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Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2015, 7 (40), pp 22525-22532
Date:
2015-09-22
Author Information
| Name | Institution |
|---|---|
| Anne-Marije Andringa | Eindhoven University of Technology |
| Alberto Perrotta | Eindhoven University of Technology |
| Koen de Peuter | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Mariadriana Creatore | Eindhoven University of Technology |
Films
Plasma SiNx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Porosity
Analysis: Ellipsometric Porosimetry (EP)
Characteristic: Barrier Characteristics
Analysis: Calcium Test
Substrates
| Si with native oxide |
Notes
| 383 |