Microstructure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Microstructure returned 102 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
3A route to low temperature growth of single crystal GaN on sapphire
4AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
5Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
6Atmospheric pressure plasma enhanced spatial ALD of silver
7Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
8Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
9Atomic layer deposition of GaN at low temperatures
10Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
11Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
12Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
13Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
14Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
15Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
16Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
17Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
18Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
19Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
20Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
21Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
22Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
23Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
24Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
25Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
26Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
27Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
28Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
29Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
30Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
31Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
32Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
33Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
34Gadolinium nitride films deposited using a PEALD based process
35Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
36GeSbTe deposition for the PRAM application
37Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
38Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
39Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
40Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
41HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
42High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
43Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
44Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
45Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
46Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
47In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
48Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
49Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
50Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
51Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
52Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
53Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
54Layer-by-layer epitaxial growth of GaN at low temperatures
55Low temperature plasma enhanced deposition of GaP films on Si substrate
56Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
57Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
58Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
59Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
60Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
61Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
62MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
63Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
64Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
65Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
66PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
67PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
68Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
69Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
70Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
71Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
72Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
73Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
74Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
75Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
76Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
77Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
78Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
79Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
80Ru thin film grown on TaN by plasma enhanced atomic layer deposition
81Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
82Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
83Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
84Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
85Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
86Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
87Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
88Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
89Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
90TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
91Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
92The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
93The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
94The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
95The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
96Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
97Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
98Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
99Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
100ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
101ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition


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