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Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 199 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
2Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
3Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
4Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
5Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
6High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
7Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
8Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
9Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
10Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
11Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
12Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
13Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
14Remote Plasma ALD of Platinum and Platinum Oxide Films
15Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
16Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
17A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
18Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
19Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
20Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
21Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
22Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
23Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
24Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
25Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
26Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
27Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
28High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
29Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
30Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
31Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
32Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
33Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
34Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
35Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
36Evaluation of plasma parameters on PEALD deposited TaCN
37Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
38Plasma-enhanced atomic layer deposition of BaTiO3
39Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
40Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
41Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
42Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
43Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
44Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
45Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
46Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
47High-Reflective Coatings For Ground and Space Based Applications
48Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
49Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
50Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
51Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
52Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
53Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
54Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
55Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
56Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
57Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
58Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
59High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
60Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
61Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
62Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
63Plasma-enhanced atomic layer deposition of titanium vanadium nitride
64Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
65A route to low temperature growth of single crystal GaN on sapphire
66Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
67Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
68Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
69Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
70Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
71Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
72Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
73Sub-nanometer heating depth of atomic layer annealing
74Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
75Plasma-Assisted Atomic Layer Deposition of Palladium
76PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
77Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
78Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
79Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
80Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
81Room-Temperature Atomic Layer Deposition of Platinum
82Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
83Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
84GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
85Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
86Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
87Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
88Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
89In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
90Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
91Properties of AlN grown by plasma enhanced atomic layer deposition
92Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
93Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
94Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
95Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
96Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
97Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
98Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
99Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
100Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
101Plasma-enhanced atomic layer deposition of superconducting niobium nitride
102Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
103Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
104Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
105Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
106Hydrogen plasma-enhanced atomic layer deposition of copper thin films
107Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
108Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
109Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
110Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
111Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
112Breakdown and Protection of ALD Moisture Barrier Thin Films
113Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
114Densification of Thin Aluminum Oxide Films by Thermal Treatments
115Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
116Plasma enhanced atomic layer deposition of SiNx:H and SiO2
117Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
118Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
119Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
120Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
121Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
122Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
123Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
124Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
125Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
126Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
127Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
128Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
129Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
130Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
131Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
132Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
133Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
134Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
135Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
136Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
137Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
138Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
139Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
140Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
141Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
142Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
143Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
144Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
145Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
146Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
147Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
148Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
149Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
150Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
151Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
152Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
153Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
154Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
155A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
156Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
157Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
158ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
159ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
160Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
161TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
162Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
163Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
164Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
165PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
166Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
167Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
168Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
169Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
170Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
171Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
172Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
173The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
174Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
175Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
176Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
177Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
178Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
179A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
180Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
181Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
182Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
183Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
184Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
185Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
186Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
187Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
188Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
189Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
190Atomic layer deposition of InN using trimethylindium and ammonia plasma
191Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
192Structural and optical characterization of low-temperature ALD crystalline AlN