Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 182 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A route to low temperature growth of single crystal GaN on sapphire
4Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
7Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
8Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
9Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
10Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
11Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
12Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
13Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
14Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
15Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
16Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
17Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
18Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
19Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
20Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
21Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
22Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
23Atomic layer deposition of InN using trimethylindium and ammonia plasma
24Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
25Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
26Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
27Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
28Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
29Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
30Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
31Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
32Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
33Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
34Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
35Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
36Breakdown and Protection of ALD Moisture Barrier Thin Films
37Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
38Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
39Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
40Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
41Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
42Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
43Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
44Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
45Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
46Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
47Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
48Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
49Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
50Densification of Thin Aluminum Oxide Films by Thermal Treatments
51Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
52Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
53Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
54Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
55Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
56Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
57Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
58Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
59Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
60Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
61Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
62Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
63Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
64Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
65Evaluation of plasma parameters on PEALD deposited TaCN
66Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
67Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
68GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
69Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
70Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
71Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
72Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
73High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
74High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
75High-Reflective Coatings For Ground and Space Based Applications
76Hydrogen plasma-enhanced atomic layer deposition of copper thin films
77Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
78In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
79Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
80Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
81Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
82Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
83Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
84Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
85Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
86Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
87Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
88Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
89Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
90Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
91Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
92Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
93Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
94Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
95Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
96Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
97Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
98Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
99PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
100PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
101Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
102Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
103Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
104Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
105Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
106Plasma enhanced atomic layer deposition of SiNx:H and SiO2
107Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
108Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
109Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
110Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
111Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
112Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
113Plasma-Assisted Atomic Layer Deposition of Palladium
114Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
115Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
116Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
117Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
118Plasma-enhanced atomic layer deposition of BaTiO3
119Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
120Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
121Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
122Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
123Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
124Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
125Plasma-enhanced atomic layer deposition of superconducting niobium nitride
126Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
127Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
128Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
129Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
130Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
131Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
132Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
133Plasma-enhanced atomic layer deposition of titanium vanadium nitride
134Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
135Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
136Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
137Properties of AlN grown by plasma enhanced atomic layer deposition
138Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
139Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
140Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
141Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
142Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
143Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
144Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
145Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
146Remote Plasma ALD of Platinum and Platinum Oxide Films
147Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
148Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
149Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
150Room-Temperature Atomic Layer Deposition of Platinum
151Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
152Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
153Structural and optical characterization of low-temperature ALD crystalline AlN
154Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
155Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
156Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
157Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
158Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
159Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
160Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
161Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
162The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
163Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
164Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
165Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
166Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
167TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
168Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
169Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
170Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
171Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
172Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
173Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
174ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
175ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium