Publication Information

Title: Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor

Type: Journal

Info: Chem. Mater., 2015, 27 (10), pp 3628-3635

Date: 2015-05-05

DOI: http://dx.doi.org/10.1021/acs.chemmater.5b00255

Author Information

Name

Institution

Ghent University

Ghent University

Ghent University

Ghent University

Films

Thermal MnOx using Custom ICP

Deposition Temperature Range = 150-250C

14324-99-3

10028-15-6

Plasma MnOx using Custom ICP

Deposition Temperature = 180C

14324-99-3

1333-74-0

Plasma MnOx using Custom ICP

Deposition Temperature = 180C

14324-99-3

7732-18-5

Deposition Temperature = 180C

14324-99-3

7727-37-9

Deposition Temperature = 180C

14324-99-3

7782-44-7

Plasma MnOx using Custom ICP

Deposition Temperature Range = 140-280C

14324-99-3

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000

Thickness

XRR, X-Ray Reflectivity

Bruker D8 Discover

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D8 Discover

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Dimension Edge

Electrochemical Performance

Galvanostatic Cycling

Metrohm Autolab PGSTAT302

Electrochemical Performance

CV, Cyclic Voltammetry

Metrohm Autolab PGSTAT302

Unknown

XRF, X-Ray Fluorescence

Unknown

Substrates

SiO2

TiN

Keywords

Batteries

Lithium-ion

PEALD Film Development

Notes

N2 plasma gave films with mostly C and N.

O2 plasma gave non-uniform films without saturation up to 120 seconds.

317

Disclaimer

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