Publication Information

Title: Plasma-enhanced atomic layer deposition of palladium on a polymer substrate

Type: Journal

Info: Chem. Vap. Deposition 2007, 13, 307–311

Date: 2007-07-10

DOI: http://dx.doi.org/10.1002/cvde.200606508

Author Information

Name

Institution

Rensselaer Polytechnic Institute (RPI)

Rensselaer Polytechnic Institute (RPI)

Rensselaer Polytechnic Institute (RPI)

State University of New York at Albany

Rensselaer Polytechnic Institute (RPI)

Rensselaer Polytechnic Institute (RPI)

Films

Plasma Pd using Custom ICP

Deposition Temperature = 80C

64916-48-9

1333-74-0

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Unknown

Gas Phase Species

QMS, Quadrupole Mass Spectrometer

Stanford Research Systems RGA-300

Thickness

RBS, Rutherford Backscattering Spectrometry

Custom

Substrates

poly(p-xylene)

Parylene-N

PPX

Si with native oxide

Keywords

Amine

Palladium

Parylene-N

Plasma-Enhanced Atomic Layer Deposition

Polymer

Notes

30

Disclaimer

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