1 | Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers |
2 | Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4 |
3 | Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors |
4 | Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2 |
5 | Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma |
6 | Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications |
7 | ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors |
8 | Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance |
9 | Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition |
10 | Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties |
11 | Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects |
12 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
13 | Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma |
14 | Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition |
15 | Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage |
16 | Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma |
17 | Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes |
18 | Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions |
19 | In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential |
20 | Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications |
21 | Hydrogen plasma-enhanced atomic layer deposition of copper thin films |
22 | Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices |
23 | Copper-ALD Seed Layer as an Enabler for Device Scaling |
24 | Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension |
25 | Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition |
26 | Plasma enhanced atomic layer deposition of gallium sulfide thin films |
27 | Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition |
28 | Plasma-Assisted ALD of LiPO(N) for Solid State Batteries |
29 | Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality |
30 | Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries |
31 | Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications |
32 | Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies |
33 | Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition |
34 | Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition |
35 | Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma |
36 | Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications |
37 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
38 | Plasma enhanced atomic layer deposition of SiNx:H and SiO2 |
39 | Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma |
40 | Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition |
41 | A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects |
42 | Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films |
43 | Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications |
44 | A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology |
45 | Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method |
46 | Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies |
47 | ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors |
48 | Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu |
49 | Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization |
50 | Topographically selective deposition |
51 | Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content |
52 | Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2 |
53 | Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films |
54 | Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2 |
55 | Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study |
56 | Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride |
57 | High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane |
58 | Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN |
59 | High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating |
60 | Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD) |
61 | NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors |
62 | Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films |
63 | Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth |
64 | Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films |
65 | Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier |
66 | Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition |
67 | Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition |
68 | An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD |
69 | Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics |
70 | Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition |
71 | Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage |
72 | Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature |
73 | Atomic Layer Deposition of the Conductive Delafossite PtCoO2 |
74 | Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes |
75 | Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors |
76 | Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia |
77 | Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches |
78 | Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films |
79 | Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization |
80 | Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method |
81 | Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten |
82 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
83 | Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process |
84 | Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate |
85 | Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration |
86 | Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM |
87 | Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor |
88 | Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection |
89 | Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors |
90 | Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition |
91 | Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration |
92 | Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors |
93 | Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD) |
94 | Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition |
95 | Study on the characteristics of aluminum thin films prepared by atomic layer deposition |
96 | Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN |
97 | Plasma enhanced atomic layer deposition of aluminum sulfide thin films |
98 | Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation |
99 | Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors |
100 | Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4 |
101 | Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor |
102 | Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects |
103 | Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor |
104 | Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma |
105 | Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma |
106 | Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride |
107 | Plasma Enhanced Atomic Layer Deposition on Powders |
108 | Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers |
109 | Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient |
110 | Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors |
111 | Plasma enhanced atomic layer deposition of zinc sulfide thin films |
112 | Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates |
113 | Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System |
114 | Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma |
115 | Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide |
116 | Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor |
117 | Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage |
118 | Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry |
119 | Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars |
120 | Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material |
121 | Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte |
122 | Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications |
123 | Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent |
124 | Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors |
125 | Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals |
126 | Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes |
127 | Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures |
128 | The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications |
129 | Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films |
130 | Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications |
131 | Very high frequency plasma reactant for atomic layer deposition |
132 | Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition |
133 | Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT) |
134 | Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications |
135 | Plasma enhanced atomic layer deposition of Ga2O3 thin films |
136 | Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment |