Flat Band Voltage Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Flat Band Voltage returned 51 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
2A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
3Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
4Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
5Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
6Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
7Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
8Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
9Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
10Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
11Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
12Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
13Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
14Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
15Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
16Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
17Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
18Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
19Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
20Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
21Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
22Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
23Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
24HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
25Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack
26Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
27Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
28In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
29Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
30Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
31Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
32Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
33On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
34Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
35Passivation effects of atomic-layer-deposited aluminum oxide
36Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
37Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
38Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
39Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
40Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
41Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
42Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
43Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
44Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
45Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
46The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
47The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
48Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
49Trapped charge densities in Al2O3-based silicon surface passivation layers
50Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
51Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices


I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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