Microstructure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Microstructure returned 85 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
2A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
3A route to low temperature growth of single crystal GaN on sapphire
4Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
5Atmospheric pressure plasma enhanced spatial ALD of silver
6Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
7Atomic layer deposition of GaN at low temperatures
8Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
9Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
10Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
11Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
12Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
13Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
14Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
15Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
16Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
17Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
18Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
19Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
20Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
21Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
22Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
23Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
24Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
25Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
26Gadolinium nitride films deposited using a PEALD based process
27Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
28GeSbTe deposition for the PRAM application
29Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
30Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
31Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
32Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
33HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
34High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
35Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
36Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
37Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
38Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
39In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
40Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
41Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
42Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
43Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
44Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
45Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
46Low temperature plasma enhanced deposition of GaP films on Si substrate
47Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
48Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
49Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
50Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
51Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
52Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
53Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
54Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
55Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
56PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
57Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
58Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
59Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
60Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
61Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
62Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
63Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
64Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
65Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
66Ru thin film grown on TaN by plasma enhanced atomic layer deposition
67Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
68Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
69Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
70Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
71Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
72Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
73Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
74Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
75TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
76Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
77The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
78The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
79The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
80The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
81Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
82Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
83Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
84ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
85ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition


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