Capacitance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Capacitance returned 138 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
2Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
3AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
4Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
5Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
6Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
7A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
8ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
9Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
10In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
11Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
12Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
13Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
14Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
15Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
16A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
17Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
18Fast PEALD ZnO Thin-Film Transistor Circuits
19Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
20ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
21Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
22The effects of plasma treatment on the thermal stability of HfO2 thin films
23Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
24Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
25Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
26Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
27Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
28Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
29Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
30Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
31Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
32Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
33Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
34High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
35Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
36Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
37Interface Properties of GaP/Si Heterojunction Fabricated by PE-ALD
38In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
39Capacitance characterization of GaP/n-Si structures grown by PE-ALD
40Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
41Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
42A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
43Oxygen migration in TiO2-based higher-k gate stacks
44Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
45Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
46Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
47Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
48Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
49Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
50Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
51Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
52Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
53Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
54Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
55Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
56Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
57Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
58The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
59Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
60High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
61High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
62Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
63AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
64Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
65Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
66Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
67Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
68Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
69Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
70MANOS performance dependence on ALD Al2O3 oxidation source
71Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
72Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
73Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
74In-gap states in titanium dioxide and oxynitride atomic layer deposited films
75Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
76Nitride passivation of the interface between high-k dielectrics and SiGe
77AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
78Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
79Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
80In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
81Effects of Recessed-Gate Structure on AlGaN/GaN-on-SiC MIS-HEMTs with Thin AlOxNy MIS Gate
82Sub-nanometer heating depth of atomic layer annealing
83Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
84Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
85Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
86Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
87Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
88Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
89Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
90Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
91Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
92Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
93Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
94MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
95Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
96Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
97Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
98Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
99High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
100Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
101Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
102Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
103Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
104The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
105Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
106Experimental and theoretical determination of the role of ions in atomic layer annealing
107Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
108Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
109Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
110Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
111Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
112AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
113The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
114Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
115Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
116Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
117Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
118Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
119Influence of PE-ALD of GaP on the Silicon Wafers Quality
120Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
121Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
122Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
123Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
124Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
125Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
126ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
127Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
128Characteristics of HfO2 thin films grown by plasma atomic layer deposition
129Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
130Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
131PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
132ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
133Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
134Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
135Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
136Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
137Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack