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Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 8(9) F25-F28(2005)
Date:
2005-05-03
Author Information
| Name | Institution |
|---|---|
| Jung Wook Lim | Electronics and Telecommunication Research Institute, (ETRI) |
| Sun Jin Yun | Electronics and Telecommunication Research Institute, (ETRI) |
| Jin Ho Lee | Electronics and Telecommunication Research Institute, (ETRI) |
Films
Film/Plasma Properties
Substrates
Notes
| 192 |