Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 173 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A route to low temperature growth of single crystal GaN on sapphire
4Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
7Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
8Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
9Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
10Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
11Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
12Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
13Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
14Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
15Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
16Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
17Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
18Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
19Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
20Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
21Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
22Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
23Atomic layer deposition of InN using trimethylindium and ammonia plasma
24Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
25Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
26Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
27Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
28Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
29Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
30Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
31Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
32Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
33Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
34Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
35Breakdown and Protection of ALD Moisture Barrier Thin Films
36Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
37Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
38Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
39Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
40Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
41Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
42Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
43Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
44Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
45Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
46Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
47Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
48Densification of Thin Aluminum Oxide Films by Thermal Treatments
49Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
50Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
51Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
52Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
53Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
54Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
55Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
56Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
57Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
58Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
59Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
60Evaluation of plasma parameters on PEALD deposited TaCN
61Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
62Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
63GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
64Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
65Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
66Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
67High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
68High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
69High-Reflective Coatings For Ground and Space Based Applications
70Hydrogen plasma-enhanced atomic layer deposition of copper thin films
71Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
72In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
73Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
74Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
75Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
76Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
77Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
78Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
79Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
80Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
81Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
82Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
83Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
84Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
85Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
86Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
87Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
88Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
89Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
90Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
91Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
92PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
93PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
94Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
95Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
96Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
97Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
98Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
99Plasma enhanced atomic layer deposition of SiNx:H and SiO2
100Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
101Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
102Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
103Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
104Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
105Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
106Plasma-Assisted Atomic Layer Deposition of Palladium
107Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
108Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
109Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
110Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
111Plasma-enhanced atomic layer deposition of BaTiO3
112Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
113Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
114Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
115Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
116Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
117Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
118Plasma-enhanced atomic layer deposition of superconducting niobium nitride
119Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
120Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
121Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
122Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
123Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
124Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
125Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
126Plasma-enhanced atomic layer deposition of titanium vanadium nitride
127Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
128Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
129Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
130Properties of AlN grown by plasma enhanced atomic layer deposition
131Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
132Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
133Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
134Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
135Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
136Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
137Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
138Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
139Remote Plasma ALD of Platinum and Platinum Oxide Films
140Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
141Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
142Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
143Room-Temperature Atomic Layer Deposition of Platinum
144Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
145Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
146Structural and optical characterization of low-temperature ALD crystalline AlN
147Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
148Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
149Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
150Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
151Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
152Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
153Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
154Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
155The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
156Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
157Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
158Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
159Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
160TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
161Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
162Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
163Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
164Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
165ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
166ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium