Microstructure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Microstructure returned 120 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
3A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
4A route to low temperature growth of single crystal GaN on sapphire
5All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
6AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
7Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
8Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
9Atmospheric pressure plasma enhanced spatial ALD of silver
10Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
11Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
12Atomic layer deposition of GaN at low temperatures
13Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
14Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
15Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
16Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
17Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
18Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
19Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
20Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
21Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
22Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
23Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
24Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
25Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
26Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
27Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
28Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
29Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
30Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
31Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
32Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
33Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
34Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
35Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
36Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
37Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
38Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
39Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
40Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
41Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
42Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
43Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
44Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
45Gadolinium nitride films deposited using a PEALD based process
46Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
47GeSbTe deposition for the PRAM application
48Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
49Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
50Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
51Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
52HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
53High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
54Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
55Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
56Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
57Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
58In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
59Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
60Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
61Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
62Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
63Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
64Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
65Layer-by-layer epitaxial growth of GaN at low temperatures
66Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
67Low temperature plasma enhanced deposition of GaP films on Si substrate
68Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
69Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
70Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
71Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
72Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
73Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
74MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
75Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
76Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
77Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
78Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
79PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
80PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
81Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
82Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
83Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
84Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
85Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
86Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
87Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
88Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
89Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
90Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
91Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
92Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
93Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
94Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
95Ru thin film grown on TaN by plasma enhanced atomic layer deposition
96Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
97Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
98Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
99Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
100Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
101Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
102Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
103Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
104Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
105Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
106Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
107TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
108Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
109The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
110The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
111The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
112The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
113Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
114Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
115Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
116Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
117Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
118ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
119ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition