Microstructure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Microstructure returned 99 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
3A route to low temperature growth of single crystal GaN on sapphire
4AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
5Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
6Atmospheric pressure plasma enhanced spatial ALD of silver
7Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
8Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
9Atomic layer deposition of GaN at low temperatures
10Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
11Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
12Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
13Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
14Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
15Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
16Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
17Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
18Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
19Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
20Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
21Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
22Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
23Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
24Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
25Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
26Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
27Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
28Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
29Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
30Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
31Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
32Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
33Gadolinium nitride films deposited using a PEALD based process
34Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
35GeSbTe deposition for the PRAM application
36Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
37Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
38Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
39Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
40HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
41High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
42Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
43Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
44Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
45Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
46In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
47Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
48Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
49Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
50Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
51Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
52Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
53Layer-by-layer epitaxial growth of GaN at low temperatures
54Low temperature plasma enhanced deposition of GaP films on Si substrate
55Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
56Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
57Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
58Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
59Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
60Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
61Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
62Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
63Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
64PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
65PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
66Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
67Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
68Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
69Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
70Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
71Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
72Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
73Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
74Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
75Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
76Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
77Ru thin film grown on TaN by plasma enhanced atomic layer deposition
78Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
79Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
80Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
81Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
82Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
83Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
84Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
85Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
86Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
87TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
88Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
89The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
90The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
91The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
92The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
93Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
94Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
95Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
96Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
97ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
98ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition


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