Conformality, Step Coverage Plasma Enhanced Atomic Layer Deposition Publications

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NumberTitle
1Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
2Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
3Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
4Plasma Enhanced Atomic Layer Deposition on Powders
5Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
6Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
7Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
8Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
9Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
10Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
11Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
12Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
13Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
14Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
15Plasma enhanced atomic layer deposition of Ga2O3 thin films
16Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
17Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
18Plasma enhanced atomic layer deposition of zinc sulfide thin films
19Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
20Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
21Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
22Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
23Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
24In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
25Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
26Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
27Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
28Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
29Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
30Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
31Hydrogen plasma-enhanced atomic layer deposition of copper thin films
32Atomic Layer Deposition of the Conductive Delafossite PtCoO2
33Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
34Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
35Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
36Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
37Topographically selective deposition
38Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
39Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
40Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
41Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
42Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
43Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
44Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
45Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
46Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
47Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
48Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
49Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
50Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
51Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
52Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
53Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
54Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
55Plasma enhanced atomic layer deposition of gallium sulfide thin films
56Very high frequency plasma reactant for atomic layer deposition
57Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
58ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
59Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
60Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
61Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
62ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
63Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
64Study on the characteristics of aluminum thin films prepared by atomic layer deposition
65Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
66A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
67Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
68Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
69Plasma enhanced atomic layer deposition of aluminum sulfide thin films
70Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
71The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
72Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
73Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
74Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
75Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
76Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
77Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
78Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
79Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
80Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
81Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
82Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
83Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
84Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process
85Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
86Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
87Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
88Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
89Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
90Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
91Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
92Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
93Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
94Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
95Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
96Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
97High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
98Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
99Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
100Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
101Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
102Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
103Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
104Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
105Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
106Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
107Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
108Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
109Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
110Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
111Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
112Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
113Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
114Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
115Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
116Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
117High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
118Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
119Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
120Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
121Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
122Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
123NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
124Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
125Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
126Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
127Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
128Plasma enhanced atomic layer deposition of SiNx:H and SiO2
129Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
130Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
131Copper-ALD Seed Layer as an Enabler for Device Scaling
132Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
133Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
134A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
135Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
136An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD