Conformality, Step Coverage Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Conformality, Step Coverage returned 136 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
2Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
3Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
4Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
5Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
6Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
7Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
8Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
9Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
10Topographically selective deposition
11Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
12Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
13Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
14A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
15Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
16Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
17Atomic Layer Deposition of the Conductive Delafossite PtCoO2
18ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
19Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
20Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
21NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
22Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
23Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
24Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
25Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
26Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
27Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
28Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
29High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
30Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
31Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
32Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
33Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
34Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
35Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
36Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
37Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
38Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
39Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
40Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
41Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
42Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
43An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
44Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
45Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
46Plasma enhanced atomic layer deposition of SiNx:H and SiO2
47Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
48Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
49Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
50Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
51Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
52Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
53Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
54Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
55In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
56Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
57Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
58Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
59Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
60Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
61Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
62Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
63Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
64Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
65Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
66Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
67Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
68Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
69Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
70Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
71Hydrogen plasma-enhanced atomic layer deposition of copper thin films
72Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
73Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
74Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
75Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
76Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
77Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
78Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
79Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
80Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
81Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
82Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
83Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
84Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
85Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
86Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
87Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
88Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
89Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
90Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
91Plasma enhanced atomic layer deposition of Ga2O3 thin films
92Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
93Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
94Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
95Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
96Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
97Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
98Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
99High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
100Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
101Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
102Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
103Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
104Study on the characteristics of aluminum thin films prepared by atomic layer deposition
105Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
106Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
107Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
108Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
109Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
110Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
111Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
112ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
113Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
114Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
115Plasma enhanced atomic layer deposition of gallium sulfide thin films
116Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
117Very high frequency plasma reactant for atomic layer deposition
118Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
119Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
120A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
121The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
122Plasma enhanced atomic layer deposition of aluminum sulfide thin films
123Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
124Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
125Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
126Plasma Enhanced Atomic Layer Deposition on Powders
127Copper-ALD Seed Layer as an Enabler for Device Scaling
128Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
129Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
130Plasma enhanced atomic layer deposition of zinc sulfide thin films
131Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
132Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
133Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
134Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
135Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
136Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma