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Plasma-assisted atomic layer deposition and post-annealing enhancement of low resistivity and oxygen-free nickel nano-films using nickelocene and ammonia precursors
Type:
Journal
Info:
J. Mater. Chem. C, 2016, 4, 11059-11066
Date:
2016-10-30
Author Information
| Name | Institution |
|---|---|
| Yong-Ping Wang | Fudan University |
| Zi-Jun Ding | Fudan University |
| Qi-Xuan Liu | Fudan University |
| Wen-Jun Liu | Fudan University |
| Shi-Jin Ding | Fudan University |
| David Wei Zhang | Fudan University |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Work Function
Analysis: UPS, Ultraviolet Photoemission Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Substrates
Notes
| 957 |