Publication Information

Title: Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films

Type: Journal

Info: J. Phys. Chem. C, 2015, 119 (21), pp 11786-11791

Date: 2015-05-08

DOI: http://dx.doi.org/10.1021/acs.jpcc.5b03255

Author Information

Name

Institution

Ghent University

Ghent University

Ghent University

Ghent University

Films

Plasma In2O3 using Custom

Deposition Temperature Range = 100-400C

34269-03-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

VG Scientific ESCALAB 220iXL

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D8 Discover

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Dimension Edge

Optical Properties

Ellipsometry

J.A. Woollam M-2000

Thickness

Ellipsometry

J.A. Woollam M-2000

Transmittance

Ellipsometry

J.A. Woollam M-2000

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Hiden Analytical QMS

Thickness

XRR, X-Ray Reflectivity

Bruker D8 Discover

Thickness

XRF, X-Ray Fluorescence

Bruker D8 Discover

Conformality, Step Coverage

XRF, X-Ray Fluorescence

Bruker D8 Discover

Substrates

SiO2

Keywords

Notes

352

Disclaimer

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