Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 117 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A route to low temperature growth of single crystal GaN on sapphire
4Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
7Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
8Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
9Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
10Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
11Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
12Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
13Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
14Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
15Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
16Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
17Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
18Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
19Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
20Breakdown and Protection of ALD Moisture Barrier Thin Films
21Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
22Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
23Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
24Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
25Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
26Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
27Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
28Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
29Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
30Densification of Thin Aluminum Oxide Films by Thermal Treatments
31Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
32Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
33Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
34Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
35Evaluation of plasma parameters on PEALD deposited TaCN
36Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
37GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
38Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
39Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
40Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
41High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
42High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
43High-Reflective Coatings For Ground and Space Based Applications
44Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
45Hydrogen plasma-enhanced atomic layer deposition of copper thin films
46Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
47Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
48Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
49Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
50Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
51Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
52Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
53Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
54Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
55Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
56Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
57Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
58Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
59Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
60Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
61Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
62PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
63PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
64Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
65Plasma enhanced atomic layer deposition of SiNx:H and SiO2
66Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
67Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
68Plasma-Assisted Atomic Layer Deposition of Palladium
69Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
70Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
71Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
72Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
73Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
74Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
75Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
76Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
77Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
78Plasma-enhanced atomic layer deposition of superconducting niobium nitride
79Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
80Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
81Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
82Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
83Plasma-enhanced atomic layer deposition of titanium vanadium nitride
84Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
85Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
86Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
87Properties of AlN grown by plasma enhanced atomic layer deposition
88Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
89Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
90Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
91Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
92Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
93Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
94Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
95Remote Plasma ALD of Platinum and Platinum Oxide Films
96Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
97Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
98Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
99Room-Temperature Atomic Layer Deposition of Platinum
100Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
101Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
102Structural and optical characterization of low-temperature ALD crystalline AlN
103Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
104Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
105Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
106Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition
107Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
108Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
109Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
110The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
111Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
112Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
113TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
114Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
115Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
116Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
117ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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