Microstructure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Microstructure returned 123 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
3A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
4A route to low temperature growth of single crystal GaN on sapphire
5All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
6AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
7Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
8Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
9Atmospheric pressure plasma enhanced spatial ALD of silver
10Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
11Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
12Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
13Atomic layer deposition of GaN at low temperatures
14Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
15Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
16Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
17Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
18Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
19Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
20Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
21Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
22Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
23Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
24Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
25Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
26Characteristics of Plasma-Enhanced Atomic Layer Deposited RuSiN as a Diffusion Barrier against Cu
27Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
28Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
29Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
30Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
31Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
32Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
33Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
34Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
35Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
36Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
37Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
38Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
39Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
40Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
41Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
42Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
43Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
44Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
45Formation of Nano-Crystalline Ru-Based Ternary Thin Films by Plasma-Enhanced Atomic Layer Deposition
46Gadolinium nitride films deposited using a PEALD based process
47Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
48GeSbTe deposition for the PRAM application
49Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
50Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
51Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
52Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
53HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
54High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
55Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
56Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
57Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
58Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
59In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
60Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
61Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
62Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
63Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
64Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
65Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
66Layer-by-layer epitaxial growth of GaN at low temperatures
67Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
68Low temperature plasma enhanced deposition of GaP films on Si substrate
69Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
70Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
71Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
72Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
73Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
74Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
75Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
76Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
77MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
78Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
79Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
80Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
81Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
82PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
83PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
84Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
85Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
86Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
87Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
88Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
89Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
90Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
91Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
92Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
93Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
94Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
95Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
96Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
97Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
98Ru thin film grown on TaN by plasma enhanced atomic layer deposition
99Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
100Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
101Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
102Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
103Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
104Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
105Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
106Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
107Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
108Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
109Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
110TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
111Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
112The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
113The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
114The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
115The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
116Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
117Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery
118Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
119Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
120Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
121ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
122ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition