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Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A126 (2016)
Date:
2015-11-10
Author Information
| Name | Institution |
|---|---|
| Akinwumi A. Amusan | Otto-von-Guericke University |
| Bodo Kalkofen | Otto-von-Guericke University |
| Hassan Gargouri | Sentech Instruments GmbH |
| Klaus Wandel | Sentech Instruments GmbH |
| Cay Pinnow | Sentech Instruments GmbH |
| Marco Lisker | IHP |
| Edmund P. Burte | Otto-von-Guericke University |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Adhesion
Analysis: AFM, Atomic Force Microscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Adhesion
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Adhesion
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Dielectric Constant, Permittivity
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: XRF, X-Ray Fluorescence
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
| SiO2 |
| TiN |
| Ti |
| Co |
| Ni |
| W |
Notes
| 410 |