Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 141 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A route to low temperature growth of single crystal GaN on sapphire
4Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
7Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
8Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
9Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
10Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
11Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
12Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
13Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
14Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
15Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
16Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
17Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
18Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
19Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
20Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
21Breakdown and Protection of ALD Moisture Barrier Thin Films
22Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
23Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
24Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
25Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
26Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
27Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
28Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
29Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
30Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
31Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
32Densification of Thin Aluminum Oxide Films by Thermal Treatments
33Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
34Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
35Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
36Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
37Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
38Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
39Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
40Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
41Evaluation of plasma parameters on PEALD deposited TaCN
42Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
43Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
44GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
45Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
46Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
47Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
48High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
49High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
50High-Reflective Coatings For Ground and Space Based Applications
51Hydrogen plasma-enhanced atomic layer deposition of copper thin films
52Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
53In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
54Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
55Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
56Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
57Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
58Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
59Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
60Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
61Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
62Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
63Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
64Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
65Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
66Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
67Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
68Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
69Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
70Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
71PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
72PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
73Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
74Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
75Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
76Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
77Plasma enhanced atomic layer deposition of SiNx:H and SiO2
78Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
79Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
80Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
81Plasma-Assisted Atomic Layer Deposition of Palladium
82Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
83Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
84Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
85Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
86Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
87Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
88Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
89Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
90Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
91Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
92Plasma-enhanced atomic layer deposition of superconducting niobium nitride
93Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
94Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
95Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
96Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
97Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
98Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
99Plasma-enhanced atomic layer deposition of titanium vanadium nitride
100Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
101Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
102Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
103Properties of AlN grown by plasma enhanced atomic layer deposition
104Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
105Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
106Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
107Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
108Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
109Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
110Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
111Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
112Remote Plasma ALD of Platinum and Platinum Oxide Films
113Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
114Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
115Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
116Room-Temperature Atomic Layer Deposition of Platinum
117Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
118Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
119Structural and optical characterization of low-temperature ALD crystalline AlN
120Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
121Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
122Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
123Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
124Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
125Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
126Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
127The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
128Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
129Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
130TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
131Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
132Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
133Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
134ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium


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