Publication Information

Title: Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN

Type: Journal

Info: 2014 J. Phys. D: Appl. Phys. 47 345104

Date: 2014-06-24

DOI: http://dx.doi.org/10.1088/0022-3727/47/34/345104

Author Information

Name

Institution

University of Alberta

University of Alberta

University of Alberta

University of Alberta

University of Alberta

Films

Deposition Temperature = 250C

75-24-1

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000D

Substrates

Keywords

Notes

561

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