Microstructure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Microstructure returned 150 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
2Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
3Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
4Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
5Atmospheric pressure plasma enhanced spatial ALD of silver
6The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
7MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
8Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
9Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
10PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
11Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
12Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
13Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
14Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
15Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
16Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
17Texture of atomic layer deposited ruthenium
18Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
19Gadolinium nitride films deposited using a PEALD based process
20ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
21Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
22Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
23Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
24Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
25The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
26Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
27Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
28Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
29Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
30Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
31Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
32Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
33A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
34Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
35Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
36Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
37Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
38Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
39Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
40Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
41Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
42Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
43Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
44GeSbTe deposition for the PRAM application
45The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
46Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
47Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
48Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
49Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
50Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
51Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
52Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
53Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
54Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
55Atomic layer deposition of GaN at low temperatures
56Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
57Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
58Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
59In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
60Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
61Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
62Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
63Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
64All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
65A route to low temperature growth of single crystal GaN on sapphire
66Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
67Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
68HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
69Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
70Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
71Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
72Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
73Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
74Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
75A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
76Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
77Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
78Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
79Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
80Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
81Sub-7-nm textured ZrO2 with giant ferroelectricity
82Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
83Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
84ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
85Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
86Layer-by-layer epitaxial growth of GaN at low temperatures
87Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
88Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
89Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
90Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
91Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
92Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
93Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
94PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
95High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
96Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
97Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
98A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
99Plasma-enhanced atomic layer deposition of Co on metal surfaces
100Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
101Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
102Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
103Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
104Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
105Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
106Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
107Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
108Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
109Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
110Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
111Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
112Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
113Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
114Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
115Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
116The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
117Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
118Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
119Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
120Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
121Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
122Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
123Ru thin film grown on TaN by plasma enhanced atomic layer deposition
124Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
125Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
126Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
127Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
128Low temperature plasma enhanced deposition of GaP films on Si substrate
129Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
130Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
131Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
132Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
133Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
134Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
135Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
136Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
137Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
138Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
139Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
140Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
141TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
142A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
143AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
144Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
145Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
146Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
147Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
148Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
149Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition