Density Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Density returned 169 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A route to low temperature growth of single crystal GaN on sapphire
4Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
6Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
7Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
8Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
9Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
10Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
11Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
12Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
13Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
14Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
15Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
16Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
17Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
18Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
19Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
20Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
21Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
22Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
23Atomic layer deposition of InN using trimethylindium and ammonia plasma
24Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
25Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
26Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
27Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
28Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
29Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
30Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
31Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
32Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
33Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
34Breakdown and Protection of ALD Moisture Barrier Thin Films
35Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
36Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
37Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
38Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
39Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
40Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
41Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
42Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
43Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
44Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
45Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
46Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
47Densification of Thin Aluminum Oxide Films by Thermal Treatments
48Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
49Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
50Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
51Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
52Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
53Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
54Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
55Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
56Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
57Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
58Evaluation of plasma parameters on PEALD deposited TaCN
59Evaluation of Stress Induced by Plasma Assisted ALD SiN Film
60Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
61GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
62Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
63Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
64Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
65High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
66High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
67High-Reflective Coatings For Ground and Space Based Applications
68Hydrogen plasma-enhanced atomic layer deposition of copper thin films
69Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
70In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
71Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
72Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
73Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
74Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
75Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
76Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
77Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
78Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
79Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
80Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
81Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
82Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
83Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
84Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
85Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
86Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
87Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
88Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
89Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
90PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
91PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
92Phase Formation in the Tantalum Carbonitride Film Deposited with Atomic Layer Deposition Using Ammonia
93Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
94Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
95Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane
96Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
97Plasma enhanced atomic layer deposition of SiNx:H and SiO2
98Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
99Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
100Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
101Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
102Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
103Plasma-Assisted Atomic Layer Deposition of Palladium
104Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
105Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
106Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
107Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
108Plasma-enhanced atomic layer deposition of BaTiO3
109Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
110Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
111Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
112Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
113Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
114Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
115Plasma-enhanced atomic layer deposition of superconducting niobium nitride
116Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
117Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
118Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
119Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
120Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
121Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
122Plasma-enhanced atomic layer deposition of titanium vanadium nitride
123Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
124Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
125Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
126Properties of AlN grown by plasma enhanced atomic layer deposition
127Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
128Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
129Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
130Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
131Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
132Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
133Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
134Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
135Remote Plasma ALD of Platinum and Platinum Oxide Films
136Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
137Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
138Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
139Room-Temperature Atomic Layer Deposition of Platinum
140Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
141Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
142Structural and optical characterization of low-temperature ALD crystalline AlN
143Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
144Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
145Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
146Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
147Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
148Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
149Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
150Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
151The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
152Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
153Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
154Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
155Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
156TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
157Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
158Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
159Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
160Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
161ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
162ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium