Publication Information

Title: Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates

Type: Journal

Info: Chem. Vap. Deposition 2007, 13, 408–413

Date: 2007-03-06

DOI: http://dx.doi.org/10.1002/cvde.200606519

Author Information

Name

Institution

University of Helsinki

University of Helsinki

University of Helsinki

University of Helsinki

University of Helsinki

Films

Deposition Temperature = 140C

0-0-0

1333-74-0

Deposition Temperature Range N/A

0-0-0

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Precursor Characterization

CHN Elemental Analysis

Unknown

Precursor Characterization

FTIR, Fourier Transform InfraRed spectroscopy

Unknown

Precursor Characterization

NMR, Nuclear Magnetic Resonance

Unknown

Precursor Characterization

QMS, Quadrupole Mass Spectrometer

Unknown

Precursor Characterization

SDTA, Simultaneous Difference Thermal Analysis

Unknown

Precursor Characterization

TGA, Thermo Gravimetric Analysis

Unknown

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Density

XRR, X-Ray Reflectivity

Bruker-Axs D8 Advance diffractometer/reflectometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker-Axs D8 Advance diffractometer/reflectometer

Morphology, Roughness, Topography

XRR, X-Ray Reflectivity

Bruker-Axs D8 Advance diffractometer/reflectometer

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Unknown

Resistivity, Sheet Resistance

Unknown

Unknown

Thickness

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Oxford INCA 350 Energy Spectrometer

Substrates

Glass

Silicon

Keywords

Atomic Layer Deposition

Plasma

Radicals

Silver

Notes

Aeronex GateKeeper gas purifiers used

41

Disclaimer

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