Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 143 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A route to low temperature growth of single crystal GaN on sapphire
4Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
7Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
8Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
9Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
10Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
11Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
12Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
13Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
14Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
15Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
16Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
17Atomic layer deposition of InN using trimethylindium and ammonia plasma
18Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
19Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
20Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
21Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
22Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
23Breakdown and Protection of ALD Moisture Barrier Thin Films
24Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
25Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
26Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
27Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
28Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
29Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
30Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
31Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
32Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
33Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
34Densification of Thin Aluminum Oxide Films by Thermal Treatments
35Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
36Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
37Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
38Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
39Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
40Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
41Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
42Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
43Evaluation of plasma parameters on PEALD deposited TaCN
44Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
45Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
46GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
47Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
48Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
49Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
50High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
51High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
52High-Reflective Coatings For Ground and Space Based Applications
53Hydrogen plasma-enhanced atomic layer deposition of copper thin films
54Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
55In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
56Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
57Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
58Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
59Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
60Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
61Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
62Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
63Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
64Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
65Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
66Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
67Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
68Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
69Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
70Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
71Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
72Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
73PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
74PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
75Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
76Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
77Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
78Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
79Plasma enhanced atomic layer deposition of SiNx:H and SiO2
80Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
81Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
82Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
83Plasma-Assisted Atomic Layer Deposition of Palladium
84Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
85Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
86Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
87Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
88Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
89Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
90Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
91Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
92Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
93Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
94Plasma-enhanced atomic layer deposition of superconducting niobium nitride
95Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
96Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
97Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
98Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
99Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
100Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
101Plasma-enhanced atomic layer deposition of titanium vanadium nitride
102Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
103Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
104Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
105Properties of AlN grown by plasma enhanced atomic layer deposition
106Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
107Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
108Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
109Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
110Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
111Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
112Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
113Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
114Remote Plasma ALD of Platinum and Platinum Oxide Films
115Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
116Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
117Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
118Room-Temperature Atomic Layer Deposition of Platinum
119Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
120Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
121Structural and optical characterization of low-temperature ALD crystalline AlN
122Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
123Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
124Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
125Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
126Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
127Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
128Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
129The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
130Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
131Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
132TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
133Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
134Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
135Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
136ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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