| 1 | Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions |
| 2 | Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material |
| 3 | Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions |
| 4 | Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition |
| 5 | Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing |
| 6 | Plasma enhanced atomic layer deposition of gallium sulfide thin films |
| 7 | Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition |
| 8 | Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers |
| 9 | Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing |
| 10 | Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers |
| 11 | Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films |
| 12 | Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy |
| 13 | A route to low temperature growth of single crystal GaN on sapphire |
| 14 | Composite materials and nanoporous thin layers made by atomic layer deposition |
| 15 | Low temperature temporal and spatial atomic layer deposition of TiO2 films |
| 16 | Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies |
| 17 | Plasma-enhanced atomic layer deposition of superconducting niobium nitride |
| 18 | Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells |
| 19 | Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition |
| 20 | Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching |
| 21 | Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma |
| 22 | ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies |
| 23 | Optical and Electrical Properties of TixSi1-xOy Films |
| 24 | Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor |
| 25 | Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma |
| 26 | Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes |
| 27 | Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications |
| 28 | Thin film GaP for solar cell application |
| 29 | Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition |
| 30 | GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation |
| 31 | PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity |
| 32 | The role of plasma in plasma-enhanced atomic layer deposition of crystalline films |
| 33 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
| 34 | Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3 |
| 35 | Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces |
| 36 | Optical and Electrical Properties of AlxTi1-xO Films |
| 37 | Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells |
| 38 | Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition |
| 39 | In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells |
| 40 | Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide |
| 41 | Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries |
| 42 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
| 43 | AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition |
| 44 | An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD |
| 45 | Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate |
| 46 | Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma |
| 47 | Atomic layer deposition of InN using trimethylindium and ammonia plasma |
| 48 | Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films |
| 49 | Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma |
| 50 | Densification of Thin Aluminum Oxide Films by Thermal Treatments |
| 51 | ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium |
| 52 | Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator |
| 53 | Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx |
| 54 | Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
| 55 | Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor |
| 56 | Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization |
| 57 | Plasma enhanced atomic layer deposition of aluminum sulfide thin films |
| 58 | Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD |
| 59 | On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR |
| 60 | Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers |
| 61 | Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs |
| 62 | AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms |
| 63 | Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier |
| 64 | Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study |
| 65 | Innovative remote plasma source for atomic layer deposition for GaN devices |
| 66 | Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range |
| 67 | Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors |
| 68 | Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection |
| 69 | Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films |
| 70 | Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films |
| 71 | Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma |
| 72 | Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films |
| 73 | Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition |
| 74 | Plasma-enhanced atomic layer deposition of titanium vanadium nitride |
| 75 | Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition |
| 76 | Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation |
| 77 | Plasma-enhanced atomic layer deposition of tungsten nitride |
| 78 | Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2 |
| 79 | Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells |
| 80 | Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition |
| 81 | Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 |
| 82 | High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors |
| 83 | Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor |
| 84 | A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films |
| 85 | Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition |
| 86 | Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD |
| 87 | Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition |
| 88 | Growth of aluminum nitride films by plasma-enhanced atomic layer deposition |
| 89 | Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties |
| 90 | Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure |
| 91 | Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy |
| 92 | Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films |
| 93 | Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor |
| 94 | Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films |
| 95 | Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry |
| 96 | Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide |
| 97 | Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures |
| 98 | Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma |
| 99 | Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4 |
| 100 | Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time |
| 101 | Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma |
| 102 | Properties of AlN grown by plasma enhanced atomic layer deposition |
| 103 | Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension |
| 104 | Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films |
| 105 | Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy |
| 106 | Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma |
| 107 | ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window" |
| 108 | Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition |
| 109 | Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material |
| 110 | Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma |
| 111 | Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition |
| 112 | Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition |
| 113 | Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition |
| 114 | Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD |
| 115 | Ag films grown by remote plasma enhanced atomic layer deposition on different substrates |
| 116 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film |
| 117 | Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition |
| 118 | Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors |
| 119 | Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process |
| 120 | Plasma enhanced atomic layer deposition of SiNx:H and SiO2 |
| 121 | Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition |
| 122 | Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma |
| 123 | Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia |
| 124 | Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition |
| 125 | Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials |
| 126 | Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc |
| 127 | Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition |
| 128 | Plasma-enhanced atomic layer deposition of vanadium nitride |
| 129 | Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition |
| 130 | Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films |
| 131 | Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma |
| 132 | Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor |
| 133 | Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements |
| 134 | Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition |
| 135 | Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice |
| 136 | Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS |
| 137 | Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition |
| 138 | A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition |
| 139 | Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films |
| 140 | Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors |
| 141 | Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
| 142 | Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets |
| 143 | Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods |
| 144 | Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting |
| 145 | Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition |
| 146 | Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition |
| 147 | In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition |
| 148 | Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction |
| 149 | Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition |
| 150 | A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology |
| 151 | Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing |
| 152 | Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs |
| 153 | Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties |
| 154 | Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries |
| 155 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
| 156 | Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage |
| 157 | Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor |
| 158 | An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor |
| 159 | Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD |
| 160 | Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques |
| 161 | Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition |
| 162 | Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide |
| 163 | Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure |
| 164 | Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy |
| 165 | The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition |
| 166 | Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature |
| 167 | Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application |
| 168 | Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers |
| 169 | Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor |
| 170 | Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum |
| 171 | Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature |
| 172 | Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide |
| 173 | Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene] |
| 174 | Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition |
| 175 | Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition |
| 176 | Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride |
| 177 | Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films |
| 178 | Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane |
| 179 | Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures |
| 180 | Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources |
| 181 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
| 182 | Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes |
| 183 | Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution |
| 184 | Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries |
| 185 | Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition |
| 186 | Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide |
| 187 | Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors |
| 188 | In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides |
| 189 | High-Reflective Coatings For Ground and Space Based Applications |
| 190 | Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition |
| 191 | Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies |
| 192 | Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition |
| 193 | Plasma enhanced atomic layer deposition of Ga2O3 thin films |
| 194 | Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition |
| 195 | ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition |
| 196 | Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride |
| 197 | Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET |
| 198 | Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition |
| 199 | Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions |
| 200 | Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma |
| 201 | Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films |
| 202 | Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma |
| 203 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films |
| 204 | Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance |
| 205 | In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices |
| 206 | Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers |
| 207 | In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition |
| 208 | Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration |
| 209 | Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes |
| 210 | SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition |
| 211 | Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3 |
| 212 | Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources |
| 213 | Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage |
| 214 | Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor |
| 215 | Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition |
| 216 | Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3 |
| 217 | Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2 |
| 218 | HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition |
| 219 | Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films |
| 220 | Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2 |
| 221 | Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane |
| 222 | Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride |
| 223 | Antireflection Coating on PMMA Substrates by Atomic Layer Deposition |
| 224 | Optical properties and bandgap evolution of ALD HfSiOx films |
| 225 | Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films |
| 226 | Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors |
