Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN

Type:
Journal
Info:
2014 J. Phys. D: Appl. Phys. 47 345104
Date:
2014-06-24

Author Information

Name Institution
Kevin VoonUniversity of Alberta
Kyle BotheUniversity of Alberta
Pouyan MotamediUniversity of Alberta
Kenneth C. CadienUniversity of Alberta
Douglas W. BarlageUniversity of Alberta

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Notes

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