Microstructure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Microstructure returned 141 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
3A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
4A route to low temperature growth of single crystal GaN on sapphire
5A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
6All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
7AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
8Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
9Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
10Atmospheric pressure plasma enhanced spatial ALD of silver
11Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
12Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
13Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
14Atomic layer deposition of GaN at low temperatures
15Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
16Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
17Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
18Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
19Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
20Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
21Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
22Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
23Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
24Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
25Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
26Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
27Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
28Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
29Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
30Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
31Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
32Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
33Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
34Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
35Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
36Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
37Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
38Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
39Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
40Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
41Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
42Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
43Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
44Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
45Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
46Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
47Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
48Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
49Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
50Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
51Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
52Gadolinium nitride films deposited using a PEALD based process
53Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
54GeSbTe deposition for the PRAM application
55Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
56Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
57Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
58Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
59Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
60Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
61HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
62High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
63Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
64Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
65Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
66Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
67In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
68Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
69Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
70Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
71Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
72Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
73Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
74Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
75Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
76Layer-by-layer epitaxial growth of GaN at low temperatures
77Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
78Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
79Low temperature plasma enhanced deposition of GaP films on Si substrate
80Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
81Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
82Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
83Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
84Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
85Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
86Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
87Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
88Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
89MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
90Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
91Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
92Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
93Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
94Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
95PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
96PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
97Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
98Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
99Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
100Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
101Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
102Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
103Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
104Plasma-enhanced atomic layer deposition of Co on metal surfaces
105Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
106Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
107Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
108Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
109Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
110Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
111Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
112Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
113Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
114Ru thin film grown on TaN by plasma enhanced atomic layer deposition
115Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
116Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
117Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
118Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
119Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
120Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
121Sub-7-nm textured ZrO2 with giant ferroelectricity
122Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
123Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
124Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
125Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
126Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
127TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
128Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
129Texture of atomic layer deposited ruthenium
130The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
131The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
132The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
133The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
134Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
135Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
136Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
137Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
138Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
139ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
140ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition