Dielectric Constant, Permittivity Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Dielectric Constant, Permittivity returned 144 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
2A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
3Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
4Advances in the fabrication of graphene transistors on flexible substrates
5Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
6Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
7AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
8An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
9Annealing behavior of ferroelectric Si-doped HfO2 thin films
10Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
11Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
12Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
13Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
14Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
15Carbon content control of silicon oxycarbide film with methane containing plasma
16Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
17Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
18Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
19Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
20Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
21Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
22Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
23Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
24Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
25Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
26Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
27Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
28Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
29Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
30Densification of Thin Aluminum Oxide Films by Thermal Treatments
31Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
32Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
33Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
34Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
35Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
36Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
37Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
38Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
39Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
40Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
41Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
42Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
43Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
44Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
45Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
46Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
47Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
48Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
49Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
50Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
51Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
52Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
53Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
54Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
55Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
56Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
57Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
58Fast PEALD ZnO Thin-Film Transistor Circuits
59Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
60Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
61Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
62Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
63Graphene-based MMIC process development and RF passives design
64Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
65Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
66Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
67Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
68High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
69High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
70Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
71Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
72Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
73Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
74Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
75Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
76Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
77In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
78In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
79Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
80Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
81Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
82Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
83Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
84Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
85Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
86Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
87Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
88Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
89Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
90Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
91Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
92Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
93Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
94Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
95Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
96Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
97Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
98Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
99Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
100Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
101Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
102Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
103PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
104PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
105Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
106Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
107Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
108Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane
109Plasma enhanced atomic layer deposition of SiNx:H and SiO2
110Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
111Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
112Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
113Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
114Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
115Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
116Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
117Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
118Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
119Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
120Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
121Propagation Effects in Carbon Nanoelectronics
122Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
123Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
124Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
125Remote Plasma ALD of Platinum and Platinum Oxide Films
126Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
127Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
128Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
129Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
130Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
131Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
132Sub-7-nm textured ZrO2 with giant ferroelectricity
133Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
134Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
135Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
136TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
137Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
138The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
139Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
140TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
141Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
142Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
143Very high frequency plasma reactant for atomic layer deposition