Publication Information

Title: Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition

Type: Poster

Info: ALD 2012 Poster

Date: 2012-06-18

DOI: No DOI

Author Information

Name

Institution

Cambridge NanoTech

Cambridge NanoTech

Cambridge NanoTech

Cambridge NanoTech

Films

Deposition Temperature Range N/A

940895-79-4

7727-37-9

1333-74-0

Deposition Temperature Range N/A

635680-56-7

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

SIMS, Secondary Ion Mass Spectrometry

Unknown

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Thickness

Ellipsometry

Unknown

Substrates

SiO2

Keywords

Notes

127

Disclaimer

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