Publication Information

Title: Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor

Type: Journal

Info: ACS Appl. Mater. Interfaces, 2014, 6 (10), pp 7316-7324

Date: 2014-04-29

DOI: http://dx.doi.org/10.1021/am5007222

Author Information

Name

Institution

Ghent University

Ghent University

Ghent University

Ghent University

Umicore

Ghent University

Films

Thermal TiN using Custom Rotary

Deposition Temperature = 150C

3275-24-9

7664-41-7

Plasma TiN using Custom Rotary

Deposition Temperature = 150C

3275-24-9

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

JEOL JSM-7600F

Images

SEM, Scanning Electron Microscopy

JEOL JSM-7600F

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Hiden Analytical QMS

Gas Phase Species

OES, Optical Emission Spectroscopy

Ocean Optics HR2000+

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Surface Science Instruments

Resistivity, Sheet Resistance

Resistivity Meter

Loresta GP MCP-T610

Thickness

XRF, X-Ray Fluorescence

Bruker Artax

Images

TEM, Transmission Electron Microscope

FEI Tecnai G2 F30

Chemical Composition, Impurities

ELS, EELS, Electron Energy Loss Spectroscopy

Unknown

Chemical Composition, Impurities

HAADF, High-Angle Annular Dark Field

Unknown

Substrates

ZnO

Keywords

Powders/Particles

Notes

Custom rotary PEALD and thermal ALD TiN on particles.

279

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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