Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 189 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
2PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
3Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
4Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
5Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
6Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
7Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
8Remote Plasma ALD of Platinum and Platinum Oxide Films
9Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
10Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
11Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
12Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
13Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
14Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
15Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
16Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
17Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
18Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
19Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
20Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
21Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
22Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
23Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
24Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
25Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
26Plasma-enhanced atomic layer deposition of titanium vanadium nitride
27Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
28Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
29A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
30Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
31Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
32Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
33GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
34Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
35Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
36Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
37Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
38Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
39Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
40Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
41Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
42Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
43Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
44Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
45Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
46Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
47Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
48The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
49Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
50Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
51Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
52Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
53Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
54Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
55Plasma-Assisted Atomic Layer Deposition of Palladium
56Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
57Evaluation of plasma parameters on PEALD deposited TaCN
58Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
59Atomic layer deposition of InN using trimethylindium and ammonia plasma
60Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
61Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
62Room-Temperature Atomic Layer Deposition of Platinum
63Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
64Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
65Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
66TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
67Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
68A route to low temperature growth of single crystal GaN on sapphire
69Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
70Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
71Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
72Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
73Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
74Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
75Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
76Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
77Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
78PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
79High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
80Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
81Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
82Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
83Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
84Structural and optical characterization of low-temperature ALD crystalline AlN
85Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
86Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
87Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
88Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
89Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
90Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
91Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
92A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
93Densification of Thin Aluminum Oxide Films by Thermal Treatments
94Plasma enhanced atomic layer deposition of SiNx:H and SiO2
95Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
96Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
97Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
98Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
99Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
100Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
101Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
102Plasma-enhanced atomic layer deposition of superconducting niobium nitride
103Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
104Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
105Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
106Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
107Properties of AlN grown by plasma enhanced atomic layer deposition
108Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
109Breakdown and Protection of ALD Moisture Barrier Thin Films
110Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
111Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
112Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
113Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
114Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
115Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
116Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
117Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
118Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
119Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
120Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
121Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
122Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
123Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
124Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
125Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
126Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
127Sub-nanometer heating depth of atomic layer annealing
128Plasma-enhanced atomic layer deposition of BaTiO3
129Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
130Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
131Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
132Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
133Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
134Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
135Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
136Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
137Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
138ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
139Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
140Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
141Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
142Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
143Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
144Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
145Hydrogen plasma-enhanced atomic layer deposition of copper thin films
146Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
147Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
148A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
149Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
150High-Reflective Coatings For Ground and Space Based Applications
151Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
152Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
153Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
154Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
155Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
156ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
157Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
158Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
159Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
160Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
161Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
162Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
163Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
164Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
165Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
166In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
167Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
168Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
169High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
170Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
171High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
172Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
173Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
174Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
175Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
176Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
177Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
178Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
179Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
180Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
181Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
182Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage