Density Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
2Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
3Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
4PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
5Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
6Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
7Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
8Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
9Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
10Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
11Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
12Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
13Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
14Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
15Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
16Hydrogen plasma-enhanced atomic layer deposition of copper thin films
17Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
18Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
19Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
20Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
21Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
22Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
23Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
24Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
25Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
26Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
27Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
28High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
29Room-Temperature Atomic Layer Deposition of Platinum
30Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
31Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
32Plasma-Assisted Atomic Layer Deposition of Palladium
33Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
34Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
35Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
36Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
37Plasma enhanced atomic layer deposition of SiNx:H and SiO2
38GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
39Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
40Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
41Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
42Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
43Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
44Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
45ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
46A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
47Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
48Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
49Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
50Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
51Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
52Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
53Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
54Structural and optical characterization of low-temperature ALD crystalline AlN
55Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
56Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
57Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
58Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
59Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
60Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
61Breakdown and Protection of ALD Moisture Barrier Thin Films
62Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
63In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
64Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
65Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
66Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
67Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
68PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
69Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
70Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
71Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
72Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
73Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
74Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
75Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
76Densification of Thin Aluminum Oxide Films by Thermal Treatments
77Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
78Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
79Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
80Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
81Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
82Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
83Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
84Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
85Plasma-enhanced atomic layer deposition of titanium vanadium nitride
86Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
87Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
88A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
89Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
90Plasma-enhanced atomic layer deposition of BaTiO3
91Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
92Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
93Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
94Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
95Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
96Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
97Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
98Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
99Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
100Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
101Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
102Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
103Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
104Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
105Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
106Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
107Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
108Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
109Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
110Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
111Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
112Evaluation of plasma parameters on PEALD deposited TaCN
113Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
114Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
115High-Reflective Coatings For Ground and Space Based Applications
116Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
117Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
118Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
119Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
120Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
121The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
122Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
123Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
124Plasma-enhanced atomic layer deposition of superconducting niobium nitride
125Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
126Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
127Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
128Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
129Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
130Sub-nanometer heating depth of atomic layer annealing
131Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
132Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
133Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
134Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
135Properties of AlN grown by plasma enhanced atomic layer deposition
136Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
137Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
138Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
139Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
140Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
141Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
142Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
143Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
144Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
145Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
146Remote Plasma ALD of Platinum and Platinum Oxide Films
147Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
148Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
149Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
150Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
151Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
152A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
153Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
154Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
155Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
156Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
157High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
158Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
159ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
160Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
161Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
162Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
163Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
164Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
165Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
166Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
167Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
168Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
169Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
170A route to low temperature growth of single crystal GaN on sapphire
171Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
172Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
173Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
174Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
175Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
176Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
177Atomic layer deposition of InN using trimethylindium and ammonia plasma
178Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
179Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
180Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
181TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
182Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
183Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
184Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
185High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
186Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
187Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
188Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
189Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
190Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
191Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
192Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma