Publication Information

Title: Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas

Type: Journal

Info: Electrochemical and Solid-State Letters, 13 (12) H426-H427 (2010)

Date: 2010-09-07

DOI: http://dx.doi.org/10.1149/1.3490413

Author Information

Name

Institution

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Films

Plasma TaCN using Custom

Deposition Temperature Range N/A

169896-41-7

1333-74-0

74-82-8

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Flat Band Voltage

C-V, Capacitance-Voltage Measurements

HP 4284A LCR

Work Function

C-V, Capacitance-Voltage Measurements

HP 4284A LCR

EOT, Equivalent Oxide Thickness

C-V, Capacitance-Voltage Measurements

HP 4284A LCR

Fixed Charge

C-V, Capacitance-Voltage Measurements

HP 4284A LCR

Resistivity, Sheet Resistance

Four-point Probe

Keithley 2400 Source Meter

Thickness

XRR, X-Ray Reflectivity

Unknown

Density

XRR, X-Ray Reflectivity

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

VG Scientific ESCALAB 220iXL

Bonding States

XPS, X-ray Photoelectron Spectroscopy

VG Scientific ESCALAB 220iXL

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Morphology, Roughness, Topography

Unknown

Unknown

Substrates

SiO2

Keywords

Gate Metal

Notes

Interesting sloped SiO2 film on Si by dipping in HF and slowly pulling it out.

450C anneal for 30min in forming gas.

80

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