Resistivity, Sheet Resistance Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Resistivity, Sheet Resistance returned 142 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
2A route to low temperature growth of single crystal GaN on sapphire
3Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
4Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
5Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
6Atmospheric pressure plasma enhanced spatial ALD of silver
7Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
8Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
9Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
10Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
11Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
12Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant
13Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
14Atomic layer deposition of titanium nitride from TDMAT precursor
15Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
16Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
17Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
18Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
19Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
20Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
21Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier
22Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
23Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
24Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
25Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
26Copper-ALD Seed Layer as an Enabler for Device Scaling
27Correlation of carbon content with the thermal stability of ruthenium deposited by using RF-direct plasma-enhanced atomic-layer deposition
28Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
29Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
30Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
31Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
32Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
33Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
34Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
35Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
36Electronic and optical device applications of hollow cathode plasma assisted atomic layer deposition based GaN thin films
37Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
38Energy transformation of plasmonic photocatalytic oxidation on 1D quantum well of platinum thin film
39Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
40Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
41Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
42Evaluation of plasma parameters on PEALD deposited TaCN
43Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
44Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
45Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
46Fully CMOS-compatible titanium nitride nanoantennas
47Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
48Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
49High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
50High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
51Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
52Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
53Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
54Hydrogen plasma-enhanced atomic layer deposition of copper thin films
55Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
56Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
57In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
58In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
59Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
60Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
61Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
62Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
63Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
64Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
65Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
66Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
67Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
68Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
69Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
70Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
71Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
72Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
73Microwave properties of superconducting atomic-layer deposited TiN films
74Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
75PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
76PEALD of Copper using New Precursors for Next Generation of Interconnections
77Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
78Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
79Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
80Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
81Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
82Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
83Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
84Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
85Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
86Plasma-enhanced atomic layer deposition of amorphous Ru-Si-N thin film as a diffusion barrier of direct plating of Cu
87Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
88Plasma-Enhanced Atomic Layer Deposition of Ni
89Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
90Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
91Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
92Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
93Plasma-enhanced atomic layer deposition of superconducting niobium nitride
94Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
95Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
96Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
97Plasma-enhanced atomic layer deposition of tungsten nitride
98Plasma-Modified Atomic Layer Deposition
99Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
100Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
101Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
102Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
103Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
104Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
105Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
106Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
107Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
108Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
109Remote Plasma ALD of Platinum and Platinum Oxide Films
110Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
111Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
112Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
113Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
114Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
115Room-Temperature Atomic Layer Deposition of Platinum
116Ru thin film grown on TaN by plasma enhanced atomic layer deposition
117Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
118Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
119Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
120Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
121Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
122Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
123Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
124Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
125Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
126Study on the characteristics of aluminum thin films prepared by atomic layer deposition
127Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
128Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
129The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
130The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
131The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
132The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
133The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
134Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
135Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
136Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
137TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
138Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
139Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
140Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
141Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
142Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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