Microstructure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Microstructure returned 95 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
3A route to low temperature growth of single crystal GaN on sapphire
4Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
5Atmospheric pressure plasma enhanced spatial ALD of silver
6Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
7Atomic layer deposition of GaN at low temperatures
8Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
9Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
10Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
11Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
12Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
13Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
14Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
15Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
16Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
17Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
18Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
19Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
20Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
21Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
22Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
23Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
24Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
25Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
26Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
27Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
28Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
29Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
30Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
31Gadolinium nitride films deposited using a PEALD based process
32Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
33GeSbTe deposition for the PRAM application
34Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
35Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
36Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
37Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
38HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
39High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
40Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
41Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
42Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
43Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
44In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
45Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
46Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
47Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
48Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
49Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
50Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
51Low temperature plasma enhanced deposition of GaP films on Si substrate
52Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
53Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
54Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
55Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
56Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
57Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
58Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
59Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
60PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
61PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
62Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
63Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
64Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
65Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
66Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
67Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
68Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
69Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
70Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
71Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
72Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
73Ru thin film grown on TaN by plasma enhanced atomic layer deposition
74Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
75Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
76Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
77Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
78Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
79Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
80Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
81Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
82Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
83TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
84Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
85The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
86The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
87The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
88The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
89Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
90Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
91Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
92Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
93ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
94ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition


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