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Conformality, Step Coverage Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Conformality, Step Coverage returned 80 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
2Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
3Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
4ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
5ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
6An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
7Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
8Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
9Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
10Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
11Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
12Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
13Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
14Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
15Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
16Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
17Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
18Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
19Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
20Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
21Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
22Copper-ALD Seed Layer as an Enabler for Device Scaling
23Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
24Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
25Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
26Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
27Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
28Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
29Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
30Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
31Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
32Hydrogen plasma-enhanced atomic layer deposition of copper thin films
33Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
34Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
35Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
36Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
37Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
38Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
39Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
40Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
41Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
42Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
43Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
44NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
45Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
46Plasma enhanced atomic layer deposition of aluminum sulfide thin films
47Plasma enhanced atomic layer deposition of Ga2O3 thin films
48Plasma enhanced atomic layer deposition of SiNx:H and SiO2
49Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
50Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
51Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
52Plasma enhanced atomic layer deposition of zinc sulfide thin films
53Plasma Enhanced Atomic Layer Deposition on Powders
54Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
55Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
56Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
57Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
58Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
59Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
60Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
61Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
62Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
63Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
64Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
65Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
66Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
67Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
68Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
69Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
70Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
71Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
72Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
73Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
74Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
75Study on the characteristics of aluminum thin films prepared by atomic layer deposition
76The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
77Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
78Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
79Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
80Very high frequency plasma reactant for atomic layer deposition


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