| 1 | Plasma enhanced atomic layer deposition of SiNx:H and SiO2 |
| 2 | Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition |
| 3 | ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors |
| 4 | Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition |
| 5 | Nitride memristors |
| 6 | Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions |
| 7 | High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors |
| 8 | Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor |
| 9 | Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension |
| 10 | Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition |
| 11 | Fundamental beam studies of radical enhanced atomic layer deposition of TiN |
| 12 | Silicon nanowire networks for multi-stage thermoelectric modules |
| 13 | Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition |
| 14 | Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN |
| 15 | Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2 |
| 16 | Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid |
| 17 | Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride |
| 18 | Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries |
| 19 | High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy |
| 20 | A controlled growth of WNx and WCx thin films prepared by atomic layer deposition |
| 21 | Fully CMOS-compatible titanium nitride nanoantennas |
| 22 | Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers |
| 23 | Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition |
| 24 | High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications |
| 25 | Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride |
| 26 | Modal properties of a strip-loaded horizontal slot waveguide |
| 27 | Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure |
| 28 | ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs |
| 29 | Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration |
| 30 | AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments |
| 31 | Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma |
| 32 | Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures |
| 33 | Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries |
| 34 | Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies |
| 35 | Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes |
| 36 | Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application |
| 37 | Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy |
| 38 | Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes |
| 39 | Atomic Layer Deposition of the Solid Electrolyte LiPON |
| 40 | High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition |
| 41 | Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties |
| 42 | Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors |
| 43 | Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks |
| 44 | Plasma-enhanced atomic layer deposition of tungsten nitride |
| 45 | Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid |
| 46 | Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition |
| 47 | Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy |
| 48 | Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition |
| 49 | ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices |
| 50 | Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition |
| 51 | SiCxNy-based resistive and threshold switching by using single precursor plasma-enhanced atomic layer deposition |
| 52 | Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor |
| 53 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
| 54 | Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition |
| 55 | Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators |
| 56 | Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology |
| 57 | Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition |
| 58 | Trilayer Tunnel Selectors for Memristor Memory Cells |
| 59 | Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer |
| 60 | Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation |
| 61 | Atomic layer epitaxy for quantum well nitride-based devices |
| 62 | Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition |
| 63 | Radical Enhanced Atomic Layer Deposition of Metals and Oxides |
| 64 | Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition |
| 65 | Atmospheric pressure plasma enhanced spatial ALD of silver |
| 66 | Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition |
| 67 | Atomic layer epitaxy for quantum well nitride-based devices |
| 68 | Analysis of nitrogen species in titanium oxynitride ALD films |
| 69 | Sub-nanometer heating depth of atomic layer annealing |
| 70 | Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma |
| 71 | Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition |
| 72 | Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy |
| 73 | High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2 |
| 74 | Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition |
| 75 | Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction |
| 76 | The role of plasma in plasma-enhanced atomic layer deposition of crystalline films |
| 77 | Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors |
| 78 | Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation |
| 79 | Correlation of interface states/border traps and threshold voltage shift on AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors |
| 80 | Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications |
| 81 | Plasma-enhanced atomic layer deposition of palladium on a polymer substrate |
| 82 | In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment |
| 83 | Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature |
| 84 | Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition |
| 85 | Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition |
| 86 | Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma |
| 87 | Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process |
| 88 | AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD |
| 89 | Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks |
| 90 | Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition |
| 91 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma |
| 92 | Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
| 93 | Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics |
| 94 | Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers |
| 95 | Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor |
| 96 | Growth of aluminum nitride films by plasma-enhanced atomic layer deposition |
| 97 | The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films |
| 98 | Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry |
| 99 | Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method |
| 100 | Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films |
| 101 | XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition |
| 102 | Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition |
| 103 | Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition |
| 104 | Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources |
| 105 | Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma |
| 106 | Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction |
| 107 | Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration |
| 108 | Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy |
| 109 | Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices |
| 110 | Large-scale synthesis of uniform hexagonal boron nitride films by plasma-enhanced atomic layer deposition |
| 111 | Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights |
| 112 | Microwave properties of superconducting atomic-layer deposited TiN films |
| 113 | Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods |
| 114 | Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods |
| 115 | Annealing behavior of ferroelectric Si-doped HfO2 thin films |
| 116 | Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study |
| 117 | Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity |
| 118 | Atomic layer epitaxy for quantum well nitride-based devices |
| 119 | Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition |
| 120 | Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals |
| 121 | Practical Challenges of Processing III-Nitride/Graphene/SiC Devices |
| 122 | Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures |
| 123 | Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition |
| 124 | PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen |
| 125 | Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas |
| 126 | Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition |
| 127 | Performance of Samples with Novel SRF Materials and Growth Techniques |
| 128 | Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material |
| 129 | Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study |
| 130 | Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition |
| 131 | Plasma-enhanced atomic layer deposition of Co on metal surfaces |
| 132 | Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals |
| 133 | Atomic layer deposition of titanium nitride from TDMAT precursor |
| 134 | Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition |
| 135 | Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition |
| 136 | Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures |
| 137 | Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties |
| 138 | Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature |
| 139 | Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films |
| 140 | Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices |
| 141 | Atomic layer deposition of TiN for the fabrication of nanomechanical resonators |
| 142 | Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells |
| 143 | Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode |
| 144 | Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition |
| 145 | Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications |
| 146 | Plasma-enhanced atomic layer deposition of titanium vanadium nitride |
| 147 | Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries |
| 148 | In-gap states in titanium dioxide and oxynitride atomic layer deposited films |
| 149 | Plasma-enhanced atomic layer deposition of vanadium nitride |
| 150 | Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization |
| 151 | Structural and optical characterization of low-temperature ALD crystalline AlN |
| 152 | Radical Enhanced Atomic Layer Deposition of Metals and Oxides |
| 153 | Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor |
| 154 | Perspectives on future directions in III-N semiconductor research |
| 155 | The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation |
| 156 | Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers |
| 157 | Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer |
| 158 | Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma |
| 159 | Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase |
| 160 | Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx |
| 161 | Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements |
| 162 | Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy |
| 163 | Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric |
| 164 | Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma |
| 165 | AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms |
| 166 | Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition |
| 167 | New materials for memristive switching |
| 168 | Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD |
| 169 | Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers |
| 170 | Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films |
| 171 | Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor |
| 172 | Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time |
| 173 | In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition |
| 174 | Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments |
| 175 | Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer |
| 176 | Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition |
| 177 | Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition |
| 178 | Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor |
| 179 | Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics |
| 180 | Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation |
| 181 | The effects of plasma treatment on the thermal stability of HfO2 thin films |
| 182 | Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition |
| 183 | Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering |
| 184 | Plasma-Assisted ALD of LiPO(N) for Solid State Batteries |
| 185 | ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors |
| 186 | GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation |
| 187 | A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition |
| 188 | Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma |
| 189 | Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition |
| 190 | Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
| 191 | Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition |
| 192 | Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering |
| 193 | Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition |
| 194 | Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum |
| 195 | Plasma-enhanced atomic layer deposition of titanium vanadium nitride |
| 196 | Nitride memristors |
| 197 | Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights |
| 198 | Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions |
| 199 | Perspectives on future directions in III-N semiconductor research |
| 200 | AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing |
| 201 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma |
| 202 | Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors |
| 203 | Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies |
| 204 | In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films |
| 205 | Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN |
| 206 | Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition |
| 207 | Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System |
| 208 | Film Uniformity in Atomic Layer Deposition |
| 209 | Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition |
| 210 | Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN |
| 211 | A route to low temperature growth of single crystal GaN on sapphire |
| 212 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
| 213 | Perspectives on future directions in III-N semiconductor research |
| 214 | Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures |
| 215 | Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy |
| 216 | In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition |
| 217 | Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films |
| 218 | Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition |
| 219 | Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing |
| 220 | Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition |
| 221 | Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition |
| 222 | Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes |
| 223 | Compatibility of AlN/SiNx Passivation With LPCVD-SiNx Gate Dielectric in GaN-Based MIS-HEMT |
| 224 | Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3 |
| 225 | Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates |
| 226 | Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations |
| 227 | Sub-10-nm ferroelectric Gd-doped HfO2 layers |
| 228 | PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity |
| 229 | Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator |
| 230 | Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals |
| 231 | Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8] |
| 232 | Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer |
| 233 | Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs |
| 234 | Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor |
| 235 | Perspectives on future directions in III-N semiconductor research |
| 236 | Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition |
| 237 | Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils |
| 238 | Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance |
| 239 | Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD |
| 240 | Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier |
| 241 | Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy |
| 242 | Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating |
| 243 | AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers |
| 244 | Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films |
| 245 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
| 246 | Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane |
| 247 | AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs |
| 248 | Gallium nitride thin films by microwave plasma-assisted ALD |
| 249 | The physical properties of cubic plasma-enhanced atomic layer deposition TaN films |
| 250 | Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma |
| 251 | In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment |
| 252 | New materials for memristive switching |
| 253 | Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs |
| 254 | Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN |
| 255 | Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas |
| 256 | Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten |
| 257 | Atomic Layer Deposition of Niobium Nitride from Different Precursors |
| 258 | Atomic layer deposition of titanium nitride for quantum circuits |
| 259 | Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
| 260 | Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films |
| 261 | Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition |
| 262 | A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition |
| 263 | Plasma Enhanced Atomic Layer Deposition of SiN:H Using N2 and Silane |
| 264 | Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition |
| 265 | AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition |
| 266 | Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition |
| 267 | Plasma-enhanced atomic layer deposition of titanium vanadium nitride |
| 268 | Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films |
| 269 | Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor |
| 270 | Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter |
| 271 | Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures |
| 272 | Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition |
| 273 | Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices |
| 274 | Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment |
| 275 | Gadolinium nitride films deposited using a PEALD based process |
| 276 | Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth |
| 277 | Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals |
| 278 | Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation |
| 279 | Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes |
| 280 | Plasma-enhanced atomic layer deposition of superconducting niobium nitride |
| 281 | In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating |
| 282 | A controlled growth of WNx and WCx thin films prepared by atomic layer deposition |
| 283 | Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films |
| 284 | The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties |
| 285 | Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions |
| 286 | Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry |
| 287 | Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique |
| 288 | Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition |
| 289 | Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures |
| 290 | In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices |
| 291 | Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs |
| 292 | Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer |
| 293 | An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices |
| 294 | Effects of Recessed-Gate Structure on AlGaN/GaN-on-SiC MIS-HEMTs with Thin AlOxNy MIS Gate |
| 295 | Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
| 296 | Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment |
| 297 | Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition |
| 298 | Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry |
| 299 | Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films |
| 300 | Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process |
| 301 | Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride |
| 302 | The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition |
| 303 | Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation |
| 304 | Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique |
| 305 | Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications |
| 306 | Fabrication and deformation of three-dimensional hollow ceramic nanostructures |
| 307 | Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition |
| 308 | Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor |
| 309 | Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition |
| 310 | Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films |
| 311 | Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes |
| 312 | Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid |
| 313 | Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories |
| 314 | Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique |
| 315 | Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy |
| 316 | Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices |
| 317 | Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant |
| 318 | Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources |
| 319 | TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD |
| 320 | Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition |
| 321 | Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires |
| 322 | Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper |
| 323 | Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects |
| 324 | Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting |
| 325 | Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition |
| 326 | Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer |
| 327 | Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization |
| 328 | Characteristics of TiO2 Films Prepared by ALD With and Without Plasma |
| 329 | Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition |
| 330 | Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor |
| 331 | Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy |
| 332 | Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry |
| 333 | Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition |
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