Capacitance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Capacitance returned 99 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
2A Silicon Nitride MIM Capacitor for Analog/Mixed-Signal Integrated Circuit using Manufacturable Atomic Layer Deposition Equipment
3A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
4Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
5Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
6ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
7ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
8AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
9AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
10AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
11Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
12Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
13Capacitance characterization of GaP/n-Si structures grown by PE-ALD
14Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
15Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
16Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
17Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
18Characteristics of HfO2 thin films grown by plasma atomic layer deposition
19Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
20Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
21Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
22Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
23Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
24Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
25Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
26Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
27Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
28Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
29Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
30Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
31Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
32Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
33Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
34Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
35Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
36Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
37Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
38Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
39Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
40Enhanced non-volatile memory characteristics with quattro-layer graphene nanoplatelets vs. 2.85-nm Si nanoparticles with asymmetric Al2O3/HfO2 tunnel oxide
41Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
42Fast PEALD ZnO Thin-Film Transistor Circuits
43Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
44Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
45Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
46High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
47High Mobility (210cm2/Vs), High Capacitance (7.2uF/cm2) ZrO2 on GaN Metal Oxide Semiconductor Capacitor via ALD
48High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
49High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
50Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
51Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack
52Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
53Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
54Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
55Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
56In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
57In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
58In-gap states in titanium dioxide and oxynitride atomic layer deposited films
59Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
60Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
61Influence of PE-ALD of GaP on the Silicon Wafers Quality
62Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
63Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
64Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
65Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
66Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
67Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
68Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
69MANOS performance dependence on ALD Al2O3 oxidation source
70Nitride passivation of the interface between high-k dielectrics and SiGe
71Oxygen migration in TiO2-based higher-k gate stacks
72Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
73PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
74Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
75Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
76Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
77Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
78Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
79Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
80Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
81Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
82Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
83Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
84Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
85Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
86Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
87Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
88Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
89Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
90Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
91Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
92Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
93The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
94The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
95Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
96Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
97Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
98ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
99ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition


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