ and SF₆ plasma
18	Atomic Layer Deposition of Aluminum Phosphate Using AlMe₃, PO(OMe)₃, and O₂ Plasma: Film Growth and Surface Reactions
19	Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
20	Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O₂ plasma
21	Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
22	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)₂ and H₂ and O₂ Plasmas
23	Atomic layer deposition of InN using trimethylindium and ammonia plasma
24	Atomic layer deposition of LiF using LiN(SiMe₃)₂ and SF₆ plasma
25	Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
26	Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
27	Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
28	Atomic layer deposition of Ru from CpRu(CO)₂Et using O₂ gas and O₂ plasma
29	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
30	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N₂ Plasma
31	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N₂ Plasma on Planar and 3D Substrate Topographies
32	Atomic layer deposition of WN_x thin films using a F-free tungsten metal-organic precursor and NH₃ plasma as a Cu-diffusion barrier
33	Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
34	Atomic scale surface modification of TiO₂ 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
35	Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
36	Breakdown and Protection of ALD Moisture Barrier Thin Films
37	Characteristics of an Al₂O₃ Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N₂O Plasma
38	Characterization of plasma-enhanced atomic layer deposition of Al₂O₃ using dimethylaluminum isopropoxide
39	Chemical Reaction Mechanism in the Atomic Layer Deposition of TaC_xN_y Films Using tert-Butylimidotris(diethylamido)tantalum
40	Chemical, optical, and electrical characterization of Ga₂O₃ thin films grown by plasma-enhanced atomic layer deposition
41	Co₃O₄ as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
42	Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
43	Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
44	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
45	Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
46	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
47	Controlling mechanical, structural, and optical properties of Al₂O₃ thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
48	Correlation between SiO₂ growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
49	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
50	Densification of Thin Aluminum Oxide Films by Thermal Treatments
51	Deposition of Al₂O₃ by Using ECR-ALD for Organic Substrate Devices
52	Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
53	Edge-Site Nanoengineering of WS₂ by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
54	Effect of an Al₂O₃/TiO₂ Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
55	Effect of atomic layer plasma treatment on TALD-ZrO₂ film to improve the corrosion protection of Mg-Ca alloy
56	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
57	Effective work function tunability and interfacial reactions with underlying HfO₂ layer of plasma-enhanced atomic layer deposited TaC_xN_y films
58	Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
59	Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
60	Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
61	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
62	Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
63	Engineering high quality and conformal ultrathin SiN_x films by PEALD for downscaled and advanced CMOS nodes
64	Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
65	Evaluation of plasma parameters on PEALD deposited TaCN
66	Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
67	Film properties of low temperature HfO₂ grown with H₂O, O₃, or remote O₂-plasma
68	GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
69	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
70	Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
71	Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
72	Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
73	High Energy Density Capacitor By Plasma-Treated ALD BaTiO₃ Thin Films
74	High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
75	High-Reflective Coatings For Ground and Space Based Applications
76	Hydrogen plasma-enhanced atomic layer deposition of copper thin films
77	Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
78	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
79	Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
80	Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
81	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al₂O₃
82	Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al₂O₃
83	Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
84	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl₄ and N₂/H₂/Ar radicals
85	Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
86	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
87	Low temperature SiO_x thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
88	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
89	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
90	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
91	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
92	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
93	Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO₂ as an Electron Transport Layer in Planar Perovskite Solar Cells
94	Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO₂ Using Carbon Dioxide
95	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al₂O₃ films on GaAs and Si
96	Moisture Barrier Properties of Al₂O₃ Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
97	Nucleation and growth of Pt atomic layer deposition on Al₂O₃ substrates using (methylcyclopentadienyl)-trimethyl platinum and O₂ plasma
98	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
99	PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
100	PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
101	Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
102	Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH₃
103	Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH₃ Plasma
104	Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
105	Plasma Enhanced Atomic Layer Deposition of SiN:H Using N₂ and Silane
106	Plasma enhanced atomic layer deposition of SiN_x:H and SiO₂
107	Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
108	Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
109	Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF₆ based plasmas
110	Plasma-Assisted ALD of Highly Conductive HfN_x: On the Effect of Energetic Ions on Film Microstructure
111	Plasma-assisted atomic layer deposition of Al₂O₃ moisture permeation barriers on polymers
112	Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
113	Plasma-Assisted Atomic Layer Deposition of Palladium
114	Plasma-Assisted Atomic Layer Deposition of SrTiO₃: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
115	Plasma-assisted atomic layer deposition of Ta₂O₅ from alkylamide precursor and remote O₂ plasma
116	Plasma-Enhanced ALD of TiO₂ Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe₂)₃] and O₂ Plasma
117	Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
118	Plasma-enhanced atomic layer deposition of BaTiO₃
119	Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)₂ as a Metal Precursor
120	Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
121	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
122	Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
123	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
124	Plasma-enhanced atomic layer deposition of SnO₂ thin films using SnCl₄ and O₂ plasma
125	Plasma-enhanced atomic layer deposition of superconducting niobium nitride
126	Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
127	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
128	Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
129	Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N₂/H₂/Ar Plasma
130	Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
131	Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
132	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
133	Plasma-enhanced atomic layer deposition of titanium vanadium nitride
134	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)₂(Me₂N)₂W and O₂ plasma
135	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
136	Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
137	Properties of AlN grown by plasma enhanced atomic layer deposition
138	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
139	Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
140	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
141	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
142	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
143	Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
144	Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
145	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al₂O₃ films deposited by remote plasma atomic layer deposition
146	Remote Plasma ALD of Platinum and Platinum Oxide Films
147	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
148	Remote Plasma Atomic Layer Deposition of Co₃O₄ Thin Film
149	Room temperature plasma enhanced atomic layer deposition for TiO₂ and WO₃ films
150	Room-Temperature Atomic Layer Deposition of Platinum
151	Selective deposition of Ta₂O₅ by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
152	Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
153	Structural and optical characterization of low-temperature ALD crystalline AlN
154	Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
155	Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
156	Study of Y₂O₃ Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
157	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
158	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
159	Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
160	Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
161	Synthesis and in situ characterization of low-resistivity TaN_x films by remote plasma atomic layer deposition
162	The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
163	Thermal and plasma enhanced atomic layer deposition of SiO₂ using commercial silicon precursors
164	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
165	Thermal conductivity of ultrathin BaTiO₃ films grown by plasma-assisted atomic layer deposition
166	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
167	TiCl₄ as a Precursor in the TiN Deposition by ALD and PEALD
168	Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
169	Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
170	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
171	Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
172	Understanding the mechanisms of interfacial reactions during TiO₂ layer growth on RuO₂ by atomic layer deposition with O₂ plasma or H₂O as oxygen source
173	Working gas effect on properties of Al₂O₃ film in plasma-enhanced atomic layer deposition
174	ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
175	ZrO₂ Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium